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1. 发明授权

US08135487B2 Temperature setting method and apparatus for a thermal processing plate 有权
标题翻译：用于热处理板的温度设定方法和装置
公开(公告)号：US08135487B2
公开(公告)日：2012-03-13
申请号：US12103276
申请日：2008-04-15
申请人： Megumi Jyousaka , Masahide Tadokoro , Yoshitaka Konishi , Shinichi Shinozuka , Kunie Ogata
发明人： Megumi Jyousaka , Masahide Tadokoro , Yoshitaka Konishi , Shinichi Shinozuka , Kunie Ogata
IPC分类号： G06F19/00 , H01L21/302 , H01L21/461
CPC分类号： H01L21/67248
摘要： A temperature setting method of the present invention includes the steps of: measuring states of an etching pattern within the substrate for a substrate for which a series of photolithography processing including thermal processing and an etching treatment thereafter have been finished; calculating temperature correction values for regions of a thermal processing plate from measurement result of the states of the etching pattern within the substrate using a function between correction amounts for the states of the etching pattern and the temperature correction values for the thermal processing plate; and setting the temperature for each of the regions of the thermal processing plate by each of the calculated temperature correction values.
摘要翻译：本发明的温度设定方法包括以下步骤：测量用于其后完成了包括热处理和蚀刻处理的一系列光刻处理的基板的蚀刻图案的状态; 使用蚀刻图案的状态的校正量和热处理板的温度校正值之间的函数，从衬底内的蚀刻图案的状态的测量结果计算热处理板的区域的温度校正值; 并且通过计算的每个温度校正值来设定热处理板的每个区域的温度。

2. 发明授权

US07957828B2 Temperature setting method for thermal processing plate, temperature setting apparatus for thermal processing plate, and computer-readable storage medium 有权
标题翻译：热处理板的温度设定方法，热处理板的温度设定装置和计算机可读存储介质
公开(公告)号：US07957828B2
公开(公告)日：2011-06-07
申请号：US12099970
申请日：2008-04-09
申请人： Masahide Tadokoro , Megumi Jyousaka , Yoshitaka Konishi , Shinichi Shinozuka , Kunie Ogata
发明人： Masahide Tadokoro , Megumi Jyousaka , Yoshitaka Konishi , Shinichi Shinozuka , Kunie Ogata
IPC分类号： G06F19/00
CPC分类号： H01L21/67248 , G03F7/70483
摘要： In the present invention, the line widths within a substrate of an etching pattern are measured for a substrate for which photolithography processing and an etching treatment thereafter have been finished. The line width measurement results are converted into the line widths of a resist pattern using relational expressions which have been obtained in advance. From the converted line widths of the resist pattern, coefficients of a polynomial function indicating variations within the substrate are calculated. Next, a function between line width correction amounts for the resist pattern and temperature correction values is used to calculate temperature correction values for the regions of the thermal plate to bring the coefficients of the polynomial function close to zero. Based on each of the calculated temperature correction values, the temperature for each of the regions is set.
摘要翻译：在本发明中，对于其后的光刻处理和蚀刻处理结束的基板测量蚀刻图案的基板内的线宽。使用预先获得的关系式将线宽测量结果转换成抗蚀剂图案的线宽。根据抗蚀剂图案的转换线宽，计算表示衬底内的变化的多项式函数的系数。接下来，使用抗蚀剂图案的线宽校正量和温度校正值之间的函数来计算热板的区域的温度校正值，以使多项式函数的系数接近零。基于每个计算的温度校正值，设定每个区域的温度。

3. 发明授权

US5525604A 4-aminopyrimidine derivatives 失效
标题翻译： 4-氨基嘧啶衍生物
公开(公告)号：US5525604A
公开(公告)日：1996-06-11
申请号：US295377
申请日：1994-08-24
申请人： Sung J. Lee , Yoshitaka Konishi , Orest T. Macina , Kigen Kondo , Dingwei T. Yu , Tamara A. Miskowski
发明人： Sung J. Lee , Yoshitaka Konishi , Orest T. Macina , Kigen Kondo , Dingwei T. Yu , Tamara A. Miskowski
IPC分类号： C07D401/04 , A61K31/505 , A61P7/02 , A61P9/00 , A61P9/08 , A61P9/10 , A61P13/02 , A61P15/00 , A61P43/00 , C07D401/14 , C07D403/04 , C07D403/14 , C07D405/04 , C07D405/14 , C07D409/14 , C07D417/14 , C07D521/00 , C07D401/06 , C07D401/12
CPC分类号： C07D231/12 , C07D233/56 , C07D249/08 , C07D409/14
摘要： A 4-aminopyrimidine of the formula (I): ##STR1## wherein A is a bond, C1-4 alkylene or C1-4 oxyalkylene;Y is a bond, C1-4 alkylene, C1-4 alkyleneoxy, C1-4 alkoxyphenylene or phenyl(C1-4)alkylene;Z is a bond or vinylene;R1 is 4-15 membered heterocyclic ring containing one or two nitrogen atom;R2 is (i) 4-15 membered heterocyclic ring containing one or two nitrogen, one or two of oxygen or one sulfur atom,(ii) C4-15 carbocyclic ring,(iii) C1-4 alkoxy,(iv) hydroxy(C1-4 alkoxy) or(v) hydroxy;R3 is (i) 4-15 membered heterocyclic ring containing one or two nitrogen, one oxygen, one sulfur, or one nitrogen and one sulfur atom,(ii) C4-15 carbocyclic ring,(iii) formula:CH2.dbd.CH(X)--whereinX is halogen.(iv) hydrogen.l is 1 or 2.and some compounds are excluded.and acid addition salts thereof, salts thereof; have inhibitory effect on cGMP-PDE, or additionally on TXA2 synthetase.
摘要翻译：式（I）的4-氨基嘧啶：其中A为键，C 1-4亚烷基或C 1-4亚氧烷基; Y是键，C 1-4亚烷基，C 1-4亚烷基氧基，C 1-4烷氧基亚苯基或苯基（C 1-4）亚烷基; Z是键或亚乙烯基; R1是含有一个或两个氮原子的4-15元杂环; R2是（i）含有一个或两个氮，一个或两个氧或一个硫原子的4-15元杂环，（ii）C4-15碳环，（iii）C1-4烷氧基，（iv）羟基（C1 -4-烷氧基）或（v）羟基; R3是（i）含有一个或两个氮，一个氧，一个硫或一个氮原子和一个硫原子的4-15元杂环，（ii）C 4-15碳环，（iii）式：CH 2 = CH ） - 其中X是卤素。（iv）氢。 l为1或2.并排除一些化合物。其酸加成盐，其盐; 对cGMP-PDE或另外在TXA2合成酶具有抑制作用。

4. 发明授权

US4313954A 6,9-Nitrilo-prostaglandin analogues 失效
标题翻译： 6,9-Nitrilo-prostaglandin类似物
公开(公告)号：US4313954A
公开(公告)日：1982-02-02
申请号：US122704
申请日：1980-02-19
申请人： Hirohisa Wakatsuka , Masaki Hayashi , Yoshitaka Konishi
发明人： Hirohisa Wakatsuka , Masaki Hayashi , Yoshitaka Konishi
IPC分类号： A61K31/557 , A61P7/02 , A61P43/00 , C07C405/00 , C07D209/52 , A61K31/40
CPC分类号： C07C405/0041 , C07C405/00 , C07D209/52
摘要： Prostaglandin I.sub.2 analogues of the general formula ##STR1## [wherein R.sup.1 represents a hydrogen atom, an alkyl group containing from 1 to 12 carbon atoms, an aralkyl group containing from 7 to 13 carbon atoms, a cycloalkyl group containing from 4 to 7 carbon atoms unsubstituted or substituted by at least one alkyl group containing from 1 to 4 carbon atoms, a phenyl group unsubstituted or substituted by at least one halogen atom, trifluoromethyl or phenyl group, or by at least one alkyl, alkoxy or alkylthio group containing from 1 to 4 carbon atoms, or represents a group --C.sub.m H.sub.2m COOR.sup.6, --C.sub.n H.sub.2n OR.sup.7 or ##STR2## in which m represents an integer of 1 to 12, n represents an integer of 2 to 12, R.sup.6, R.sup.8 and R.sup.9, which may be the same or different, each represent an alkyl group containing from 1 to 4 carbon atoms, and R.sup.7 represents a hydrogen atom or an alkyl group containing from 1 to 4 carbon atoms, R.sup.2 represents a hydrogen atom or a methyl or ethyl group, R.sup.3 represents an alkyl group containing from 1 to 4 carbon atoms, R.sup.4 represents a hydrogen atom, or an alkyl group containing from 1 to 4 carbon atoms, R.sup.5 represents an alkyl group containing from 1 to 10 carbon atoms, Y represents ethylene or trans-vinylene, the hydroxy group attached to the C-11 carbon atom is in .alpha.-configuration, and the wavy line attached to the C-15 carbon atom is in .alpha.- or .beta.-configuration or a mixture thereof] and non-toxic acid addition salts thereof and, when R.sup.1 represents a hydrogen atom, non-toxic salts thereof are new compounds possessing pharmacological properties typical of the prostaglandins.
摘要翻译：具有通式的前列腺素I2类似物[其中R1表示氢原子，含有1至12个碳原子的烷基，含有7至13个碳原子的芳烷基，含有4至7个碳原子的环烷基未取代或被至少一个含有1至4个碳原子的烷基取代的苯基，未被取代或被至少一个卤素原子取代的苯基，三氟甲基或苯基，或至少一个含有1至4个碳原子的烷基，烷氧基或烷硫基 4个碳原子，或表示基团-C m H 2 mCOOR 6，-C n H 2n OR 7或其中m表示1至12的整数，n表示2至12的整数，R 6，R 8和R 9可以相同或不同各自表示含有1至4个碳原子的烷基，R 7表示氢原子或含有1至4个碳原子的烷基，R 2表示氢原子或甲基或乙基，R 3表示含有从1 至4个碳原子，R 4表示氢原子或含有1至4个碳原子的烷基，R 5表示含有1至10个碳原子的烷基，Y表示亚乙基或反式亚乙烯基， C-11碳原子为α-构型，连接至C-15碳原子的波浪线为α-或β-构型或其混合物）及其无毒的酸加成盐，当R1表示氢原子，其无毒盐是具有典型的前列腺素的药理学性质的新化合物。

5. 发明申请

US20080257496A1 TEMPERATURE SETTING METHOD FOR THERMAL PROCESSING PLATE, TEMPERATURE SETTING APPARATUS FOR THERMAL PROCESSING PLATE, AND COMPUTER-READABLE STORAGE MEDIUM 有权
标题翻译：热处理板的温度设定方法，热处理板的温度设定装置和计算机可读存储介质
公开(公告)号：US20080257496A1
公开(公告)日：2008-10-23
申请号：US12103276
申请日：2008-04-15
申请人： Megumi JYOUSAKA , Masahide Tadokoro , Yoshitaka Konishi , Shinichi Shinozuka , Kunie Ogata
发明人： Megumi JYOUSAKA , Masahide Tadokoro , Yoshitaka Konishi , Shinichi Shinozuka , Kunie Ogata
IPC分类号： C23F1/00 , G06F19/00
CPC分类号： H01L21/67248
摘要： A temperature setting method of the present invention includes the steps of: measuring states of an etching pattern within the substrate for a substrate for which a series of photolithography processing including thermal processing and an etching treatment thereafter have been finished; calculating temperature correction values for regions of a thermal processing plate from measurement result of the states of the etching pattern within the substrate using a function between correction amounts for the states of the etching pattern and the temperature correction values for the thermal processing plate; and setting the temperature for each of the regions of the thermal processing plate by each of the calculated temperature correction values.
摘要翻译：本发明的温度设定方法包括以下步骤：测量用于其后完成了包括热处理和蚀刻处理的一系列光刻处理的基板的蚀刻图案的状态; 使用蚀刻图案的状态的校正量和热处理板的温度校正值之间的函数，从衬底内的蚀刻图案的状态的测量结果计算热处理板的区域的温度校正值; 并且通过计算的每个温度校正值来设定热处理板的每个区域的温度。

6. 发明申请

US20080257495A1 TEMPERATURE SETTING METHOD FOR THERMAL PROCESSING PLATE, TEMPERATURE SETTING APPARATUS FOR THERMAL PROCESSING PLATE, AND COMPUTER-READABLE STORAGE MEDIUM 有权
标题翻译：热处理板的温度设定方法，热处理板的温度设定装置和计算机可读存储介质
公开(公告)号：US20080257495A1
公开(公告)日：2008-10-23
申请号：US12099970
申请日：2008-04-09
申请人： Masahide Tadokoro , Megumi Jyousaka , Yoshitaka Konishi , Shinichi Shinozuka , Kunie Ogata
发明人： Masahide Tadokoro , Megumi Jyousaka , Yoshitaka Konishi , Shinichi Shinozuka , Kunie Ogata
IPC分类号： C23F1/00 , G06F19/00
CPC分类号： H01L21/67248 , G03F7/70483
摘要： In the present invention, the line widths within a substrate of an etching pattern are measured for a substrate for which photolithography processing and an etching treatment thereafter have been finished. The line width measurement results are converted into the line widths of a resist pattern using relational expressions which have been obtained in advance. From the converted line widths of the resist pattern, coefficients of a polynomial function indicating variations within the substrate are calculated. Next, a function between line width correction amounts for the resist pattern and temperature correction values is used to calculate temperature correction values for the regions of the thermal plate to bring the coefficients of the polynomial function close to zero. Based on each of the calculated temperature correction values, the temperature for each of the regions is set.
摘要翻译：在本发明中，对于其后的光刻处理和蚀刻处理结束的基板测量蚀刻图案的基板内的线宽。使用预先获得的关系式将线宽测量结果转换成抗蚀剂图案的线宽。根据抗蚀剂图案的转换线宽，计算表示衬底内的变化的多项式函数的系数。接下来，使用抗蚀剂图案的线宽校正量和温度校正值之间的函数来计算热板的区域的温度校正值，以使多项式函数的系数接近零。基于每个计算的温度校正值，设定每个区域的温度。

7. 发明申请

US20080116195A1 TEMPERATURE SETTING METHOD OF THERMAL PROCESSING PLATE, COMPUTER-READABLE RECORDING MEDIUM RECORDING PROGRAM THEREON, AND TEMPERATURE SETTING APPARATUS FOR THERMAL PROCESSING PLATE 有权
标题翻译：热处理板的温度设定方法，计算机可读记录介质记录程序及温度设定装置
公开(公告)号：US20080116195A1
公开(公告)日：2008-05-22
申请号：US11934303
申请日：2007-11-02
申请人： Megumi Jyousaka , Yoshitaka Konishi
发明人： Megumi Jyousaka , Yoshitaka Konishi
IPC分类号： H05B1/02
CPC分类号： G05D23/1932 , H01L21/67248
摘要： In the present invention, a thermal plate of a PEB unit is divided into a plurality of thermal plate regions, and a temperature is settable for each of the thermal plate regions. A temperature correction value for adjusting the temperature within the thermal plate is settable for each of the thermal plate regions of the thermal plate. The line widths within the substrate which has been subjected to the photolithography process are measured, and an improvement in-plane tendency Za improved by change of the temperature settings is subtracted from an in-plane tendency Z of the measured line widths within the substrate to calculate an in-plane tendency Zb of the line widths within the substrate after change of temperature settings. The improvement in-plane tendency Za is calculated using the following expression. Za=−1×α×MT (α: a resist heat sensitivity, M: a calculation model, and T: temperature correction values for thermal plate regions)
摘要翻译：在本发明中，将PEB单元的热板分割为多个热板区域，并且可以对每个热板区域设定温度。用于调节热板内的温度的温度校正值可针对热板的每个热板区域而设定。测量已进行了光刻处理的基板内的线宽，并从基板内的被测线宽度的面内倾向Z中减去由温度设定的变化而提高的面内倾向Za，在温度设置更改后，计算衬底内线宽的面内倾向Zb。使用以下表达式计算平面内倾向Za的改善。 <？in-line-formula description =“In-line Formulas”end =“lead”？> Za = -1xalphaxMT（α：抗蚀剂热敏性，M：计算模型，T：热板区域的温度校正值）<？in-line-formula description =“In-line Formulas”end =“tail”？>

8. 发明授权

US06914087B2 Process for producing powder coating composition, powder coating composition, and method of coating film formation 有权
标题翻译：粉末涂料组合物的制备方法，粉末涂料组合物和涂膜成膜方法
公开(公告)号：US06914087B2
公开(公告)日：2005-07-05
申请号：US09926632
申请日：2001-03-29
申请人： Katsuhiko Okada , Tetsuro Agawa , Kouji Shinohara , Yoshitaka Konishi
发明人： Katsuhiko Okada , Tetsuro Agawa , Kouji Shinohara , Yoshitaka Konishi
IPC分类号： B05D7/24 , C09D5/03 , C09D7/12 , C09D201/02 , C09D201/06 , B05D1/36 , C08L63/00
CPC分类号： C09D5/03
摘要： A powder coating is provided which does not require a long complicated production process, can be produced easily and with no danger of gelling occurring during production, and which forms a paint film with superior smoothness and with no film defects such as bubbles or pinholes. A powder coating raw materials solution comprising as essential constituents a room temperature solid main constituent resin (A) with a curable reactive group, a room temperature solid curing agent (B) which reacts with the curable reactive group of the main constituent resin (A), and an organic solvent (C), is spray dried at a temperature at which the main constituent resin (A) and the curing agent (B) undergo no substantial curing reaction.
摘要翻译：提供粉末涂料，其不需要长的复杂生产工艺，可以容易地制备，并且在生产过程中不会发生胶凝的危险，并且形成具有优异平滑度和没有膜缺陷如气泡或针孔的漆膜。一种粉末涂料原料溶液，其包含具有可固化反应性基团的室温固体主要构成树脂（A）和与主要构成树脂（A）的可固化反应性基团反应的室温固体固化剂（B）作为必要组分）和有机溶剂（C）在主要构成树脂（A）和固化剂（B）不发生实质固化反应的温度下进行喷雾干燥。

9. 发明授权

US6114338A Heterocyclic compounds 失效
标题翻译：杂环化合物
公开(公告)号：US6114338A
公开(公告)日：2000-09-05
申请号：US417910
申请日：1999-10-13
申请人： Sung Jai Lee , Yoshitaka Konishi , Orest Taras Macina , Kigen Kondo , Dingwei Tim Yu , Manton Rodgers Frierson , Masafumi Sugitani
发明人： Sung Jai Lee , Yoshitaka Konishi , Orest Taras Macina , Kigen Kondo , Dingwei Tim Yu , Manton Rodgers Frierson , Masafumi Sugitani
IPC分类号： A61K31/505 , A61P1/16 , A61P7/02 , A61P9/00 , A61P9/08 , A61P9/10 , A61P9/12 , A61P11/00 , A61P11/08 , A61P13/02 , A61P15/00 , A61P25/28 , A61P29/00 , A61P37/04 , A61P43/00 , C07D487/04 , C07D495/04 , C07D487/02
CPC分类号： C07D487/04 , C07D495/04
摘要： The compounds of the formula: ##STR1## wherein Y is bond or alkylene;Z is bond, alkylene or vinylene;E is(i) 4-15 membered, unsaturated, partially saturated or fully saturated, mono or bicyclic hetero ring containing as hetero atoms, one or two nitrogen atoms, one or two oxygen atoms or one sulfur atom,(ii) 4-15 membered, unsaturated or partially saturated, mono or bicyclic carbocyclic ring, or(iii) --OR.sup.4 (in which R.sup.4 is hydrogen atom, alkyl or alkyl substituted by a hydroxy group);Cyc is benzene, pyridine or imidazole;R.sup.1 is hydrogen or alkyl;R.sup.2 is hydrogen, alkyl, alkoxy or halogen atom;R.sup.3 is hydrogen, alkyl, alkoxy or --COOR.sup.5 (in which R.sup.5 is hydrogen or alkyl);with the proviso that(1) a Cyc ring should not bond to Z through a nitrogen atom in the Cyc ring when Z is vinylene and that(2) Y is not a single bond, when E is --OR.sup.4 ;or pharmaceutically acceptable acid addition salts thereof, pharmaceutically acceptable salts thereof, or hydrates thereof; have inhibitory effect on cGMP-PDE, or additionally on TXA.sub.2 synthetase.
摘要翻译：下式的化合物：其中Y是键或亚烷基; Z是键，亚烷基或亚乙烯基; E是（i）含有杂原子，一个或两个氮原子，一个或两个氧原子或一个硫原子的4-15元，不饱和，部分饱和或完全饱和的单或双环杂环，（ii）4-15 或（iii）-OR4（其中R4为氢原子，被羟基取代的烷基或烷基）;或（iii）-OR4（其中R4为氢原子，被羟基取代的烷基或烷基）; 环是苯，吡啶或咪唑; R1是氢或烷基; R2是氢，烷基，烷氧基或卤素原子; R3是氢，烷基，烷氧基或-COOR5（其中R5是氢或烷基）; 条件是（1）当Z是亚乙烯基时，环环不应通过环中的氮原子与Z键合，并且（2）Y不是单键，当E是-OR4时; 或其药学上可接受的酸加成盐，其药学上可接受的盐或其水合物; 对cGMP-PDE或另外在TXA2合成酶具有抑制作用。

10. 发明授权

US6001830A Heterocyclic compounds 失效
标题翻译：杂环化合物
公开(公告)号：US6001830A
公开(公告)日：1999-12-14
申请号：US189843
申请日：1998-11-12
申请人： Sung Jai Lee , Yoshitaka Konishi , Orest Taras Macina , Kigen Kondo , Dingwei Tim Yu , Manton Rodgers Frierson , Masafumi Sugitani
发明人： Sung Jai Lee , Yoshitaka Konishi , Orest Taras Macina , Kigen Kondo , Dingwei Tim Yu , Manton Rodgers Frierson , Masafumi Sugitani
IPC分类号： A61K31/505 , A61P1/16 , A61P7/02 , A61P9/00 , A61P9/08 , A61P9/10 , A61P9/12 , A61P11/00 , A61P11/08 , A61P13/02 , A61P15/00 , A61P25/28 , A61P29/00 , A61P37/04 , A61P43/00 , C07D487/04 , C07D495/04 , A61K31/50
CPC分类号： C07D487/04 , C07D495/04
摘要： The compounds of the formula: ##STR1## wherein ring ##STR2## is a hetero ring containing nitrogen atom, optionally selected from ##STR3## n is 0-2; Y is bond or alkylene;Z is bond, alkylene or vinylene;E is(i) 4-15 membered, unsaturated, partially saturated or fully saturated, mono or bicyclic hetero ring containing as hetero atoms, 1 or 2 N atoms, 1 or 2 O atoms or 1 S atom,(ii) 4-15 membered, unsaturated or partially saturated, mono or bicyclic carbocyclic ring, or(iii) --OR.sup.4 (in which R.sup.4 is hydrogen atom, alkyl or alkyl substituted by a hydroxy group);Cyc is 5-7 membered, unsaturated, partially saturated or fully saturated, monocyclic hetero ring containing as hetero atoms, 1 or 2 N atoms or 5-7 membered, unsaturated or partially saturated, monocyclic carbocyclic ring;R.sup.1 is H or alkyl;R.sup.2 is H, alkyl, alkoxy or halogen atom;R.sup.3 is H, alkyl, alkoxy or --COOR.sup.5 (in which R.sup.5 is H or alkyl);with the proviso that(1) a Cyc ring should not bond to Z through a nitrogen atom in the Cyc ring when Z is vinylene and that(2) Y is not a single bond, when E is --OR.sup.4 ;or pharmaceutically acceptable acid addition salts thereof, pharmaceutically acceptable salts thereof, or hydrates thereof; have inhibitory effect on cGMP-PDE, or additionally on TXA.sub.2 synthetase.
摘要翻译：下式的化合物：其中环是含氮原子的杂环，任选地选自n是0-2; Y是键或亚烷基; Z是键，亚烷基或亚乙烯基; E是（i）含有1或2个N原子，1或2个O原子或1个S原子的4-15元，不饱和，部分饱和或完全饱和的单或双环杂环，（ii）4-15 或（iii）-OR4（其中R4为氢原子，被羟基取代的烷基或烷基）;或（iii）-OR4（其中R4为氢原子，被羟基取代的烷基或烷基）; 环是含有杂原子，1或2个N原子或5-7元不饱和或部分饱和的单环碳环的5-7元，不饱和，部分饱和或完全饱和的单环杂环; R1是H或烷基; R2是H，烷基，烷氧基或卤素原子; R3是H，烷基，烷氧基或-COOR5（其中R5是H或烷基）; 条件是（1）当Z是亚乙烯基时，环环不应通过环中的氮原子与Z键合，并且（2）Y不是单键，当E是-OR4时; 或其药学上可接受的酸加成盐，其药学上可接受的盐或其水合物; 对cGMP-PDE或另外在TXA2合成酶具有抑制作用。

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