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1. 发明申请

US20190011828A1 A MEMBRANE FOR EUV LITHOGRAPHY 审中-公开
公开(公告)号：US20190011828A1
公开(公告)日：2019-01-10
申请号：US16060635
申请日：2016-12-02
申请人： ASML NETHERLANDS B.V
发明人： Pieter-Jan VAN ZWOL , Dennis DE GRAAF , Paul JANSSEN , Mária PÉTER , Marcus Adrianus VAN DE KERKHOF , Willem Joan VAN DER ZANDE , David Ferdinand VLES , Willem-Pieter VOORTHUIJZEN
IPC分类号： G03F1/24 , G03F1/62 , G03F7/20
摘要： A membrane for EUV lithography, the membrane having a thickness of no more than 200 nm and including a stack having: at least one silicon layer; and at least one silicon compound layer made of a compound of silicon and an element selected from the group consisting of boron, phosphorous, bromine.

2. 发明申请

US20180314150A1 Mask Assembly and Associated Methods 审中-公开
公开(公告)号：US20180314150A1
公开(公告)日：2018-11-01
申请号：US15545390
申请日：2016-02-01
申请人： ASML Netherlands B.V.
发明人： Derk Servatius Gertruda BROUNS , Dennis DE GRAAF , Robertus Cornelis Martinus DE KRUIF , Paul JANSSEN , Matthias KRUIZINGA , Arnoud Willem NOTENBOOM , Daniel Andrew SMITH , Beatrijs Louise Marie-Joseph Katrien VERBRUGGE , James Norman WILEY
IPC分类号： G03F1/84 , G03F1/22 , G03F1/64 , G03F1/66 , G03F1/42
CPC分类号： G03F1/84 , G03F1/22 , G03F1/42 , G03F1/62 , G03F1/64 , G03F1/66
摘要： A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.

3. 发明申请

US20200341365A1 EUV PELLICLES 审中-公开
公开(公告)号：US20200341365A1
公开(公告)日：2020-10-29
申请号：US16758250
申请日：2018-11-06
申请人： ASML NETHERLANDS B.V.
发明人： Zomer Silvester HOUWELING , Chaitanya Krishna ANDE , Dennis DE GRAAF , Thijs KATER , Michael Alfred Josephus KUIJKEN , Mahdiar VALEFI
IPC分类号： G03F1/64 , G03F1/00
摘要： A pellicle having a metal oxysilicide layer. A pellicle having a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. A method of manufacturing a pellicle for a lithographic apparatus, the method including providing a metal oxysilicide layer. A lithographic assembly including a pellicle having a metal oxysilicide layer. The use of a pellicle having a metal oxysilicide layer in a lithographic apparatus.

4. 发明申请

US20220121110A1 EUV PELLICLES 有权
公开(公告)号：US20220121110A1
公开(公告)日：2022-04-21
申请号：US17566764
申请日：2021-12-31
申请人： ASML NETHERLANDS B.V.
发明人： Zomer Silvester HOUWELING , Chaitanya Krishna ANDE , Dennis DE GRAAF , Thijs KATER , Michael Alfred Josephus KUIJKEN , Mahdiar VALEFI
IPC分类号： G03F1/62
摘要： A pellicle having a metal oxysilicide layer. A pellicle having a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. A method of manufacturing a pellicle for a lithographic apparatus, the method including providing a metal oxysilicide layer. A lithographic assembly including a pellicle having a metal oxysilicide layer. The use of a pellicle having a metal oxysilicide layer in a lithographic apparatus.

5. 发明申请

US20220035239A1 METHOD OF MANUFACTURING A MEMBRANE ASSEMBLY 有权
公开(公告)号：US20220035239A1
公开(公告)日：2022-02-03
申请号：US17278356
申请日：2019-10-02
申请人： ASML NETHERLANDS B.V.
发明人： Pieter-Jan VAN ZWOL , Sander BALTUSSEN , Dennis DE GRAAF , Johannes Christiaan Leonardus FRANKEN , Adrianus Johannes Maria GIESBERS , Alexander Ludwig KLEIN , Johan Hendrik KLOOTWIJK , Peter Simon Antonius KNAPEN , Evgenia KURGANOVA , Alexey Sergeevich KUZNETSOV , Arnoud Willem NOTENBOOM , Mahdiar VALEFI , Marcus Adrianus VAN DE KERKHOF , Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN , Ties Wouter VAN DER WOORD , Hendrikus Jan WONDERGEM , Aleksandar Nikolov ZDRAVKOV
IPC分类号： G03F1/64 , G03F7/20
摘要： A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including: at least one membrane layer supported by a planar substrate, wherein the planar substrate has an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate such that the membrane assembly has: a membrane formed from the at least one membrane layer, and a border holding the membrane, the border having the border region of the planar substrate and the first sacrificial layer situated between the border region and the membrane layer, wherein the selectively removing the inner region of the planar substrate includes using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer.

6. 发明申请

US20210341831A1 Mask Assembly and Associated Methods 有权
公开(公告)号：US20210341831A1
公开(公告)日：2021-11-04
申请号：US17375283
申请日：2021-07-14
申请人： ASML Netherlands B.V.
发明人： Derk Servatius Gertruda BROUNS , Dennis DE GRAAF , Robertus Cornelis Martinus DE KRUIF , Paul JANSSEN , Matthias KRUIZINGA , Arnoud Willem NOTENBOOM , Daniel Andrew SMITH , Beatrijs Louise Marie-Josep VERBRUGGE , James Norman WILEY
IPC分类号： G03F1/38 , G03F1/66 , G03F1/62
摘要： A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.

7. 发明申请

US20210240070A1 PELLICLE FOR EUV LITHOGRAPHY 有权
公开(公告)号：US20210240070A1
公开(公告)日：2021-08-05
申请号：US17048875
申请日：2019-04-12
申请人： ASML NETHERLANDS B.V.
发明人： Dennis DE GRAAF , Richard BEAUDRY , Maxime BIRON , Paul JANSSEN , Thijs KATER , Kevin KORNELSEN , Michael Alfred Josephus KUIJKEN , Jan Hendrik Willem KUNTZEL , Stephane MARTEL , Maxim Aleksandrovich NASALEVICH , Guido SALMASO , Pieter-Jan VAN ZWOL
IPC分类号： G03F1/64 , G03F7/20 , H01L21/033 , H01L21/027
摘要： A wafer including a mask on one face and at least one layer on an opposite face, wherein the mask has at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one layer is described. Also described is a method of preparing a pellicle, the method including: providing a wafer having a mask on one face and at least one layer on an opposite face, defining a scribeline in the mask, and selectively removing a portion of the at least one layer which at least partially overlies the scribeline as well as a method of preparing a pellicle, the method including: providing a pellicle core, and removing at least some material from at least one face of the pellicle core in a non-oxidising environment. In any aspect, the pellicle may include a metal nitride layer.

8. 发明申请

US20160274467A1 Radiation Source and Method for Lithography 审中-公开
标题翻译：放射源和光刻方法
公开(公告)号：US20160274467A1
公开(公告)日：2016-09-22
申请号：US14442415
申请日：2013-10-23
申请人： ASML NETHERLANDS B.V.
发明人： Hendrikus Gijsbertus SCHIMMEL , Michel RIEPEN , Reinier Theodorus Martinus JULISEN , Dennis DE GRAAF
IPC分类号： G03F7/20 , H05G2/00
CPC分类号： G03F7/70058 , G03F7/70033 , G03F7/70916 , H05G2/005 , H05G2/006 , H05G2/008
摘要： A radiation source suitable for providing radiation to a lithographic apparatus generates radiation from a plasma (12) generated from a fuel (31) within an enclosure comprising a gas. The plasma generates primary fuel debris collected as a fuel layer on a debris-receiving surface ((33a), (33b)). The debris-receiving surface is heated to a temperature to maintain the fuel layer as a liquid, and to provide a reduced or zero rate of formation gas bubbles within the liquid fuel layer in order to reduce contamination of optical surfaces (14) by secondary debris arising from gas bubble eruption from the liquid fuel layer. Additionally or alternatively, the radiation source may have a debris receiving surface positioned and/or oriented such that substantially all lines normal to the debris receiving surface do not intersect an optically active surface of the radiation source.
摘要翻译：适于向光刻设备提供辐射的辐射源产生从包括气体的外壳内的燃料（31）产生的等离子体（12）的辐射。等离子体产生作为燃料层收集的碎屑接收表面（（33a），（33b））上的主要燃料碎片。碎片接收表面被加热到一个温度以将燃料层保持为液体，并且在液体燃料层内提供降低或零速率的地层气泡，以便减少光学表面（14）由二次碎屑的污染来自液体燃料层的气泡喷发。附加地或替代地，辐射源可以具有定位和/或定向的碎片接收表面，使得基本上所有垂直于碎片接收表面的线不与辐射源的光学活性表面相交。

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