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    • 4. 发明申请
    • LOW LEAKAGE BIDIRECTIONAL CLAMPS AND METHODS OF FORMING THE SAME
    • 低泄漏双向夹子及其形成方法
    • US20160204096A1
    • 2016-07-14
    • US14594394
    • 2015-01-12
    • Analog Devices, Inc.
    • James ZhaoJavier Alejandro Salcedo
    • H01L27/02H03K17/567H01L29/06H01L21/8222H01L49/02H01L29/10
    • H01L27/0262H01L21/8222H01L28/20H01L29/0638H01L29/0649H01L29/1095H01L29/861H03K17/567
    • Low leakage bidirectional clamps and methods of forming the same are provided. In certain configurations, a bidirectional clamp includes a first p-well region, a second p-well region, and an n-well region positioned between the first and second p-wells regions. The bidirectional clamp further includes two or more oxide regions over the n-well region, and one or more n-type active (N+) dummy blocking current regions are positioned between the oxide regions. The one or more N+ dummy leakage current blocking regions interrupt an electrical path from the first p-type well region to the second p-type well region along interfaces between the n-well region and the oxide regions. Thus, even when charge accumulates at the interfaces due to extended high voltage, e.g., >60V, and/or high temperature operation (e.g., >125° C.), the N+ dummy leakage current blocking regions inhibit charge trapping-induced leakage current.
    • 提供了低泄漏双向夹具及其形成方法。 在某些配置中,双向钳位包括第一p阱区,第二p阱区和位于第一和第二p阱区之间的n阱区。 双向夹具还包括在n阱区域上的两个或更多个氧化物区域,并且一个或多个n型有源(N +)虚拟阻挡电流区域位于氧化物区域之间。 一个或多个N +虚设泄漏电流阻断区域沿着n阱区域和氧化物区域之间的界面中断从第一p型阱区域到第二p型阱区域的电路径。 因此,即使当由于延长的高电压(例如> 60V)和/或高温操作(例如> 125℃)在接口处累积电荷时,N +虚设泄漏电流阻挡区域抑制电荷捕获诱发的漏电流 。