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1. 发明授权

US07824997B2 Membrane suspended MEMS structures 失效
标题翻译：膜悬浮MEMS结构
公开(公告)号：US07824997B2
公开(公告)日：2010-11-02
申请号：US12056780
申请日：2008-03-27
申请人： Alexandros Margomenos , Linda P. B. Katehi , Yuxing Tang
发明人： Alexandros Margomenos , Linda P. B. Katehi , Yuxing Tang
IPC分类号： H01L21/20
CPC分类号： H03H9/462 , H01P1/127
摘要： A method for micro-machining a varactor that is part of a membrane suspended MEMS tunable filter. In one non-limiting embodiment, the method includes providing a main substrate; depositing a membrane on the main substrate; depositing and patterning a plurality of sacrificial photoresist layers at predetermined times during the fabrication of the varactor; depositing metal layers that define a fabricated varactor structure enclosed within photoresist; coupling a carrier substrate to the fabricated structure opposite to the main substrate using a release layer; etching a central portion of the main substrate to expose the membrane; removing the carrier substrate by dissolving the release layer in a material that attacks the release layer but does not dissolve the photoresist; and removing the photoresist layers to provide a released varactor.
摘要翻译：一种用于微机械加工可变电抗器的方法，该变容二极管是膜悬浮的MEMS可调滤波器的一部分。在一个非限制性实施例中，该方法包括提供主衬底; 在主衬底上沉积膜; 在制造变容二极管期间的预定时间沉积和图案化多个牺牲光致抗蚀剂层; 沉积限定在光致抗蚀剂内包围的制造的变容二极管结构的金属层; 使用剥离层将载体衬底耦合到与主衬底相对的制造结构; 蚀刻主衬底的中心部分以暴露膜; 通过将剥离层溶解在攻击剥离层但不溶解光致抗蚀剂的材料中去除载体基材; 并去除光致抗蚀剂层以提供释放的变容二极管。

2. 发明申请

US20090246929A1 MEMBRANE SUSPENDED MEMS STRUCTURES 失效
标题翻译：膜悬浮MEMS结构
公开(公告)号：US20090246929A1
公开(公告)日：2009-10-01
申请号：US12056780
申请日：2008-03-27
申请人： Alexandros Margomenos , Linda P.B. Katehi , Yuxing Tang
发明人： Alexandros Margomenos , Linda P.B. Katehi , Yuxing Tang
IPC分类号： H01L21/20
CPC分类号： H03H9/462 , H01P1/127
摘要： A method for micro-machining a varactor that is part of a membrane suspended MEMS tunable filter. In one non-limiting embodiment, the method includes providing a main substrate; depositing a membrane on the main substrate; depositing and patterning a plurality of sacrificial photoresist layers at predetermined times during the fabrication of the varactor; depositing metal layers that define a fabricated varactor structure enclosed within photoresist; coupling a carrier substrate to the fabricated structure opposite to the main substrate using a release layer; etching a central portion of the main substrate to expose the membrane; removing the carrier substrate by dissolving the release layer in a material that attacks the release layer but does not dissolve the photoresist; and removing the photoresist layers to provide a released varactor.
摘要翻译：一种用于微机械加工可变电抗器的方法，该变容二极管是膜悬浮的MEMS可调滤波器的一部分。在一个非限制性实施例中，该方法包括提供主衬底; 在主衬底上沉积膜; 在制造变容二极管期间的预定时间沉积和图案化多个牺牲光致抗蚀剂层; 沉积限定在光致抗蚀剂内包围的制造的变容二极管结构的金属层; 使用剥离层将载体衬底耦合到与主衬底相对的制造结构; 蚀刻主衬底的中心部分以暴露膜; 通过将剥离层溶解在攻击剥离层但不溶解光致抗蚀剂的材料中去除载体基材; 并去除光致抗蚀剂层以提供释放的变容二极管。

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