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    • 9. 发明授权
    • Phase-shift mask blank and process for the production thereof comprising
a semi transparent film with silicon and nitrogen
    • 相移掩模空白及其制造方法,其包括具有硅和氮的半透明膜
    • US5955223A
    • 1999-09-21
    • US816942
    • 1997-03-14
    • Hideaki MitsuiKenji MatsumotoYoichi Yamaguchi
    • Hideaki MitsuiKenji MatsumotoYoichi Yamaguchi
    • F02G5/00F02M45/04F02M47/00F02M47/02F02M51/06F02M57/02F02M59/10F02M59/36F02M59/46F02M63/00G03F1/00G03F1/32G03F1/68H01L21/027G03F9/00
    • G03F1/32
    • PURPOSE: To provide the phase shift mask which can be produced while the generation of microdefects is suppressed with relatively simple stages and with which pattern transfer with a high resolution is possible and the phase shift mask blank which is the blank material thereof.CONSTITUTION: The mask patterns to be formed on a transparent substrate 1 of this phase shift mask are composed of light transparent parts 4 which allow the transmission of light of the intensity substantially contributing to exposing and light translucent parts 2 which allow the transmission of the light of the intensity substantially contributing to exposing. The phase shift mask is so formed that the phase of the light past the light translucent parts 2 and the phase of the light past the light transparent parts 4 are varied by shifting the phase of the light passing the light translucent parts 2, by which the light rays passing near the boundary parts of the light transparent parts 4 and the light translucent parts 2 are negated with each other and the contrast in the boundary parts is well maintained. The light translucent parts 2 are composed of thin films consisting of materials consisting of oxygen, molybdenum and silicide as main constituting elements.
    • 目的:提供可以在相对简单的阶段抑制微缺陷的产生并且可以以高分辨率进行图案转印并且作为其空白材料的相移掩模坯料的同时产生的相移掩模。 构成:在该相移掩模的透明基板1上形成的掩模图案由透光部分4构成,透光部分4允许传播强度大致有助于曝光的光和透光部分2,光透射部分2允许透射光 的强度基本上有助于曝光。 相移掩模被形成为使得通过光半透明部分2的光的相位和光通过光透射部分4的相位通过偏移通过光半透明部分2的光的相位而变化,由此 通过透光部4和光半透明部2的边界附近的光线相互抵消,边界部的对比度保持良好。 光半透明部分2由作为主要构成元素的由氧,钼和硅化物组成的材料构成的薄膜构成。