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1. 发明授权

US07355691B2 Defect inspection apparatus and defect inspection method 失效
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US07355691B2
公开(公告)日：2008-04-08
申请号：US11540681
申请日：2006-10-02
申请人： Noboru Yamaguchi , Yuudai Ishikawa
发明人： Noboru Yamaguchi , Yuudai Ishikawa
IPC分类号： G01N21/00
CPC分类号： G01N21/956 , G01N21/8806 , G01N2021/95676 , G03F1/84 , H01L21/67294
摘要： An irregularity defect inspection apparatus for inspecting an object to be inspected having a repeated pattern composed of regularly arranged unit patterns on the surface thereon to detect an irregularity defect occurring in the repeated pattern. The apparatus includes a light source apparatus having a light source for applying light to a region including an inspection region of the object to be inspected at a desired incidence angle, and an observation apparatus having a light-receiving optical system for receiving light which is generated from the inspection surface of the object to be inspected perpendicularly thereto when light is applied by the light source apparatus. The light source apparatus is provide with a light source having a parallelism of 2 degrees or less and an illuminance of 300000 Lx or higher.
摘要翻译：一种用于检查被检查物体的不规则缺陷检查装置，其具有在其表面上由规则排列的单位图形组成的重复图案，以检测在重复图案中出现的不规则缺陷。该装置包括：光源装置，具有用于将光照射到包括被检查物体的检查区域的区域以期望的入射角的光源;以及观察装置，具有用于接收产生的光的光接收光学系统当由光源装置施加光时，从垂直于被检查物体的检查表面。光源装置具有2度以下的平行度和300000Lx以上的照度的光源。

2. 发明申请

US20050220330A1 Method of inspecting an mura defect in a pattern and apparatus used for the same 审中-公开
标题翻译：用于其中使用的图案和装置中的检查缺陷的方法
公开(公告)号：US20050220330A1
公开(公告)日：2005-10-06
申请号：US11094357
申请日：2005-03-31
申请人： Masaaki Kobayashi , Atsushi Hara , Noboru Yamaguchi , Yuudai Ishikawa
发明人： Masaaki Kobayashi , Atsushi Hara , Noboru Yamaguchi , Yuudai Ishikawa
IPC分类号： G01N21/956 , G02F1/13 , G03F1/68 , G03F1/84 , G06K9/00
CPC分类号： G03F1/84 , G01N21/956
摘要： A mura defect inspection apparatus 10 having an illuminating unit 12 which irradiates light onto a photomask 50 having a chip 55 on the surface thereof, the chip is formed with a repeated pattern that a unit pattern is regularly arranged, and a photoreceptor 13 which receives scattered light generated at the edge part of the unit pattern of the repeated pattern on the chip of the photomask and converts it to received light data, wherein the received light data is analyzed to detect a mura defect generated in the repeated pattern, wherein the illuminating unit irradiates light that is emitted from an illumination light source and has a orientation property of the rays almost parallel, the light having a parallelism within an angle of 2°, for example, onto a repeated pattern 51 on the chip 55 of the photomask 50. This application claims foreign priority based on Japanese Patent application No. 2004-106462, filed Mar. 31, 2004, the contents of which is incorporated herein by reference in its entirety.
摘要翻译：具有将光照射到其表面上具有芯片55的光掩模50的照明单元12的保护膜缺陷检查装置10形成有以规则排列的单位图案的重复图案，以及接收散射的感光体13 在光掩模的芯片上的重复图案的单元图案的边缘部分处产生的光，并将其转换为接收的光数据，其中分析接收的光数据以检测在重复图案中产生的色调缺陷，其中照明单元照射从照明光源发射的光，并且具有几乎平行的射线的取向特性，例如平行于2°的角度的光到光掩模50的芯片55上的重复图案51上。本申请基于2004年3月31日提交的日本专利申请No.2004-106462要求国外优先权，其内容通过引用并入本文 e整体。

3. 发明申请

US20110128850A1 BAND CONTROL SYSTEM, LOAD DISTRIBUTION DEVICE AND BAND CONTROL DEVICE 审中-公开
标题翻译：带控制系统，负载分配装置和带控制装置
公开(公告)号：US20110128850A1
公开(公告)日：2011-06-02
申请号：US12868197
申请日：2010-08-25
申请人： Ryo IIZAWA , Yuudai Ishikawa , Takahiro Ogawa
发明人： Ryo IIZAWA , Yuudai Ishikawa , Takahiro Ogawa
IPC分类号： H04L12/26
CPC分类号： H04W28/16 , H04L47/125 , H04L47/14 , H04W72/0486
摘要： Band control is conducted for each user by distributing traffic for each user in a case where a plurality of band control devices are required due to increased traffic and under the condition where the user uses a plurality of terminals or has a plurality of IP addresses with one terminal to generate a plurality of communications at the same time. The band control is performed for each user, using a load distribution device for specifying a user identifier such as a contractor number or telephone number from the source IP address used by the users in making the communication, and transferring the traffic based on the user identifier, a user management device for managing the correspondence between the user identifier and the source IP address, and a plurality of band control devices for managing the traffic for each user identifier, and making the band control of traffic for each user through a transparent process installed on the network path and not recognized by the originator and recipient of the communication.
摘要翻译：在由于业务量增加而需要多个频带控制装置的情况下以及在用户使用多个终端或具有多个IP地址的情况下，为每个用户分配流量进行频带控制终端同时生成多个通信。对于每个用户，使用负载分配装置执行频带控制，用于从进行通信时由用户使用的源IP地址指定诸如承包商号码或电话号码的用户标识符，并且基于用户标识符传送业务，用于管理用户标识符和源IP地址之间的对应关系的用户管理装置，以及用于管理每个用户标识符的流量的多个频带控制装置，以及通过安装的透明处理使每个用户的业务频带控制在网络路径上，由通信的发起者和接收者无法识别。

4. 发明申请

US20070076195A1 Defect inspection apparatus and defect inspection method 失效
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US20070076195A1
公开(公告)日：2007-04-05
申请号：US11540681
申请日：2006-10-02
申请人： Noboru Yamaguchi , Yuudai Ishikawa
发明人： Noboru Yamaguchi , Yuudai Ishikawa
IPC分类号： G01N21/88
CPC分类号： G01N21/956 , G01N21/8806 , G01N2021/95676 , G03F1/84 , H01L21/67294
摘要： An irregularity defect inspection apparatus for inspecting an object to be inspected having a repeated pattern composed of regularly arranged unit patterns on the surface thereon to detect an irregularity defect occurring in the repeated pattern. The apparatus includes a light source apparatus having a light source for applying light to a region including an inspection region of the object to be inspected at a desired incidence angle, and an observation apparatus having a light-receiving optical system for receiving light which is generated from the inspection surface of the object to be inspected perpendicularly thereto when light is applied by the light source apparatus. The light source apparatus is provide with a light source having a parallelism of 2 degrees or less and an illuminance of 300000 Lx or higher.
摘要翻译：一种用于检查被检查物体的不规则缺陷检查装置，其具有在其表面上由规则排列的单位图形组成的重复图案，以检测在重复图案中出现的不规则缺陷。该装置包括：光源装置，具有用于将光照射到包括被检查物体的检查区域的区域以期望的入射角的光源;以及观察装置，具有用于接收产生的光的光接收光学系统当由光源装置施加光时，从垂直于被检查物体的检查表面。光源装置具有2度以下的平行度和300000Lx以上的照度的光源。

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