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    • 7. 发明授权
    • Variable breakdown transient voltage suppressor
    • 可变击穿瞬态电压抑制器
    • US08730629B2
    • 2014-05-20
    • US13334598
    • 2011-12-22
    • Avinash Srikrishnan KashyapStanislav Ivanovich Soloviev
    • Avinash Srikrishnan KashyapStanislav Ivanovich Soloviev
    • H02H3/22
    • H01L29/36H01L29/1602H01L29/1608H01L29/2003H01L29/861H01L29/8618
    • A semiconductor die includes a substrate comprising a first layer of a first wide band gap semiconductor material having a first conductivity, a second layer of a second wide band gap semiconductor material having a second conductivity different from the first conductivity, in electrical contact with the first layer, a third layer of a third wide band gap semiconductor material having a third conductivity different from the first conductivity and second conductivity, in electrical contact with the second layer, a fourth layer of a fourth wide band gap semiconductor material having the second conductivity, in electrical contact with the third layer, and a fifth layer of a fifth wide band gap semiconductor material having the first conductivity and in electrical contact with the fourth layer, wherein the first layer, the second layer, the third layer, the fourth layer, and the fifth layer are sequentially arranged to form a structure.
    • 半导体管芯包括:衬底,其包括具有第一导电性的第一宽带隙半导体材料的第一层,具有与第一导电性不同的第二导电性的第二宽带隙半导体材料的第二层与第一导电 具有与第一导电性和第二导电性不同的第三导电性的与第二层电接触的第三宽带隙半导体材料的第三层,具有第二导电性的第四宽带隙半导体材料的第四层, 与第三层电接触,以及具有第一导电性并与第四层电接触的第五宽带隙半导体材料的第五层,其中第一层,第二层,第三层,第四层, 并且顺序地布置第五层以形成结构。
    • 8. 发明申请
    • VARIABLE BREAKDOWN TRANSIENT VOLTAGE SUPPRESSOR
    • 可变断开瞬态电压抑制器
    • US20130163139A1
    • 2013-06-27
    • US13334598
    • 2011-12-22
    • Avinash Srikrishnan KashyapStanislav Ivanovich Soloviev
    • Avinash Srikrishnan KashyapStanislav Ivanovich Soloviev
    • H02H3/22H01L29/20H01L21/66H01L29/16
    • H01L29/36H01L29/1602H01L29/1608H01L29/2003H01L29/861H01L29/8618
    • A semiconductor die includes a substrate comprising a first layer of a first wide band gap semiconductor material having a first conductivity, a second layer of a second wide band gap semiconductor material having a second conductivity different from the first conductivity, in electrical contact with the first layer, a third layer of a third wide band gap semiconductor material having a third conductivity different from the first conductivity and second conductivity, in electrical contact with the second layer, a fourth layer of a fourth wide band gap semiconductor material having the second conductivity, in electrical contact with the third layer, and a fifth layer of a fifth wide band gap semiconductor material having the first conductivity and in electrical contact with the fourth layer, wherein the first layer, the second layer, the third layer, the fourth layer, and the fifth layer are sequentially arranged to form a structure.
    • 半导体管芯包括:衬底,其包括具有第一导电性的第一宽带隙半导体材料的第一层,具有与第一导电性不同的第二导电性的第二宽带隙半导体材料的第二层与第一导电 具有与第一导电性和第二导电性不同的第三导电性的与第二层电接触的第三宽带隙半导体材料的第三层,具有第二导电性的第四宽带隙半导体材料的第四层, 与第三层电接触,以及具有第一导电性并与第四层电接触的第五宽带隙半导体材料的第五层,其中第一层,第二层,第三层,第四层, 并且顺序地布置第五层以形成结构。