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    • 3. 发明授权
    • Method of preparing an organosilicon compound containing a methacryloxy functional group
    • 制备含有甲基丙烯酰氧基官能团的有机硅化合物的方法
    • US06448427B1
    • 2002-09-10
    • US09994449
    • 2001-11-28
    • Keiji WakitaAkihiko Shirahata
    • Keiji WakitaAkihiko Shirahata
    • C07F708
    • C07F7/1892
    • A method of preparing an organosilicon compound containing an acryloxy-functional group or a methacryloxy-functional group represented by general formula CH2═CR1—COO—R2—Si(OR3)nR43−n, where R1, R2, R3, R4 are as described below, comprising reacting (a) an alkali-metal salt of acrylic acid or an alkali-metal salt of methacrylic acid described by general formula CH2═CR1COOM1, where R1 is a methyl group or a hydrogen atom and M1 is an alkali metal and (b) an organosilicon containing a halogen-substituted organic group described by general formula XR2Si(OR3)nR43−n, where X is a halogen atom, R2 is an alkylenoxyalkylene group or an alkylene group comprising 1 to 6 carbon atoms, R3 is an alkyl group comprising 1 to 6 carbon atoms or an alkoxyalkyl group comprising 2 to 4 carbon atoms, R4 is a monovalent hydrocarbon group, and n is an integer of 1 to 3; in the presence of (c) a tertiary amine having a cyclic structure selected from the group consisting of 1,8-diazabicyclo[5.4.0]undec-7-ene, 1,4-diazabicyclo[2.2.2]octane, and 1,5-diazabicyclo[4.3.0]-non-5-ene.
    • 制备含有通式CH2 = CR1-COO-R2-Si(OR3)nR43-n表示的丙烯酰氧基官能团或甲基丙烯酰氧基官能团的有机硅化合物的方法,其中R 1,R 2,R 3,R 4如上所述 包括使(a)丙烯酸的碱金属盐或通式CH 2 = CR 1 COOM 1所述的甲基丙烯酸的碱金属盐,其中R1是甲基或氢原子,M1是碱金属和( b)含有通式XR2Si(OR3)nR43-n所示的卤素取代的有机基团的有机硅,其中X为卤素原子,R 2为亚烷基氧化烯基或含有1至6个碳原子的亚烷基,R 3为烷基 包含1至6个碳原子的基团或包含2至4个碳原子的烷氧基烷基,R4是一价烃基,n是1至3的整数; 在(c)具有选自1,8-二氮杂双环[5.4.0]十一碳-7-烯,1,4-二氮杂双环[2.2.2]辛烷和1 ,5-二氮杂双环[4.3.0]壬-5-烯。
    • 6. 发明授权
    • Silsesquioxane resins
    • 倍半硅氧烷树脂
    • US08318258B2
    • 2012-11-27
    • US12811130
    • 2008-12-05
    • Akihiko Shirahata
    • Akihiko Shirahata
    • B05D3/02G03F7/075C08G77/00
    • C08G77/18C08G77/04C08G77/045C08G77/12C08G77/28C08G77/70C08G77/80C08L83/04C09D183/14G02B1/111
    • Silsesquioxane resins useful in antireflective coatings wherein the silsesquioxane resin has the formula (PhSiO(3−x)/2(OR′)x)m(HSiO(3−x)/2(OR′)x)n(MeSiO(3−x)/2(OR′)x)o(RSiO(3−x)/2(OR′)x)p(R2SiO(3−x)/2(OR′)x)q where Ph is a phenyl group, Me is a methyl group; R is selected from a sulfur-containing organic functional group; R′ is hydrogen atom or a hydrocarbon group having from 1 to 4 carbon atoms; R2 is selected from ester groups, polyether groups; and polyethylene oxide groups; x has a value of 0, 1 or 2; m has a value of 0.01 to 0.97; n has a value of 0.01 to 0.97; o has a value of 0.01 to 0.97; p has a value of 0.01 to 0.97; q has a value of 0 to 0.96; and m+n+o+p+q≈1.
    • 可用于抗反射涂料的倍半硅氧烷树脂,其中倍半硅氧烷树脂具有式(PhSiO(3-x)/ 2(OR')x)m(HSiO(3-x)/ 2(OR')x)n(MeSiO x)/ 2(OR')x)o(RSiO(3-x)/ 2(OR')x)p(R2SiO(3-x)/ 2(OR')x)q其中Ph是苯基, 我是甲基; R选自含硫有机官能团; R'是氢原子或具有1至4个碳原子的烃基; R2选自酯基,聚醚基团; 和聚环氧乙烷基团; x的值为0,1或2; m的值为0.01〜0.97; n的值为0.01〜0.97; o的值为0.01〜0.97; p的值为0.01〜0.97; q的值为0〜0.96; 和m + n + o + p +q≈1。
    • 7. 发明授权
    • Silylating method
    • 硅烷化法
    • US5153343A
    • 1992-10-06
    • US695833
    • 1991-05-06
    • Akihiko Shirahata
    • Akihiko Shirahata
    • C07F7/02C07F7/12C07F7/18
    • C07F7/12C07F7/1856Y02P20/55
    • The present invention is a silylating method employing of formula(CH.sub.3)(R)(R.sup.1)SiX ;where R is an isopropyl group, R.sup.1 is a monovalent hydrocarbon group having 2 to 6 carbon atoms, and X is a chlorine atom or bromine atom. The silylating agent of the present invention provide silylation product which is much more stable than the silylation product obtained with trimethylchlorosilane, and its protective group is as stable as the silylation product obtained from t-butyldimethylchlorosilane. Moreover, the present described silylating agents are characterized by an easier desilylation than the t-butyldimethylsilyl group.
    • 本发明是使用式(CH3)(R)(R1)SiX的甲硅烷基化方法; 其中R是异丙基,R 1是具有2至6个碳原子的一价烃基,X是氯原子或溴原子。 本发明的甲硅烷基化剂提供甲硅烷基化产物,其比用三甲基氯硅烷获得的甲硅烷基化产物更稳定,其保护基团与从叔丁基二甲基氯硅烷获得的甲硅烷基化产物一样稳定。 此外,本发明描述的甲硅烷基化剂的特征在于比叔丁基二甲基甲硅烷基更易脱甲硅烷基化。