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1. 发明授权

US08946004B2 Contact portion of wire and manufacturing method thereof 有权
标题翻译：电线接触部分及其制造方法
公开(公告)号：US08946004B2
公开(公告)日：2015-02-03
申请号：US12544144
申请日：2009-08-19
申请人： Joo-Han Kim , Ki-Yong Song , Dong-Ju Yang , Hee-Joon Kim , Yeo-Geon Yoon , Sung-Hen Cho , Chang-Hoon Kim , Jae-Hong Kim , Yu-Gwang Jeong , Ki-Yeup Lee , Sang-Gab Kim , Yun-Jong Yeo , Shin-Il Choi , Ji-Young Park
发明人： Joo-Han Kim , Ki-Yong Song , Dong-Ju Yang , Hee-Joon Kim , Yeo-Geon Yoon , Sung-Hen Cho , Chang-Hoon Kim , Jae-Hong Kim , Yu-Gwang Jeong , Ki-Yeup Lee , Sang-Gab Kim , Yun-Jong Yeo , Shin-Il Choi , Ji-Young Park
IPC分类号： H01L29/786 , H01L27/12 , G02F1/1362
CPC分类号： H01L24/05 , G02F1/136227 , H01L27/12 , H01L27/1214 , H01L27/124 , H01L2224/04042 , H01L2924/14 , H01L2924/1426 , H01L2924/00
摘要： A contact portion of wiring and a method of manufacturing the same are disclosed. A contact portion of wiring according to an embodiment includes: a substrate; a conductive layer disposed on the substrate; an interlayer insulating layer disposed on the conductive layer and having a contact hole; a metal layer disposed on the conductive layer and filling the contact hole; and a transparent electrode disposed on the interlayer insulating layer and connected to the metal layer, wherein the interlayer insulating layer includes a lower insulating layer and an upper insulating layer disposed on the lower insulating layer, the lower insulating layer is undercut at the contact hole, and the metal layer fills in the portion where the lower insulating layer is undercut.
摘要翻译：公开了布线的接触部分及其制造方法。根据实施例的布线的接触部分包括：基板; 设置在所述基板上的导电层; 设置在所述导电层上并具有接触孔的层间绝缘层; 设置在所述导电层上并填充所述接触孔的金属层; 以及透明电极，设置在所述层间绝缘层上并连接到所述金属层，其中所述层间绝缘层包括下绝缘层和设置在所述下绝缘层上的上绝缘层，所述下绝缘层在所述接触孔处被底切，并且金属层填充在下绝缘层被切下的部分。

2. 发明申请

US20100230679A1 CONTACT PORTION OF WIRE AND MANUFACTURING METHOD THEREOF 有权
标题翻译：接线方式及其制造方法
公开(公告)号：US20100230679A1
公开(公告)日：2010-09-16
申请号：US12544144
申请日：2009-08-19
申请人： Joo-Han Kim , Ki-Yong Song , Dong-Ju Yang , Hee-Joon Kim , Yeo-Geon Yoon , Sung-Hen Cho , Chang-Hoon Kim , Jae-Hong Kim , Yu-Gwang Jeong , Ki-Yeup Lee , Snag-Gab Kim , Yun-Jong Yeo , Shin-Il Choi , Ji-Young Park
发明人： Joo-Han Kim , Ki-Yong Song , Dong-Ju Yang , Hee-Joon Kim , Yeo-Geon Yoon , Sung-Hen Cho , Chang-Hoon Kim , Jae-Hong Kim , Yu-Gwang Jeong , Ki-Yeup Lee , Snag-Gab Kim , Yun-Jong Yeo , Shin-Il Choi , Ji-Young Park
IPC分类号： H01L29/786 , H01L29/49 , H01L21/28 , H01L21/336
CPC分类号： H01L24/05 , G02F1/136227 , H01L27/12 , H01L27/1214 , H01L27/124 , H01L2224/04042 , H01L2924/14 , H01L2924/1426 , H01L2924/00
摘要： A contact portion of wiring and a method of manufacturing the same are disclosed. A contact portion of wiring according to an embodiment includes: a substrate; a conductive layer disposed on the substrate; an interlayer insulating layer disposed on the conductive layer and having a contact hole; a metal layer disposed on the conductive layer and filling the contact hole; and a transparent electrode disposed on the interlayer insulating layer and connected to the metal layer, wherein the interlayer insulating layer includes a lower insulating layer and an upper insulating layer disposed on the lower insulating layer, the lower insulating layer is undercut at the contact hole, and the metal layer fills in the portion where the lower insulating layer is undercut.
摘要翻译：公开了布线的接触部分及其制造方法。根据实施例的布线的接触部分包括：基板; 设置在所述基板上的导电层; 设置在所述导电层上并具有接触孔的层间绝缘层; 设置在所述导电层上并填充所述接触孔的金属层; 以及设置在所述层间绝缘层上且与所述金属层连接的透明电极，其中所述层间绝缘层包括下绝缘层和设置在所述下绝缘层上的上绝缘层，所述下绝缘层在所述接触孔处被底切，并且金属层填充在下绝缘层被切下的部分。

3. 发明申请

US20100163862A1 THIN FILM TRANSISTOR ARRAY SUBSTRATE AND METHOD OF FABRICATING THE SAME 有权
标题翻译：薄膜晶体管阵列基板及其制造方法
公开(公告)号：US20100163862A1
公开(公告)日：2010-07-01
申请号：US12484116
申请日：2009-06-12
申请人： Dong-Ju YANG , Yu-Gwang Jeong , Ki-Yeup Lee , Sang-Gab Kim , Yun-Jong Yeo , Shin-Il Choi , Hong-Kee Chin , Seung-Ha Choi , Jung-Suk Bang
发明人： Dong-Ju YANG , Yu-Gwang Jeong , Ki-Yeup Lee , Sang-Gab Kim , Yun-Jong Yeo , Shin-Il Choi , Hong-Kee Chin , Seung-Ha Choi , Jung-Suk Bang
IPC分类号： H01L29/786 , H01L29/24 , H01L21/336
CPC分类号： H01L27/1248 , H01L27/1214 , H01L27/1225 , H01L27/1288 , H01L29/7869
摘要： A method of fabricating a thin film transistor array substrate is presented. The method entails forming a gate interconnection line on an insulating substrate, forming a gate insulating layer on the gate interconnection line, forming a semiconductor layer and a data interconnection line on the semiconductor layer, sequentially forming multiple passivation layers, etching the passivation layers down to a drain electrode that is an extension of the data interconnection line. The portion of the drain electrode that is exposed at this stage is a part of the drain electrode-pixel electrode contact portion. A pixel electrode is formed connected to the drain electrode. Two of the passivation layers have the same composition but are processed at different temperatures. A thin film transistor prepared in the above manner is also presented.
摘要翻译：提出了制造薄膜晶体管阵列基板的方法。该方法需要在绝缘基板上形成栅极互连线，在栅极互连线上形成栅极绝缘层，在半导体层上形成半导体层和数据互连线，依次形成多个钝化层，将钝化层蚀刻到作为数据互连线的延伸线的漏电极。在该阶段暴露的漏电极的部分是漏极电极 - 像素电极接触部分的一部分。形成连接到漏电极的像素电极。两个钝化层具有相同的组成，但是在不同的温度下进行处理。还提出了以上述方式制备的薄膜晶体管。

4. 发明授权

US09671637B2 Touch screen substrate and method of manufacturing the same 有权
公开(公告)号：US09671637B2
公开(公告)日：2017-06-06
申请号：US12903688
申请日：2010-10-13
申请人： Yun-Jong Yeo , Hong-Kee Chin
发明人： Yun-Jong Yeo , Hong-Kee Chin
IPC分类号： G06F3/042 , G02F1/1333 , G06F3/041 , H01L27/12
CPC分类号： G02F1/13338 , G06F3/0412 , G06F3/042 , H01L27/12 , H01L27/1214 , Y10T29/49105
摘要： In a touch screen substrate and a method of manufacturing the same, the touch screen substrate includes a base substrate, a light blocking pattern, a first sensing element and a first switching element. The light blocking pattern includes an inorganic layer formed on the base substrate and a light blocking layer formed on the inorganic layer, the light blocking layer transmitting an infrared light and absorbing a visible light. The first sensing element is formed on the light blocking pattern and senses the infrared light. The first switching element is electrically connected to the first sensing element. Thus, an undercut may be prevented from being formed at a lower portion of the light blocking pattern, and an adhesive strength between the light blocking pattern and the base substrate may be enhanced.

5. 发明授权

US08586990B2 Method of fabricating a thin film transistor array substrate 有权
标题翻译：制造薄膜晶体管阵列基板的方法
公开(公告)号：US08586990B2
公开(公告)日：2013-11-19
申请号：US13210282
申请日：2011-08-15
申请人： Dong-Ju Yang , Yu Gwang Jeong , Ki-Yeup Lee , Sang-Gab Kim , Yun-Jong Yeo , Shin-Il Choi , Hong-Kee Chin , Seung-Ha Choi , Jung-Suk Bang
发明人： Dong-Ju Yang , Yu Gwang Jeong , Ki-Yeup Lee , Sang-Gab Kim , Yun-Jong Yeo , Shin-Il Choi , Hong-Kee Chin , Seung-Ha Choi , Jung-Suk Bang
IPC分类号： H01L27/14
CPC分类号： H01L27/1248 , H01L27/1214 , H01L27/1225 , H01L27/1288 , H01L29/7869
摘要： A method of fabricating a thin film transistor array substrate is presented. The method entails forming a gate interconnection line on an insulating substrate, forming a gate insulating layer on the gate interconnection line, forming a semiconductor layer and a data interconnection line on the semiconductor layer, sequentially forming multiple passivation layers, etching the passivation layers down to a drain electrode that is an extension of the data interconnection line. The portion of the drain electrode that is exposed at this stage is a part of the drain electrode-pixel electrode contact portion. A pixel electrode is formed connected to the drain electrode. Two of the passivation layers have the same composition but are processed at different temperatures. A thin film transistor prepared in the above manner is also presented.
摘要翻译：提出了制造薄膜晶体管阵列基板的方法。该方法需要在绝缘基板上形成栅极互连线，在栅极互连线上形成栅极绝缘层，在半导体层上形成半导体层和数据互连线，依次形成多个钝化层，将钝化层蚀刻到作为数据互连线的延伸线的漏电极。在该阶段暴露的漏电极的部分是漏极电极 - 像素电极接触部分的一部分。形成连接到漏电极的像素电极。两个钝化层具有相同的组成，但是在不同的温度下进行处理。还提出了以上述方式制备的薄膜晶体管。

6. 发明申请

US20120228505A1 OPTICAL SENSOR 有权
标题翻译：光传感器
公开(公告)号：US20120228505A1
公开(公告)日：2012-09-13
申请号：US13194365
申请日：2011-07-29
申请人： Kun-Wook HAN , Sung-Ryul KIM , Woong-Kwon KIM , Dae-Cheol KIM , Ki-Hun JEONG , Jung-Suk BANG , Yun-Jong YEO , Byeong-Hoon CHO , Hong-Kee CHIN , Sung-jin MUN
发明人： Kun-Wook HAN , Sung-Ryul KIM , Woong-Kwon KIM , Dae-Cheol KIM , Ki-Hun JEONG , Jung-Suk BANG , Yun-Jong YEO , Byeong-Hoon CHO , Hong-Kee CHIN , Sung-jin MUN
IPC分类号： H01L27/14
CPC分类号： H01L27/14692 , H01L27/14665
摘要： An optical sensor includes a visible light sensor includes a visible light sensing transistor and an infrared light sensor includes an infrared light sensing transistor, wherein the visible light sensing transistor receives a first driving voltage through a first driving voltage line, the infrared light sensing transistor receives a second driving voltage through a second driving voltage line, and the visible light sensing transistor and the infrared light sensing transistor receive a reference voltage through a reference voltage line.
摘要翻译：光学传感器包括可见光传感器，其包括可见光感测晶体管，红外光传感器包括红外光检测晶体管，其中可见光感测晶体管通过第一驱动电压线接收第一驱动电压，红外光检测晶体管接收通过第二驱动电压线的第二驱动电压，并且可见光感测晶体管和红外光检测晶体管通过参考电压线接收参考电压。

7. 发明申请

US20110234536A1 TOUCH SCREEN SUBSTRATE AND METHOD OF MANUFACTURING THE SAME 有权
标题翻译：触摸屏幕基板及其制造方法
公开(公告)号：US20110234536A1
公开(公告)日：2011-09-29
申请号：US12903688
申请日：2010-10-13
申请人： Yun-Jong Yeo , Hong-Kee Chin
发明人： Yun-Jong Yeo , Hong-Kee Chin
IPC分类号： G06F3/042 , H01H11/00
CPC分类号： G02F1/13338 , G06F3/0412 , G06F3/042 , H01L27/12 , H01L27/1214 , Y10T29/49105
摘要： In a touch screen substrate and a method of manufacturing the same, the touch screen substrate includes a base substrate, a light blocking pattern, a first sensing element and a first switching element. The light blocking pattern includes an inorganic layer formed on the base substrate and a light blocking layer formed on the inorganic layer, the light blocking layer transmitting an infrared light and absorbing a visible light. The first sensing element is formed on the light blocking pattern and senses the infrared light. The first switching element is electrically connected to the first sensing element. Thus, an undercut may be prevented from being formed at a lower portion of the light blocking pattern, and an adhesive strength between the light blocking pattern and the base substrate may be enhanced.
摘要翻译：在触摸屏基板及其制造方法中，触摸屏基板包括基底基板，遮光图案，第一感测元件和第一开关元件。遮光图案包括形成在基底基板上的无机层和形成在无机层上的遮光层，遮光层透射红外光并吸收可见光。第一感测元件形成在遮光图案上并感测红外光。第一开关元件电连接到第一感测元件。因此，可以防止在遮光图案的下部形成底切，并且可以提高遮光图案和基底基板之间的粘合强度。

8. 发明申请

US20090278126A1 METAL LINE SUBSTRATE, THIN FILM TRANSISTOR SUBSTRATE AND METHOD OF FORMING THE SAME 审中-公开
标题翻译：金属线基板，薄膜晶体管基板及其形成方法
公开(公告)号：US20090278126A1
公开(公告)日：2009-11-12
申请号：US12431969
申请日：2009-04-29
申请人： Dong-Ju YANG , Sang-Gab KIM , Ki-Yeup LEE , Yun-Jong YEO , Shin-Il CHOI , Hong-Kee CHIN , Yu-Gwang JEONG , Seung-Ha CHOI
发明人： Dong-Ju YANG , Sang-Gab KIM , Ki-Yeup LEE , Yun-Jong YEO , Shin-Il CHOI , Hong-Kee CHIN , Yu-Gwang JEONG , Seung-Ha CHOI
IPC分类号： H01L29/786 , H01L23/522 , H01L21/768
CPC分类号： H01L21/76879 , H01L27/124
摘要： A metal line substrate and a method of fabricating thereof, the metal line substrate including an insulating layer and a capping layer disposed on an insulating substrate, a trench defined by the insulating layer and the capping layer disposed on the insulating substrate, a seed layer pattern disposed on the insulating substrate, and a low-resistive conductive layer pattern disposed in the trench and contacting the seed layer pattern. The capping layer pattern includes a protrusion region which is in contact with the low-resistive conductive layer pattern.
摘要翻译：一种金属线基板及其制造方法，所述金属线基板包括绝缘层和设置在绝缘基板上的覆盖层，由绝缘层限定的沟槽和设置在绝缘基板上的覆盖层，种子层图案设置在绝缘基板上，以及设置在沟槽中并接触种子层图案的低电阻导电层图案。覆盖层图案包括与低电阻导电层图案接触的突起区域。

9. 发明授权

US09229283B2 Display substrate including organic layer and method of manufacturing the same 有权
标题翻译：显示基板包括有机层及其制造方法
公开(公告)号：US09229283B2
公开(公告)日：2016-01-05
申请号：US13488733
申请日：2012-06-05
申请人： Yun-Jong Yeo , Yu-Gwang Jeong , Hong-Kee Chin , Sang-Gab Kim , Jeong-Min Park , Ji-Young Park
发明人： Yun-Jong Yeo , Yu-Gwang Jeong , Hong-Kee Chin , Sang-Gab Kim , Jeong-Min Park , Ji-Young Park
IPC分类号： H01L27/00 , G02F1/1343 , H01L27/12
CPC分类号： G02F1/134363 , H01L27/124 , H01L27/1244 , H01L27/1248 , H01L27/1288
摘要： A display substrate includes a base substrate, a switching element, a protecting layer, an organic layer, a first pixel electrode and a second pixel electrode. The switching element is on the base substrate, and includes a gate electrode, a source electrode and a drain electrode. The protecting layer is on the switching element, and includes a first hole exposing the drain electrode. The organic layer is on the protecting layer, and includes a second hole which exposes a side surface of the protecting layer which defines the first hole and exposes a top surface of the protecting layer which is adjacent to the side surface of the protecting layer. The first pixel electrode is on the organic layer. The second pixel electrode overlaps the first pixel electrode, and is electrically connected to the drain electrode via the first and second holes.
摘要翻译：显示基板包括基底基板，开关元件，保护层，有机层，第一像素电极和第二像素电极。开关元件在基底基板上，并且包括栅电极，源电极和漏电极。保护层位于开关元件上，并且包括暴露漏电极的第一孔。有机层位于保护层上，并且包括第二孔，其露出限定第一孔的保护层的侧表面，并露出与保护层的侧表面相邻的保护层的顶表面。第一像素电极在有机层上。第二像素电极与第一像素电极重叠，并且经由第一和第二孔电连接到漏电极。

10. 发明授权

US08598587B2 Optical sensor 有权
标题翻译：光学传感器
公开(公告)号：US08598587B2
公开(公告)日：2013-12-03
申请号：US13209188
申请日：2011-08-12
申请人： Yun Jong Yeo , Hong-Kee Chin , Byeong Hoon Cho , Ki-Hun Jeong , Jung Suk Bang , Woong Kwon Kim , Sung Ryul Kim , Dae Cheol Kim , Kun-Wook Han
发明人： Yun Jong Yeo , Hong-Kee Chin , Byeong Hoon Cho , Ki-Hun Jeong , Jung Suk Bang , Woong Kwon Kim , Sung Ryul Kim , Dae Cheol Kim , Kun-Wook Han
IPC分类号： H01L31/0376
CPC分类号： G06F3/0412 , G06F3/0421 , G06F2203/04103
摘要： An optical sensor preventing damage to a semiconductor layer, and preventing a disconnection and a short circuit of a source electrode and a drain electrode, and a manufacturing method of the optical sensor is provided. The optical sensor includes: a substrate; an infrared ray sensing thin film transistor including a first semiconductor layer disposed on the substrate; a visible ray sensing thin film transistor including a second semiconductor layer disposed on the substrate; a switching thin film transistor including a third semiconductor layer disposed on the substrate; and a semiconductor passivation layer enclosing an upper surface and a side surface of an end portion of at least one of the first semiconductor layer, the second semiconductor layer, and the third semiconductor layer.
摘要翻译：提供了防止半导体层损坏并防止源电极和漏极的断开和短路的光学传感器以及光学传感器的制造方法。光学传感器包括：基板; 包括设置在所述基板上的第一半导体层的红外线感测薄膜晶体管; 包括设置在所述基板上的第二半导体层的可见光线感测薄膜晶体管; 开关薄膜晶体管，其包括设置在所述基板上的第三半导体层; 以及半导体钝化层，其包围第一半导体层，第二半导体层和第三半导体层中的至少一个的端部的上表面和侧面。

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