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1. 外观设计

USD323635S Automobile 失效
公开(公告)号：USD323635S
公开(公告)日：1992-02-04
申请号：US385263
申请日：1989-07-24
申请人： Akio Koike , Tamotsu Okamoto , Fumihito Takayama
设计人： Akio Koike , Tamotsu Okamoto , Fumihito Takayama

2. 发明授权

US08735308B2 Optical member comprising TiO2-containing silica glass 有权
标题翻译：含有TiO 2的石英玻璃的光学构件
公开(公告)号：US08735308B2
公开(公告)日：2014-05-27
申请号：US12718776
申请日：2010-03-05
申请人： Akio Koike , Chikaya Tamitsuji , Kunio Watanabe , Tomonori Ogawa
发明人： Akio Koike , Chikaya Tamitsuji , Kunio Watanabe , Tomonori Ogawa
IPC分类号： C03C15/00 , C03C17/00 , C03C19/00 , C03C3/06
CPC分类号： C03C3/06 , C03B19/1423 , C03B19/1453 , C03B19/1461 , C03B25/02 , C03B2201/075 , C03B2201/12 , C03B2201/42 , C03B2207/36 , C03C4/0085 , C03C2201/12 , C03C2201/23 , C03C2201/42 , C03C2203/54
摘要： The present invention relates to an optical member including a TiO2-containing silica glass having: a TiO2 concentration of from 3 to 10% by mass; a Ti3+ concentration of 100 wt ppm or less; a thermal expansion coefficient at from 0 to 100° C., CTE0-100, of 0±150 ppb/° C.; and an internal transmittance in the wavelength range of 400 to 700 nm per a thickness of 1 mm, T400-700, of 80% or more, in which the optical member has a ratio of variation of Ti3+ concentration to an average value of the Ti3+ concentration, ΔTi3+/Ti3+, on an optical use surface, is 0.2 or less.
摘要翻译：本发明涉及一种含有TiO2含量为3〜10质量％的含TiO 2的二氧化硅玻璃的光学构件， Ti3 +浓度为100重量ppm以下; 0-100℃的热膨胀系数，CTE0-100，为0±150ppb /℃。并且在400〜700nm的波长范围内的内部透射率，每1mm厚度，T400〜700，为80％以上，其中光学部件具有Ti 3+浓度的变化比与Ti 3+的平均值的比值，在光学用表面上的浓度＆Dgr; Ti 3+ / Ti 3+为0.2以下。

3. 发明授权

US08178450B2 TiO2-containing silica glass and optical member for EUV lithography using high energy densities as well as special temperature controlled process for its manufacture 失效
标题翻译：含TiO 2的石英玻璃和用于EUV光刻的光学构件，使用高能量密度以及用于其制造的特殊温度控制方法
公开(公告)号：US08178450B2
公开(公告)日：2012-05-15
申请号：US12868900
申请日：2010-08-26
申请人： Akio Koike , Kenta Saito , Long Shao , Yasutomi Iwahashi , Shinya Kikugawa
发明人： Akio Koike , Kenta Saito , Long Shao , Yasutomi Iwahashi , Shinya Kikugawa
IPC分类号： C03C3/06 , C03C3/04 , C03B37/018
CPC分类号： C03B19/1453 , C03B19/1415 , C03B2201/075 , C03B2201/23 , C03B2201/42 , C03B2207/70 , C03B2207/81 , C03C3/06 , C03C3/076 , C03C2201/23 , C03C2201/42 , C03C2203/44 , C03C2203/52 , C03C2203/54 , Y02P40/57
摘要： The present invention provides a TiO2—SiO2 glass whose coefficient of linear thermal expansion in the range of the time of irradiation with EUV light is substantially zero when used as an optical member of an exposure tool for EUVL and which has extremely high surface smoothness. The present invention relates to a TiO2-containing silica glass having a TiO2 content of from 7.5 to 12% by mass, a temperature at which a coefficient of linear thermal expansion is 0 ppb/° C., falling within the range of from 40 to 110° C., and a standard deviation (σ) of a stress level of striae of 0.03 MPa or lower within an area of 30 mm×30 mm in at least one plane.
摘要翻译：本发明提供一种TiO 2 -SiO 2玻璃，当用作EUVL的曝光工具的光学部件并且具有非常高的表面光滑度时，在EUV光的照射时间范围内的线性热膨胀系数基本上为零。本发明涉及TiO 2含量为7.5〜12质量％，线膨胀系数为0ppb /℃的温度，在40〜 110℃，在至少一个平面内在30mm×30mm的区域内的条纹应力水平为0.03MPa以下的标准偏差（＆sgr）。

4. 发明授权

US08012653B2 Substrate for EUV mask blanks 有权
标题翻译：基板用于EUV掩模空白
公开(公告)号：US08012653B2
公开(公告)日：2011-09-06
申请号：US12490833
申请日：2009-06-24
申请人： Akio Koike , Ken Ebihara
发明人： Akio Koike , Ken Ebihara
IPC分类号： G03F1/00
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , C03B19/1415 , C03B19/1453 , C03B19/1469 , C03B19/1492 , C03B2201/21 , C03B2201/42 , C03C3/06 , C03C2201/14 , C03C2201/21 , C03C2201/23 , C03C2201/42 , Y02P40/57
摘要： A substrate that is suitable for an EUV mask or an EUV mask blank and excellent in flatness, is provided.A substrate for an EUV mask blank, which is made of a silica glass containing from 1 to 12 mass % of TiO2, wherein the surface roughness (rms) in a surface quality area of the substrate is at most 2 nm, and the maximum variation (PV) of the stress in the surface quality area of the substrate is at most 0.2 MPa.
摘要翻译：提供了适用于EUV掩模或EUV掩模坯料并且具有优异的平面度的基板。由含有1〜12质量％的TiO 2的二氧化硅玻璃构成的EUV掩模坯的基板，其中，所述基板的表面质量区域的表面粗糙度（rms）为2nm以下，最大变化量基板的表面质量区域的应力的最大值（PV）为0.2MPa以下。

5. 发明申请

US20100323871A1 TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR EUV LITHOGRAPHY USING HIGH ENERGY DENSITIES AS WELL AS SPECIAL TEMPERATURE CONTROLLED PROCESS FOR ITS MANUFACTURE 失效
标题翻译：含氧二氧化硅玻璃和光学成员，用于使用高能量密度的EUV光刻作为其特殊温度控制过程的制造
公开(公告)号：US20100323871A1
公开(公告)日：2010-12-23
申请号：US12868900
申请日：2010-08-26
申请人： Akio Koike , Kenta Saito , Long Shao , Yasutomi Iwahashi , Shinya Kikugawa
发明人： Akio Koike , Kenta Saito , Long Shao , Yasutomi Iwahashi , Shinya Kikugawa
IPC分类号： C03C3/04
CPC分类号： C03B19/1453 , C03B19/1415 , C03B2201/075 , C03B2201/23 , C03B2201/42 , C03B2207/70 , C03B2207/81 , C03C3/06 , C03C3/076 , C03C2201/23 , C03C2201/42 , C03C2203/44 , C03C2203/52 , C03C2203/54 , Y02P40/57
摘要： The present invention provides a TiO2—SiO2 glass whose coefficient of linear thermal expansion in the range of the time of irradiation with EUV light is substantially zero when used as an optical member of an exposure tool for EUVL and which has extremely high surface smoothness. The present invention relates to a TiO2-containing silica glass having a TiO2 content of from 7.5 to 12% by mass, a temperature at which a coefficient of linear thermal expansion is 0 ppb/° C., falling within the range of from 40 to 110° C., and a standard deviation (σ) of a stress level of striae of 0.03 MPa or lower within an area of 30 mm×30 mm in at least one plane.
摘要翻译：本发明提供一种TiO 2 -SiO 2玻璃，当用作EUVL的曝光工具的光学部件并且具有非常高的表面光滑度时，在EUV光的照射时间范围内的线性热膨胀系数基本上为零。本发明涉及TiO 2含量为7.5〜12质量％，线膨胀系数为0ppb /℃的温度，在40〜 110℃，在至少一个平面内在30mm×30mm的区域内的条纹应力水平为0.03MPa以下的标准偏差（＆sgr）。

6. 发明授权

US07780616B2 Walking assistance device 有权
标题翻译：行走辅助装置
公开(公告)号：US07780616B2
公开(公告)日：2010-08-24
申请号：US10557338
申请日：2004-03-15
申请人： Hisashi Katoh , Takashi Hirata , Akio Koike , Taiji Koyama , Takako Fujii , Yoshirou Koyama
发明人： Hisashi Katoh , Takashi Hirata , Akio Koike , Taiji Koyama , Takako Fujii , Yoshirou Koyama
IPC分类号： A61F5/00 , A61H1/00
CPC分类号： B25J9/0006 , A61F5/0102 , A61H1/0255 , A61H3/00 , A61H3/008 , A61H2201/0192 , A61H2201/1215 , A61H2201/163 , A61H2201/1642 , A61H2201/165 , A61H2205/081
摘要： In order to provide a walking assistance device capable of favorably providing an assisting force for maintaining the upright posture while reducing the sense of pressure when worn by the user, a hip support member (1) of the walking assisting device, which comprises an assisting force generator (hip joint actuator 10) disposed at least on a side of a hip joint to provide an assisting force to a movement of a lower limb, is provided with: a back support (4) equipped with pads (18, 19, 20) for respectively abutting an intermediate portion between right and left erector spinae muscles, lateral outer sides of the spinae muscles and right and left iliac crests; and a belt (5) connected to the back support for tightening a lower part of the rectus abdominis muscle. In this way, a supporting force can be provided to the lumbar vertebrae to steadily keep the upright posture while reducing a resistance to a bending movement of the waist caused by the support member. Further, the drive torque from the assisting force generator can be supported by the whole hip portion and this can contribute to preventing inadvertent move of the support member.
摘要翻译：为了提供一种行走辅助装置，其能够有利地提供用于维持直立姿势的辅助力，同时在使用者佩戴时减少压力感觉，行走辅助装置的臀部支撑构件（1）包括辅助力至少设置在髋关节一侧以提供对下肢运动的辅助力的发生器（髋关节致动器10）设置有：配备有垫（18,19,20）的后支撑件（4）用于分别邻接右和左耳直肌之间的中间部分，脊肌的侧外侧和右髂骨和左髂骨顶; 以及连接到后支撑件的带（5），用于收紧腹直肌的下部。以这种方式，可以向腰椎提供支撑力以稳定地保持直立姿势，同时减少由支撑构件引起的腰部弯曲运动的阻力。此外，来自辅助力发生器的驱动扭矩可以由整个臀部支撑，并且这可以有助于防止支撑构件的意外移动。

7. 发明申请

US20090122281A1 SILICA GLASS CONTAINING TIO2 AND PROCESS FOR ITS PRODUCTION 有权
标题翻译：二氧化硅玻璃含有TIO2及其生产工艺
公开(公告)号：US20090122281A1
公开(公告)日：2009-05-14
申请号：US12351998
申请日：2009-01-12
申请人： Yasutomi IWAHASHI , Akio Koike
发明人： Yasutomi IWAHASHI , Akio Koike
IPC分类号： G03B27/00 , C03C3/04
CPC分类号： C03B19/1415 , C03B19/1461 , C03B2201/12 , C03B2201/42 , C03C3/06 , C03C2201/12 , C03C2201/23 , C03C2201/42 , C03C2203/40 , C03C2203/54
摘要： A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C.A process for producing a silica glass containing TiO2, which comprises a step of forming a porous glass body on a target quartz glass particles obtained by flame hydrolysis of glass-forming materials, a step of obtaining a fluorine-containing porous glass body, a step of obtaining a fluorine-containing vitrified glass body, a step of obtaining a fluorine-containing formed glass body and a step of carrying out annealing treatment.
摘要翻译：含有TiO 2的二氧化硅玻璃，其假想温度为至多1200℃，F浓度为至少100ppm，热膨胀系数为0±200ppb /℃，为0〜100℃。含有TiO 2的二氧化硅玻璃的制造方法，其包括在通过玻璃形成材料的火焰水解得到的目标石英玻璃粒子上形成多孔玻璃体的工序，得到含氟多孔玻璃体的工序，获得含氟玻璃化玻璃体，获得含氟成形玻璃体的步骤和进行退火处理的步骤。

8. 发明申请

US20050245382A1 Silica glass containing TiO2 and process for its production 有权
标题翻译：含二氧化硅的硅玻璃及其生产工艺
公开(公告)号：US20050245382A1
公开(公告)日：2005-11-03
申请号：US11172872
申请日：2005-07-05
申请人： Yasutomi Iwahashi , Akio Koike
发明人： Yasutomi Iwahashi , Akio Koike
IPC分类号： C03B20/00 , C03C3/06 , C03C3/076 , C03C4/00 , H01L21/027
CPC分类号： C03C4/0085 , C03C3/06 , C03C2201/23 , C03C2201/42
摘要： A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., an OH group concentration of at most 600 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C.
摘要翻译：含有TiO 2的二氧化硅玻璃，其具有至多1200℃的假想温度，至多600ppm的OH基浓度和0±200ppb /℃的热膨胀系数 0至100℃

9. 外观设计

USD506165S1 Wheelchair for athletics 失效
标题翻译：轮椅轮椅
公开(公告)号：USD506165S1
公开(公告)日：2005-06-14
申请号：US29203769
申请日：2004-04-20
申请人： Akio Koike , Kyoichi Yokouchi
设计人： Akio Koike , Kyoichi Yokouchi

10. 发明授权

US06537937B1 Alkali-free glass 有权
标题翻译：无碱玻璃
公开(公告)号：US06537937B1
公开(公告)日：2003-03-25
申请号：US09631113
申请日：2000-08-02
申请人： Manabu Nishizawa , Yasumasa Nakao , Akio Koike , Junichiro Kase
发明人： Manabu Nishizawa , Yasumasa Nakao , Akio Koike , Junichiro Kase
IPC分类号： C03C3091
CPC分类号： C03C3/091
摘要： An alkali-free glass consisting essentially of: SiO2 64 to 76 mol %, Al2O3 5 to 14 mol %, B2O3 5 to 16 mol %, MgO 1 to 16.5 mol %, CaO 0 to 14 mol %, SrO 0 to 6 mol %, and BaO 0 to 2 mol %.
摘要翻译：一种基本上由...组成的无碱玻璃

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