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1. 发明申请

US20080252871A1 Projection exposure apparatus 审中-公开
标题翻译：投影曝光装置
公开(公告)号：US20080252871A1
公开(公告)日：2008-10-16
申请号：US12069415
申请日：2008-02-08
申请人： Jin Sato , Masaru Yamaga , Akira Nakazawa , Koutatsu Kudo , Yuken Nakamoto
发明人： Jin Sato , Masaru Yamaga , Akira Nakazawa , Koutatsu Kudo , Yuken Nakamoto
IPC分类号： G03B27/70 , G03B27/72
CPC分类号： G03B27/72 , G03F7/70233 , G03F7/70575
摘要： The present invention relates to a projection exposure apparatus that forms predetermined patterns onto a substrate. The projection exposure apparatus for forming patterns onto a substrate, which includes a mask-stage for holding a photo-mask having predetermined patterns thereon, a light source for emitting a light ray containing spectral lines including g, h, i and j-lines, a wavelength selector for selecting a light ray containing predetermined spectral lines from the light ray emitted from the light source, an illumination optical system for irradiating the photo-mask with the selected light ray, an Offner type projection system for projecting the light having passed through the photo-mask onto the substrate, a substrate stage including a vacuum portion for holding the substrate, the substrate stage for positioning the substrate, and a light-shielding body for partially blocking the light irradiated to the substrate.
摘要翻译：投影曝光装置技术领域本发明涉及在基板上形成预定图案的投影曝光装置。用于在基板上形成图案的投影曝光装置，其包括用于保持其上具有预定图案的光掩模的掩模台，用于发射包含g，h，i和j行的谱线的光线的光源，用于从从光源发射的光线中选择包含预定光谱线的光线的波长选择器，用于用所选择的光线照射光掩模的照明光学系统，用于投射已经通过的光的偏移型投影系统光掩模到基板上，基板载台包括用于保持基板的真空部分，用于定位基板的基板台和用于部分地遮挡照射到基板的光的遮光体。

2. 发明申请

US20130155398A1 PROJECTION ALIGNER 有权
标题翻译：投影对准器
公开(公告)号：US20130155398A1
公开(公告)日：2013-06-20
申请号：US13814403
申请日：2011-06-23
申请人： Yuken Nakamoto
发明人： Yuken Nakamoto
IPC分类号： G01B9/08
CPC分类号： G03F7/7055 , G01B11/14 , G01B11/27 , G03F9/7011 , G03F9/7015
摘要： A projection aligner comprises a projection optical system for radiating a luminous flux including ultraviolet rays onto a photomask, and projecting said luminous flux which has passed through the photomask onto a substrate to which photoresist is applied; a substrate table for mounting the substrate, and a light blocking means for covering the peripheral portion of the substrate to block luminous flux. The light blocking means (80) includes a first light blocking member (84) and a second light blocking member (86) each having a substantially semicircular opening, and moving means (82, 83) for moving the first light blocking means and the second light blocking means approaching each other and away from each other. As the first light blocking member and the second light blocking member are moved to approach each other, the first light blocking member and the second light blocking member form an annular shape and cover the peripheral portion of the substrate (CB).
摘要翻译：投影对准器包括投影光学系统，用于将包含紫外线的光通量照射到光掩模上，并将已经通过光掩模的所述光束投射到施加有光致抗蚀剂的基板上; 用于安装衬底的衬底台，以及用于覆盖衬底的周边部分以阻挡光通量的遮光装置。遮光装置（80）包括每个具有大致半圆形开口的第一遮光构件（84）和第二遮光构件（86），以及移动装置（82,83），用于移动第一遮光装置和第二遮光构件遮光装置彼此接近并远离彼此。当第一遮光构件和第二遮光构件彼此接近移动时，第一遮光构件和第二遮光构件形成环形并且覆盖基底（CB）的周边部分。

3. 发明授权

US09013695B2 Projection aligner 有权
标题翻译：投影对准器
公开(公告)号：US09013695B2
公开(公告)日：2015-04-21
申请号：US13814403
申请日：2011-06-23
申请人： Yuken Nakamoto
发明人： Yuken Nakamoto
IPC分类号： G03F7/20 , G03F9/00 , G01B11/14 , G01B11/27
CPC分类号： G03F7/7055 , G01B11/14 , G01B11/27 , G03F9/7011 , G03F9/7015
摘要： A projection aligner comprises a projection optical system for radiating a luminous flux including ultraviolet rays onto a photomask, and projecting said luminous flux which has passed through the photomask onto a substrate to which photoresist is applied; a substrate table for mounting the substrate, and a light blocking means for covering the peripheral portion of the substrate to block luminous flux. The light blocking means (80) includes a first light blocking member (84) and a second light blocking member (86) each having a substantially semicircular opening, and moving means (82, 83) for moving the first light blocking means and the second light blocking means approaching each other and away from each other. As the first light blocking member and the second light blocking member are moved to approach each other, the first light blocking member and the second light blocking member form an annular shape and cover the peripheral portion of the substrate (CB).
摘要翻译：投影对准器包括投影光学系统，用于将包含紫外线的光通量照射到光掩模上，并将已经通过光掩模的所述光束投射到施加有光致抗蚀剂的基板上; 用于安装衬底的衬底台，以及用于覆盖衬底的周边部分以阻挡光通量的遮光装置。遮光装置（80）包括每个具有大致半圆形开口的第一遮光构件（84）和第二遮光构件（86），以及移动装置（82,83），用于移动第一遮光装置和第二遮光构件遮光装置彼此接近并远离彼此。当第一遮光构件和第二遮光构件彼此接近移动时，第一遮光构件和第二遮光构件形成环形并且覆盖基底（CB）的周边部分。

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