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1. 发明授权

US08510610B2 Method and system of compressing raw fabrication data for fault determination 有权
标题翻译：压缩原始制造数据进行故障确定的方法和系统
公开(公告)号：US08510610B2
公开(公告)日：2013-08-13
申请号：US13240305
申请日：2011-09-22
申请人： Yij Chieh Chu , Yun-Zong Tian
发明人： Yij Chieh Chu , Yun-Zong Tian
IPC分类号： G06F11/00
CPC分类号： G05B23/0254 , G06F11/0754 , G06F11/3013 , G06F11/3082
摘要： The instant disclosure relates to a raw data compression method for the fabrication process. The method includes the steps of: inputting into a signal converter a collection of raw data points representing operational parameter of a semiconductor equipment within a predetermined time period; obtaining an approximation of the raw data points with a Fourier series; computing the Fourier coefficients and the residuals between the raw data points and the corresponding predicted values predicted by the Fourier series; determining if the residuals exceed an error threshold; recording and storing the Fourier coefficients as the compressed data if none of the residuals exceeds the error threshold; and recording the raw data point as abnormal data point if the corresponding residual exceeds the error threshold before recording and storing the Fourier coefficients and the abnormal data point as the compressed data.
摘要翻译：本公开涉及用于制造过程的原始数据压缩方法。该方法包括以下步骤：在预定时间段内向信号转换器输入表示半导体设备的操作参数的原始数据点的集合; 用傅里叶级数获得原始数据点的近似值; 计算傅里叶系数和原始数据点之间的残差与由傅立叶级数预测的对应预测值; 确定残差是否超过误差阈值; 如果没有残差超过误差阈值，则将傅立叶系数作为压缩数据进行记录和存储; 并且如果在记录和存储傅立叶系数和异常数据点作为压缩数据之前相应的残差超过误差阈值，则将原始数据点记录为异常数据点。

2. 发明授权

US08090668B2 Method for predicting cycle time 有权
标题翻译：预测周期时间的方法
公开(公告)号：US08090668B2
公开(公告)日：2012-01-03
申请号：US12243301
申请日：2008-10-01
申请人： Yi Feng Lee , Chun Chi Chen , Yun-Zong Tian , Tsung-Wei Lin
发明人： Yi Feng Lee , Chun Chi Chen , Yun-Zong Tian , Tsung-Wei Lin
IPC分类号： G06F15/18 , G06E1/00
CPC分类号： G06F17/30598 , G06Q10/06
摘要： A method for predicting cycle time comprises the steps of: collecting a plurality of known sets of data; using a clustering method to classify the known sets of data into a plurality of clusters; using a decision tree method to build a classification rule of the clusters; building a prediction model of each cluster; preparing data predicted set of data; using the classification rule to determine that to which clusters the predicted set of data belongs; and using the prediction model of the cluster to estimate the objective cycle time of the predicted set of data. Therefore, engineers can beforehand know the cycle time that one lot of wafers spend in the forward fabrication process, which helps engineers to properly arrange the following fabrication process of the lot of wafer.
摘要翻译：一种用于预测周期时间的方法包括以下步骤：收集多个已知的数据集; 使用聚类方法将已知的数据集合分类成多个聚类; 使用决策树方法构建集群的分类规则; 构建每个群集的预测模型; 准备数据预测数据集; 使用分类规则来确定预测的数据集合属于哪个集群; 并使用群集的预测模型来估计预测数据集的目标周期时间。因此，工程师可以事先知道大量晶圆在正向制造过程中花费的周期时间，这有助于工程师正确布置晶圆批次的以下制造工艺。

3. 发明申请

US20110233468A1 PROCESS OF FORMING A CADMIUM AND SELENIUM CONTAINING NANOCRYSTALLINE COMPOSITE AND NANOCRYSTALLINE COMPOSITE OBTAINED THEREFROM 审中-公开
标题翻译：形成包含纳米复合材料的纳米复合材料和纳米复合材料的方法
公开(公告)号：US20110233468A1
公开(公告)日：2011-09-29
申请号：US12672269
申请日：2008-08-06
申请人： Yun Zong , Mingyong Han , Wolfgang Knoll
发明人： Yun Zong , Mingyong Han , Wolfgang Knoll
IPC分类号： C09K11/54 , B82Y20/00
CPC分类号： C09K11/565 , C09K11/883
摘要： Provided is a process of forming a Cd and Se containing nanocrystalline composite. The nanocrystalline composite has a composition of one of (a) Cd, M, Se, (b) Cd, Se, A, and (c) Cd, M, Se, A, with M being an element of group (12) of the PSE other than Cd and A being an element of group (16) of the PSE other than O and Se. In one embodiment in a suitable solvent a solution of the element Cd, or a precursor thereof, and, where applicable, of M, or a precursor thereof is formed. To the solution the element Se and, where applicable, A is added and thereby a reaction mixture formed. The reaction mixture is heated for a sufficient period of time at a temperature suitable for forming the Cd and Se containing nanocrystalline composite and then the reaction mixture is allowed to cool. Finally the Cd and Se containing nanocrystalline composite isolated. In another embodiment the reaction mixture is formed by adding into a suitable solvent the element Cd, or a precursor thereof, Se, where applicable M and where applicable A. In this embodiment the reaction mixture is heated and water formed during the process is being removed.
摘要翻译：提供了形成含Cd和Se的纳米晶复合材料的方法。纳米晶复合物具有（a）Cd，M，Se，（b）Cd，Se，A和（c）Cd，M，Se，A中的一种的组成，M是组（12）的元素除了Cd和A之外的PSE是除了O和Se之外的PSE的组（16）的元素。在一个实施方案中，在合适的溶剂中，形成元素Cd或其前体，以及适用的M或其前体的溶液。向溶液中加入元素Se和（如适用）A，形成反应混合物。将反应混合物在适于形成含Cd和Se的纳米晶复合材料的温度下加热足够的时间，然后使反应混合物冷却。最后分离Cd和Se纳米晶复合物。在另一个实施方案中，反应混合物通过在合适的溶剂中加入元素Cd或其前体Se，在适用的情况下加入，并且在适用的情况下，在适用的情况下，A形成。在该实施方案中，将反应混合物加热并在该过程中形成水。

4. 发明申请

US20110153660A1 METHOD OF SEARCHING FOR KEY SEMICONDUCTOR OPERATION WITH RANDOMIZATION FOR WAFER POSITION 审中-公开
标题翻译：搜索用于主要半导体操作的方法用于放置位置的随机化
公开(公告)号：US20110153660A1
公开(公告)日：2011-06-23
申请号：US13040633
申请日：2011-03-04
申请人： YIJ CHIEH CHU , CHUN CHI CHEN , YUN-ZONG TIAN , CHENG-HAO CHEN
发明人： YIJ CHIEH CHU , CHUN CHI CHEN , YUN-ZONG TIAN , CHENG-HAO CHEN
IPC分类号： G06F17/30
CPC分类号： G05B19/41875 , G05B2219/32221 , G05B2219/45031 , H01L22/20 , Y02P90/22
摘要： A method of searching for the key semiconductor operation with randomization for wafer position, comprising: recording the wafer position and the wafer yields of a plurality of wafer ID respectively corresponding to a plurality of semiconductor operations; establishing a matrix model which describes the matrix set for wafer yields of the plurality of wafer ID; analyzing the matrix model, further computing the matrix set for wafer yields of the wafer ID, thereby acquiring the weightings of the randomized wafer positions in such semiconductor operations; and searching for a key semiconductor operation among the plurality of semiconductor operations; herein, by using a local regression model to estimate the wafer position effect, computing the weighting of the position effect in each semiconductor operation based on the estimated position effect and the randomized wafer yield, higher weighting thereof indicates the key semiconductor operation having greater position effect in the aforementioned semiconductor process.
摘要翻译：一种用于晶片位置的随机化搜索密钥半导体操作的方法，包括：分别记录分别对应于多个半导体操作的多个晶片ID的晶片位置和晶片产量; 建立描述多个晶片ID的晶片产量的矩阵集合的矩阵模型; 分析矩阵模型，进一步计算晶片ID的晶片产量的矩阵集，从而在这种半导体操作中获得随机晶片位置的权重; 以及在所述多个半导体操作中搜索密钥半导体操作; 在本文中，通过使用局部回归模型来估计晶片位置效应，基于估计的位置效应和随机晶片产量计算每个半导体操作中的位置效应的加权，其较高的加权指示具有较大位置效应的关键半导体操作在上述半导体工艺中。

5. 发明申请

US20100128272A1 METHOD FOR DETECTING SURFACE PLASMON RESONANCE 有权
标题翻译：检测表面质子共振的方法
公开(公告)号：US20100128272A1
公开(公告)日：2010-05-27
申请号：US12312715
申请日：2007-11-23
申请人： Yun Zong , Wolfgang Knoll , Xiaodi Su
发明人： Yun Zong , Wolfgang Knoll , Xiaodi Su
IPC分类号： G01N21/55
CPC分类号： G01N21/553 , G01N21/554 , G01N29/12 , G01N29/2418 , G01N29/2437
摘要： There is disclosed a method and system for detecting a surface plasmon resonance associated with a fluid sample. The method includes the step of providing a piezoelectric substrate having at least two electrodes thereon, wherein at least one of said electrodes is coupled to a fluid sample. A light beam is transmitted toward the fluid sample to induce a oscillation frequency in the piezoelectric substrate. The oscillation frequency from said electrodes is then measured during transmittance of the light to detect the surface plasmon resonance associated with the fluid sample.
摘要翻译：公开了一种用于检测与流体样品相关联的表面等离子体共振的方法和系统。该方法包括提供其上具有至少两个电极的压电基片的步骤，其中所述电极中的至少一个耦合到流体样品。光束朝向流体样品传输，以在压电基片中引起振荡频率。然后在光的透射率期间测量来自所述电极的振荡频率，以检测与流体样品相关联的表面等离子体共振。

6. 发明授权

US08756028B2 Fault detection method of semiconductor manufacturing processes and system architecture thereof 有权
标题翻译：半导体制造工艺的故障检测方法及其系统架构
公开(公告)号：US08756028B2
公开(公告)日：2014-06-17
申请号：US13240348
申请日：2011-09-22
申请人： Yij Chieh Chu , Yun-Zong Tian
发明人： Yij Chieh Chu , Yun-Zong Tian
IPC分类号： G06F19/00 , H01L21/66 , G06T7/00
CPC分类号： G06F19/00 , G05B19/4184 , G06T7/001 , G06T2207/30148 , H01L22/12 , H01L22/14 , H01L22/20 , Y02P90/14
摘要： A fault detection method of semiconductor manufacturing processes is disclosed. The method includes the steps of providing a storage device, collecting a fault detection and classification(FDC) parameter by the storage device, setting up a measurement site for measuring an online measurement parameter, collecting a wafer acceptance test(WAT) in correspondence to the FDC parameter, establishing a first relationship equation between the FDC parameter and the online measurement parameter, establishing a second relationship equation of the online measurement parameter and the WAT by using the first relationship equation, establishing a third relationship equation between the FDC parameter and the WAT, establishing a waning region of the manufacturing processes by using the first, second, and third relationship equations, and determining the situation of generating wafer defects according to the warning region. The present invention discloses a system architecture for the method.
摘要翻译：公开了半导体制造工艺的故障检测方法。该方法包括以下步骤：提供存储装置，通过存储装置收集故障检测和分类（FDC）参数，设置用于测量在线测量参数的测量位置，收集对应于该测量参数的晶片验收测试（WAT） FDC参数，建立FDC参数和在线测量参数之间的第一关系式，建立第一关系式在线测量参数和WAT的第二关系式，建立FDC参数与WAT之间的第三关系式通过使用第一，第二和第三关系式建立制造过程的下降区域，并根据警告区域确定产生晶片缺陷的情况。本发明公开了一种用于该方法的系统架构。

7. 发明申请

US20120102052A1 SPECIFICATION ESTABLISHING METHOD FOR CONTROLLING SEMICONDUCTOR PROCESS 有权
标题翻译：用于控制半导体工艺的规范建立方法
公开(公告)号：US20120102052A1
公开(公告)日：2012-04-26
申请号：US13004236
申请日：2011-01-11
申请人： CHENG-HAO CHEN , YUN-ZONG TIAN , SHIH-CHANG KAO , YIJ CHIEH CHU , WEI JUN CHEN
发明人： CHENG-HAO CHEN , YUN-ZONG TIAN , SHIH-CHANG KAO , YIJ CHIEH CHU , WEI JUN CHEN
IPC分类号： G06F17/30
CPC分类号： G05B19/41865 , G05B2219/32201 , G05B2219/45031 , H01L22/20 , Y02P90/20 , Y02P90/22
摘要： A specification establishing method for controlling semiconductor process, the steps includes: providing a database and choosing a population from the database; sampling a plurality of sample groups from the population, each sample group being a non-normal distribution and having a plurality of samples; filtering the sample groups; summarizing the filtered sample groups to form a non-normal distribution diagram; getting a value-at-risk and a median by calculating from the non-normal distribution diagram; getting a critical value by calculating the value-at-risk and the median with a critical formula; getting a plurality of state values by calculating the filtered sample groups with a proportion formula; and getting an index value by calculating the non-normal distribution diagram with the proportion formula. Thus, the state values indicate the states of the sample groups are abnormal or not by comparing the state values to the index value.
摘要翻译：一种用于控制半导体处理的规范建立方法，所述步骤包括：提供数据库并从数据库中选择人口; 从群体中抽取多个样本组，每个样本组是非正态分布并具有多个样本; 过滤样品组; 总结过滤样品组以形成非正态分布图; 通过从非正态分布图计算得到风险价值和中位数; 通过使用关键公式计算风险值和中位数来获得临界值; 通过以比例公式计算过滤的样本组来获得多个状态值; 并用比例公式计算非正态分布图，得到指标值。因此，通过将状态值与指标值进行比较，状态值表示样本组的状态异常。

8. 发明申请

US20110251708A1 METHOD FOR PLANNING PRODUCTION SCHEDULE OF EQUIPMENT AND ASSOCIATED COMPUTER READABLE MEDIUM 审中-公开
标题翻译：计算设备生产时间表和相关计算机可读介质的方法
公开(公告)号：US20110251708A1
公开(公告)日：2011-10-13
申请号：US12783510
申请日：2010-05-19
申请人： Wei-Jun Chen , Yun-Zong Tian , Yij-Chieh Chu , Yi-Feng Lee
发明人： Wei-Jun Chen , Yun-Zong Tian , Yij-Chieh Chu , Yi-Feng Lee
IPC分类号： G06F19/00
CPC分类号： G06Q10/06 , Y02P90/86
摘要： A method for planning a production schedule of equipment includes: receiving information about a material replacement of the equipment; and determining a target production schedule of the equipment according to the information about the material replacement of the equipment, wherein the target production schedule includes an idle period, and during the idle period, the equipment stops manufacturing under a normal state.
摘要翻译：一种用于规划设备生产计划的方法包括：接收关于设备的材料更换的信息; 根据关于设备的材料更换的信息来确定设备的目标生产进度，其中目标生产计划包括空闲时段，并且在空闲期间，设备在正常状态下停止制造。

9. 发明申请

US20110010132A1 METHOD FOR EVALUATING EFFICACY OF PREVENTION MAINTENANCE FOR A TOOL 有权
标题翻译：评估工具预防性维护效率的方法
公开(公告)号：US20110010132A1
公开(公告)日：2011-01-13
申请号：US12566974
申请日：2009-09-25
申请人： YI-FENG LEE , CHUN-CHI CHEN , SHIH-CHANG KAO , YUN-ZONG TIAN , WEI-JUN CHEN
发明人： YI-FENG LEE , CHUN-CHI CHEN , SHIH-CHANG KAO , YUN-ZONG TIAN , WEI-JUN CHEN
IPC分类号： G06F15/00
CPC分类号： G06Q10/00
摘要： A method for evaluating efficacy of prevention maintenance for a tool includes the steps of: choosing a tool which has been maintained preventively and choosing a productive parameter of the tool; collecting values of the productive parameter generated from the tool during a time range for building a varying curve of the productive parameter versus time, modifying the varying curve with a moving average method; transforming the varying curve into a Cumulative Sum chart; and judging whether the values of the productive parameter generated from the tool after the prevention maintenance are more stable, compared with the values of the productive parameter generated from the tool before the prevention maintenance, according to the Cumulative Sum chart. Thereby, if the varying of the values of the productive parameter after the prevention maintenance isn't stable, then the efficacy of this prevention maintenance for the tool is judged not good.
摘要翻译：一种用于评估工具的预防维护功效的方法包括以下步骤：选择已预先维护的工具并选择工具的生产参数; 在用于构建生产参数对时间的变化曲线的时间范围内收集从工具产生的生产参数的值，以移动平均法修改变化曲线; 将变化曲线转换为累计总和图; 并且根据累计总和图来判断在防止维护之后从工具生成的生产参数的值是否比预防维护之前从工具产生的生产参数的值更稳定。因此，如果防止维护后的生产参数的值的变化不稳定，则对该工具的该防止维护的功效被判断为不好。

10. 发明申请

US20100256792A1 METHOD OF ADJUSTING WAFER PROCESSING SEQUENCE 有权
标题翻译：调整加工顺序的方法
公开(公告)号：US20100256792A1
公开(公告)日：2010-10-07
申请号：US12476559
申请日：2009-06-02
申请人： YUN-ZONG TIAN , CHUN CHI CHEN , YI FENG LEE , WEI JUN CHEN , SHIH CHANG KAO , YIJ CHIEH CHU , CHENG-HAO CHEN
发明人： YUN-ZONG TIAN , CHUN CHI CHEN , YI FENG LEE , WEI JUN CHEN , SHIH CHANG KAO , YIJ CHIEH CHU , CHENG-HAO CHEN
IPC分类号： G06F17/00
CPC分类号： G05B19/41865 , G05B2219/32015 , G05B2219/32016 , G05B2219/32019 , G05B2219/45031 , Y02P90/20
摘要： A method of adjusting wafer process sequence includes steps of collecting production parameters for a plurality of lots; selecting a plurality of key parameters from the production parameters, wherein the key parameters at least includes a processing sequence; defining a formula to obtain an epsilon value; categorizing the lots into groups according to the epsilon value and the minimum point number by using density-based spatial clustering of application with noise (DBSCAN); and adjusting the processing sequences of the lots in the groups. Thereby, the lots with the same process recipe can be continuously or simultaneously sent into a machine, thereby reducing replacement of process recipes or shortening machine idle time.
摘要翻译：调整晶片工艺顺序的方法包括收集多个批次的生产参数的步骤; 从所述生产参数中选择多个关键参数，其中所述关键参数至少包括处理序列; 定义公式以获得ε值; 通过使用基于密度的噪声空间聚类（DBSCAN），根据ε值和最小点数将批次分组成组。并调整组中批次的处理顺序。因此，具有相同处理配方的批次可以连续或同时发送到机器中，从而减少过程配方的更换或缩短机器空闲时间。

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