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    • 2. 发明授权
    • Methods and apparatuses for detecting registration offsets
    • 用于检测登记偏移的方法和装置
    • US09232632B2
    • 2016-01-05
    • US13724981
    • 2012-12-21
    • PEKING UNIVERSITY FOUNDER GROUP CO., LTD.ZHUHAI FOUNDER TECH HI-DENSITY ELECTRONIC CO., LTD.
    • Xinhong SuChen Chen
    • H01B12/00H05K1/02H05K3/06H05K3/46
    • H05K1/0269H05K3/067H05K3/4679
    • A method for detecting a registration offset is disclosed. The method includes transferring a first pattern to a metal layer on a first side of a printed circuit board (PCB) substrate. The first pattern has a reference scale. The method further includes transferring a second pattern to a metal layer on a second side opposite to the first side of the PCB substrate. The second pattern has a measurement scale. The second pattern is transferred by aligning an origin of the measurement scale with an origin of the reference scale in an apparatus such that at least a portion of the reference scale is overlapped with the measurement scale. The method includes etching the metal layers of the PCB substrate and measuring an offset in the patterns on the PCB substrate by using the reference scale and the measurement scale.
    • 公开了一种用于检测配准偏移的方法。 该方法包括将第一图案转印到印刷电路板(PCB)基板的第一侧上的金属层。 第一个模式有参考比例。 该方法还包括将第二图案转移到与PCB基板的第一侧相对的第二侧上的金属层。 第二种模式具有测量尺度。 通过将测量刻度的原点与参考刻度的原点对准在装置中,使得参考刻度的至少一部分与测量刻度重叠来传送第二图案。 该方法包括蚀刻PCB衬底的金属层,并通过使用参考刻度和测量刻度来测量PCB衬底上的图案中的偏移。
    • 6. 发明申请
    • Methods and Apparatuses for Detecting Registration Offsets
    • 检测注册偏移的方法和装置
    • US20130161072A1
    • 2013-06-27
    • US13724981
    • 2012-12-21
    • PEKING UNIVERSITY FOUNDER GROUP CO. LTD.ZHUHAI FOUNDER TECH HI-DENSITY ELECTRONIC CO., LTD.
    • Xinhong SUChen CHEN
    • H05K1/02H05K3/06
    • H05K1/0269H05K3/067H05K3/4679
    • A method for detecting a registration offset is disclosed. The method includes transferring a first pattern to a metal layer on a first side of a printed circuit board (PCB) substrate. The first pattern has a reference scale. The method further includes transferring a second pattern to a metal layer on a second side opposite to the first side of the PCB substrate. The second pattern has a measurement scale. The second pattern is transferred by aligning an origin of the measurement scale with an origin of the reference scale in an apparatus such that at least a portion of the reference scale is overlapped with the measurement scale. The method includes etching the metal layers of the PCB substrate and measuring an offset in the patterns on the PCB substrate by using the reference scale and the measurement scale.
    • 公开了一种用于检测配准偏移的方法。 该方法包括将第一图案转印到印刷电路板(PCB)基板的第一侧上的金属层。 第一个模式有参考比例。 该方法还包括将第二图案转移到与PCB基板的第一侧相对的第二侧上的金属层。 第二种模式具有测量尺度。 通过将测量刻度的原点与参考刻度的原点对准在装置中,使得参考刻度的至少一部分与测量刻度重叠来传送第二图案。 该方法包括蚀刻PCB衬底的金属层,并通过使用参考刻度和测量刻度来测量PCB衬底上的图案中的偏移。