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1. 发明授权

US07927780B2 Resist composition, method of forming resist pattern, novel compound and method of producing the same, and acid generator 有权
标题翻译：抗蚀剂组合物，形成抗蚀剂图案的方法，新型化合物及其制备方法和酸发生剂
公开(公告)号：US07927780B2
公开(公告)日：2011-04-19
申请号：US12208109
申请日：2008-09-10
申请人： Akiya Kawaue , Takeshi Iwai , Hideo Hada , Shinichi Hidesaka , Tsuyoshi Kurosawa , Natsuko Maruyama , Kensuke Matsuzawa , Takehiro Seshimo , Hiroaki Shimizu , Tsuyoshi Nakamura
发明人： Akiya Kawaue , Takeshi Iwai , Hideo Hada , Shinichi Hidesaka , Tsuyoshi Kurosawa , Natsuko Maruyama , Kensuke Matsuzawa , Takehiro Seshimo , Hiroaki Shimizu , Tsuyoshi Nakamura
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , C07D407/02 , C07D409/02
CPC分类号： C07D493/18 , G03F7/0045 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/115 , Y10S430/122 , Y10S430/123 , Y10S430/124 , Y10S430/125
摘要： A compound represented by formula (I); and a compound represented by formula (b1-1): wherein X represents —O—, —S—, —O—R3— or —S—R4—, wherein each of R3 and R4 independently represents an alkylene group of 1 to 5 carbon atoms; R2 represents an alkyl group of 1 to 6 carbon atoms, an alkoxy group of 1 to 6 carbon atoms, a halogenated alkyl group of 1 to 6 carbon atoms, a halogen atom, a hydroxyalkyl group of 1 to 6 carbon atoms, a hydroxyl group or a cyano group; a represents an integer of 0 to 2; Q1 represents an alkylene group of 1 to 12 carbon atoms or a single bond; Y1 represents an alkylene group of 1 to 4 carbon atoms or a fluorinated alkylene group; M+ represents an alkali metal ion; and A+ represents an organic cation.
摘要翻译：由式（I）表示的化合物; 和由式（b1-1）表示的化合物：其中X表示-O - ， - S - ， - O-R 3 - 或-S-R 4 - ，其中R 3和R 4各自独立地表示1至5的亚烷基碳原子 R2表示碳原子数为1〜6的烷基，碳原子数为1〜6的烷氧基，碳原子数为1〜6的卤代烷基，碳原子数为1〜6的卤原子，羟基烷基，羟基或氰基; a表示0〜2的整数， Q1表示1〜12个碳原子的亚烷基或单键; Y1表示1〜4个碳原子的亚烷基或氟化亚烷基; M +表示碱金属离子; 而A +代表有机阳离子。

2. 发明申请

US20090068591A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND AND METHOD OF PRODUCING THE SAME, AND ACID GENERATOR 有权
标题翻译：耐蚀组合物，形成耐药性图案的方法，新颖化合物及其制备方法和酸产生剂
公开(公告)号：US20090068591A1
公开(公告)日：2009-03-12
申请号：US12208109
申请日：2008-09-10
申请人： Akiya Kawaue , Takeshi Iwai , Hideo Hada , Shinichi Hidesaka , Tsuyoshi Kurosawa , Natsuko Maruyama , Kensuke Matsuzawa , Takehiro Seshimo , Hiroaki Shimizu , Tsuyoshi Nakamura
发明人： Akiya Kawaue , Takeshi Iwai , Hideo Hada , Shinichi Hidesaka , Tsuyoshi Kurosawa , Natsuko Maruyama , Kensuke Matsuzawa , Takehiro Seshimo , Hiroaki Shimizu , Tsuyoshi Nakamura
IPC分类号： G03F7/004 , G03F7/20 , C07D493/18
CPC分类号： C07D493/18 , G03F7/0045 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/115 , Y10S430/122 , Y10S430/123 , Y10S430/124 , Y10S430/125
摘要： A compound represented by formula (I); and a compound represented by formula (b1-1): wherein X represents —O—, —S—, —O—R3— or —S—R4—, wherein each of R3 and R4 independently represents an alkylene group of 1 to 5 carbon atoms; R2 represents an alkyl group of 1 to 6 carbon atoms, an alkoxy group of 1 to 6 carbon atoms, a halogenated alkyl group of 1 to 6 carbon atoms, a halogen atom, a hydroxyalkyl group of 1 to 6 carbon atoms, a hydroxyl group or a cyano group; a represents an integer of 0 to 2; Q1 represents an alkylene group of 1 to 12 carbon atoms or a single bond; Y1 represents an alkylene group of 1 to 4 carbon atoms or a fluorinated alkylene group; M+ represents an alkali metal ion; and A+ represents an organic cation.
摘要翻译：由式（I）表示的化合物; 和由式（b1-1）表示的化合物：其中X表示-O - ， - S - ， - O-R 3 - 或-S-R 4 - ，其中R 3和R 4各自独立地表示1至5的亚烷基碳原子 R2表示碳原子数为1〜6的烷基，碳原子数为1〜6的烷氧基，碳原子数为1〜6的卤代烷基，碳原子数为1〜6的卤原子，羟基烷基，羟基或氰基; a表示0〜2的整数， Q1表示1〜12个碳原子的亚烷基或单键; Y1表示1〜4个碳原子的亚烷基或氟化亚烷基; M +表示碱金属离子; 而A +代表有机阳离子。

3. 发明授权

US07488568B2 Resist composition, method of forming resist pattern, compound and acid generator 有权
标题翻译：抗蚀剂组合物，形成抗蚀剂图案的方法，化合物和酸发生剂
公开(公告)号：US07488568B2
公开(公告)日：2009-02-10
申请号：US12060695
申请日：2008-04-01
申请人： Takeshi Iwai , Hideo Hada , Masaru Takeshita , Akiya Kawaue , Keita Ishiduka , Hiroaki Shimizu , Kyoko Ohshita , Tsuyoshi Nakamura , Komei Hirahara , Yuichi Suzuki , Takehiro Seshimo , Kensuke Matsuzawa
发明人： Takeshi Iwai , Hideo Hada , Masaru Takeshita , Akiya Kawaue , Keita Ishiduka , Hiroaki Shimizu , Kyoko Ohshita , Tsuyoshi Nakamura , Komei Hirahara , Yuichi Suzuki , Takehiro Seshimo , Kensuke Matsuzawa
IPC分类号： G03F7/004 , G03F7/30 , C07D333/46
CPC分类号： C07D333/76 , G03F7/0045 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/123
摘要： A resist composition including a base component (A) and an acid-generator component (B), the acid-generator component (B) including an acid generator (B1) including a compound represented by general formula (b1-8) shown below (wherein R401 represents an acid dissociable, dissolution inhibiting group; R41 to R43 each independently represents a halogen atom, a halogenated alkyl group, an alkyl group, an acetyl group, an alkoxy group, a carboxy group or a hydroxyalkyl group; Q represents a divalent linking group or a single bond; and X− represents an anion) or an acid generator (B1′) including a compound represented by general formula (b1-9) shown below (wherein R402 and R403 each independently represents a hydrogen atom, an alkyl group or a halogenated alkyl group; R404 represents an alkyl group or a halogenated alkyl group, wherein R403 and R404 may be bonded to each other to form a ring structure; and X− represents an anion).
摘要翻译：包含基础组分（A）和酸产生剂组分（B）的抗蚀剂组合物，所述酸产生剂组分（B）包括含有下述通式（b1-8）表示的化合物的酸产生剂（B1）（其中R401表示酸解离的溶解抑制基团; R 41至R 43各自独立地表示卤素原子，卤代烷基，烷基，乙酰基，烷氧基，羧基或羟烷基; Q表示二价连接基团或单键; X表示阴离子）或包含下述通式（b1-9）表示的化合物的酸产生剂（B1'）（其中R402和R403各自独立地表示氢原子，烷基基团或卤代烷基; R404表示烷基或卤代烷基，其中R403和R404可以彼此键合以形成环结构;并且X-表示阴离子）。

4. 发明申请

US20080248422A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR 有权
标题翻译：抗菌组合物，形成耐药性图案，化合物和酸产生剂的方法
公开(公告)号：US20080248422A1
公开(公告)日：2008-10-09
申请号：US12060695
申请日：2008-04-01
申请人： Takeshi Iwai , Hideo Hada , Masaru Takeshita , Akiya Kawaue , Keita Ishiduka , Hiroaki Shimizu , Kyoko Ohshita , Tsuyoshi Nakamura , Komei Hirahara , Yuichi Suzuki , Takehiro Seshimo , Kensuke Matsuzawa
发明人： Takeshi Iwai , Hideo Hada , Masaru Takeshita , Akiya Kawaue , Keita Ishiduka , Hiroaki Shimizu , Kyoko Ohshita , Tsuyoshi Nakamura , Komei Hirahara , Yuichi Suzuki , Takehiro Seshimo , Kensuke Matsuzawa
IPC分类号： G03F7/025 , C07D333/50
CPC分类号： C07D333/76 , G03F7/0045 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/123
摘要： A resist composition including a base component (A) and an acid-generator component (B), the acid-generator component (B) including an acid generator (B1) including a compound represented by general formula (b1-8) shown below (wherein R401 represents an acid dissociable, dissolution inhibiting group; R41 to R43 each independently represents a halogen atom, a halogenated alkyl group, an alkyl group, an acetyl group, an alkoxy group, a carboxy group or a hydroxyalkyl group; Q represents a divalent linking group or a single bond; and X− represents an anion) or an acid generator (B1′) including a compound represented by general formula (b1-9) shown below (wherein R403 and R403 each independently represents a hydrogen atom, an alkyl group or a halogenated alkyl group; R404 represents an alkyl group or a halogenated alkyl group, wherein R403 and R404 may be bonded to each other to form a ring structure; and X− represents an anion).
摘要翻译：包含基础组分（A）和酸产生剂组分（B）的抗蚀剂组合物，所述酸产生剂组分（B）包括含有下述通式（b1-8）表示的化合物的酸产生剂（B1）（其中R 401表示酸解离的溶解抑制基团; R 41至R 43各自独立地表示卤素原子，卤代烷基，烷基，乙酰基，烷氧基，羧基或羟烷基; Q表示二价连接基团或单键; X-O - 表示阴离子）或酸发生剂（ B1'），其包含如下所示的由通式（b1-9）表示的化合物（其中R 403和R 403）各自独立地表示氢原子，烷基或卤代烷基; R 404表示烷基或卤代烷基，其中R 403和R 404可彼此键合至形成一个戒指结构; 而X - 代表阴离子）。

5. 发明授权

US07776510B2 Resist composition, method of forming resist pattern, compound and acid generator 有权
标题翻译：抗蚀剂组合物，形成抗蚀剂图案的方法，化合物和酸发生剂
公开(公告)号：US07776510B2
公开(公告)日：2010-08-17
申请号：US12135680
申请日：2008-06-09
申请人： Takeshi Iwai , Hideo Hada , Keita Ishiduka , Akiya Kawaue , Hiroaki Shimizu , Kyoko Ohshita , Tsuyoshi Nakamura , Komei Hirahara , Yuichi Suzuki , Takehiro Seshimo
发明人： Takeshi Iwai , Hideo Hada , Keita Ishiduka , Akiya Kawaue , Hiroaki Shimizu , Kyoko Ohshita , Tsuyoshi Nakamura , Komei Hirahara , Yuichi Suzuki , Takehiro Seshimo
IPC分类号： G03F7/004 , G03F7/30 , C07C381/12
CPC分类号： C07C309/06 , C07C309/04 , C07C309/10 , C07C381/12 , C07C2603/74 , G03F7/0045 , G03F7/0397 , Y10S430/111 , Y10S430/123
摘要： A compound represented by general formula (b-14); and acid generator consisting of the compound; and a resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-14): wherein R7″ to R9″ each independently represents an aryl group or an alkyl group, wherein two of R7″ to R9″ may be bonded to each other to form a ring with the sulfur atom, and at least one of R7″ to R9″ represents a substituted aryl group in which a portion or all of the hydrogen atoms are substituted with an alkoxyalkyloxy group or an alkoxycarbonylalkyloxy group; and X− represents an anion.
摘要翻译：由通式（b-14）表示的化合物; 和由该化合物组成的酸发生剂; 以及抗蚀剂组合物，其包含在酸的作用下在碱性显影液中溶解度变化的碱成分（A）和暴露时产生酸的酸发生剂成分（B），所述酸发生剂成分（B）含有酸由通式（b1-14）表示的化合物构成的发光体（B1）：其中，R7“〜R9”各自独立地表示芳基或烷基，其中，R7“〜R9”中的2个可以相互键合而成与硫原子形成环，并且R 7“至R 9”中的至少一个表示其中一部分或全部氢原子被烷氧基烷氧基或烷氧基羰基烷氧基取代的取代芳基; X-表示阴离子。

6. 发明申请

US20080311522A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR 有权
标题翻译：抗菌组合物，形成耐药性图案，化合物和酸产生剂的方法
公开(公告)号：US20080311522A1
公开(公告)日：2008-12-18
申请号：US12135680
申请日：2008-06-09
申请人： Takeshi Iwai , Hideo Hada , Keita Ishiduka , Akiya Kawaue , Hiroaki Shimizu , Kyoko Ohshita , Tsuyoshi Nakamura , Komei Hirahara , Yuichi Suzuki , Takehiro Seshimo
发明人： Takeshi Iwai , Hideo Hada , Keita Ishiduka , Akiya Kawaue , Hiroaki Shimizu , Kyoko Ohshita , Tsuyoshi Nakamura , Komei Hirahara , Yuichi Suzuki , Takehiro Seshimo
IPC分类号： G03F7/004 , C07C309/04 , C07C69/74
CPC分类号： C07C309/06 , C07C309/04 , C07C309/10 , C07C381/12 , C07C2603/74 , G03F7/0045 , G03F7/0397 , Y10S430/111 , Y10S430/123
摘要： A compound represented by general formula (b-14); and acid generator consisting of the compound; and a resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-14): wherein R7″ to R9″ each independently represents an aryl group or an alkyl group, wherein two of R7″ to R9″ may be bonded to each other to form a ring with the sulfur atom, and at least one of R7″ to R9″ represents a substituted aryl group in which a portion or all of the hydrogen atoms are substituted with an alkoxyalkyloxy group or an alkoxycarbonylalkyloxy group; and X− represents an anion.
摘要翻译：由通式（b-14）表示的化合物; 和由该化合物组成的酸发生剂; 以及抗蚀剂组合物，其包含在酸的作用下在碱性显影液中溶解度变化的碱成分（A）和暴露时产生酸的酸发生剂成分（B），所述酸发生剂成分（B）含有酸发生器（B1）由通式（b1-14）表示的化合物组成：其中R7“至R9”各自独立地表示芳基或烷基，其中R7“至R9”中的两个可以键合彼此形成具有硫原子的环，并且R 7“至R 9”中的至少一个表示取代的芳基，其中部分或全部氢原子被烷氧基烷氧基或烷氧基羰基烷氧基取代; X-表示阴离子。

7. 发明申请

US20090023095A1 NOVEL COMPOUND, MANUFACTURING METHOD THEREOF, ACID GENERATOR, RESIST COMPOSITION AND METHOD OF FORMING A RESIST PATTERN 失效
标题翻译：新型化合物，其制造方法，酸发生器，耐蚀组合物和形成耐蚀图案的方法
公开(公告)号：US20090023095A1
公开(公告)日：2009-01-22
申请号：US12174293
申请日：2008-07-16
申请人： Hideo Hada , Takeshi Iwai , Takehiro Seshimo , Akiya Kawaue , Keita Ishiduka
发明人： Hideo Hada , Takeshi Iwai , Takehiro Seshimo , Akiya Kawaue , Keita Ishiduka
IPC分类号： G03F7/004 , C07D333/46 , C07D335/02 , C07C309/02
CPC分类号： C07D335/02 , C07C309/04 , C07D333/46 , G03F7/0045 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： There are provided a novel compound represented by a general formula (b1-1) shown below, which is useful as an acid generator for a resist composition and a manufacturing method thereof, a compound useful as a precursor of the novel compound and a manufacturing method thereof, an acid generator, a resist composition and a method of forming a resist pattern. (wherein, R1 represents an aryl group or alkyl group which may contain a substituent group; R3 represents a hydrogen atom or an alkyl group; n1 represents an integer of 0 or 1, and in the case that n1 is 1, R1 and R3 may mutually be bonded to form a ring with a 3- to 7-membered ring structure together with the carbon atom with which R1 is bonded and the carbon atom with which R3 is bonded; A represents a bivalent group which forms a ring with 3- to 7-membered ring structure together with the sulfur atom with which A is bonded, and the ring may contain a substituent group; R2 represents an aromatic group which may contain a substituent group, a linear or branched alkyl group of 1 to 10 carbon atoms which may contain a substituent group, or a linear or branched alkenyl group of 2 to 10 carbon atoms which may contain a substituent group; n represents an integer of 0 or 1; and Y1 represents an alkylene group of 1 to 4 carbon atoms in which hydrogen atoms may be substituted with fluorine atoms.).
摘要翻译：提供了由下述通式（b1-1）表示的新化合物，其可用作抗蚀剂组合物的酸产生剂及其制备方法，可用作新化合物的前体的化合物和制备方法酸产生剂，抗蚀剂组合物和形成抗蚀剂图案的方法。（其中，R1表示可以含有取代基的芳基或烷基，R3表示氢原子或烷基，n1表示0或1的整数，在n1为1的情况下，R 1和R 3可以相互键合形成具有3〜7元环结构的环以及与R 1键合的碳原子和与R3结合的碳原子; A表示与3-至 7元环结构与A键合的硫原子一起形成，环可含有取代基; R2表示可含有取代基的芳香族基团，碳原子数1〜10的直链或支链烷基，可以含有取代基，或可以含有取代基的2〜10个碳原子的直链或支链烯基; n表示0或1的整数; Y1表示碳原子数为1〜4的亚烷基，其中氢原子可以被氟取代 oms）。

8. 发明授权

US07745097B2 Compound, manufacturing method thereof, acid generator, resist composition and method of forming resist pattern 失效
标题翻译：化合物，其制造方法，酸产生剂，抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US07745097B2
公开(公告)日：2010-06-29
申请号：US12174293
申请日：2008-07-16
申请人： Hideo Hada , Takeshi Iwai , Takehiro Seshimo , Akiya Kawaue , Keita Ishiduka
发明人： Hideo Hada , Takeshi Iwai , Takehiro Seshimo , Akiya Kawaue , Keita Ishiduka
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： C07D335/02 , C07C309/04 , C07D333/46 , G03F7/0045 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： There are provided a novel compound represented by a general formula (b1-1) shown below, which is useful as an acid generator for a resist composition and a manufacturing method thereof, a compound useful as a precursor of the novel compound and a manufacturing method thereof, an acid generator, a resist composition and a method of forming a resist pattern. (wherein, R1 represents an aryl group or alkyl group which may contain a substituent group; R3 represents a hydrogen atom or an alkyl group; n1 represents an integer of 0 or 1, and in the case that n1 is 1, R1 and R3 may mutually be bonded to form a ring with a 3- to 7-membered ring structure together with the carbon atom with which R1 is bonded and the carbon atom with which R3 is bonded; A represents a bivalent group which forms a ring with 3- to 7-membered ring structure together with the sulfur atom with which A is bonded, and the ring may contain a substituent group; R2 represents an aromatic group which may contain a substituent group, a linear or branched alkyl group of 1 to 10 carbon atoms which may contain a substituent group, or a linear or branched alkenyl group of 2 to 10 carbon atoms which may contain a substituent group; n represents an integer of 0 or 1; and Y1 represents an alkylene group of 1 to 4 carbon atoms in which hydrogen atoms may be substituted with fluorine atoms.).
摘要翻译：提供了由下述通式（b1-1）表示的新化合物，其可用作抗蚀剂组合物的酸产生剂及其制备方法，可用作新化合物的前体的化合物和制备方法酸产生剂，抗蚀剂组合物和形成抗蚀剂图案的方法。（其中，R1表示可以含有取代基的芳基或烷基，R3表示氢原子或烷基，n1表示0或1的整数，在n1为1的情况下，R 1和R 3可以相互键合形成具有3〜7元环结构的环以及与R 1键合的碳原子和与R3结合的碳原子; A表示与3-至 7元环结构与A键合的硫原子一起形成，环可含有取代基; R2表示可含有取代基的芳香族基团，碳原子数1〜10的直链或支链烷基，可以含有取代基，或可以含有取代基的2〜10个碳原子的直链或支链烯基; n表示0或1的整数; Y1表示碳原子数为1〜4的亚烷基，其中氢原子可以被氟取代 oms）。

9. 发明授权

US08007981B2 Resist composition and method of forming resist pattern 有权
标题翻译：抗蚀剂图案的抗蚀剂组成和方法
公开(公告)号：US08007981B2
公开(公告)日：2011-08-30
申请号：US11997527
申请日：2006-07-10
申请人： Ryoji Watanabe , Takehiro Seshimo , Takeshi Iwai
发明人： Ryoji Watanabe , Takehiro Seshimo , Takeshi Iwai
IPC分类号： G03F7/00 , G03F7/004
CPC分类号： G03F7/0048 , G03F7/0397 , Y10S430/114
摘要： A resist composition of the present invention is obtained by dissolving a resin component (A) that displays changed alkali solubility under action of acid and an acid generator component (B) that generates acid upon exposure in an organic solvent (S), wherein the organic solvent (S) includes an aromatic organic solvent (S1). According to the present invention, a resist composition and a method of forming a resist pattern, in which the level of LWR is reduced, can be provided.
摘要翻译：本发明的抗蚀剂组合物是通过在有机溶剂（S）中暴露后溶解在酸作用下显示出改变的碱溶性的树脂组分（A）和产生酸的酸产生剂组分（B），其中有机溶剂溶剂（S）包括芳族有机溶剂（S1）。根据本发明，可以提供抗蚀剂组合物和形成抗蚀剂图案的方法，其中LWR的水平降低。

10. 发明申请

US20100104972A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权
标题翻译：耐蚀组合物和形成耐力图案的方法
公开(公告)号：US20100104972A1
公开(公告)日：2010-04-29
申请号：US11997527
申请日：2006-07-10
申请人： Ryoji Watanabe , Takehiro Seshimo , Takeshi Iwai
发明人： Ryoji Watanabe , Takehiro Seshimo , Takeshi Iwai
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/0048 , G03F7/0397 , Y10S430/114
摘要： A resist composition of the present invention is obtained by dissolving a resin component (A) that displays changed alkali solubility under action of acid and an acid generator component (B) that generates acid upon exposure in an organic solvent (S), wherein the organic solvent (S) includes an aromatic organic solvent (S1). According to the present invention, a resist composition and a method of forming a resist pattern, in which the level of LWR is reduced, can be provided.
摘要翻译：本发明的抗蚀剂组合物是通过在有机溶剂（S）中暴露后溶解在酸作用下显示出改变的碱溶性的树脂组分（A）和产生酸的酸产生剂组分（B），其中有机溶剂溶剂（S）包括芳族有机溶剂（S1）。根据本发明，可以提供抗蚀剂组合物和形成抗蚀剂图案的方法，其中LWR的水平降低。

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