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    • 1. 发明授权
    • Formation of masks/reticles having dummy features
    • 形成具有虚拟特征的掩模/掩模版
    • US08176447B2
    • 2012-05-08
    • US12791942
    • 2010-06-02
    • Amit KumarHoward Smith LandisJeanne-Tania Sucharitaves
    • Amit KumarHoward Smith LandisJeanne-Tania Sucharitaves
    • G06F17/50
    • G03F1/36
    • A method of forming a mask. The method includes providing design information of a design layer. The design layer includes M original design features and N original dummy features. The method further includes (i) creating a cluster of P representative dummy features, P being a positive integer less than N, (ii) performing OPC for the cluster of the P representative dummy features but not for the N original dummy features, resulting in P OPC-applied representative dummy features, and (iii) forming the mask including N mask dummy features. The N mask dummy features are identical. Each mask dummy feature of the N mask dummy features of the mask has an area which is a function of at least an area of an OPC-applied representative dummy feature of the P OPC-applied representative dummy features. The N mask dummy features have the same relative positions as the N original dummy features.
    • 一种形成掩模的方法。 该方法包括提供设计层的设计信息。 设计层包括M原始设计特征和N个原始虚拟特征。 该方法还包括(i)创建P代表虚拟特征的聚类,P是小于N的正整数,(ii)对P代表虚拟特征的簇进行OPC,而不对N个原始伪特征执行OPC,导致 P OPC应用的代表虚拟特征,以及(iii)形成包括N个掩模虚拟特征的掩模。 N个掩码虚拟特征是相同的。 掩模的N个掩模虚拟特征的每个掩码虚拟特征具有至少是应用于P OPC应用的代表虚拟特征的OPC应用的代表性虚拟特征的区域的函数的区域。 N个掩模虚拟特征具有与N个原始虚拟特征相同的相对位置。
    • 2. 发明申请
    • FORMATION OF MASKS/RETICLES HAVING DUMMY FEATURES
    • 形成具有不同特征的掩蔽物/反应物
    • US20100242012A1
    • 2010-09-23
    • US12791942
    • 2010-06-02
    • Amit KumarHoward Smith LandisJeanne-Tania Sucharitaves
    • Amit KumarHoward Smith LandisJeanne-Tania Sucharitaves
    • G06F17/50
    • G03F1/36
    • A method of forming a mask. The method includes providing design information of a design layer. The design layer includes M original design features and N original dummy features. The method further includes (i) creating a cluster of P representative dummy features, P being a positive integer less than N, (ii) performing OPC for the cluster of the P representative dummy features but not for the N original dummy features, resulting in P OPC-applied representative dummy features, and (iii) forming the mask including N mask dummy features. The N mask dummy features are identical. Each mask dummy feature of the N mask dummy features of the mask has an area which is a function of at least an area of an OPC-applied representative dummy feature of the P OPC-applied representative dummy features. The N mask dummy features have the same relative positions as the N original dummy features.
    • 一种形成掩模的方法。 该方法包括提供设计层的设计信息。 设计层包括M原始设计特征和N个原始虚拟特征。 该方法还包括(i)创建P代表虚拟特征的聚类,P是小于N的正整数,(ii)对P代表虚拟特征的簇进行OPC,而不对N个原始伪特征执行OPC,导致 P OPC应用的代表虚拟特征,以及(iii)形成包括N个掩模虚拟特征的掩模。 N个掩码虚拟特征是相同的。 掩模的N个掩模虚拟特征的每个掩码虚拟特征具有至少是应用于P OPC应用的代表虚拟特征的OPC应用的代表性虚拟特征的区域的函数的区域。 N个掩模虚拟特征具有与N个原始虚拟特征相同的相对位置。
    • 3. 发明授权
    • Formation of masks/reticles having dummy features
    • 形成具有虚拟特征的掩模/掩模版
    • US07739648B2
    • 2010-06-15
    • US11673611
    • 2007-02-12
    • Amit KumarHoward Smith LandisJeanne-Tania Sucharitaves
    • Amit KumarHoward Smith LandisJeanne-Tania Sucharitaves
    • G06F17/50
    • G03F1/36
    • Structures and methods for forming the same. The method includes providing design information of a design layer. The design layer includes M original design features and N original dummy features. The method further includes (i) creating a cluster of P representative dummy features, P being a positive integer less than N, (ii) performing OPC for the cluster of the P representative dummy features but not for the N original dummy features, resulting in P OPC-applied representative dummy features, and (iii) forming the mask including N mask dummy features. The N mask dummy features are identical. Each mask dummy feature of the N mask dummy features of the mask has an area which is a function of at least an area of an OPC-applied representative dummy feature of the P OPC-applied representative dummy features. The N mask dummy features have the same relative positions as the N original dummy features.
    • 用于形成它的结构和方法。 该方法包括提供设计层的设计信息。 设计层包括M原始设计特征和N个原始虚拟特征。 该方法还包括(i)创建P代表虚拟特征的聚类,P是小于N的正整数,(ii)对于P代表虚拟特征的簇执行OPC,而不对N个原始伪特征执行OPC,导致 P OPC应用的代表虚拟特征,以及(iii)形成包括N个掩模虚拟特征的掩模。 N个掩码虚拟特征是相同的。 掩模的N个掩模虚拟特征的每个掩码虚拟特征具有至少是应用于P OPC的代表虚拟特征的OPC应用的代表性虚拟特征的区域的函数的面积。 N个掩模虚拟特征具有与N个原始虚拟特征相同的相对位置。
    • 4. 发明申请
    • FORMATION OF MASKS/RETICLES HAVING DUMMY FEATURES
    • 形成具有不同特征的掩蔽物/反应物
    • US20080195995A1
    • 2008-08-14
    • US11673611
    • 2007-02-12
    • Amit KumarHoward Smith LandisJeanne-Tania Sucharitaves
    • Amit KumarHoward Smith LandisJeanne-Tania Sucharitaves
    • G06F17/50
    • G03F1/36
    • Structures and methods for forming the same. The method includes providing design information of a design layer. The design layer includes M original design features and N original dummy features. The method further includes (i) creating a cluster of P representative dummy features, P being a positive integer less than N, (ii) performing OPC for the cluster of the P representative dummy features but not for the N original dummy features, resulting in P OPC-applied representative dummy features, and (iii) forming the mask including N mask dummy features. The N mask dummy features are identical. Each mask dummy feature of the N mask dummy features of the mask has an area which is a function of at least an area of an OPC-applied representative dummy feature of the P OPC-applied representative dummy features. The N mask dummy features have the same relative positions as the N original dummy features.
    • 用于形成它的结构和方法。 该方法包括提供设计层的设计信息。 设计层包括M原始设计特征和N个原始虚拟特征。 该方法还包括(i)创建P代表虚拟特征的聚类,P是小于N的正整数,(ii)对P代表虚拟特征的簇进行OPC,而不对N个原始伪特征执行OPC,导致 P OPC应用的代表虚拟特征,以及(iii)形成包括N个掩模虚拟特征的掩模。 N个掩码虚拟特征是相同的。 掩模的N个掩模虚拟特征的每个掩码虚拟特征具有至少是应用于P OPC应用的代表虚拟特征的OPC应用的代表性虚拟特征的区域的函数的区域。 N个掩模虚拟特征具有与N个原始虚拟特征相同的相对位置。
    • 10. 发明授权
    • Surfacing business applications based on calling activities
    • 基于呼叫活动来覆盖业务应用程序
    • US09369562B2
    • 2016-06-14
    • US13398351
    • 2012-02-16
    • Milind MahajanAmit Kumar
    • Milind MahajanAmit Kumar
    • H04M1/725H04M1/56H04M1/57
    • H04M1/72525H04M1/56H04M1/57H04M1/72569H04M2250/60
    • Computer-readable media, computer systems, and computing methods are provided for discovering applications using phone-number information. Initially, an application uploaded to an application marketplace is targeted. Phone numbers associated with the targeted application are discovered by identifying attributes of the targeted application from metadata associated therewith in the application marketplace, and identifying the phone numbers that reach at least one business affiliated with the targeted application or are relevant to the identified attributes of the targeted application. The associated phone numbers are mapped to the targeted application and maintained within an application manifest. Upon detecting user-initiated call-based operation(s) at a client device, the phone number(s) involved in the call-based operation(s) are compared against the application manifest to determine relevant applications. The relevant applications are distributed to the client device for presentation within a phone-number context, such as placing an outgoing call, receiving an incoming call, or reviewing a call-history log.
    • 提供计算机可读介质,计算机系统和计算方法,用于使用电话号码信息来发现应用。 最初,上传到应用程序市场的应用程序是针对性的。 与目标应用相关联的电话号码通过从应用市场中与其相关的元数据识别目标应用的属性来发现,并且识别到达至少一个与目标应用有关的业务的电话号码,或者与所标识的属性相关 有针对性的应用。 相关联的电话号码映射到目标应用程序并保存在应用程序清单中。 在客户端设备检测用户发起的基于呼叫的操作时,将基于呼叫的操作中涉及的电话号码与应用程序清单进行比较以确定相关的应用程序。 将相关应用程序分发到客户端设备,以便在电话号码上下文中进行呈现,例如放置呼出呼叫,接收来电或查看呼叫历史日志。