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1. 发明申请

US20110255063A1 Seamless Stitching of Patterns Formed by Interference Lithography 审中-公开
标题翻译：通过干涉光刻形成的图案的无缝拼接
公开(公告)号：US20110255063A1
公开(公告)日：2011-10-20
申请号：US12748854
申请日：2010-03-29
申请人： Vincent E. Stenger
发明人： Vincent E. Stenger
IPC分类号： G03B27/58
CPC分类号： G03F7/70475 , G03F7/70408 , G03F9/7011 , G03F9/7088
摘要： This invention addresses the scalability problem of periodic “nanostructured” surface treatments such as those formed by interference lithography. A novel but simple method is described that achieves seamless stitching of nanostructure surface textures at the pattern exposure level. The described tiling approach will enable scaling up of coherent nanostructured surfaces to arbitrary area sizes. Such a large form factor nanotechnology will be essential for fabricating large aperture, coherent diffractive elements. Other applications include high performance, antiglare/antireflection and smudge resistant Motheye treatments for display products such as PDA's, laptop computers, large screen TV's, cockpit canopies, instrument panels, missile and targeting domes, and, more recently, “negative-index” surfaces. Although ideal for seamless stitching of nanometer scale patterns, the technology is broadly applicable to any situation where an arbitrarily large area needs to be seamlessly tiled with a smaller base pattern that has periodic overlap able boundaries.
摘要翻译：本发明解决了周期性的“纳米结构”表面处理（例如由干涉光刻形成的表面处理）的可伸缩性问题。描述了一种新颖但简单的方法，其在图案曝光水平下实现纳米结构表面纹理的无缝缝合。所描述的平铺方法将能够将相干纳米结构化表面扩展到任意面积大小。这种大尺寸纳米技术对于制造大孔径，相干衍射元件是至关重要的。其他应用包括PDA，笔记本电脑，大屏幕电视，驾驶舱檐篷，仪表板，导弹和瞄准穹顶等显示产品的高性能，防眩光/抗反射和防污染Motheye处理，以及最近的“负指数”表面。尽管纳米尺度图案的无缝拼接是理想的，但是该技术广泛适用于任何大面积需要无缝拼接的基础图案，具有周期性重叠边界的任何情况。

2. 发明授权

US5963034A Electro-optic electromagnetic field sensor system with optical bias adjustment 失效
标题翻译：光电电磁场传感器系统，具有光偏置调节功能
公开(公告)号：US5963034A
公开(公告)日：1999-10-05
申请号：US975349
申请日：1997-11-20
申请人： Amaresh Mahapatra , Vincent E. Stenger
发明人： Amaresh Mahapatra , Vincent E. Stenger
IPC分类号： G01R29/08 , G01R33/032 , G01R33/02
CPC分类号： G01R29/0885 , G01R33/032
摘要： An electro-optic electromagnetic field sensor system includes an electro-optic sensor located at an electromagnetic field sensing site for detecting an intensity of an electromagnetic field. The sensor changes an optical measuring signal received from a laser source to an optical sensor signal representative of the electromagnetic field intensity. An optical bias adjust unit optically coupled to the laser source adjusts the bias operating point of the electro-optic sensor responsive to an electrical bias adjust signal which includes a test signal component. A detector optically coupled to the electro-optic sensor converts the optical sensor signal to an electrical sensor signal and detects a feedback signal indicative of the transfer function of the electro-optic sensor operating on the test signal component. A bias control circuit electrically coupled to the optical bias adjust unit generates the bias adjust signal responsive to the feedback signal. An optical input fiber couples the optical measuring signal from the laser source to the electro-optic sensor and an optical output fiber couples the optical sensor signal to the detector.
摘要翻译：电光电磁场传感器系统包括位于电磁场感测位置的用于检测电磁场强度的电光传感器。传感器将从激光源接收的光学测量信号改变为表示电磁场强度的光学传感器信号。光学耦合到激光源的光学偏置调节单元响应于包括测试信号分量的电偏置调整信号调节电光传感器的偏压工作点。光耦合到电光传感器的检测器将光学传感器信号转换成电传感器信号，并且检测表示在测试信号分量上运行的电光传感器的传递函数的反馈信号。电耦合到光偏置调节单元的偏置控制电路响应于反馈信号产生偏置调整信号。光学输入光纤将来自激光源的光学测量信号耦合到电光传感器，并且光输出光纤将光学传感器信号耦合到检测器。

3. 发明授权

US07718326B2 Seamless stitching of patterns formed by interference lithography 失效
标题翻译：通过干涉光刻形成的图案的无缝缝合
公开(公告)号：US07718326B2
公开(公告)日：2010-05-18
申请号：US11454274
申请日：2006-06-17
申请人： Vincent E Stenger
发明人： Vincent E Stenger
IPC分类号： G03F9/00
CPC分类号： G03F7/70475 , G03F7/70408 , G03F9/7011 , G03F9/7088
摘要： This invention addresses the scalability problem of periodic “nanostructured” surface treatments such as those formed by interference lithography. A novel but simple method is described that achieves seamless stitching of nanostructure surface textures at the pattern exposure level. The described tiling approach will enable scaling up of coherent nanostructured surfaces to arbitrary area sizes. Such a large form factor nanotechnology will be essential for fabricating large aperture, coherent diffractive elements. Other applications include high performance, antiglare/antireflection and smudge resistant Motheye treatments for display products such as PDA's, laptop computers, large screen TV's, cockpit canopies, instrument panels, missile and targeting domes, and, more recently, “negative-index” surfaces. Although ideal for seamless stitching of nanometer scale patterns, the technology is broadly applicable to any situation where an arbitrarily large area needs to be seamlessly tiled with a smaller base pattern that has periodic overlap able boundaries.
摘要翻译：本发明解决了周期性的“纳米结构”表面处理（例如由干涉光刻形成的表面处理）的可伸缩性问题。描述了一种新颖但简单的方法，其在图案曝光水平下实现纳米结构表面纹理的无缝缝合。所描述的平铺方法将能够将相干纳米结构化表面扩展到任意面积大小。这种大尺寸纳米技术对于制造大孔径，相干衍射元件是至关重要的。其他应用包括PDA，笔记本电脑，大屏幕电视，驾驶舱檐篷，仪表板，导弹和瞄准穹顶等显示产品的高性能，防眩光/抗反射和防污染Motheye处理，以及最近的“负指数”表面。尽管纳米尺度图案的无缝拼接是理想的，但是该技术广泛适用于任何大面积需要无缝拼接的基础图案，具有周期性重叠边界的任何情况。

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