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    • 2. 发明申请
    • Array Antenna With Optimized Elements Positions And Dimensions
    • 阵列天线优化元件位置和尺寸
    • US20150333412A1
    • 2015-11-19
    • US14761162
    • 2013-08-28
    • AGENCE SPATIALE EUROPEENNE
    • Piero AngelettiGiovanni TosoGianfranco Ruggerini
    • H01Q21/00G06F17/14G05B19/4097
    • H01Q21/0087G05B19/4097G06F17/14H01Q21/20H01Q21/22
    • A method of manufacturing an array antenna comprising: a design phase wherein an array layout of said array antenna is synthesized and radiating elements are designed to be arranged according to said array layout; and a phase of physically making said array antenna wherein the radiating elements are arranged according to said array layout. The design phase comprises the steps of: defining a continuous reference aperture; subdividing said continuous reference aperture into a plurality of elementary cells with assigned power levels; determining, within each said elementary cell, a position for at least one maximum efficiency radiating element; determining a size and an aperture field amplitude of each said maximum efficiency radiating element, such that a variation of a cumulative field distribution of the resulting array antenna aperture over each said elementary cell is substantially equal to a variation of a cumulative field distribution of said reference aperture over the same elementary cell, subject to size constraints.
    • 一种阵列天线的制造方法,包括:设计阶段,其中所述阵列天线的阵列布局被合成,并且辐射元件被设计为根据所述阵列布局布置; 以及物理地制造所述阵列天线的相位,其中根据所述阵列布局布置所述辐射元件。 设计阶段包括以下步骤:定义连续参考孔; 将所述连续参考孔径分成具有分配功率水平的多个基本单元; 在每个所述基本单元内确定用于至少一个最大效率辐射元件的位置; 确定每个所述最大效率辐射元件的尺寸和孔径场幅度,使得所得阵列天线孔径在每个所述基本单元上的累积场分布的变化基本上等于所述参考的累积场分布的变化 孔径在相同的单元格上,受尺寸限制。