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1. 发明授权

US4614568A High-speed silver plating and baths therefor 失效
标题翻译：高速镀银和浴缸
公开(公告)号：US4614568A
公开(公告)日：1986-09-30
申请号：US617215
申请日：1984-06-04
申请人： Toshikazu Okubo , Yasuo Mori , Shunichi Kasai
发明人： Toshikazu Okubo , Yasuo Mori , Shunichi Kasai
IPC分类号： C25D3/46 , C25D5/34
CPC分类号： C25D5/34 , C25D3/46
摘要： A high-speed silver plating solution for electroplating silver on a substrate which consists of a less-noble metal, such as copper, copper alloy, copper-plated base metal, iron, ferroalloy, nickel, or nickel alloy, characterized in that a cyclic compound whose ring includes a thioureylene radical ##STR1## (in which R.sub.1 and R.sub.2 are hydrogen or an alkyl or aryl group each) is added to the solution in a sufficient amount to prevent silver deposition by displacement reaction, whereby the silver deposition on the substrate is avoided. There is also provided a pretreating solution including the aforementioned compound for dipping the substrate prior to the silver plating.
摘要翻译：一种用于在由诸如铜，铜合金，镀铜贱金属，铁，铁合金，镍或镍合金的低贵金属组成的基板上电镀银的高速镀银溶液，其特征在于，其环包含硫代亚芳基的化合物（其中R 1和R 2为氢或各自为烷基或芳基）以足够的量加入到溶液中，以防止通过置换反应进行银沉积，由此在基板上沉积银被避免。还提供了一种包含上述化合物的预处理溶液，用于在镀银之前浸渍基底。

2. 发明申请

US20120275203A1 AC-DC CONVERTER AND METHOD OF CONTROLLING SAME 审中-公开
标题翻译： AC-DC转换器及其控制方法
公开(公告)号：US20120275203A1
公开(公告)日：2012-11-01
申请号：US13520716
申请日：2010-01-05
申请人： Takae Shimada , Akihiko Kanouda , Toshikazu Okubo , Tomoyuki Hatakeyama
发明人： Takae Shimada , Akihiko Kanouda , Toshikazu Okubo , Tomoyuki Hatakeyama
IPC分类号： H02M7/04
CPC分类号： H02M1/4225 , H02M1/34 , H02M3/158 , H02M2001/342 , H02M2001/344 , Y02B70/126 , Y02B70/1491
摘要： To provide an AC-DC converter that is highly efficient in a broad load current range from a light load to a heavy load.An AC-DC converter 1 has a main circuit and a control means 4; the main circuit includes a diode bridge circuit 3, a main inductor L1, a main switching element S1, a main diode D1, an auxiliary inductor L2, an auxiliary switching element S2, an auxiliary diode D2, and a smoothing capacitor C1 connected to a DC load 12. The AC-DC converter 1 supplies electric power from an AC power supply 11 to the DC load 12. In a period during which the instantaneous value of an input current from the AC power supply 11 is smaller than a prescribed value Ith, the AC-DC converter 1 stops the main switching element S1 and performs electricity conversion in hard switching by the operation of the auxiliary switching element S2.
摘要翻译：提供一种在从轻负载到重负载的宽负载电流范围内高效的AC-DC转换器。 AC-DC转换器1具有主电路和控制装置4; 主电路包括二极管电路3，主电感器L1，主开关元件S1，主二极管D1，辅助电感器L2，辅助开关元件S2，辅助二极管D2和连接到直流负载12.AC-DC转换器1将电力从交流电源11提供给直流负载12.在来自交流电源11的输入电流的瞬时值小于规定值Ith的期间 AC-DC转换器1停止主开关元件S1，并通过辅助开关元件S2的动作进行硬切换的电力转换。

3. 发明授权

US07936573B2 Bi-directional DC-DC converter and control method 有权
标题翻译：双向DC-DC转换器及控制方法
公开(公告)号：US07936573B2
公开(公告)日：2011-05-03
申请号：US12706750
申请日：2010-02-17
申请人： Tatsumi Yamauchi , Hiroyuki Shoji , Seigou Yukutake , Toshikazu Okubo
发明人： Tatsumi Yamauchi , Hiroyuki Shoji , Seigou Yukutake , Toshikazu Okubo
IPC分类号： H02M3/335
CPC分类号： H02M3/33584 , B60L11/1868 , B60L2210/10 , Y02T10/7005 , Y02T10/7066 , Y02T10/7216 , Y10T307/685
摘要： A bi-directional DC-DC converter uses a transformer for both step-down and step-up operations. A switching frequency for operating a switching device is set separately for the step-down and step-up operations. When, for example, the switching frequency during the step-up operation is lower than the switching frequency during the step-down operation, the range in which the duty ratio in PWM control can be controlled is widened, compensating for step-up ratio insufficiency. Conversely, step-down ratio insufficiency is compensated for by making the switching frequency during the step-down operation lower than the switching frequency during the step-up operation.
摘要翻译：双向DC-DC转换器使用变压器进行降压和升压操作。用于操作开关装置的开关频率分别设置用于降压和升压操作。例如，当升压操作期间的开关频率低于降压操作时的开关频率时，可以控制PWM控制中的占空比的范围，补偿升压比不足。相反，通过在降压操作期间使开关频率低于升压操作期间的开关频率来补偿降压比不足。

4. 发明申请

US20110025294A1 METHOD FOR ANALYZING ELECTROLYTIC COPPER PLATING SOLUTION 有权
标题翻译：分析电解铜溶液的方法
公开(公告)号：US20110025294A1
公开(公告)日：2011-02-03
申请号：US12903090
申请日：2010-10-12
申请人： Toshikazu Okubo , Katsuyoshi Naoi , Yuka Yamada
发明人： Toshikazu Okubo , Katsuyoshi Naoi , Yuka Yamada
IPC分类号： G01N27/00
CPC分类号： C25D21/12 , G01N27/42
摘要： Effective fillability and the uniformity electrodeposition of a copper electroplating solution is judged by determining the time-dependent potential change thereof at a cathode current density of 0.1-20 A/dm2. The potential change is determined at a working electrode rotation of 100-7500 rpm, and the fillability with the solution is judged from the curve profile. In an embodiment of the present invention, the fillability is judged by obtaining the potential change speed in the initial stage of electrolysis and the potential convergent point from the time-dependent potential change curve for a predetermined period of time after the start of the electrolysis.
摘要翻译：通过在0.1-20A / dm 2的阴极电流密度下确定其时间依赖性电位变化来判断铜电镀溶液的有效填充性和均匀性电沉积。在100-7500rpm的工作电极旋转下确定电位变化，并根据曲线轮廓判断溶液的填充性。在本发明的一个实施例中，通过在电解开始之后的预定时间段内从时间依赖电位变化曲线获得电解初始阶段的电位变化速度和电位收敛点来判断可填充性。

5. 发明授权

US07692935B2 Bi-directional DC-DC converter and control method 有权
标题翻译：双向DC-DC转换器及控制方法
公开(公告)号：US07692935B2
公开(公告)日：2010-04-06
申请号：US11641662
申请日：2006-12-20
申请人： Tatsumi Yamauchi , Hiroyuki Shoji , Seigou Yukutake , Toshikazu Okubo
发明人： Tatsumi Yamauchi , Hiroyuki Shoji , Seigou Yukutake , Toshikazu Okubo
IPC分类号： H02M3/335
CPC分类号： H02M3/33584 , B60L11/1868 , B60L2210/10 , Y02T10/7005 , Y02T10/7066 , Y02T10/7216 , Y10T307/685
摘要： A bi-directional DC-DC converter uses a transformer for both step-down and step-up operations. A switching frequency for operating a switching device is set separately for the step-down and step-up operations. When, for example, the switching frequency during the step-up operation is lower than the switching frequency during the step-down operation, the range in which the duty ratio in PWM control can be controlled is widened, compensating for step-up ratio insufficiency. Conversely, step-down ratio insufficiency is compensated for by making the switching frequency during the step-down operation lower than the switching frequency during the step-up operation.
摘要翻译：双向DC-DC转换器使用变压器进行降压和升压操作。用于操作开关装置的开关频率分别设置用于降压和升压操作。例如，当升压操作期间的开关频率低于降压操作时的开关频率时，可以控制PWM控制中的占空比的范围，补偿升压比不足。相反，通过在降压操作期间使开关频率低于升压操作期间的开关频率来补偿降压比不足。

6. 发明申请

US20070139975A1 Bi-directional DC-DC converter and control method 有权
标题翻译：双向DC-DC转换器及控制方法
公开(公告)号：US20070139975A1
公开(公告)日：2007-06-21
申请号：US11641662
申请日：2006-12-20
申请人： Tatsumi Yamauchi , Hiroyuki Shoji , Seigou Yukutake , Toshikazu Okubo
发明人： Tatsumi Yamauchi , Hiroyuki Shoji , Seigou Yukutake , Toshikazu Okubo
IPC分类号： H02M3/335
CPC分类号： H02M3/33584 , B60L11/1868 , B60L2210/10 , Y02T10/7005 , Y02T10/7066 , Y02T10/7216 , Y10T307/685
摘要： The inventive bi-directional DC-DC converter addresses a problem of an insufficient step-up ratio during the step-up operation that is caused when a turns ratio of the transformer is determined to, for example, match the step-up operation and also address a contrary problem of an insufficient step-down ratio during the step-down operation that is caused when a turns ratio is determined to match the step-up operation. In the inventive bi-directional DC-DC converter that uses a transformer for both step-down and step-up operations, a switching frequency for operating a switching device is set separately for the step-down and step-up operations. For example, when the switching frequency during the step-up operation is lower than the switching frequency during the step-down operation, the range in which the duty ratio in PWM control can be controlled is widened, compensating for step-up ratio insufficiency. Conversely, step-down ratio insufficiency is compensated for by making the switching frequency during the step-down operation lower than the switching frequency during the step-up operation.
摘要翻译：本发明的双向DC-DC转换器解决了在升压操作期间由于变压器的匝数比被确定为例如与升压操作相匹配而引起的升压比不足的问题，并且还解决了当匝数比被确定为与升压操作相匹配时在降压操作期间不足的降压比的相反问题。在本发明的使用变压器用于降压和升压操作的双向DC-DC转换器中，用于操作开关装置的开关频率分别设置用于降压和升压操作。例如，当升压操作期间的开关频率低于降压操作期间的开关频率时，可以控制PWM控制中的占空比的范围变大，从而补偿升压比不足。相反，通过在降压操作期间使开关频率低于升压操作期间的开关频率来补偿降压比不足。

7. 发明申请

US20060183257A1 Method for analyzing electrolytic copper plating solution, and analyzing device therefor and production method for semi-conductor product 有权
标题翻译：电解铜电镀液分析方法及其分析装置及半导体制品的制造方法
公开(公告)号：US20060183257A1
公开(公告)日：2006-08-17
申请号：US10550153
申请日：2004-03-23
申请人： Toshikazu Okubo , Katsuyoshi Naoi , Yuka Yamada
发明人： Toshikazu Okubo , Katsuyoshi Naoi , Yuka Yamada
IPC分类号： H01L21/66 , H01L21/44
CPC分类号： C25D21/12 , G01N27/42
摘要： Effective fillability and the uniformity electrodeposition of a copper electroplating solution is judged by determining the time-dependent potential change thereof at a cathode current density of 0.1-20 A/dm2. The potential change is determined at a working electrode rotation of 100-7500 rpm, and the fillability with the solution is judged from the curve profile. The time-dependent potential change curve within a predetermined period of time after the start of electrolysis is approximated according to the Boltzmann's function, and the potential change speed dx and the potential convergent point A2 are obtained to judge the fillability with a plating solution.
摘要翻译：通过在0.1-20A / dm 2的阴极电流密度下确定其依赖于电位的变化来判断铜电镀溶液的有效填充性和均匀性电沉积。在100-7500rpm的工作电极旋转下确定电位变化，并根据曲线轮廓判断溶液的填充性。在电解开始之后的预定时间段内的时间依赖电位变化曲线根据玻尔兹曼函数近似，并且获得电位变化速度dx和电位收敛点A <2>，以判断电镀溶液的填充性。

8. 发明授权

US07820535B2 Method for analyzing copper electroplating solution, apparatus for the analysis, and method for fabricating semiconductor product 有权
标题翻译：铜电镀液分析方法，分析装置及制造半导体产品的方法
公开(公告)号：US07820535B2
公开(公告)日：2010-10-26
申请号：US10550153
申请日：2004-03-23
申请人： Toshikazu Okubo , Katsuyoshi Naoi , Yuka Yamada
发明人： Toshikazu Okubo , Katsuyoshi Naoi , Yuka Yamada
IPC分类号： H01L21/20
CPC分类号： C25D21/12 , G01N27/42
摘要： Effective fillability and the uniformity electrodeposition of a copper electroplating solution is judged by determining the time-dependent potential change thereof at a cathode current density of 0.1-20 A/dm2. The potential change is determined at a working electrode rotation of 100-7500 rpm, and the fillability with the solution is judged from the curve profile. The time-dependent potential change curve within a predetermined period of time after the start of electrolysis is approximated according to the Boltzmann's function, and the potential change speed dx and the potential convergent point A2 are obtained to judge the fillability with a plating solution.
摘要翻译：通过在0.1-20A / dm 2的阴极电流密度下确定其时间依赖性电位变化来判断铜电镀溶液的有效填充性和均匀性电沉积。在100-7500rpm的工作电极旋转下确定电位变化，并根据曲线轮廓判断溶液的填充性。在电解开始之后的预定时间段内的时间依赖电位变化曲线根据波尔兹曼函数近似，并且获得电位变化速度dx和电位收敛点A2，以判断电镀溶液的填充性。

9. 发明申请

US20100142228A1 Bi-Directional DC-DC Converter and Control Method 有权
标题翻译：双向DC-DC转换器和控制方法
公开(公告)号：US20100142228A1
公开(公告)日：2010-06-10
申请号：US12706750
申请日：2010-02-17
申请人： Tatsumi YAMAUCHI , Hiroyuki Shoji , Seigou Yukutake , Toshikazu Okubo
发明人： Tatsumi YAMAUCHI , Hiroyuki Shoji , Seigou Yukutake , Toshikazu Okubo
IPC分类号： H02M3/335 , H02J1/00
CPC分类号： H02M3/33584 , B60L11/1868 , B60L2210/10 , Y02T10/7005 , Y02T10/7066 , Y02T10/7216 , Y10T307/685
摘要： A bi-directional DC-DC converter uses a transformer for both step-down and step-up operations. A switching frequency for operating a switching device is set separately for the step-down and step-up operations. When, for example, the switching frequency during the step-up operation is lower than the switching frequency during the step-down operation, the range in which the duty ratio in PWM control can be controlled is widened, compensating for step-up ratio insufficiency. Conversely, step-down ratio insufficiency is compensated for by making the switching frequency during the step-down operation lower than the switching frequency during the step-up operation.
摘要翻译：双向DC-DC转换器使用变压器进行降压和升压操作。用于操作开关装置的开关频率分别设置用于降压和升压操作。例如，当升压操作期间的开关频率低于降压操作时的开关频率时，可以控制PWM控制中的占空比的范围，补偿升压比不足。相反，通过在降压操作期间使开关频率低于升压操作期间的开关频率来补偿降压比不足。

10. 发明授权

US08440555B2 Method for analyzing electrolytic copper plating solution 有权
标题翻译：电解镀铜液分析方法
公开(公告)号：US08440555B2
公开(公告)日：2013-05-14
申请号：US12903090
申请日：2010-10-12
申请人： Toshikazu Okubo , Katsuyoshi Naoi , Yuka Yamada
发明人： Toshikazu Okubo , Katsuyoshi Naoi , Yuka Yamada
IPC分类号： H01L21/20
CPC分类号： C25D21/12 , G01N27/42
摘要： Effective fillability and the uniformity electrodeposition of a copper electroplating solution is judged by determining the time-dependent potential change thereof at a cathode current density of 0.1-20 A/dm2. The potential change is determined at a working electrode rotation of 100-7500 rpm, and the fillability with the solution is judged from the curve profile. In an embodiment of the present invention, the fillability is judged by obtaining the potential change speed in the initial stage of electrolysis and the potential convergent point from the time-dependent potential change curve for a predetermined period of time after the start of the electrolysis.
摘要翻译：通过在0.1-20A / dm 2的阴极电流密度下确定其时间依赖的电位变化来判断铜电镀溶液的有效填充性和均匀性电沉积。在100-7500rpm的工作电极旋转下确定电位变化，并根据曲线轮廓判断溶液的填充性。在本发明的一个实施例中，通过在电解开始之后的预定时间段内从时间依赖电位变化曲线获得电解初始阶段的电位变化速度和电位收敛点来判断可填充性。

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