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    • 1. 发明申请
    • PLATING METHOD AND METHOD OF FORMING MAGNETIC POLE
    • 成形方法及其形成方法
    • US20090246715A1
    • 2009-10-01
    • US12246252
    • 2008-10-06
    • Yasunori KouchiMasaya Kato
    • Yasunori KouchiMasaya Kato
    • G03F7/20
    • G03F7/0751C25D5/022G11B5/1278G11B5/3116G11B5/3163
    • The plating method is capable of firmly adhering a resist pattern on a plating base in case that, for example, a main magnetic pole of a vertical recording magnetic head is formed by using the resist pattern and accurately configurating a sectional shape of a plated pattern. The plating method comprises the steps of: applying an alkoxylsilyl propyl amino triazine dithiol solution, which is formed by dissolving alkoxylsilyl propyl amino triazine dithiol acting as molecular glue in a solvent, onto the plating base; volatilizing the solvent to form a molecular glue layer; applying resist onto the plating base coated with the molecular glue layer; optically exposing and developing the resist to expose a part of the plating base; and plating the exposed part of the plating base coated with the molecular glue layer.
    • 在例如通过使用抗蚀剂图案形成垂直记录磁头的主磁极并精确地构造电镀图案的截面形状的情况下,电镀方法能够将抗蚀剂图案牢固地粘附在电镀基板上。 电镀方法包括以下步骤:通过将作为分子胶的烷氧基甲硅烷基丙基氨基三嗪二硫醇溶解在溶剂中而形成的烷氧基甲硅烷基丙基氨基三嗪二硫醇溶液施加到电镀基体上; 挥发溶剂形成分子胶层; 将抗蚀剂涂布在涂布有分子胶层的镀覆基底上; 光刻曝光和显影抗蚀剂以暴露电镀基底的一部分; 并镀覆涂有分子胶层的电镀基底的露出部分。