会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明申请
    • METROLOGY TOOL RECIPE VALIDATOR USING BEST KNOWN METHODS
    • 使用最佳方法的量测工具验证器
    • US20070192056A1
    • 2007-08-16
    • US11307640
    • 2006-02-15
    • Ejaj AhmedCharles ArchieStephen GoodrichEric SoleckyGeorgios VakasErwin WeissmannLin Zhou
    • Ejaj AhmedCharles ArchieStephen GoodrichEric SoleckyGeorgios VakasErwin WeissmannLin Zhou
    • G06F15/00
    • G05B19/41865G05B2219/31459G05B2219/45031Y02P90/20
    • A method of preparing recipes for operating a metrology tool, each recipe including a set of instructions for measuring dimensions in a microelectronic feature. A database includes a plurality of known instructions with best known methods for measuring different feature dimensions by creating a summary of a recipes used by the tool, and adding categorization attributes to identify the summary for retrieval from the database. There is provided a desired recipe having instructions for measuring desired dimensions, including a summary of parameters relating to tool function for the feature dimension to be measured. The method includes comparing the instructions in the desired recipe with the instructions in the database, identifying differences there between, modifying the desired recipe instructions to conform to the database instructions, verifying the desired recipe prior to using the modified desired recipe by the tool, and using the desired recipe to execute a feature measurement on the tool.
    • 一种制备用于操作计量工具的配方的方法,每个配方包括用于测量微电子特征中的尺寸的一组指令。 数据库包括多个已知指令,其具有用于通过创建工具使用的配方的摘要来测量不同特征尺寸的最为已知的方法,并且添加分类属性以识别用于从数据库检索的摘要。 提供了具有用于测量所需尺寸的指令的期望配方,包括与要测量的特征尺寸的工具功能相关的参数的总结。 该方法包括将所需配方中的指令与数据库中的指令进行比较,识别其间的差异,修改所需配方指令以符合数据库指令,在使用工具进行修改的所需配方之前验证所需的配方;以及 使用所需的配方在工具上执行功能测量。
    • 3. 发明申请
    • Measurement Tool Monitoring Using Fleet Measurement Precision and Tool Matching Precision Analysis
    • 使用车队测量的测量工具监控精度和刀具匹配精度分析
    • US20110172958A1
    • 2011-07-14
    • US12687145
    • 2010-01-14
    • Charles ArchieAndrew BrendlerDmitriy ShneyderEric Solecky
    • Charles ArchieAndrew BrendlerDmitriy ShneyderEric Solecky
    • G06F15/00G06F17/18
    • G05B23/0237
    • A method for monitoring a fleet comprising a plurality of measurement tools includes collecting data for a current time interval from the fleet by a data collection module; and performing fleet measurement precision (FMP)/tool matching precision (TMP) analysis on the collected data by a FMP/TMP analysis module, wherein FMP/TMP analysis comprises determining a TMP for each of the plurality of measurement tools using a static and a dynamic benchmark measuring system (BMS); and determining a FMP for the fleet using the static and the dynamic BMS; and determining if the FMP is above a predetermined threshold by a fleet improvement module, and in the event the FMP is above the predetermined threshold, identifying at least one tool of the plurality of tools as poorly performing based on the TMPs; and flagging the identified at least one tool for improvement.
    • 一种用于监视包括多个测量工具的车队的方法,包括:通过数据采集模块从车队收集当前时间间隔的数据; 以及通过FMP / TMP分析模块对所收集的数据执行车队测量精度(FMP)/工具匹配精度(TMP)分析,其中FMP / TMP分析包括使用静态和静态的来确定多个测量工具中的每一个的TMP 动态基准测量系统(BMS); 并使用静态和动态BMS确定船队的FMP; 以及通过车队改进模块确定所述FMP是否高于预定阈值,并且在所述FMP高于所述预定阈值的情况下,基于所述TMP将所述多个工具中的至少一个工具识别为差的性能; 并标记所识别的至少一个工具以进行改进。
    • 4. 发明申请
    • Metrology tool error log analysis methodology and system
    • US20060293778A1
    • 2006-12-28
    • US11407543
    • 2006-04-19
    • Sarah KayEric SoleckyLin Zhou
    • Sarah KayEric SoleckyLin Zhou
    • G06F19/00
    • G05B19/41875G05B2219/32222G05B2219/45031Y02P90/20Y02P90/22
    • A method of identifying failures in a metrology tool system used to measure desired dimensions in microelectronic features. Each metrology tool in the system runs a plurality of recipes for measuring desired dimensions in microelectronic features, with each recipe comprising a set of instructions for measuring at least one dimension in a microelectronic feature. The system includes an error log having stored thereon failures in measurement of microelectronic feature dimensions. The method includes determining normalized number of errors for the recipes used by the metrology tool from the failures stored in the error log, identifying one or more recipes having the greatest normalized number of errors in the error log, identifying, in a list of jobs to be performed by the metrology tool, the one or more identified recipes having the greatest normalized number of errors, and from the identified one or more recipes having the greatest normalized number of errors, determining the cause of the errors in the one or more recipes. The method then includes effecting a change in the one or more identified recipes having the greatest normalized number of errors to correct the errors therein and tracking a metrology tool job having the one or more recipes in which a change has been effected to determine whether the cause of errors has been corrected.