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1. 发明申请

US20070211232A1 Thermophoretic Techniques for Protecting Reticles from Contaminants 审中-公开
标题翻译：用于保护网状物免受污染物的热解技术
公开(公告)号：US20070211232A1
公开(公告)日：2007-09-13
申请号：US10578752
申请日：2004-11-10
申请人： Alton Phillips , Michael Sogard , Douglas Watson , Keiichi Tanaka
发明人： Alton Phillips , Michael Sogard , Douglas Watson , Keiichi Tanaka
IPC分类号： G03B27/52
CPC分类号： G03F7/70741 , G03B27/52 , G03F1/82 , G03F7/70875 , G03F7/70916
摘要： Thermophoresis within lithography systems for protecting reticles from contaminants (e.g., floating particles). Generally, thermophoretic protection is implemented by maintaining the reticle at a higher temperature than its surrounding environment. Thermophoretic protection can be maintained throughout a reticle's use in a lithography system. For example, a reticle can be thermophoretically protected while in storage, through various stages of transportation via a reticle handler (also referred to as an end-effector), to its period of use while attached to a reticle chuck.
摘要翻译：在光刻系统内进行热电泳以保护掩模版免受污染物（例如浮动颗粒）的影响。通常，通过将掩模版保持在比周围环境更高的温度下来实现热保护。在光刻系统中使用的掩模版可以保持热保护。例如，在通过分划板处理器（也称为末端执行器）的各种运输阶段到存储期间，在将光罩保持在其使用期间，同时附着于标线盘卡盘上，可以对掩模版进行热保护。

2. 发明申请

US20070170379A1 Cooled optical filters and optical systems comprising same 审中-公开
标题翻译：冷却的光学滤波器和包括它们的光学系统
公开(公告)号：US20070170379A1
公开(公告)日：2007-07-26
申请号：US11338951
申请日：2006-01-24
申请人： Douglas Watson , Alton Phillips , Michael Sogard
发明人： Douglas Watson , Alton Phillips , Michael Sogard
IPC分类号： G21F3/00
CPC分类号： G02B5/22 , G02B7/008 , G02B26/007 , G03F7/70575
摘要： An exemplary apparatus for filtering electromagnetic radiation includes a filter element, an actuator, and a filter-cooler. The filter element has multiple selectable regions situated so that electromagnetic radiation impinges on a selected filter region to transmit therethrough a first wavelength while limiting transmission of a second wavelength. Absorption of impinging radiation heats the filter element, but the actuator moves the filter element to select a particular filter region for impingement by the radiation while moving another region away from impingement by the radiation. The filter-cooler directs a heat-conduction medium (e.g., a gas) at, and thus cools, the moved-away region. By such ongoing refreshment of portions of the filter element being irradiated and portions being cooled, the filter element can be irradiated for extended periods without thermal damage. An important use is in optical systems for EUV lithography.
摘要翻译：用于过滤电磁辐射的示例性装置包括过滤元件，致动器和过滤器 - 冷却器。滤波器元件具有多个可选择区域，其位置使得电磁辐射照射到所选择的滤波器区域上，以便透射第一波长，同时限制第二波长的透射。冲击辐射的吸收加热过滤元件，但是致动器移动过滤器元件以选择特定的过滤器区域，以便通过辐射冲击另一区域而远离辐射的冲击。过滤器 - 冷却器将导热介质（例如，气体）引导到移动的区域，并且因此冷却移动的区域。通过正在照射的过滤元件的部分和正在冷却的部分的这种持续更新，可以长时间地对过滤元件进行照射，而不会发生热损伤。一个重要的用途是用于EUV光刻的光学系统。

3. 发明申请

US20060066834A1 EUV reticle handling system and method 失效
公开(公告)号：US20060066834A1
公开(公告)日：2006-03-30
申请号：US11238237
申请日：2005-09-28
申请人： Alton Phillips , Michael Sogard , Douglas Watson
发明人： Alton Phillips , Michael Sogard , Douglas Watson
IPC分类号： G03B27/62
CPC分类号： G03F7/70741
摘要： An enclosure for protecting at least a pattern side and an opposing side of a reticle is disclosed. The enclosure includes a first and second part that form an enclosure around a reticle to be protected during handling, inspection, storage, and transport. The enclosure in conjunction with a heater and heat sink provides thermophoretic protection of an enclosed reticle.

4. 发明授权

US06989922B2 Deformable mirror actuation system 失效
公开(公告)号：US06989922B2
公开(公告)日：2006-01-24
申请号：US10373687
申请日：2003-02-27
申请人： Alton Phillips , Michael Sogard
发明人： Alton Phillips , Michael Sogard
IPC分类号： G02B26/08 , G02B26/00 , G02B27/00
CPC分类号： G03F7/70233 , G02B26/0825 , G03F7/70266 , G03F7/70275
摘要： Mechanical control and actuation of an adaptive optical element provides highly stable and repeatable correction of the shape of an optical element to an accuracy of a small fraction of a very short wavelength of light, responsive to a metrology source and sensor arrangement. Actuators in the form of individual set-screws or other actuators capable of axially positioning a shaft are driven by a robotic screw driver with four degrees of freedom or one or more linear actuators to exert force on the mirror. Positive or negative force may be used for outward and/or inward deflection of the mirror. When a desired force is developed on the mirror through a mechanical linkage, the linkage may be clamped by a passive clamp which may be released by an actuator such that the adjustment is maintained while the linear actuator and the clamp actuator are turned off; yielding a highly stable adjustment while effectively removing sources of actuator drift, noise, vibration and heating which may adversely affect stability.

5. 发明申请

US20070211352A1 Aperture changing apparatus and method 审中-公开
标题翻译：孔径改变装置和方法
公开(公告)号：US20070211352A1
公开(公告)日：2007-09-13
申请号：US11372824
申请日：2006-03-09
申请人： Alton Phillips , Douglas Watson
发明人： Alton Phillips , Douglas Watson
IPC分类号： G02B9/00
CPC分类号： G03F7/70825 , G02B5/005 , G03F7/70091 , G03F7/701 , G21K1/04
摘要： An apparatus for rotating apertures from a storage position not in a desired plane to a “in use” position in a desired plane. The stored position of the apertures does not interfere with a radiation beam path of an optical system. The apparatus may compactly store multiple apertures and may position a smaller aperture in a desired plane without removing a larger aperture from the desired plane.
摘要翻译：一种用于将孔从不在所需平面的存储位置旋转到期望平面中的“使用中”位置的装置。孔的存储位置不干涉光学系统的辐射束路径。该设备可以紧凑地存储多个孔，并且可以在期望的平面中定位较小的孔，而不从期望的平面移除较大的孔。

6. 发明申请

US20070268476A1 KINEMATIC CHUCKS FOR RETICLES AND OTHER PLANAR BODIES 审中-公开
标题翻译：用于反应和其他平面机构的动力卡
公开(公告)号：US20070268476A1
公开(公告)日：2007-11-22
申请号：US11749706
申请日：2007-05-16
申请人： Alton Phillips , Douglas Watson , W. Novak
发明人： Alton Phillips , Douglas Watson , W. Novak
IPC分类号： G03B27/62
CPC分类号： G03F7/70783 , G03F7/707
摘要： Devices are disclosed for holding and moving a planar body such as a reticle as used, for example, in microlithography. An exemplary device includes a stage and a body chuck. The stage has a movable support surface. A proximal region of a first membrane is mounted to the support surface. A distal region of the first membrane extends from the support surface and is coupled to the chuck such that the first membrane at least partially supports the chuck. The chuck includes a surface from which multiple pins extend. The surface is situated at the distal region. The pins are arrayed to contact and support a respective region of the body. The pin arrangement is configured such that, during movements of the chuck imparted by the support surface, body slippage relative to the pins due to forces caused by the movement is substantially uniform at each pin.
摘要翻译：公开了用于保持和移动例如在微光刻中使用的诸如掩模版的平面体的装置。示例性装置包括台架和车身卡盘。舞台具有可移动的支撑表面。第一膜的近侧区域安装到支撑表面。第一膜的远侧区域从支撑表面延伸并且联接到卡盘，使得第一膜至少部分地支撑卡盘。卡盘包括多个销延伸的表面。表面位于远端区域。引脚被排列成接触和支撑身体的相应区域。销配置被构造成使得在由支撑表面赋予的卡盘的移动期间，由于由运动引起的力，相对于销的主体滑动在每个销处基本均匀。

7. 发明申请

US20060176460A1 Lithographic optical systems including exchangeable optical-element sets 审中-公开
标题翻译：平版光学系统包括可交换的光学元件组
公开(公告)号：US20060176460A1
公开(公告)日：2006-08-10
申请号：US11233968
申请日：2005-09-23
申请人： Alton Phillips , Douglas Watson
发明人： Alton Phillips , Douglas Watson
IPC分类号： G03B27/54
CPC分类号： G03F7/70975
摘要： Optical systems are disclosed for use in lithography systems, especially extreme-ultraviolet (EUV) lithography systems. An exemplary optical system includes at least a first optical-element set and a second optical-element set that are collectively configured to perform an optical function in which, for example, the first and second optical-element sets receive an EUV light flux from an EUV source and direct the EUV light flux to a pattern master so as to illuminate a selected region of the pattern master. At least one of the first and second optical-element sets is provided as an ensemble of multiple counterpart optical-element sets that are individually selectable for positioning and use at an operational position for performing the optical function. For each ensemble, a respective exchange mechanism holds the ensemble and moves a selected counterpart optical-element set of the ensemble from an off-line position for placement at the operational position and to move another counterpart optical-element set of the ensemble from the operational position to an off-line position.
摘要翻译：光学系统被公开用于光刻系统，特别是极紫外（EUV）光刻系统。示例性的光学系统包括至少第一光学元件组和第二光学元件组，其被共同配置为执行光学功能，其中例如第一和第二光学元件组接收来自 EUV源并将EUV光通量引导到图案母版，以照亮图案母版的选定区域。第一和第二光学元件组中的至少一个被提供为多个对应的光学元件组的集合，其可以单独地选择用于在用于执行光学功能的操作位置处的定位和使用。对于每个集合，相应的交换机构保持整体并且从离线位置移动所选集成的组合的光学元件组，以便放置在操作位置，并且从操作位置移动组合的另一个对应的光学元件组位置到离线位置。

8. 发明申请

US20060126039A9 MULTIPLE SYSTEM VIBRATION ISOLATOR 有权
标题翻译：多系统振动隔离器
公开(公告)号：US20060126039A9
公开(公告)日：2006-06-15
申请号：US10186876
申请日：2002-06-28
申请人： Alton Phillips , Douglas Watson , Andrew Hazelton
发明人： Alton Phillips , Douglas Watson , Andrew Hazelton
IPC分类号： G03B27/42
CPC分类号： F16F15/0232 , F16F9/02
摘要： A vibration isolator (200) for isolating a first assembly (206) from vibration from a second assembly (208) includes a first system (202) and a second system (204) coupled to the first system (202). In one embodiment, the first system (202) supports the majority of the first assembly (206) relative to the second assembly (208) and the second system (204) adjusts for a change in the location of the center of gravity of the first assembly (206). Further, the second system (204) can be used to compensate for fluctuations in the atmospheric pressure near the vibration isolator (200).
摘要翻译：用于将第一组件（206）与来自第二组件（208）的振动隔离的隔振器（200）包括耦合到第一系统（202）的第一系统（202）和第二系统（204）。在一个实施例中，第一系统（202）相对于第二组件（208）支撑大部分第一组件（206），并且第二系统（204）调节第一组件（206）的重心位置的变化组件（206）。此外，第二系统（204）可以用于补偿隔振器（200）附近的大气压力的波动。

9. 发明申请

US20070292245A1 Stage assembly with secure device holder 审中-公开
标题翻译：具有安全装置支架的舞台组装
公开(公告)号：US20070292245A1
公开(公告)日：2007-12-20
申请号：US11805806
申请日：2007-05-24
申请人： Alton Phillips , Douglas Watson , Leonard Kho , Hiromitsu Yoshimoto
发明人： Alton Phillips , Douglas Watson , Leonard Kho , Hiromitsu Yoshimoto
IPC分类号： H01L21/44
CPC分类号： G03F7/709 , G03F7/707 , G03F7/70716
摘要： A stage assembly (18) that moves a work piece (200) includes a stage base (36), a stage (238), and a stage mover assembly (40) that moves the stage (238) relative to the stage base (36). The stage (238) includes a stage housing (244) and a device holder (242). The stage housing (244) is rigid. The device holder (242) selectively secures the work piece (200) to the stage housing (244). The device holder (242) can included one or more support pairs (250) that clamp the work piece (200) there between to couple the work piece (200) to the stage housing (244). The stage (238) can include one or more resilient supports (258) that support the work piece (200). Further, the support pairs (250) can retain the work piece (200) so that a small fluid gap exists between the work piece (200) and the stage (238) so that the work piece (200) experiences squeeze film damping.
摘要翻译：移动工件（200）的台架组件（18）包括台架（36），台架（238）和使台架（238）相对于台架（36）移动的平台移动器组件（40））。舞台（238）包括舞台外壳（244）和装置保持架（242）。平台外壳（244）是刚性的。装置保持器（242）选择性地将工件（200）固定到平台壳体（244）上。装置保持器（242）可以包括一个或多个支撑对（250），其夹紧工件（200）之间，以将工件（200）联接到工作台壳体（244）。台架（238）可以包括支撑工件（200）的一个或多个弹性支撑件（258）。此外，支撑对（250）可以保持工件（200），使得在工件（200）和工作台（238）之间存在小的流体间隙，使得工件（200）经历挤压膜阻尼。

10. 发明申请

US20070091485A1 Liquid Cooled Mirror for Use in Extreme Ultraviolet Lithography 有权
标题翻译：液体冷却镜用于极紫外光刻
公开(公告)号：US20070091485A1
公开(公告)日：2007-04-26
申请号：US11382342
申请日：2006-05-09
申请人： Alton Phillips , Derek Coon , Douglas Watson
发明人： Alton Phillips , Derek Coon , Douglas Watson
IPC分类号： G02B5/08
CPC分类号： G02B5/10 , G02B7/1815 , G03F7/70783 , G03F7/70891 , G03F7/70983 , G21K1/06 , G21K2201/065
摘要： Methods and apparatus for internally or directly cooling a mirror using a fluid with laminar flow properties are disclosed. According to one aspect of the present invention, an internally cooled mirror includes an optical surface that absorbs light, and at least one microchannel formed beneath the optical surface. The mirror also includes a port that supplied a fluid to the microchannel. The fluid is subjected to a laminar flow and absorbs heat associated with the absorbed light.
摘要翻译：公开了使用具有层流性质的流体内部或直接冷却反射镜的方法和装置。根据本发明的一个方面，内部冷却镜包括吸收光的光学表面和形成在光学表面下方的至少一个微通道。镜子还包括向微通道供应流体的端口。流体经受层流并吸收与吸收的光相关的热量。

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