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1. 发明申请

US20140311044A1 POLISHING FILM 审中-公开
标题翻译：抛光膜
公开(公告)号：US20140311044A1
公开(公告)日：2014-10-23
申请号：US14238324
申请日：2012-04-18
申请人： Toshikazu Taura , Kazuo Saito , Fumihiro Mukai
发明人： Toshikazu Taura , Kazuo Saito , Fumihiro Mukai
IPC分类号： B24D3/28
CPC分类号： B24D3/28 , B24B19/226 , B24B37/245 , B24D3/344 , B24D3/346
摘要： The present invention provides a polishing film with which, even when water containing impurity ions is used as a polishing liquid, the abrasive particles comprising SiO2 are less apt to adhere to the polished surface, e.g., the polished surface of an end of an optical fiber itself, and which is less apt to cause the optical loss attributable to scratches or edge chips in the polished surface. The polishing film hence renders good finish-polishing quality possible. This polishing film is characterized by comprising a substrate and an abrasive layer which has been disposed on a surface of the substrate and which comprises abrasive particles comprising SiO2, a binder resin, and an adhesion inhibitor containing a phosphorus compound.
摘要翻译：本发明提供了一种抛光膜，即使使用含有杂质离子的水作为研磨液，包含SiO 2的磨料颗粒也不易附着在抛光表面上，例如光纤末端的抛光表面并且其不太可能引起归因于抛光表面中的划痕或边缘碎屑的光学损耗。因此抛光膜可以提供良好的抛光质量。该抛光膜的特征在于包括基材和研磨层，该研磨层已经设置在基材的表面上，并且其包含包含SiO 2的研磨颗粒，粘合剂树脂和含有磷化合物的粘合抑制剂。

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