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1. 发明授权

US11525777B2 Optimizing signal-to-noise ratio in optical imaging of defects on unpatterned wafers 有权
公开(公告)号：US11525777B2
公开(公告)日：2022-12-13
申请号：US17243548
申请日：2021-04-28
申请人： APPLIED MATERIALS ISRAEL LTD.
发明人： Yechiel Kapoano , Binyamin Kirshner , David Goldovsky
IPC分类号： G01N21/47 , G01N21/95 , G02B5/30
摘要： A system for optical imaging of defects on unpatterned wafers that includes an illumination module, relay optics, a segmented polarizer, and a detector. The illumination module is configured to produce a polarized light beam incident on a selectable area of an unpatterned wafer. The relay optics is configured to collect and guide, radiation scattered off the area, onto the polarizer. The detector is configured to sense scattered radiation passed through the polarizer. The polarizer includes at least four polarizer segments, such that (i) boundary lines, separating the polarizer segments, are curved outwards relative to a plane, perpendicular to the segmented polarizer, unless the boundary line is on the perpendicular plane, and (ii) when the area comprises a typical defect, a signal-to-noise ratio of scattered radiation, passed through the polarizer segments, is increased as compared to when utilizing a linear polarizer.

2. 发明申请

US20210116368A1 OPTICAL INSPECTION 有权
公开(公告)号：US20210116368A1
公开(公告)日：2021-04-22
申请号：US16659938
申请日：2019-10-22
申请人： Applied Materials Israel Ltd.
发明人： Amir Shoham , Binyamin Kirshner , David Goldovsky , Nitzan Chamiel
IPC分类号： G01N21/47 , G01N21/21
摘要： Systems and methods for optical inspection of a sample are provided. Radiation scattered from the sample includes a first portion having a first polarization state and a second portion having a second polarization state that is a mirror image of the first polarization state. The first polarization state of the first portion of the scattered radiation is transposed using a polarizing mirroring device so that the scattered radiation output from the polarizing mirroring device has substantially the second polarization state.

3. 发明申请

US20160161750A1 CALIBRATABLE BEAM SHAPING SYSTEM AND METHOD 有权
标题翻译：可校准的波束形状系统和方法
公开(公告)号：US20160161750A1
公开(公告)日：2016-06-09
申请号：US15046377
申请日：2016-02-17
申请人： Applied Materials Israel, Ltd.
发明人： Binyamin Kirshner , Haim Eder
IPC分类号： G02B27/09 , G06T7/00 , G01J1/42 , G02B27/00
CPC分类号： G02B27/0927 , G01J1/4257 , G02B7/003 , G02B27/0025 , G06T7/001 , G06T7/32
摘要： A beam shaping system including: a first and second optical modules that are accommodated in a spaced-apart relationship in an optical path of light through the system to sequentially apply beam shaping to light incident thereon. The beam shaping system includes first and second alignment modules respectively carrying the first and second optical modules and operable for laterally positioning the optical modules with respect to the optical path. A calibration module of the beam shaping system is connectable to the first and second alignment modules and is operable to sequentially calibrate and align the respective lateral positions of the first and second optical modules with respect to the optical path. The system thereby enables shaping of an incoming light beam of given predetermined wave-front and lateral intensity distribution to form an output light beam having desired wave-front and desired lateral intensity distribution.
摘要翻译：一种光束整形系统，包括：第一和第二光学模块，其以相互间隔的关系容纳在通过该系统的光学光路中，以顺序对其上入射的光进行光束整形。光束整形系统包括分别承载第一和第二光学模块的第一和第二对准模块，并且可操作以相对于光路横向地定位光学模块。光束成形系统的校准模块可连接到第一和第二对准模块，并且可操作以相对于光路顺序校准和校准第一和第二光学模块的相应横向位置。因此，该系统能够对给定的预定波前和横向强度分布的入射光束进行成形，以形成具有期望的波前和期望的横向强度分布的输出光束。

4. 发明授权

US11474437B2 Increasing signal-to-noise ratio in optical imaging of defects on unpatterned wafers 有权
公开(公告)号：US11474437B2
公开(公告)日：2022-10-18
申请号：US16861094
申请日：2020-04-28
申请人： APPLIED MATERIALS ISRAEL LTD.
发明人： Yechiel Kapoano , Binyamin Kirshner , David Goldovsky
IPC分类号： G03F7/20 , G01N21/88 , G01N21/956 , G01N21/95 , G03F1/84 , F21V8/00
摘要： Disclosed herein is a method for increasing signal-to-noise (SNR) in optical imaging of defects on unpatterned wafers. The method includes: (i) irradiating a region of an unpatterned wafer with a substantially polarized, incident light beam, and (ii) employing relay optics to collect and guide, radiation scattered off the region, onto a segmented polarizer comprising at least four polarizer segments characterized by respective dimensions and polarization directions. The respective dimensions and polarization direction of each of the at least four polarizer segments are such that an overall power of background noise radiation, generated in the scattering of the incident light beam from the region and passed through all of the at least four polarizer segments, is decreased as compared to utilizing a linear polarizer.

5. 发明申请

US20210333719A1 INCREASING SIGNAL-TO-NOISE RATIO IN OPTICAL IMAGING OF DEFECTS ON UNPATTERNED WAFERS 有权
公开(公告)号：US20210333719A1
公开(公告)日：2021-10-28
申请号：US16861094
申请日：2020-04-28
申请人： APPLIED MATERIALS ISRAEL LTD.
发明人： Yechiel Kapoano , Binyamin Kirshner , David Goldovsky
IPC分类号： G03F7/20 , G01N21/88 , G01N21/956 , G01N21/95 , G03F1/84
摘要： Disclosed herein is a method for increasing signal-to-noise (SNR) in optical imaging of defects on unpatterned wafers. The method includes: (i) irradiating a region of an unpatterned wafer with a substantially polarized, incident light beam, and (ii) employing relay optics to collect and guide, radiation scattered off the region, onto a segmented polarizer comprising at least four polarizer segments characterized by respective dimensions and polarization directions. The respective dimensions and polarization direction of each of the at least four polarizer segments are such that an overall power of background noise radiation, generated in the scattering of the incident light beam from the region and passed through all of the at least four polarizer segments, is decreased as compared to utilizing a linear polarizer.

6. 发明授权

US11105740B2 Optical inspection 有权
公开(公告)号：US11105740B2
公开(公告)日：2021-08-31
申请号：US16659938
申请日：2019-10-22
申请人： Applied Materials Israel Ltd.
发明人： Amir Shoham , Binyamin Kirshner , David Goldovsky , Nitzan Chamiel
IPC分类号： G01N21/47 , G01N21/21 , G01N21/88 , G01N21/956 , G01N21/95
摘要： Systems and methods for optical inspection of a sample are provided. Radiation scattered from the sample includes a first portion having a first polarization state and a second portion having a second polarization state that is a mirror image of the first polarization state. The first polarization state of the first portion of the scattered radiation is transposed using a polarizing mirroring device so that the scattered radiation output from the polarizing mirroring device has substantially the second polarization state.

7. 发明授权

US09690105B2 Calibratable beam shaping system and method 有权
公开(公告)号：US09690105B2
公开(公告)日：2017-06-27
申请号：US15046377
申请日：2016-02-17
申请人： Applied Materials Israel, Ltd.
发明人： Binyamin Kirshner , Haim Eder
IPC分类号： G06K7/10 , G02B27/09 , G01J1/42 , G02B27/00 , G06T7/00 , G06T7/32 , G02B7/00
CPC分类号： G02B27/0927 , G01J1/4257 , G02B7/003 , G02B27/0025 , G06T7/001 , G06T7/32
摘要： A beam shaping system including: a first and second optical modules that are accommodated in a spaced-apart relationship in an optical path of light through the system to sequentially apply beam shaping to light incident thereon. The beam shaping system includes first and second alignment modules respectively carrying the first and second optical modules and operable for laterally positioning the optical modules with respect to the optical path. A calibration module of the beam shaping system is connectable to the first and second alignment modules and is operable to sequentially calibrate and align the respective lateral positions of the first and second optical modules with respect to the optical path. The system thereby enables shaping of an incoming light beam of given predetermined wave-front and lateral intensity distribution to form an output light beam having desired wave-front and desired lateral intensity distribution.

8. 发明申请

US20210349019A1 OPTIMIZING SIGNAL-TO-NOISE RATIO IN OPTICAL IMAGING OF DEFECTS ON UNPATTERNED WAFERS 有权
公开(公告)号：US20210349019A1
公开(公告)日：2021-11-11
申请号：US17243548
申请日：2021-04-28
申请人： APPLIED MATERIALS ISRAEL LTD.
发明人： Yechiel Kapoano , Binyamin Kirshner , David Goldovsky
IPC分类号： G01N21/47 , G01N21/95 , G02B5/30
摘要： A system for optical imaging of defects on unpatterned wafers that includes an illumination module, relay optics, a segmented polarizer, and a detector. The illumination module is configured to produce a polarized light beam incident on a selectable area of an unpatterned wafer. The relay optics is configured to collect and guide, radiation scattered off the area, onto the polarizer. The detector is configured to sense scattered radiation passed through the polarizer. The polarizer includes at least four polarizer segments, such that (i) boundary lines, separating the polarizer segments, are curved outwards relative to a plane, perpendicular to the segmented polarizer, unless the boundary line is on the perpendicular plane, and (ii) when the area comprises a typical defect, a signal-to-noise ratio of scattered radiation, passed through the polarizer segments, is increased as compared to when utilizing a linear polarizer.

9. 发明授权

US10295476B1 System and method for multiple mode inspection of a sample 有权
公开(公告)号：US10295476B1
公开(公告)日：2019-05-21
申请号：US16103535
申请日：2018-08-14
申请人： Applied Materials Israel Ltd.
发明人： Binyamin Kirshner , Yehiel Kapoano
IPC分类号： G01N21/88 , G01N21/95 , G02B26/08 , G02B27/10
摘要： A system and method for multiple mode inspection of a sample. The system includes a radiation source, an objective lens, a bright field detection module, a dark field detection module and optics. The optics, when the system operates at a first mode, is configured to direct the input beam through a first opening, without substantially blocking any part of the input beam, towards a first region of the objective lens. The optics, when the system operates at a second mode, is configured to direct the input beam through a second opening, without substantially blocking any part of the input beam, towards a second region of the objective lens. The first region of the objective lens differs from the second region of the objective lens.

10. 发明授权

US09291825B2 Calibratable beam shaping system and method 有权
标题翻译：可校准光束整形系统及方法
公开(公告)号：US09291825B2
公开(公告)日：2016-03-22
申请号：US13849187
申请日：2013-03-22
申请人： Applied Materials Israel, Ltd.
发明人： Binyamin Kirshner , Haim Eder
IPC分类号： G06K7/10 , G02B27/09 , G01J1/42 , G02B7/00
CPC分类号： G02B27/0927 , G01J1/4257 , G02B7/003 , G02B27/0025 , G06T7/001 , G06T7/32
摘要： A beam shaping system including: a first and second optical modules that are accommodated in a spaced-apart relationship in an optical path of light through the system to sequentially apply beam shaping to light incident thereon. The beam shaping system includes first and second alignment modules respectively carrying the first and second optical modules and operable for laterally positioning the optical modules with respect to the optical path. A calibration module of the beam shaping system is connectable to the first and second alignment modules and is operable to sequentially calibrate and align the respective lateral positions of the first and second optical modules with respect to the optical path. The system thereby enables shaping of an incoming light beam of given predetermined wave-front and lateral intensity distribution to form an output light beam having desired wave-front and desired lateral intensity distribution.
摘要翻译：一种光束整形系统，包括：第一和第二光学模块，其以相互间隔的关系容纳在通过该系统的光学光路中，以顺序对其上入射的光进行光束整形。光束整形系统包括分别承载第一和第二光学模块的第一和第二对准模块，并且可操作以相对于光路横向地定位光学模块。光束成形系统的校准模块可连接到第一和第二对准模块，并且可操作以相对于光路顺序校准和校准第一和第二光学模块的相应横向位置。因此，该系统能够对给定的预定波前和横向强度分布的入射光束进行成形，以形成具有期望的波前和期望的横向强度分布的输出光束。

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