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1. 发明授权

US08358417B2 Spectrometer with validation cell 有权
标题翻译：光谱仪带有验证单元
公开(公告)号：US08358417B2
公开(公告)日：2013-01-22
申请号：US13026921
申请日：2011-02-14
申请人： Alfred Feitisch , Lutz Keller , Xiang Liu , Mathias Schrempel , Keith Benjamin Helbley
发明人： Alfred Feitisch , Lutz Keller , Xiang Liu , Mathias Schrempel , Keith Benjamin Helbley
IPC分类号： G01J3/28 , G01N21/00
CPC分类号： G01J3/28 , G01J3/42 , G01N21/031 , G01N21/274 , G01N21/31 , G01N21/3504 , G01N21/3518 , G01N21/39 , G01N2021/399
摘要： A valid state of an analytical system that includes a light source and a detector can be verified by determining that deviation of first light intensity data quantifying a first intensity of light received at the detector from the light source after the light has passed at least once through each of a reference gas in a validation cell and a zero gas from a stored data set does not exceed a pre-defined threshold deviation. The stored data set can represent at least one previous measurement collected during a previous instrument validation process performed on the analytical system. The reference gas can include a known amount of an analyte. A concentration of the analyte in a sample gas can be determined by correcting second light intensity data quantifying a second intensity of the light received at the detector after the light passes at least once through each of the reference gas in the validation cell and a sample gas containing an unknown concentration of the analyte compound. Related systems, methods, and articles of manufacture are also described.
摘要翻译：包括光源和检测器的分析系统的有效状态可以通过确定在光已经通过至少一次通过之后量化在检测器处接收的第一光强度的光的第一光强度数据与来自光源的偏差验证单元中的参考气体和来自存储的数据组的零气体中的每一个不超过预定义的阈值偏差。存储的数据集可以表示在分析系统上执行的先前的仪器验证过程期间收集的至少一个以前的测量。参考气体可以包括已知量的分析物。样品气体中分析物的浓度可以通过校正第二光强度数据来确定，该第二光强度数据在光通过至少一次通过验证单元中的每个参考气体之后，量化在检测器处接收的光的第二强度，并且样品气体含有未知浓度的分析物。还描述了相关系统，方法和制品。

2. 发明授权

US08953165B2 Validation and correction of spectrometer performance using a validation cell 有权
标题翻译：使用验证单元验证和校正光谱仪性能
公开(公告)号：US08953165B2
公开(公告)日：2015-02-10
申请号：US13027000
申请日：2011-02-14
申请人： Alfred Feitisch , Lutz Keller , Xiang Liu , Mathias Schrempel , Keith Benjamin Helbley
发明人： Alfred Feitisch , Lutz Keller , Xiang Liu , Mathias Schrempel , Keith Benjamin Helbley
IPC分类号： G01N21/27 , G01J3/28 , G01J3/42 , G01N21/03 , G01N21/31 , G01N21/3504 , G01N21/3518 , G01N21/39
CPC分类号： G01J3/28 , G01J3/42 , G01N21/031 , G01N21/274 , G01N21/31 , G01N21/3504 , G01N21/3518 , G01N21/39 , G01N2021/399
摘要： Light intensity data quantifying intensity of light generated by a light source and received at a detector during a validation mode of an absorption spectrometer can be compared with a stored data set representing at least one previous measurement in a validation mode of an analytical system. The validation mode can include causing the light to pass at least once through each of a zero gas and a reference gas contained within a validation cell and including a known amount of a target analyte. The zero gas can have at least one of known and negligible first light absorbance characteristics within a range of wavelengths produced by the light source. A validation failure can be determined to have occurred if the first light intensity data and the stored data set are out of agreement by more than a predefined threshold amount. Related systems, methods, and articles of manufacture are also described.
摘要翻译：在吸收光谱仪的验证模式期间，由光源产生并在检测器处接收的光的光强度数据的量化可以与在分析系统的验证模式中表示至少一个先前测量的存储的数据集进行比较。验证模式可以包括使光通过至少一次通过包含在验证单元内的零气体和参考气体中的每一个，并且包括已知量的目标分析物。零气体可以具有由光源产生的波长范围内的已知和可忽略的第一光吸收特性中的至少一种。如果第一光强度数据和存储的数据集超出预定义的阈值量，则可以确定已经发生验证失败。还描述了相关系统，方法和制品。

3. 发明申请

US20110299084A1 VALIDATION AND CORRECTION OF SPECTROMETER PERFORMANCE USING A VALIDATION CELL 有权
标题翻译：使用验证单元的光谱仪性能的验证和校正
公开(公告)号：US20110299084A1
公开(公告)日：2011-12-08
申请号：US13027000
申请日：2011-02-14
申请人： ALFRED FEITISCH , Lutz Keller , Xiang Liu , Mathias Schrempel
发明人： ALFRED FEITISCH , Lutz Keller , Xiang Liu , Mathias Schrempel
IPC分类号： G01N21/00
CPC分类号： G01J3/28 , G01J3/42 , G01N21/031 , G01N21/274 , G01N21/31 , G01N21/3504 , G01N21/3518 , G01N21/39 , G01N2021/399
摘要： Light intensity data quantifying intensity of light generated by a light source and received at a detector during a validation mode of an absorption spectrometer can be compared with a stored data set representing at least one previous measurement in a validation mode of an analytical system. The validation mode can include causing the light to pass at least once through each of a zero gas and a reference gas contained within a validation cell and including a known amount of a target analyte. The zero gas can have at least one of known and negligible first light absorbance characteristics within a range of wavelengths produced by the light source. A validation failure can be determined to have occurred if the first light intensity data and the stored data set are out of agreement by more than a predefined threshold amount. Related systems, methods, and articles of manufacture are also described.
摘要翻译：在吸收光谱仪的验证模式期间，由光源产生并在检测器处接收的光的光强度数据的量化可以与在分析系统的验证模式中表示至少一个先前测量的存储的数据集进行比较。验证模式可以包括使光通过至少一次通过包含在验证单元内的零气体和参考气体中的每一个，并且包括已知量的目标分析物。零气体可以具有由光源产生的波长范围内的已知和可忽略的第一光吸收特性中的至少一种。如果第一光强度数据和存储的数据集超出预定义的阈值量，则可以确定已经发生验证失败。还描述了相关系统，方法和制品。

4. 发明申请

US20110299076A1 SPECTROMETER WITH VALIDATION CELL 有权
标题翻译：带有验证单元的光谱仪
公开(公告)号：US20110299076A1
公开(公告)日：2011-12-08
申请号：US13026921
申请日：2011-02-14
申请人： ALFRED FEITISCH , Lutz Keller , Xiang Liu , Mathias Schrempel
发明人： ALFRED FEITISCH , Lutz Keller , Xiang Liu , Mathias Schrempel
IPC分类号： G01J3/28
CPC分类号： G01J3/28 , G01J3/42 , G01N21/031 , G01N21/274 , G01N21/31 , G01N21/3504 , G01N21/3518 , G01N21/39 , G01N2021/399
摘要： A valid state of an analytical system that includes a light source and a detector can be verified by determining that deviation of first light intensity data quantifying a first intensity of light received at the detector from the light source after the light has passed at least once through each of a reference gas in a validation cell and a zero gas from a stored data set does not exceed a pre-defined threshold deviation. The stored data set can represent at least one previous measurement collected during a previous instrument validation process performed on the analytical system. The reference gas can include a known amount of an analyte. A concentration of the analyte in a sample gas can be determined by correcting second light intensity data quantifying a second intensity of the light received at the detector after the light passes at least once through each of the reference gas in the validation cell and a sample gas containing an unknown concentration of the analyte compound. Related systems, methods, and articles of manufacture are also described.
摘要翻译：包括光源和检测器的分析系统的有效状态可以通过确定在光已经通过至少一次通过之后量化在检测器处接收的第一光强度的光的第一光强度数据与来自光源的偏差验证单元中的参考气体和来自存储的数据组的零气体中的每一个不超过预定义的阈值偏差。存储的数据集可以表示在分析系统上执行的先前的仪器验证过程期间收集的至少一个以前的测量。参考气体可以包括已知量的分析物。样品气体中分析物的浓度可以通过校正第二光强度数据来确定，该第二光强数据在光通过至少一次通过验证单元中的每个参考气体之后，量化在检测器处接收的光的第二强度，并且样品气体含有未知浓度的分析物。还描述了相关系统，方法和制品。

5. 发明授权

US08842282B2 Optical reflectors for spectrometer gas cells 有权
标题翻译：用于光谱仪气体电池的光学反射器
公开(公告)号：US08842282B2
公开(公告)日：2014-09-23
申请号：US13712923
申请日：2012-12-12
申请人： Lutz Keller , Alfred Feitisch , Peter Scott , Mathias Schrempel , Nathan St. John
发明人： Lutz Keller , Alfred Feitisch , Peter Scott , Mathias Schrempel , Nathan St. John
IPC分类号： G01N21/00 , G01J3/28 , G01N21/35 , G01J3/42 , G01N21/03 , G01N21/09
CPC分类号： G01N21/0303 , G01J3/42 , G01N21/031 , G01N21/09 , G01N21/3504
摘要： A spectrometer cell can include a spacer, at least one end cap, and at least one mirror with a reflective surface. The end cap can be positioned proximate to a first contact end of the spacer such that the end cap and spacer at least partially enclose an internal volume of the spectrometer cell. The mirror can be secured in place by a mechanical attachment that includes attachment materials that are chemically inert to at least one reactive gas compound. The mechanical attachment can hold an optical axis of the reflective surface in a fixed orientation relative to other components of the spectrometer cell and or a spectrometer device that comprises the spectrometer cell. The mirror can optionally be constructed of a material such as stainless steel, ceramic, or the like. Related methods, articles of manufacture, systems, and the like are described.
摘要翻译：光谱仪单元可以包括间隔物，至少一个端盖和至少一个具有反射表面的反射镜。端盖可以定位成靠近隔离物的第一接触端，使得端盖和间隔件至少部分地包围光谱仪单元的内部体积。镜子可以通过机械附件固定在适当的位置，该机械附件包括对至少一种反应性气体化合物具有化学惰性的附着材料。机械附件可以将反射表面的光轴相对于分光计单元的其他部件和包括光谱仪单元的光谱仪装置固定在一定方向。镜子可以任意地由诸如不锈钢，陶瓷等的材料构成。描述了相关方法，制品，系统等。

6. 发明申请

US20140160474A1 OPTICAL REFLECTORS FOR SPECTROMETER GAS CELLS 有权
标题翻译：用于光谱仪气体细胞的光反射器
公开(公告)号：US20140160474A1
公开(公告)日：2014-06-12
申请号：US13712923
申请日：2012-12-12
申请人： Lutz Keller , Alfred Feitisch , Peter Scott , Mathias Schrempel , Nathan St. John
发明人： Lutz Keller , Alfred Feitisch , Peter Scott , Mathias Schrempel , Nathan St. John
IPC分类号： G01N21/03
CPC分类号： G01N21/0303 , G01J3/42 , G01N21/031 , G01N21/09 , G01N21/3504
摘要： A spectrometer cell can include a spacer, at least one end cap, and at least one mirror with a reflective surface. The end cap can be positioned proximate to a first contact end of the spacer such that the end cap and spacer at least partially enclose an internal volume of the spectrometer cell. The mirror can be secured in place by a mechanical attachment that includes attachment materials that are chemically inert to at least one reactive gas compound. The mechanical attachment can hold an optical axis of the reflective surface in a fixed orientation relative to other components of the spectrometer cell and or a spectrometer device that comprises the spectrometer cell. The mirror can optionally be constructed of a material such as stainless steel, ceramic, or the like. Related methods, articles of manufacture, systems, and the like are described.
摘要翻译：光谱仪单元可以包括间隔物，至少一个端盖和至少一个具有反射表面的反射镜。端盖可以定位成靠近隔离物的第一接触端，使得端盖和间隔件至少部分地包围光谱仪单元的内部体积。镜子可以通过机械附件固定在适当的位置，该机械附件包括对至少一种反应性气体化合物具有化学惰性的附着材料。机械附件可以将反射表面的光轴相对于分光计单元的其他部件和包括光谱仪单元的光谱仪装置固定在一定方向。镜子可以任意地由诸如不锈钢，陶瓷等的材料构成。描述了相关方法，制品，系统等。

7. 发明授权

US09166364B2 Semiconductor laser mounting with intact diffusion barrier layer 有权
标题翻译：具有完整扩散阻挡层的半导体激光器安装
公开(公告)号：US09166364B2
公开(公告)日：2015-10-20
申请号：US13212085
申请日：2011-08-17
申请人： Alfred Feitisch , Gabi Neubauer , Mathias Schrempel
发明人： Alfred Feitisch , Gabi Neubauer , Mathias Schrempel
IPC分类号： H01S3/04 , H01S5/022 , H01L23/00 , H01S5/042
CPC分类号： H01S5/02272 , H01L24/03 , H01L24/05 , H01L24/29 , H01L24/32 , H01L24/83 , H01L2224/0383 , H01L2224/04026 , H01L2224/05573 , H01L2224/05624 , H01L2224/05663 , H01L2224/05664 , H01L2224/05666 , H01L2224/05669 , H01L2224/0567 , H01L2224/0568 , H01L2224/05681 , H01L2224/05684 , H01L2224/05686 , H01L2224/29109 , H01L2224/29111 , H01L2224/29139 , H01L2224/29144 , H01L2224/32245 , H01L2224/83801 , H01L2924/12042 , H01L2924/15747 , H01S5/02212 , H01S5/0425 , H01L2924/04941 , H01L2924/01022 , H01L2924/053 , H01L2924/049 , H01L2924/00014 , H01L2924/01032 , H01L2924/01014 , H01L2924/014 , H01L2924/0105 , H01L2924/01029 , H01L2924/01082 , H01L2924/00
摘要： A first contact surface of a semiconductor laser chip can be formed to a target surface roughness selected to have a maximum peak to valley height that is substantially smaller than a barrier layer thickness. A barrier layer that includes a non-metallic, electrically-conducting compound and that has the barrier layer thickness can be applied to the first contact surface, and the semiconductor laser chip can be soldered to a carrier mounting along the first contact surface using a solder composition by heating the soldering composition to less than a threshold temperature at which dissolution of the barrier layer into the soldering composition occurs. Related systems, methods, articles of manufacture, and the like are also described.
摘要翻译：可以将半导体激光器芯片的第一接触表面形成为选择为具有基本上小于阻挡层厚度的最大峰谷高度的目标表面粗糙度。包含非金属导电性化合物并且具有阻挡层厚度的阻挡层可以施加到第一接触表面，并且可以使用焊料将半导体激光器芯片焊接到沿着第一接触表面安装的载体上通过将焊料组合物加热到低于阻挡层溶入焊料组合物的阈值温度的组合物。还描述了相关系统，方法，制品等。

8. 发明申请

US20140112363A1 SOLDERLESS MOUNTING FOR SEMICONDUCTOR LASERS 有权
标题翻译：半导体激光器的无焊接安装
公开(公告)号：US20140112363A1
公开(公告)日：2014-04-24
申请号：US13659019
申请日：2012-10-24
申请人： Alfred Feitisch , Gabi Neubauer , Mathias Schrempel
发明人： Alfred Feitisch , Gabi Neubauer , Mathias Schrempel
IPC分类号： H01L33/62
CPC分类号： H01L24/83 , B23K20/023 , B23K20/24 , B23K2101/42 , H01L33/62 , H01L2224/73265 , H01L2224/83201 , H01L2224/8385 , H01L2924/12042 , H01S5/02212 , H01S5/02256 , H01S5/0226 , H01S5/02264 , H01S5/02476 , H01S5/0425
摘要： A first contact surface of a semiconductor laser chip can be formed to a first target surface roughness and a second contact surface of a carrier mounting can be formed to a second target surface roughness. A first bond preparation layer comprising a first metal can optionally be applied to the formed first contact surface, and a second bond preparation layer comprising a second metal can optionally be applied to the formed second contact surface. The first contact surface can be contacted with the second contact surface, and a solderless securing process can secure the semiconductor laser chip to the carrier mounting. Related systems, methods, articles of manufacture, and the like are also described.
摘要翻译：可以将半导体激光器芯片的第一接触表面形成为第一目标表面粗糙度，并且可以将载体安装的第二接触表面形成为第二目标表面粗糙度。包含第一金属的第一粘合制备层可以任选地施加到所形成的第一接触表面，并且包括第二金属的第二接合制备层可任选地施加到形成的第二接触表面。第一接触表面可以与第二接触表面接触，并且无焊接固定工艺可以将半导体激光器芯片固定到载体安装。还描述了相关系统，方法，制品等。

9. 发明申请

US20130044322A1 SEMICONDUCTOR LASER MOUNTING WITH INTACT DIFFUSION BARRIER LAYER 有权
标题翻译：半导体激光器安装与INTIF扩散障碍层
公开(公告)号：US20130044322A1
公开(公告)日：2013-02-21
申请号：US13212085
申请日：2011-08-17
申请人： Alfred Feitisch , Gabi Neubauer , Mathias Schrempel
发明人： Alfred Feitisch , Gabi Neubauer , Mathias Schrempel
IPC分类号： G01N21/59 , H01S5/022 , H01L21/60
CPC分类号： H01S5/02272 , H01L24/03 , H01L24/05 , H01L24/29 , H01L24/32 , H01L24/83 , H01L2224/0383 , H01L2224/04026 , H01L2224/05573 , H01L2224/05624 , H01L2224/05663 , H01L2224/05664 , H01L2224/05666 , H01L2224/05669 , H01L2224/0567 , H01L2224/0568 , H01L2224/05681 , H01L2224/05684 , H01L2224/05686 , H01L2224/29109 , H01L2224/29111 , H01L2224/29139 , H01L2224/29144 , H01L2224/32245 , H01L2224/83801 , H01L2924/12042 , H01L2924/15747 , H01S5/02212 , H01S5/0425 , H01L2924/04941 , H01L2924/01022 , H01L2924/053 , H01L2924/049 , H01L2924/00014 , H01L2924/01032 , H01L2924/01014 , H01L2924/014 , H01L2924/0105 , H01L2924/01029 , H01L2924/01082 , H01L2924/00
摘要： A first contact surface of a semiconductor laser chip can be formed to a target surface roughness selected to have a maximum peak to valley height that is substantially smaller than a barrier layer thickness. A barrier layer that includes a non-metallic, electrically-conducting compound and that has the barrier layer thickness can be applied to the first contact surface, and the semiconductor laser chip can be soldered to a carrier mounting along the first contact surface using a solder composition by heating the soldering composition to less than a threshold temperature at which dissolution of the barrier layer into the soldering composition occurs. Related systems, methods, articles of manufacture, and the like are also described.
摘要翻译：可以将半导体激光器芯片的第一接触表面形成为选择为具有基本上小于阻挡层厚度的最大峰谷高度的目标表面粗糙度。包含非金属导电性化合物并且具有阻挡层厚度的阻挡层可以施加到第一接触表面，并且可以使用焊料将半导体激光器芯片焊接到沿着第一接触表面安装的载体上通过将焊料组合物加热到低于阻挡层溶入焊料组合物的阈值温度的组合物。还描述了相关系统，方法，制品等。

10. 发明申请

US20120236893A1 Semiconductor Laser Mounting for Improved Frequency Stability 有权
标题翻译：用于提高频率稳定性的半导体激光器安装
公开(公告)号：US20120236893A1
公开(公告)日：2012-09-20
申请号：US13212075
申请日：2011-08-17
申请人： Gabi Neubauer , Alfred Feitisch , Mathias Schrempel
发明人： Gabi Neubauer , Alfred Feitisch , Mathias Schrempel
IPC分类号： H01S5/026 , H01L33/48
CPC分类号： H01S5/02272 , G01N21/39 , G01N21/718 , G01N2021/399 , H01L24/29 , H01L24/32 , H01L24/48 , H01L24/83 , H01L2224/29101 , H01L2224/29109 , H01L2224/29111 , H01L2224/32225 , H01L2224/32245 , H01L2224/32501 , H01L2224/48091 , H01L2224/4823 , H01L2224/73265 , H01L2224/83065 , H01L2224/83075 , H01L2224/83801 , H01L2924/00014 , H01L2924/01004 , H01L2924/01006 , H01L2924/01013 , H01L2924/01024 , H01L2924/01025 , H01L2924/01029 , H01L2924/01033 , H01L2924/0104 , H01L2924/01042 , H01L2924/01047 , H01L2924/01049 , H01L2924/0105 , H01L2924/01051 , H01L2924/01058 , H01L2924/01061 , H01L2924/01073 , H01L2924/01074 , H01L2924/01075 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/0132 , H01L2924/0133 , H01L2924/014 , H01L2924/10329 , H01L2924/12042 , H01L2924/15747 , H01L2924/19107 , H01S5/02212 , H01S5/0425 , H01L2924/01007 , H01L2924/01001 , H01L2924/00 , H01L2924/01026 , H01L2924/01028 , H01L2224/45099 , H01L2224/45015 , H01L2924/207
摘要： A first contact surface of a semiconductor laser chip can be formed to a target surface roughness selected to have a maximum peak to valley height that is substantially smaller than a barrier layer thickness of a metallic barrier layer to be applied to the first contact surface. A metallic barrier layer having the barrier layer thickness can be applied to the first contact surface, and the semiconductor laser chip can be soldered to a carrier mounting along the first contact surface using a solder composition by heating the soldering composition to less than a threshold temperature at which dissolution of the metallic barrier layer into the soldering composition occurs. Related systems, methods, articles of manufacture, and the like are also described.
摘要翻译：可以将半导体激光器芯片的第一接触表面形成为被选择为具有基本上小于施加到第一接触表面的金属阻挡层的阻挡层厚度的最大峰谷高度的目标表面粗糙度。可以将具有阻挡层厚度的金属阻挡层施加到第一接触表面，并且可以使用焊料组合物将半导体激光器芯片焊接到沿着第一接触表面安装的载体上，通过将焊接组合物加热到小于阈值温度发生金属阻挡层溶入焊料组合物的过程。还描述了相关系统，方法，制品等。

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