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1. 外观设计

USD898683S1 Key of controller 有权
公开(公告)号：USD898683S1
公开(公告)日：2020-10-13
申请号：US29699310
申请日：2019-07-24
申请人： Hung-Wei Lan
设计人： Hung-Wei Lan
摘要： FIG. 1 is a perspective view of a key of controller showing my new design;
FIG. 2 is a front view thereof;
FIG. 3 is a rear view thereof;
FIG. 4 is a left side view thereof;
FIG. 5 is a right side view thereof;
FIG. 6 is a top view thereof;
FIG. 7 is a bottom view thereof; and,
FIG. 8 is a second perspective view showing the key of controller.

2. 发明授权

US09070632B2 Aqueous polishing composition and process for chemically mechanically polishing substrates having patterned or unpatterned low-k dielectric layers 有权
标题翻译：水性抛光组合物和用于化学机械抛光具有图案化或未图案化的低k电介质层的衬底的方法
公开(公告)号：US09070632B2
公开(公告)日：2015-06-30
申请号：US13878361
申请日：2011-10-04
申请人： Vijay Immanuel Raman , Frank Rittig , Yuzhuo Li , Wei Lan William Chiu
发明人： Vijay Immanuel Raman , Frank Rittig , Yuzhuo Li , Wei Lan William Chiu
IPC分类号： B24D3/02 , C09C1/68 , C09K3/14 , H01L21/306 , C09G1/04 , G09G1/02 , H01L21/3105 , H01L21/321 , H01L21/768
CPC分类号： H01L21/30625 , C09G1/02 , C09G1/04 , G09G1/02 , H01L21/31053 , H01L21/3212 , H01L21/7684
摘要： An aqueous polishing composition comprising (A) abrasive particles and (B) an amphiphilic nonionic surfactant selected from the group consisting of water-soluble or water-dispersible surfactants having (b1) hydrophobic groups selected from the group consisting of branched alkyl groups having 10 to 18 carbon atoms; and (b2) hydrophilic groups selected from the group consisting of polyoxyalkylene groups comprising (b21) oxyethylene monomer units and (b22) substituted oxyalkylene monomer units wherein the substituents are selected from the group consisting of alkyl, cycloalkyl, or aryl, alkyl-cycloalkyl, alkyl-aryl, cycloalkyl-aryl and alkyl-cycloalkyl-aryl groups, the said polyoxyalkylene group containing the monomer units (b21) and (b22) in random, alternating, gradient and/or blocklike distribution; a CMP process for substrates having patterned or unpatterned low-k or ultra-low-k dielectric layers making use of the said aqueous polishing composition; and the use of the said aqueous polishing composition for manufacturing electrical, mechanical and optical devices.
摘要翻译：一种水性抛光组合物，其包含（A）研磨颗粒和（B）选自水溶性或水分散性表面活性剂的两亲性非离子表面活性剂，所述水性或水分散性表面活性剂具有（b1）疏水基团，所述支链烷基选自具有10〜 18个碳原子; 和（b2）选自包含（b21）氧化乙烯单体单元和（b22）取代的氧化烯单体单元的聚氧化烯基的亲水基团，其中取代基选自烷基，环烷基或芳基，烷基 - 环烷基，烷基 - 芳基，环烷基 - 芳基和烷基 - 环烷基 - 芳基，所述含有单体单元（b21）和（b22）的聚氧化烯基以随机，交替，梯度和/或块状分布形式存在; 用于使用所述水性抛光组合物的具有图案化或未图案化的低k或超低k电介质层的衬底的CMP工艺; 以及使用所述水性抛光组合物制造电气，机械和光学装置。

3. 发明授权

US08812524B2 Method and system for preserving privacy of a dataset 有权
标题翻译：保护数据集隐私的方法和系统
公开(公告)号：US08812524B2
公开(公告)日：2014-08-19
申请号：US13586891
申请日：2012-08-16
申请人： Ya-Ling Chen , Ci-Wei Lan , Tyrone W Grandison , Jen-Hao Hsiao , Li-Feng Tseng , Yi-Hui Chen
发明人： Ya-Ling Chen , Ci-Wei Lan , Tyrone W Grandison , Jen-Hao Hsiao , Li-Feng Tseng , Yi-Hui Chen
IPC分类号： G06F17/30 , G06F21/62
CPC分类号： G06F21/6254 , G06F17/30289 , G06F17/30539
摘要： A method and a system for preserving privacy of a dataset are provided. In the method, a k-anonymity value with respect to a sensitive data field is determined according to at least one first quasi-identifier. Data entries in each group have the same value in the one or more fields of the first quasi-identifier and data entries in different groups have different values in the one or more fields of the first quasi-identifier. A first group and a second group among the plurality of groups are determined according to the reference number Kr, where the first group and the second group are merged into a merging group. The number of data entries in the merging group is not less than a reference number Kr. One or more fields of at least one first quasi-identifier is masked for the merging group.
摘要翻译：提供了一种保护数据集隐私的方法和系统。在该方法中，根据至少一个第一准标识符确定相对于敏感数据字段的k匿名值。每个组中的数据条目在第一准标识符的一个或多个字段中具有相同的值，并且不同组中的数据条目在第一准标识符的一个或多个字段中具有不同的值。根据参考号Kr确定多个组中的第一组和第二组，其中第一组和第二组合并到合并组中。合并组中的数据条目数不小于参考号Kr。对于合并组，屏蔽至少一个第一准标识符的一个或多个字段。

4. 发明申请

US20130302867A1 METHOD FOR PRODUCING BIODEGRADABLE POLYMER AND BIOMASS FUEL CONVERTED FROM CARBON SOURCE BY RECOMBINANT MICROORGANISMS 审中-公开
标题翻译：通过重组微生物生产碳源可生物降解聚合物和生物质燃料的方法
公开(公告)号：US20130302867A1
公开(公告)日：2013-11-14
申请号：US13469945
申请日：2012-05-11
申请人： Chi-Wei Lan , Ho-Shing Wu , Feng-Shen Chiu
发明人： Chi-Wei Lan , Ho-Shing Wu , Feng-Shen Chiu
IPC分类号： C12P7/42
CPC分类号： C12P7/625 , C12N9/0006 , C12N9/0008 , C12N9/1029 , C12P7/06 , C12P7/08 , C12Y101/01021 , C12Y101/01036 , C12Y102/01003 , C12Y203/01 , C12Y203/01009 , Y02E50/17
摘要： Disclosed is a method for producing biodegradable polymer and biomass fuel converted from carbon source by using recombinant microorganisms, comprising the steps of: (A) providing recombinant microorganisms transformed with plasmids containing at least a gene encoding for glycerol utilizing enzyme and a gene encoding for polyhydroxyalkanoate synthase; (B) culturing the recombinant microorganisms in a medium containing glycerol; (C) inducing expression of the genes of step (A), thereby obtaining polyhydroxyalkanoate and ethanol; and (D) recovering the polyhydroxyalkanoate and the ethanol; wherein the recombinant microorganisms have a glycerol utilization rate more than 90% (w/w), and have polyhydroxyalkanoate accumulated therein to a biomass content thereof at least 30% (w/w).
摘要翻译：本发明公开了一种通过使用重组微生物从碳源转化生物可降解聚合物和生物质燃料的方法，包括以下步骤：（A）提供用至少含有编码甘油的基因的质粒转化的重组微生物，并使用编码聚羟基链烷酸酯的基因合酶（B）在含有甘油的培养基中培养重组微生物; （C）诱导步骤（A）的基因的表达，从而获得聚羟基链烷酸酯和乙醇; 和（D）回收聚羟基链烷酸酯和乙醇; 其中所述重组微生物的甘油利用率大于90％（w / w），并且其中积聚有聚羟基链烷酸酯的生物质含量至少为30％（w / w）。

5. 发明授权

US08576345B2 Choloesteric liquid crystal display and fabrication thereof 有权
标题翻译：胆酸液晶显示器及其制造
公开(公告)号：US08576345B2
公开(公告)日：2013-11-05
申请号：US13191432
申请日：2011-07-26
申请人： Kai-Wei Lan , Chao-Wen Chen , Wan-Wen Chiu
发明人： Kai-Wei Lan , Chao-Wen Chen , Wan-Wen Chiu
IPC分类号： G02F1/133 , G02F1/1335 , C09K19/02
CPC分类号： G02F1/134309 , G02F1/13718
摘要： A cholesteric liquid crystal display is provided, including a substrate, a first electrode layer disposed on the substrate, and a liquid crystal layer disposed on the first electrode layer, wherein the liquid crystal layer comprises at least two liquid crystals having different sensitivities to driving frequencies, mixed with each other, and liquid crystals having a greater initial state-transition temperature are more sensitive to driving frequency.
摘要翻译：提供一种胆甾型液晶显示器，包括基板，设置在基板上的第一电极层和设置在第一电极层上的液晶层，其中液晶层包括至少两个具有与驱动频率不同的灵敏度的液晶，并且具有较大初始状态转变温度的液晶对驱动频率更敏感。

6. 发明申请

US20130169586A1 TOUCH SYSTEM FOR INCREASING A REPORT RATE AND METHOD FOR INCREASING A REPORT RATE OF A TOUCH SYSTEM 审中-公开
标题翻译：用于提高报告率的触控系统和提高触摸系统报告率的方法
公开(公告)号：US20130169586A1
公开(公告)日：2013-07-04
申请号：US13413657
申请日：2012-03-07
申请人： Bo-Wei Lan , Chun-Chieh Wang
发明人： Bo-Wei Lan , Chun-Chieh Wang
IPC分类号： G06F3/044 , G06F3/045 , G06F3/041
CPC分类号： G06F3/044 , G06F3/0416 , G06F3/045
摘要： A touch system for increasing a report rate includes a touch panel and a readout circuit. The touch panel is used for being touched by at least one object. A first axial direction of the touch panel has N first sensing lines and a second axial direction of the touch panel has M second sensing lines. The readout circuit is used for transmitting driving signals to each at least two first sensing lines of the N first sensing lines simultaneously, receiving sensing signals corresponding to the at least two first sensing lines through the M second sensing lines in turn, and calculating and outputting coordinates of at least one object touching the touch panel to a host according to the sensing signals corresponding to the at least two first sensing lines. The driving signals corresponding to the at least two first sensing lines partially overlap each other.
摘要翻译：用于提高报告率的触摸系统包括触摸面板和读出电路。触摸面板用于被至少一个物体触摸。触摸面板的第一轴向具有N个第一感测线，并且触摸面板的第二轴向具有M个第二感测线。读出电路用于将驱动信号同时发送到N个第一感测线的至少两个第一感测线，依次接收通过M个第二感测线对应于至少两个第一感测线的感测信号，并计算和输出根据与至少两个第一感测线对应的感测信号，将触摸面板的至少一个物体的坐标指向主机。对应于至少两个第一感测线的驱动信号部分地彼此重叠。

7. 发明授权

US08409456B2 Planarization method for high wafer topography 有权
标题翻译：高晶圆地形平面化方法
公开(公告)号：US08409456B2
公开(公告)日：2013-04-02
申请号：US13090763
申请日：2011-04-20
申请人： Shun-Wei Lan , Jieh-Jang Chen , Shih-Wei Lin , Feng-Jia Shiu , Hung Chang Hsieh
发明人： Shun-Wei Lan , Jieh-Jang Chen , Shih-Wei Lin , Feng-Jia Shiu , Hung Chang Hsieh
IPC分类号： B44C1/22
CPC分类号： H01L21/31058 , H01L21/31138
摘要： A method for planarizing a semiconductor device includes providing a substrate having at least one opening therein, each opening defining a lower portion and an upper portion; coating a light sensitive material layer over the substrate, the light sensitive material layer covering the lower and upper portions of the at least one opening; etching back the light sensitive material layer to expose the upper portion of the at least one opening; repeating the steps of coating and etching to remove a predetermined amount below the upper portion of the at least one opening; depositing an insulating layer over the substrate; and planarizing the insulating layer until the upper portion of the at least one opening is exposed.
摘要翻译：一种用于平面化半导体器件的方法包括提供其中具有至少一个开口的衬底，每个开口限定下部和上部; 在所述基板上涂覆感光材料层，所述光敏材料层覆盖所述至少一个开口的下部和上部; 蚀刻光敏材料层以暴露至少一个开口的上部; 重复涂覆和蚀刻步骤以除去至少一个开口的上部下方的预定量; 在衬底上沉积绝缘层; 并且平坦化绝缘层，直到暴露至少一个开口的上部。

8. 发明申请

US20120270398A1 PLANARIZATION METHOD FOR HIGH WAFER TOPOGRAPHY 有权
标题翻译：高速地形平面化方法
公开(公告)号：US20120270398A1
公开(公告)日：2012-10-25
申请号：US13090763
申请日：2011-04-20
申请人： Shun-Wei LAN , Jieh-Jang CHEN , Shih-Wei LIN , Feng-Jia SHIU , Hung Chang HSIEH
发明人： Shun-Wei LAN , Jieh-Jang CHEN , Shih-Wei LIN , Feng-Jia SHIU , Hung Chang HSIEH
IPC分类号： H01L21/3105 , H01L21/306
CPC分类号： H01L21/31058 , H01L21/31138
摘要： A method for planarizing a semiconductor device includes providing a substrate having at least one opening therein, each opening defining a lower portion and an upper portion; coating a light sensitive material layer over the substrate, the light sensitive material layer covering the lower and upper portions of the at least one opening; etching back the light sensitive material layer to expose the upper portion of the at least one opening; repeating the steps of coating and etching to remove a predetermined amount below the upper portion of the at least one opening; depositing an insulating layer over the substrate; and planarizing the insulating layer until the upper portion of the at least one opening is exposed.
摘要翻译：一种用于平面化半导体器件的方法包括提供其中具有至少一个开口的衬底，每个开口限定下部和上部; 在所述基板上涂覆感光材料层，所述光敏材料层覆盖所述至少一个开口的下部和上部; 蚀刻光敏材料层以暴露至少一个开口的上部; 重复涂覆和蚀刻步骤以除去至少一个开口的上部下方的预定量; 在衬底上沉积绝缘层; 并且平坦化绝缘层，直到暴露至少一个开口的上部。

9. 外观设计

USD646310S1 Linear actuator 有权
标题翻译：线性执行机构
公开(公告)号：USD646310S1
公开(公告)日：2011-10-04
申请号：US29391825
申请日：2011-05-13
申请人： Hung-Wei Lan
设计人： Hung-Wei Lan

10. 外观设计

USD643449S1 Motor device 有权
公开(公告)号：USD643449S1
公开(公告)日：2011-08-16
申请号：US29391811
申请日：2011-05-13
申请人： Hung-Wei Lan
设计人： Hung-Wei Lan

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