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1. 发明申请

US20190235392A1 LITHOGRAPHIC METHOD 审中-公开
公开(公告)号：US20190235392A1
公开(公告)日：2019-08-01
申请号：US16318191
申请日：2017-06-29
申请人： ASML NETHERLANDS B.V.
发明人： Andre Bernardus JEUNINK , Laurentius Johannes Adrianus VAN BOKHOVEN , Stan Henricus VAN DER MEULEN , Yang-Shan HUANG , Federico LA TORRE , Barry MOEST , Stefan Carolus Jacobus Antonius KEIJ , Enno VAN DEN BRINK , Christine Henriette SCHOUTEN , Hoite Pieter Theodoor TOLSMA
IPC分类号： G03F7/20 , G03F1/64
摘要： A lithographic apparatus has a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.

2. 发明申请

US20130314684A1 Lithographic Apparatus and Device Manufacturing Method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US20130314684A1
公开(公告)日：2013-11-28
申请号：US13871328
申请日：2013-04-26
申请人： ASML NETHERLANDS B.V.
发明人： Yang-Shan HUANG , Theodorus Petrus Maria Cadee
IPC分类号： G03F7/20
CPC分类号： G03F7/70775 , G03F7/70725 , G03F7/70758
摘要： A substrate stage is used in a lithographic apparatus. The substrate stage includes a substrate table constructed to hold a substrate and a positioning device for in use positioning the substrate table relative to a projection system of the lithographic apparatus. The positioning device includes a first positioning member mounted to the substrate table and a second positioning member co-operating with the first positioning member to position the substrate table. The second positioning member is mounted to a support structure. The substrate stage further comprises an actuator that is arranged to exert a vertical force on a bottom surface of the substrate table at a substantially fixed horizontal position relative to the support structure.
摘要翻译：基板台用于光刻设备中。衬底台包括构造成保持衬底的衬底台和用于使用的定位装置相对于光刻设备的投影系统定位衬底台。所述定位装置包括安装到所述基板台的第一定位构件和与所述第一定位构件配合以定位所述基板台的第二定位构件。第二定位构件安装到支撑结构。衬底台还包括致动器，该致动器被布置成相对于支撑结构在基本上固定的水平位置上在衬底台的底表面上施加垂直力。

3. 发明申请

US20210173315A1 PARTICLE SUPPRESSION SYSTEMS AND METHODS 有权
公开(公告)号：US20210173315A1
公开(公告)日：2021-06-10
申请号：US16629337
申请日：2018-07-18
申请人： ASML NETHERLANDS B.V. , ASML HOLDING N.V.
发明人： Yang-Shan HUANG , Marcel Joseph Louis BOONEN , Han-Kwang NIENHUYS , Jacob BRINKERT , Richard Joseph BRULS , Peter Conrad KOCHERSPERGER
IPC分类号： G03F7/20
摘要： A lithographic apparatus that includes an illumination system that conditions a radiation beam, a first stationary plate having a first surface, and a reticle stage defining, along with the first stationary plate, a first chamber. The reticle stage supports a reticle in the first chamber, and the reticle stage includes a first surface spaced apart from a second surface of the first stationary plate, thereby defining a first gap configured to suppress an amount of contamination passing from a second chamber to the first chamber. The first stationary plate is between the reticle stage and both the illumination system and a projection system configured to project a pattern imparted to the radiation beam by the patterning device onto a substrate.

4. 发明申请

US20190219932A1 POSITIONING SYSTEM AND LITHOGRAPHIC APPARATUS 审中-公开
公开(公告)号：US20190219932A1
公开(公告)日：2019-07-18
申请号：US16332002
申请日：2017-08-31
申请人： ASML NETHERLANDS B.V. , ASML HOLDING N.V.
发明人： Krijn Frederik BUSTRAAN , Yang-Shan HUANG , Antonius Franciscus Johannes DE GROOT , Minkyu KIM , Jasper Anne Frido Marikus SIMONS , Theo Anjes Maria RUIJL , Ronald Josephus Maria LAMERS
IPC分类号： G03F7/20
CPC分类号： G03F7/70766 , G03F7/70725 , G03F7/70758
摘要： A positioning system for positioning an object. The positioning system includes a stage, a balance mass and an actuator system. The stage is for holding the object. The actuator system is arranged to drive the stage in a first direction while driving the balance mass in a second direction opposite to the first direction. The stage is moveable in the first direction in a movement range. When the stage is moving in the first direction and is at an end of the movement range, the positioning system is arranged to collide the stage frontally into the balance mass.

5. 发明申请

US20230063156A1 LITHOGRAPHIC SYSTEM PROVIDED WITH A DEFLECTION APPARATUS FOR CHANGING A TRAJECTORY OF PARTICULATE DEBRIS 有权
公开(公告)号：US20230063156A1
公开(公告)日：2023-03-02
申请号：US17794897
申请日：2020-12-24
申请人： ASML Holding N.V. , ASML Netherlands B.V.
发明人： Ronald Peter ALBRIGHT , Kursat BAL , Vadim Yevgenyevich BANINE , Richard Joseph BRULS , Sjoerd Frans DE VRIES , Olav Waldemar Vladimir FRIJNS , Yang-Shan HUANG , Zhuangxiong HUANG , Johannes Henricus Wilhelmus JACOBS , Johannes Hubertus Josephina MOORS , Georgi Nanchev NENCHEV , Andrey NIKIPELOV , Thomas Maarten RAASVELD , Manish RANJAN , Edwin TE SLIGTE , Karl Robert UMSTADTER , Eray UZGÖREN , Marcus Adrianus VAN DE KERKHOF , Parham YAGHOOBI
IPC分类号： G03F7/20
摘要： An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.

6. 发明申请

US20220397830A1 A FLUID HANDLING SYSTEM, METHOD AND LITHOGRAPHIC APPARATUS 有权
公开(公告)号：US20220397830A1
公开(公告)日：2022-12-15
申请号：US17776369
申请日：2020-10-12
申请人： ASML NETHERLANDS B.V.
发明人： Yang-Shan HUANG , Nicolaas TEN KATE
IPC分类号： G03F7/20
摘要： A fluid handling system that includes a liquid confinement structure configured to confine immersion liquid to a space between at least a part of the liquid confinement structure and a surface of a substrate. The fluid handling system also includes a mechanism configured to vibrate a vibration component in contact with the immersion liquid.

7. 发明申请

US20210391139A1 REPLACEABLE MODULE FOR A CHARGED PARTICLE APPARATUS 有权
公开(公告)号：US20210391139A1
公开(公告)日：2021-12-16
申请号：US17344446
申请日：2021-06-10
申请人： ASML Netherlands B.V.
发明人： Christiaan OTTEN , Peter-Paul CRANS , Marc SMITS , Laura DEL TIN , Christan TEUNISSEN , Yang-Shan HUANG , Stijn Wilem, Herman, Karel STEENBRINK , Xuerang HU , Qingpo XI , Xinan LUO , Xuedong LIU
IPC分类号： H01J37/20 , H01J37/28 , H01J37/18 , H01J37/14 , H01J37/147 , H01J37/244
摘要： Disclosed herein is a module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus, the module comprising: a support arrangement configured to support the device, wherein the device is configured to manipulate a charged particle path within the charged particle apparatus; and a support positioning system configured to move the support arrangement within the module; wherein the module is arranged to be field replaceable in the charged particle apparatus.

8. 发明申请

US20210373446A1 A Positioning System and a Method for Positioning a Substage or a Stage with Respect to a Frame 有权
公开(公告)号：US20210373446A1
公开(公告)日：2021-12-02
申请号：US16763925
申请日：2018-10-08
申请人： ASML Netherlands B.V.
发明人： Yang-Shan HUANG , Petrus Theodorus RUTGERS
IPC分类号： G03F7/20 , H02K41/03 , H02K21/44
摘要： A method for positioning a substage (9), supported by a main stage (5), relative to a reference object, the substage moveable in a direction (7) between a first and second position relative to the main stage. The method includes positioning the first stage using a passive force system that is activated by positioning the main stage. The passive force system includes two magnet systems (119, 121), each magnet system being configured to apply a force in the direction to the first stage with respect to the second stage in a non-contact manner, the forces resulting in a resultant force applied to the first stage in the direction by the passive force system. A magnitude and/or a direction of the resultant force depends on the position of the first stage relative to the second stage, and the first stage has a zero-force position between the first and second position in which the resultant force is zero.

9. 发明申请

US20200333717A1 Object Stage Bearing for Lithographic Apparatus 审中-公开
公开(公告)号：US20200333717A1
公开(公告)日：2020-10-22
申请号：US16763487
申请日：2018-11-07
申请人： ASML Netherlands B.V.
发明人： Yang-Shan HUANG , Pieter Cornelis Johan DE JAGER , Rob REILINK , Christiaan Louis VALENTIN , Jasper Leonardus Johannes SCHOLTEN , Antonie Hendrik VERWEIJ , Edwin VAN HORNE
IPC分类号： G03F7/20 , F16C29/02
摘要： An object stage bearing system can include an object stage, a hollow shaft coupled to the object stage, and an in-vacuum gas bearing assembly coupled to the hollow shaft and the object stage. The in-vacuum gas bearing assembly can include a gas bearing, a scavenging groove, and a vacuum groove. The gas bearing is disposed along an inner wall of the in-vacuum gas bearing assembly and along an external wall of the hollow shaft. The scavenging groove is disposed along the inner wall such that the scavenging groove is isolated from the gas bearing. The vacuum groove is disposed along the inner wall such that the vacuum groove is isolated from the scavenging groove and the gas bearing.

10. 发明申请

US20170010544A1 COIL ASSEMBLY, ELECTROMAGNETIC ACTUATOR, STAGE POSITIONING DEVICE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：线圈组件，电磁致动器，阶段定位装置，平面装置和装置制造方法
公开(公告)号：US20170010544A1
公开(公告)日：2017-01-12
申请号：US15113428
申请日：2014-12-19
申请人： ASML NETHERLANDS B.V. , ASML HOLDING NV
发明人： Yang-Shan HUANG , Minkyu KIM , Gerard Johannes Pieter NIJSSE
IPC分类号： G03F7/20 , H02K9/00 , H02K3/48 , H01F7/10
CPC分类号： G03F7/70725 , G03F7/70758 , G03F7/70858 , G03F7/70875 , H01F7/10 , H02K3/24 , H02K3/48 , H02K9/005 , H02K9/19 , H02K41/031
摘要： A coil assembly for an electromagnetic actuator or motor, includes a magnetic core including at least one pair of slots; a coil, at least partly mounted inside the at least one pair of slots; and a cooling member, the cooling member being mounted to a surface of the coil.
摘要翻译：一种用于电磁致动器或电动机的线圈组件，包括：包含至少一对槽的磁芯; 至少部分地安装在所述至少一对槽中的线圈; 以及冷却部件，所述冷却部件安装在所述线圈的表面。

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