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    • 3. 发明授权
    • Array substrate and method for manufacturing the same, and display device
    • 阵列基板及其制造方法以及显示装置
    • US09019462B2
    • 2015-04-28
    • US13699659
    • 2012-08-13
    • Wei QinYun Dong
    • Wei QinYun Dong
    • G02F1/13G02F1/1343H01L21/283G02F1/1368H01L27/12H01L27/15G02F1/1333
    • H01L21/283G02F1/1333G02F1/134363G02F1/1368H01L27/1214H01L27/1288H01L27/156
    • Embodiments of the present invention provide an array substrate and a method for manufacturing the same, and a display device. The method comprises: depositing a first transparent electrode layer on a base substrate, coating first photoresist on the transparent electrode layer, and performing exposure and development on the first photoresist to retain the first photoresist at a location where a first transparent electrode is to be formed, so that a first photoresist pattern is formed; etching the first transparent electrode layer with the first photoresist pattern, so as to form the first transparent electrode; and depositing a second transparent electrode layer on the base substrate after the etching, and then performing a photoresist lifting-off process on the first photoresist pattern to remove a part of the second transparent electrode layer on the first photoresist pattern so that a second transparent electrode is formed.
    • 本发明的实施例提供一种阵列基板及其制造方法以及显示装置。 该方法包括:在基底基板上沉积第一透明电极层,在透明电极层上涂覆第一光致抗蚀剂,并在第一光致抗蚀剂上进行曝光和显影以将第一光致抗蚀剂保持在要形成第一透明电极的位置 ,从而形成第一光致抗蚀剂图案; 用第一光致抗蚀剂图案蚀刻第一透明电极层,以形成第一透明电极; 以及在蚀刻之后在基底基板上沉积第二透明电极层,然后在第一光致抗蚀剂图案上进行光致抗蚀剂剥离处理以除去第一光致抗蚀剂图案上的第二透明电极层的一部分,使得第二透明电极 形成了。
    • 7. 发明授权
    • Array substrate and manufacturing method thereof, liquid crystal display
    • 阵列基板及其制造方法,液晶显示器
    • US08537327B2
    • 2013-09-17
    • US13278391
    • 2011-10-21
    • Wei Qin
    • Wei Qin
    • G02F1/13G02F1/136
    • H01L27/1288G02F2001/136236
    • Embodiments of the disclosed technology relates to an array substrate, a manufacturing method thereof and a liquid crystal display. The method comprises: forming a gate metal film, applying photoresist on the gate metal film, patterning to form a gate line, a gate electrode and a gate line leading wire, and remain a part of photoresist on the gate line leading wire; sequentially depositing a gate insulating film, an active layer film and a source/drain metal film, applying photoresist on the source/drain metal film and patterning to form source/drain electrodes and a channel; lifting off the remained photoresist, the gate insulating film and the photoresist above the gate line leading wire; and then forming a protection layer and a pixel electrode.
    • 所公开的技术的实施例涉及阵列基板,其制造方法和液晶显示器。 该方法包括:形成栅极金属膜,在栅极金属膜上施加光致抗蚀剂,图案化以形成栅极线,栅极电极和栅极引线,并且在栅极线导线上保留光致抗蚀剂的一部分; 依次沉积栅极绝缘膜,有源层膜和源极/漏极金属膜,在源极/漏极金属膜上施加光致抗蚀剂并构图以形成源极/漏极和沟道; 剥离剩余的光致抗蚀剂,栅极绝缘膜和栅极线上的光致抗蚀剂导线; 然后形成保护层和像素电极。
    • 8. 发明申请
    • ARRAY SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME, AND DISPLAY DEVICE
    • 阵列基板及其制造方法以及显示装置
    • US20130114017A1
    • 2013-05-09
    • US13699659
    • 2012-08-13
    • Wei QinYun Dong
    • Wei QinYun Dong
    • H01L21/283H01L27/15G02F1/1368H01L27/12
    • H01L21/283G02F1/1333G02F1/134363G02F1/1368H01L27/1214H01L27/1288H01L27/156
    • Embodiments of the present invention provide an array substrate and a method for manufacturing the same, and a display device. The method comprises: depositing a first transparent electrode layer on a base substrate, coating first photoresist on the transparent electrode layer, and performing exposure and development on the first photoresist to retain the first photoresist at a location where a first transparent electrode is to be formed, so that a first photoresist pattern is formed; etching the first transparent electrode layer with the first photoresist pattern, so as to form the first transparent electrode; and depositing a second transparent electrode layer on the base substrate after the etching, and then performing a photoresist lifting-off process on the first photoresist pattern to remove a part of the second transparent electrode layer on the first photoresist pattern so that a second transparent electrode is formed.
    • 本发明的实施例提供一种阵列基板及其制造方法以及显示装置。 该方法包括:在基底基板上沉积第一透明电极层,在透明电极层上涂覆第一光致抗蚀剂,并在第一光致抗蚀剂上进行曝光和显影以将第一光致抗蚀剂保持在要形成第一透明电极的位置 ,从而形成第一光致抗蚀剂图案; 用第一光致抗蚀剂图案蚀刻第一透明电极层,以形成第一透明电极; 以及在蚀刻之后在基底基板上沉积第二透明电极层,然后在第一光致抗蚀剂图案上进行光致抗蚀剂剥离处理以除去第一光致抗蚀剂图案上的第二透明电极层的一部分,使得第二透明电极 形成了。