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    • 2. 发明授权
    • Novolak type phenol resin
    • 酚醛清漆型酚醛树脂
    • US06242533B1
    • 2001-06-05
    • US09584188
    • 2000-05-31
    • Yoshiaki KurimotoKatsuhiro MaruyamaAkira YoshitomoSatoru YoshidaSatoru Kitano
    • Yoshiaki KurimotoKatsuhiro MaruyamaAkira YoshitomoSatoru YoshidaSatoru Kitano
    • C08L6108
    • C08L61/04C08G8/24C08L61/14
    • The present invention relates to a novolak type phenol resin, in particular a novolak type phenol resin for resists suitable for forming resist patterns. The novolak type phenol resin of the present invention is obtained by reacting at least a vinylphenol having a vinyl group and a phenolic hydroxyl group, such as parahydroxystyrene, or a polyvinylphenol, which is a polymer of the vinylphenol, a compound (A) such as 4,4′-methylenebis(2-hydroxymethyl-3,6-dimethylphenol) and/or a compound (B) such as 2,6-dihydroxymethyl-4-phenol, in a ratio of 1 to 40 moles of the compound (A) and/or compound (B) to 100 moles of the vinylphenol or 100 moles of structural unit of the vinylphenol contained in the polyvinylphenol in the presence of an acid and having a weight average molecular weight of 2,000 to 20,000. Such a novolak type phenol resin provides good pattern shape, heat resistance, resolution, and sensitivity in resists for lithography.
    • 酚醛清漆型酚醛树脂本发明涉及一种酚醛清漆型酚醛树脂,特别是一种用于形成抗蚀剂图案的抗蚀剂的酚醛清漆型酚醛树脂。 本发明的酚醛清漆型酚醛树脂通过使至少一种具有乙烯基的乙烯基酚和酚羟基如对羟基苯乙烯或作为乙烯基苯酚的聚合物的聚乙烯基苯酚,化合物(A)如 4,4'-亚甲基双(2-羟甲基-3,6-二甲基苯酚)和/或化合物(B)如2,6-二羟甲基-4-苯酚的化合物(A )和/或化合物(B)至100摩尔乙烯基苯酚或100摩尔聚乙烯基苯酚中包含的乙烯基苯酚的结构单元,在酸存在下,重均分子量为2,000至20,000。 这种酚醛清漆型酚醛树脂在光刻抗蚀剂中提供良好的图案形状,耐热性,分辨率和灵敏度。
    • 3. 发明授权
    • Phenol resin
    • 苯酚树脂
    • US06211328B1
    • 2001-04-03
    • US09583536
    • 2000-06-01
    • Yoshiaki KurimotoKatsuhiro MaruyamaAkira YoshitomoSatoru YoshidaSatoru Kitano
    • Yoshiaki KurimotoKatsuhiro MaruyamaAkira YoshitomoSatoru YoshidaSatoru Kitano
    • C08G6538
    • C08G65/38C08F8/00Y10S430/11C08F12/24
    • The present invention relates to a phenol resin, in particular a phenol resin for resists suitable for forming resist patterns. The phenol resin of the present invention is obtained by reacting at least two components, i.e., a compound (A) such as 4-hydroxymethyl-2,6-dimethylphenol and a polymerizable phenol compound such as parahydroxystyrene or a polymer (B), which is a polymer of the polymerizable phenol compound, in a ratio of 1 to 50 moles of the compound (A) to 100 moles of the polymerizable phenol compound or 100 moles of structural unit of the polymerizable phenol compound contained in the polymer (B) in the presence of an acid and having a molecular weight of 2,000 to 20,000. Such a phenol resin provides good pattern shape, heat resistance, resolution, and sensitivity in resists for lithography.
    • 本发明涉及一种酚醛树脂,特别是涉及适用于形成抗蚀剂图案的抗蚀剂的酚醛树脂。 本发明的酚醛树脂是通过使至少两种成分即4-羟甲基-2,6-二甲基苯酚等化合物(A)与对羟基苯乙烯等聚合性酚化合物或聚合物(B)反应而得到的, 是聚合物(A)中的1-50摩尔与聚合性酚化合物100摩尔或聚合物(B)中所含的聚合性酚化合物的结构单元的摩尔比为100摩尔的聚合物(B)中的聚合物 酸的存在并且分子量为2,000至20,000。 这种酚醛树脂在光刻抗蚀剂中提供良好的图案形状,耐热性,分辨率和灵敏度。