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1. 发明申请

US20170090298A1 EXPOSURE APPARATUS AND EXPOSURE METHOD 有权
公开(公告)号：US20170090298A1
公开(公告)日：2017-03-30
申请号：US15221600
申请日：2016-07-28
申请人： ADVANTEST CORPORATION
发明人： Shoji KOJIMA , Akio YAMADA , Masahiro SEYAMA
IPC分类号： G03F7/20
CPC分类号： G03F7/7055 , G03F7/2059 , H01J37/045 , H01J37/3177 , H01J2237/304
摘要： Provided is an exposure apparatus that exposes a pattern on a sample, the exposure apparatus including a plurality of blanking electrodes that are provided corresponding to a plurality of charged particle beams and each switch whether the corresponding particle beam irradiates the sample according to an input voltage; an irradiation control section that outputs switching signals for switching blanking voltages supplied respectively to the blanking electrodes; and a measuring section that, for each blanking electrode, measures a delay amount that is from when the switching signal changes to when the blanking voltage changes.

2. 发明申请

US20160314934A1 EXPOSURE APPARATUS AND EXPOSURE METHOD 有权
标题翻译：曝光装置和曝光方法
公开(公告)号：US20160314934A1
公开(公告)日：2016-10-27
申请号：US15052881
申请日：2016-02-25
申请人： ADVANTEST CORPORATION
发明人： Akio YAMADA , Masahiro SEYAMA , Hideki NASUNO
IPC分类号： H01J37/304 , H01J37/244 , H01J37/20 , H01J37/317
CPC分类号： H01J37/3045 , H01J37/20 , H01J37/244 , H01J37/3177 , H01J2237/043 , H01J2237/0435 , H01J2237/15 , H01J2237/2025 , H01J2237/20285 , H01J2237/30455 , H01J2237/31766 , H01J2237/31774
摘要： To use a charged particle beam to form a complex and fine pattern by decreasing movement error of a stage, provided is an exposure apparatus comprising a beam generating section that generates a charged particle beam; a stage section that has a sample mounted thereon and moves the sample relative to the beam generating section; a detecting section that detects a position of the stage section; a predicting section that generates a predicted drive amount obtained by predicting a drive amount of the stage section based on a detected position of the stage section; and an irradiation control section that performs irradiation control for irradiating the sample with the charged particle beam, based on the predicted drive amount. Also provided is an exposure method.
摘要翻译：为了使带电粒子束通过降低载物台的运动误差来形成复杂和精细的图案，提供了一种曝光装置，其包括产生带电粒子束的束产生部分; 具有安装在其上的样品并使样本相对于束生成部移动的台部，检测部，其检测所述台部的位置; 预测部，其基于所述台部的检测位置生成预测所述台部的驱动量而得到的预测驱动量; 以及照射控制部，其根据预测的驱动量进行照射带电粒子束的样品的照射控制。还提供了一种曝光方法。

3. 发明申请

US20160189930A1 EXPOSURE APPARATUS AND EXPOSURE METHOD 有权
标题翻译：曝光装置和曝光方法
公开(公告)号：US20160189930A1
公开(公告)日：2016-06-30
申请号：US14883634
申请日：2015-10-15
申请人： ADVANTEST CORPORATION
发明人： Akio YAMADA , Shinji SUGATANI , Masaki KUROKAWA , Masahiro SEYAMA
IPC分类号： H01J37/317
CPC分类号： H01J37/3174 , H01J37/045 , H01J37/3177 , H01J2237/31761 , H01J2237/31766 , H01J2237/31774
摘要： To form a complex and fine pattern by combining optical exposure technology and charged particle beam exposure technology, provided is an exposure apparatus that radiates a charged particle beam at a position corresponding to a line pattern on a sample, including a beam generating section that generates a plurality of the charged particle beams at different irradiation positions in a width direction of the line pattern; a scanning control section that performs scanning with the irradiation positions of the charged particle beams along a longitudinal direction of the line pattern; a selecting section that selects at least one charged particle beam to irradiate the sample from among the plurality of charged particle beams, at a designated irradiation position in the longitudinal direction of the line pattern; and an irradiation control section that controls the at least one selected charged particle beam to irradiate the sample.
摘要翻译：为了通过组合光学曝光技术和带电粒子束曝光技术来形成复杂和精细图案，提供了一种曝光装置，其在与样品上的线图案相对应的位置处辐射带电粒子束，包括生成在线图案的宽度方向上的不同照射位置处的多个带电粒子束; 扫描控制部，其沿着所述线条图案的长度方向对所述带电粒子束的照射位置进行扫描; 选择部，其选择至少一个带电粒子束，以在所述多个带电粒子束中沿所述线图案的长度方向的指定的照射位置照射所述样本; 以及照射控制部，其控制所述至少一个所选择的带电粒子束照射所述样品。

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