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1. 发明授权

US11828585B2 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method 有权
公开(公告)号：US11828585B2
公开(公告)日：2023-11-28
申请号：US17692974
申请日：2022-03-11
申请人： ASML Netherlands B.V.
发明人： Henricus Petrus Maria Pellemans , Arie Jeffrey Den Boef
IPC分类号： G01B11/24 , G03F7/00 , G03F7/20
CPC分类号： G01B11/24 , G03F7/7085 , G03F7/70191 , G03F7/70633
摘要： A scatterometer for measuring a property of a target on a substrate includes a radiation source, a detector, and a processor. The radiation source produces a radiated spot on the target. The scatterometer adjusts a position of the radiated spot along a first direction across the target and along a second direction that is at an angle with respect to the first direction. The detector receives radiation scattered by the target. The received radiation is associated with positions of the radiated spot on the target along at least the first direction. The detector generates measurement signals based on the positions of the radiated spot on the target. The processor outputs, based on the measurement signals, a single value that is representative of the property of the target. The processor also combines the measurement signals to output a combined signal and derives, based on the combined signal, the single value.

2. 发明授权

US11428925B2 Position metrology apparatus and associated optical elements 有权
公开(公告)号：US11428925B2
公开(公告)日：2022-08-30
申请号：US16731249
申请日：2019-12-31
申请人： ASML Netherlands B.V.
发明人： Arjan Johannes Anton Beukman , Alessandro Polo , Henricus Petrus Maria Pellemans , Nitish Kumar
IPC分类号： G02B26/00 , G03F7/20 , G01B11/27
摘要： Disclosed is a metrology apparatus comprising an optical element configured to receive at or near a pupil plane of the metrology apparatus, at least first radiation comprising a first higher diffracted order and second radiation comprising a zeroth order resulting from illumination of a metrology target with radiation; and to direct said first radiation and second radiation together in a first direction. The metrology apparatus is further configured to form at least a first image of a first interference pattern, the first interference pattern resulting from interference of said first radiation and second radiation at an image plane.

3. 发明授权

US11307024B2 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method 有权
公开(公告)号：US11307024B2
公开(公告)日：2022-04-19
申请号：US16817552
申请日：2020-03-12
申请人： ASML Netherlands B.V.
发明人： Henricus Petrus Maria Pellemans , Arie Jeffrey Den Boef
IPC分类号： G01B11/24 , G03F7/20
摘要： A scatterometer for measuring a property of a target on a substrate includes a radiation source, a detector, and a processor. The radiation source produces a radiated spot on the target. The scatterometer adjusts a position of the radiated spot along a first direction across the target and along a second direction that is at an angle with respect to the first direction. The detector receives radiation scattered by the target. The received radiation is associated with positions of the radiated spot on the target along at least the first direction. The detector generates measurement signals based on the positions of the radiated spot on the target. The processor outputs, based on the measurement signals, a single value that is representative of the property of the target. The processor also combines the measurement signals to output a combined signal and derives, based on the combined signal, the single value.

4. 发明授权

US10241055B2 Method and apparatus for angular-resolved spectroscopic lithography characterization 有权
公开(公告)号：US10241055B2
公开(公告)日：2019-03-26
申请号：US14264547
申请日：2014-04-29
申请人： ASML Netherlands B.V.
发明人： Arie Jeffrey Maria Den Boef , Arno Jan Bleeker , Youri Johannes Laurentius Maria Van Dommelen , Mircea Dusa , Antoine Gaston Marie Kiers , Paul Frank Luehrmann , Henricus Petrus Maria Pellemans , Maurits Van Der Schaar , Cedric Desire Grouwstra , Markus Gerardus Martinus Van Kraaij
IPC分类号： G01B9/02 , G01N21/88 , G03F7/20 , G03F9/00
摘要： An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.

5. 发明授权

US08760662B2 Method and apparatus for angular-resolved spectroscopic lithography characterization 有权
标题翻译：用于角分辨光谱光刻特征的方法和装置
公开(公告)号：US08760662B2
公开(公告)日：2014-06-24
申请号：US14011663
申请日：2013-08-27
申请人： ASML Netherlands B.V.
发明人： Arie Jeffrey Den Boef , Arno Jan Bleeker , Youri Johannes Laurentius Maria Van Dommelen , Mircea Dusa , Antoine Gaston Marie Kiers , Paul Frank Luehrmann , Henricus Petrus Maria Pellemans , Maurits Van Der Schaar , Cédric Désiré Grouwstra , Markus Gerardus Martinus Maria Van Kraaij
IPC分类号： G01J3/45
CPC分类号： G01N21/8806 , G03F7/70341 , G03F7/70633 , G03F7/7065 , G03F9/7034
摘要： An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
摘要翻译：通过在高数值孔径透镜的光瞳平面中测量作为辐射的结果的角度分辨光谱从衬底反射来确定衬底的性质的装置和方法。该属性可以是角度和波长相关的，并且可以包括TM和TE偏振辐射的强度及其相对相位差。

6. 发明授权

US10955353B2 Method and apparatus for angular-resolved spectroscopic lithography characterization 有权
公开(公告)号：US10955353B2
公开(公告)日：2021-03-23
申请号：US16270155
申请日：2019-02-07
申请人： ASML Netherlands B.V.
发明人： Arie Jeffrey Den Boef , Arno Jan Bleeker , Youri Johannes Laurentius Maria Van Dommelen , Mircea Dusa , Antoine Gaston Marie Kiers , Paul Frank Luehrmann , Henricus Petrus Maria Pellemans , Maurits Van Der Schaar , Cedric Desire Grouwstra , Markus Gerardus Martinus Maria Van Kraaij
IPC分类号： G01B9/02 , G01N21/88 , G03F7/20 , G03F9/00
摘要： An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.

7. 发明申请

US20200209608A1 Position Metrology Apparatus and Associated Optical Elements 审中-公开
公开(公告)号：US20200209608A1
公开(公告)日：2020-07-02
申请号：US16731249
申请日：2019-12-31
申请人： ASML Netherlands B.V.
发明人： Arjan Johannes Anton Beukman , Alessandro Polo , Henricus Petrus Maria Pellemans , Nitish Kumar
IPC分类号： G02B26/00
摘要： Disclosed is a metrology apparatus comprising an optical element configured to receive at or near a pupil plane of the metrology apparatus, at least first radiation comprising a first higher diffracted order and second radiation comprising a zeroth order resulting from illumination of a metrology target with radiation; and to direct said first radiation and second radiation together in a first direction. The metrology apparatus is further configured to form at least a first image of a first interference pattern, the first interference pattern resulting from interference of said first radiation and second radiation at an image plane.

8. 发明申请

US20160011523A1 Inspection Apparatus and Methods, Methods of Manufacturing Devices 有权
标题翻译：检验装置和方法，制造装置的方法
公开(公告)号：US20160011523A1
公开(公告)日：2016-01-14
申请号：US14794013
申请日：2015-07-08
申请人： ASML Netherlands B.V.
发明人： Amandev SINGH , Henricus Petrus Maria Pellemans , Patrick Warnaar
IPC分类号： G03F7/20 , G01J3/28 , G01N21/47 , G01J3/45
CPC分类号： G03F7/70491 , G01J3/2823 , G01J3/45 , G01N21/4788 , G01N2201/06113 , G03F7/70625 , G03F7/70633
摘要： Inspection apparatus (100) is used for measuring parameters of targets on a substrate. Coherent radiation follows an illumination path (solid rays) for illuminating target (T). A collection path (dashed rays) collects diffracted radiation from the target and delivers it to a lock-in image detector (112). A reference beam following a reference path (dotted rays). An acousto-optical modulator (108) shifts the optical frequency of the reference beam so that the intensity of radiation at the lock-in detector includes a time-varying component having a characteristic frequency corresponding to a difference between the frequencies of the diffracted radiation and the reference radiation. The lock-in image detector records two-dimensional image information representing both amplitude and phase of the time-varying component. A second reference beam with a different shift (110) follows a second reference path (dot-dash rays). Interference between the two reference beams can be used for intensity normalization.
摘要翻译：检查装置（100）用于测量基板上的目标的参数。相干辐射遵循用于照射目标（T）的照明路径（固体光线）。收集路径（虚线）从目标物体收集衍射辐射并将其传送到锁定图像检测器（112）。参考光束遵循参考路径（虚线）。声光调制器（108）移动参考光束的光频率，使得锁定检测器处的辐射强度包括具有与衍射辐射的频率之间的差异相对应的特征频率的时变分量，以及参考辐射。锁定图像检测器记录表示时变分量的幅度和相位的二维图像信息。具有不同偏移（110）的第二参考光束遵循第二参考路径（点划线）。两个参考光束之间的干涉可用于强度归一化。

9. 发明授权

US11525786B2 Method and apparatus for angular-resolved spectroscopic lithography characterization 有权
公开(公告)号：US11525786B2
公开(公告)日：2022-12-13
申请号：US17192276
申请日：2021-03-04
申请人： ASML Netherlands B.V.
发明人： Arie Jeffrey Den Boef , Arno Jan Bleeker , Youri Johannes Laurentius Maria Van Dommelen , Mircea Dusa , Antoine Gaston Marie Kiers , Paul Frank Luehrmann , Henricus Petrus Maria Pellemans , Maurits Van Der Schaar , Cédric Désiré Grouwstra , Markus Gerardus Martinus Maria Van Kraaij
IPC分类号： G01N21/00 , G01N21/88 , G03F7/20 , G03F9/00
摘要： An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.

10. 发明申请

US20180195857A1 Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method 审中-公开
公开(公告)号：US20180195857A1
公开(公告)日：2018-07-12
申请号：US15913253
申请日：2018-03-06
申请人： ASML Netherlands B.V.
发明人： Henricus Petrus Maria Pellemans , Arie Jeffrey Den Boef
IPC分类号： G01B11/24 , G03F7/20
CPC分类号： G01B11/24 , G03F7/70191 , G03F7/70633 , G03F7/7085
摘要： A device manufacturing method is disclosed. A radiated spot is directed onto a target pattern formed on a substrate. The radiated spot is moved along the target pattern in a series of discrete steps, each discrete step corresponding to respective positions of the radiated spot on the target pattern. Measurement signals are generated that correspond to respective ones of the positions of the radiated spot on the target pattern. A single value is determined that is based on the measurement signals and that is representative of the property of the substrate.

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