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1. 发明授权

US08110013B2 Polishing composition 有权
标题翻译：抛光组成
公开(公告)号：US08110013B2
公开(公告)日：2012-02-07
申请号：US11896492
申请日：2007-08-31
申请人： Masahiko Suzuki , Yuichi Homma , Yukiko Yamawaki
发明人： Masahiko Suzuki , Yuichi Homma , Yukiko Yamawaki
IPC分类号： C09K3/14 , B24D3/02 , C09C1/68
CPC分类号： C09G1/16 , C08F212/08 , C08F220/06 , C08F220/26 , C08F220/56 , C08F2220/1891 , C09G1/02 , C09K3/1409 , C09K3/1463
摘要： A polishing composition includes a copolymer and an abrasive. The copolymer has a constitutional unit expressed as the following formula (I) and at least one of constitutional units expressed as the following formulas (II) to (IV). Methoxypolyethylene glycol methacrylate etc. are used as monomers for forming the constitutional unit of the formula (I), stearyl methacrylate etc. are used as monomers for forming the constitutional unit of the formula (II), polypropylene glycol methacrylate etc. are used as monomers for forming the constitutional unit of the formula (III), and styrene etc. are used as monomers for forming the constitutional unit of the formula (IV).
摘要翻译：抛光组合物包括共聚物和研磨剂。共聚物具有如下式（I）表示的结构单元和由下式（II）至（IV）表示的至少一种结构单元。甲氧基聚乙二醇甲基丙烯酸酯等用作形成式（I）的结构单元的单体，甲基丙烯酸硬脂酯等用作形成式（II）的结构单元的单体，聚丙二醇甲基丙烯酸酯等用作单体用于形成式（III）的结构单元和苯乙烯等用作形成式（IV）的结构单元的单体。

2. 发明申请

US20080115422A1 Polishing composition 有权
标题翻译：抛光组成
公开(公告)号：US20080115422A1
公开(公告)日：2008-05-22
申请号：US11896492
申请日：2007-08-31
申请人： Masahiko Suzuki , Yuichi Homma , Yukiko Yamawaki
发明人： Masahiko Suzuki , Yuichi Homma , Yukiko Yamawaki
IPC分类号： B24D3/02
CPC分类号： C09G1/16 , C08F212/08 , C08F220/06 , C08F220/26 , C08F220/56 , C08F2220/1891 , C09G1/02 , C09K3/1409 , C09K3/1463
摘要： A polishing composition includes a copolymer and an abrasive. The copolymer has a constitutional unit expressed as the following formula (I) and at least one of constitutional units expressed as the following formulas (II) to (IV). Methoxypolyethylene glycol methacrylate etc. are used as monomers for forming the constitutional unit of the formula (I), stearyl methacrylate etc. are used as monomers for forming the constitutional unit of the formula (II), polypropylene glycol methacrylate etc. are used as monomers for forming the constitutional unit of the formula (III), and styrene etc. are used as monomers for forming the constitutional unit of the formula (IV).
摘要翻译：抛光组合物包括共聚物和研磨剂。共聚物具有如下式（I）表示的结构单元和由下式（II）至（IV）表示的至少一种结构单元。甲氧基聚乙二醇甲基丙烯酸酯等用作形成式（I）的结构单元的单体，甲基丙烯酸硬脂酯等用作形成式（II）的结构单元的单体，聚丙二醇甲基丙烯酸酯等用作单体用于形成式（III）的结构单元和苯乙烯等用作形成式（IV）的结构单元的单体。

3. 发明申请

US20070167116A1 POLISHING COMPOSITION 审中-公开
标题翻译：抛光组合物
公开(公告)号：US20070167116A1
公开(公告)日：2007-07-19
申请号：US11692619
申请日：2007-03-28
申请人： Hiroyuki YOSHIDA , Yuichi Homma , Shigeaki Takashima , Toshiya Hagihara
发明人： Hiroyuki YOSHIDA , Yuichi Homma , Shigeaki Takashima , Toshiya Hagihara
IPC分类号： B24D3/02 , B24B7/30
CPC分类号： C09G1/02 , B24B37/044 , C09K3/1436 , C09K3/1463
摘要： The present invention relates to a polishing composition containing an aqueous medium and silica particles, wherein the silica particles in the polishing composition has a zeta potential of from −15 to 40 mV; a method for manufacturing a substrate including the step of polishing a substrate to be polished with a polishing composition containing an aqueous medium and silica particles, wherein the silica particles in the polishing composition has a zeta potential of from −15 to 40 mV; and a method for reducing scratches on a substrate to be polished with a polishing composition containing an aqueous medium and silica particles, including the step of adjusting a zeta potential of silica particles in the polishing composition to −15 to 40 mV. The polishing composition can be favorably used in polishing the substrate for precision parts, including substrates for magnetic recording media such as magnetic discs, optical discs and opto-magnetic discs; photomask substrates; optical lenses; optical mirrors; optical prisms; semiconductor substrates; and the like.
摘要翻译：本发明涉及含有水性介质和二氧化硅颗粒的抛光组合物，其中抛光组合物中的二氧化硅颗粒的ζ电位为-15至40mV; 一种基板的制造方法，其特征在于，包括使用含有水性介质和二氧化硅粒子的研磨用组合物研磨待研磨基板的工序，其中，研磨用组合物中的二氧化硅粒子的ζ电位为-15〜40mV，以及包括将研磨用组合物中的二氧化硅粒子的ζ电位调整为-15〜40mV的步骤的减少含有水性介质和二氧化硅粒子的研磨用组合物的研磨用基板上的划痕的方法。抛光组合物可以有利地用于抛光用于精密部件的基板，包括用于诸如磁盘，光盘和光磁盘的磁记录介质的基板; 光掩模基板; 光学镜片; 光学镜; 光学棱镜半导体衬底; 等等。

4. 发明申请

US20110059683A1 POLISHING COMPOSITION 有权
标题翻译：抛光组合物
公开(公告)号：US20110059683A1
公开(公告)日：2011-03-10
申请号：US12948478
申请日：2010-11-17
申请人： Masahiko SUZUKI , Yuichi Homma , Yukiko Yamawaki
发明人： Masahiko SUZUKI , Yuichi Homma , Yukiko Yamawaki
IPC分类号： B24B1/00 , C09K3/14
CPC分类号： C09G1/16 , C08F212/08 , C08F220/06 , C08F220/26 , C08F220/56 , C08F2220/1891 , C09G1/02 , C09K3/1409 , C09K3/1463
摘要： A polishing composition includes a copolymer and an abrasive. The copolymer has a constitutional unit expressed as the following formula (I) and at least one of constitutional units expressed as the following formulae (II) to (IV). Methoxypolyethylene glycol methacrylate etc. are used as monomers for forming the constitutional unit of the formula (I), stearyl methacrylate etc. are used as monomers for forming the constitutional unit of the formula (II), polypropylene glycol methacrylate etc. are used as monomers for forming the constitutional unit of the formula (III), and styrene etc. are used as monomers for forming the constitutional unit of the formula (IV).
摘要翻译：抛光组合物包括共聚物和研磨剂。共聚物具有如下式（I）表示的结构单元和由下式（II）至（IV）表示的至少一种结构单元。甲氧基聚乙二醇甲基丙烯酸酯等用作形成式（I）的结构单元的单体，甲基丙烯酸硬脂酯等用作形成式（II）的结构单元的单体，聚丙二醇甲基丙烯酸酯等用作单体用于形成式（III）的结构单元和苯乙烯等用作形成式（IV）的结构单元的单体。

5. 发明授权

US08012224B2 Polishing composition 有权
标题翻译：抛光组成
公开(公告)号：US08012224B2
公开(公告)日：2011-09-06
申请号：US12948478
申请日：2010-11-17
申请人： Masahiko Suzuki , Yuichi Homma , Yukiko Yamawaki
发明人： Masahiko Suzuki , Yuichi Homma , Yukiko Yamawaki
IPC分类号： B24D3/00 , B24D11/00 , B24D18/00 , B24D3/02 , C09K3/14 , C09C1/68
CPC分类号： C09G1/16 , C08F212/08 , C08F220/06 , C08F220/26 , C08F220/56 , C08F2220/1891 , C09G1/02 , C09K3/1409 , C09K3/1463
摘要： A polishing composition includes a copolymer and an abrasive. The copolymer has a constitutional unit expressed as the following formula (I) and at least one of constitutional units expressed as the following formulae (II) to (IV). Methoxypolyethylene glycol methacrylate etc. are used as monomers for forming the constitutional unit of the formula (I), stearyl methacrylate etc. are used as monomers for forming the constitutional unit of the formula (II), polypropylene glycol methacrylate etc. are used as monomers for forming the constitutional unit of the formula (III), and styrene etc. are used as monomers for forming the constitutional unit of the formula (IV).
摘要翻译：抛光组合物包括共聚物和研磨剂。共聚物具有如下式（I）表示的结构单元和由下式（II）至（IV）表示的至少一种结构单元。甲氧基聚乙二醇甲基丙烯酸酯等用作形成式（I）的结构单元的单体，甲基丙烯酸硬脂酯等用作形成式（II）的结构单元的单体，聚丙二醇甲基丙烯酸酯等用作单体用于形成式（III）的结构单元和苯乙烯等用作形成式（IV）的结构单元的单体。

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