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1. 发明授权

US08111380B2 Write-pattern determination for maskless lithography 失效
标题翻译：无掩模光刻的写模式确定
公开(公告)号：US08111380B2
公开(公告)日：2012-02-07
申请号：US12206660
申请日：2008-09-08
申请人： Daniel S. Abrams , Timothy Lin
发明人： Daniel S. Abrams , Timothy Lin
IPC分类号： G03B27/54 , G03B27/44 , G03B27/32 , G03B27/68 , G03B27/42
CPC分类号： G03F7/70291 , G03F7/70116 , G03F7/70508
摘要： A method for generating a write pattern to be used in a maskless-lithography process is described. During the method, a computer system determines a one-to-one correspondence between pixels in the write pattern and at least a subset of elements in a spatial-light modulator used in the maskless-lithography process. Furthermore, the computer system generates the write pattern. Note that the write pattern includes features corresponding to at least the subset of elements in the spatial-light modulator, and the generating is in accordance with a characteristic dimension of an element in the spatial-light modulator and a target pattern that is to be printed on a semiconductor wafer during the maskless-lithography process.
摘要翻译：描述用于产生无掩模光刻工艺中使用的写入模式的方法。在该方法期间，计算机系统确定写入模式中的像素与无掩模光刻工艺中使用的空间光调制器中的至少一个元素子集之间的一一对应关系。此外，计算机系统生成写入模式。注意，写入模式包括对应于空间光调制器中的至少元素的子集的特征，并且该生成是根据空间光调制器中的元素的特征尺寸和要被打印的目标图案在无掩模光刻工艺中的半导体晶片上。

2. 发明申请

US20090319978A1 Mask Patterns for Use in Multiple-Exposure Lithography 有权
标题翻译：在多曝光光刻中使用的面膜图案
公开(公告)号：US20090319978A1
公开(公告)日：2009-12-24
申请号：US12423686
申请日：2009-04-14
申请人： Robert P. Gleason , Timothy Lin , Andrew J. Moore , Bennett W. Olson , Paul Rissman
发明人： Robert P. Gleason , Timothy Lin , Andrew J. Moore , Bennett W. Olson , Paul Rissman
IPC分类号： G06F17/50
CPC分类号： G03F7/70466 , G03F1/70
摘要： A method for determining mask patterns to be used on photo-masks in a multiple-exposure photolithographic process is described. During the method, an initial mask pattern, which is intended for use in a single-exposure photolithographic process, and a target pattern that is to be printed are used to determine a first mask pattern and a second mask pattern, which are intended for use in the multiple-exposure photolithographic process. In particular, the first mask pattern includes a first feature and the second mask pattern includes a second feature, and the first feature and the second feature overlap an intersection between features in the initial mask pattern. Moreover, the first mask pattern and the second mask pattern have at least one decreased spatial frequency relative to the initial mask pattern along at least one direction in the initial mask pattern.
摘要翻译：描述了一种用于确定在多曝光光刻工艺中用于光掩模的掩模图案的方法。在该方法期间，用于单曝光光刻工艺中使用的初始掩模图案和待印刷的目标图案用于确定预期使用的第一掩模图案和第二掩模图案在多曝光光刻工艺中。特别地，第一掩模图案包括第一特征，第二掩模图案包括第二特征，并且第一特征和第二特征与初始掩模图案中的特征之间的交点重叠。此外，第一掩模图案和第二掩模图案在初始掩模图案中沿着至少一个方向具有相对于初始掩模图案的至少一个减小的空间频率。

3. 发明申请

US20080174782A1 METHOD OF SPECKLE SIZE AND DISTRIBUTION CONTROL AND THE OPTICAL SYSTEM USING THE SAME 审中-公开
标题翻译：分布尺寸和分布控制方法以及使用该方法的光学系统
公开(公告)号：US20080174782A1
公开(公告)日：2008-07-24
申请号：US11682291
申请日：2007-03-05
申请人： Timothy Lin
发明人： Timothy Lin
IPC分类号： G01B11/02
CPC分类号： G06F3/0317
摘要： A method of speckle size and distribution control and the optical system using the same are disclosed. The optical system is arranged inside a housing of a computer mouse that is primarily composed of a laser unit, a lens set, an image sensing unit and a digital signal processing unit. It is known that by projecting a laser beam onto a surface with sufficient roughness, the surface will exhibits a speckled appearance as the speckle pattern is a random intensity pattern produced by the mutual interference of coherent laser beam that are subject to phase differences and/or intensity fluctuations. Thus, the present invention provides an optical system capable of controlling the speckle sizes and the speckle pattern distribution by adjusting the bandwidth of a coherent laser beam being emitted out of the laser light source of the optical system as well as by adjusting the distance between an image plane of the digital signal processing unit and the rough surface being illuminated by the coherent laser beam, so that the distribution of the resulting speckle pattern and the size of each speckle thereof can match with the effective pixel size of different image sensing units used in the optical system. The method and optical system is advantageous in its simple optical path, by which the mechanical structure accuracy is minimized that facilitates and enhances manufacturers of different image sensing units to use speckle patterns for determining how far the optical system has moved and in which direction it is moved.
摘要翻译：公开了一种散斑尺寸和分布控制方法以及使用其的光学系统。光学系统布置在主要由激光单元，透镜组，图像感测单元和数字信号处理单元组成的计算机鼠标的壳体内。已知通过将激光束投射到具有足够粗糙度的表面上，由于散斑图案是由经受相位差的相干激光束的相互干扰产生的随机强度图案，和/或强度波动。因此，本发明提供了一种光学系统，其能够通过调整从光学系统的激光光源发出的相干激光束的带宽以及通过调整光学系统的距离来控制斑点大小和散斑图案分布数字信号处理单元的图像平面和粗糙表面被相干激光束照射，使得所得到的散斑图案的分布和其每个散斑的尺寸可以与使用的不同图像感测单元的有效像素尺寸相匹配光学系统。该方法和光学系统在其简单光路中是有利的，通过该光学系统，机械结构精度被最小化，这有助于和增强不同图像感测单元的制造商使用散斑图案来确定光学系统已经移动了多远，并且在哪个方向上移动了

4. 发明授权

US08082524B2 Mask patterns for use in multiple-exposure lithography 有权
标题翻译：用于多曝光光刻的掩模图案
公开(公告)号：US08082524B2
公开(公告)日：2011-12-20
申请号：US12423686
申请日：2009-04-14
申请人： Robert P. Gleason , Timothy Lin , Andrew J. Moore , Bennett W. Olson , Paul Rissman
发明人： Robert P. Gleason , Timothy Lin , Andrew J. Moore , Bennett W. Olson , Paul Rissman
IPC分类号： G06F17/50
CPC分类号： G03F7/70466 , G03F1/70
摘要： A method for determining mask patterns to be used on photo-masks in a multiple-exposure photolithographic process is described. During the method, an initial mask pattern, which is intended for use in a single-exposure photolithographic process, and a target pattern that is to be printed are used to determine a first mask pattern and a second mask pattern, which are intended for use in the multiple-exposure photolithographic process. In particular, the first mask pattern includes a first feature and the second mask pattern includes a second feature, and the first feature and the second feature overlap an intersection between features in the initial mask pattern. Moreover, the first mask pattern and the second mask pattern have at least one decreased spatial frequency relative to the initial mask pattern along at least one direction in the initial mask pattern.
摘要翻译：描述了一种用于确定在多曝光光刻工艺中用于光掩模的掩模图案的方法。在该方法期间，用于单曝光光刻工艺中使用的初始掩模图案和待印刷的目标图案用于确定预期使用的第一掩模图案和第二掩模图案在多曝光光刻工艺中。特别地，第一掩模图案包括第一特征，第二掩模图案包括第二特征，并且第一特征和第二特征与初始掩模图案中的特征之间的交点重叠。此外，第一掩模图案和第二掩模图案在初始掩模图案中沿着至少一个方向具有相对于初始掩模图案的至少一个减小的空间频率。

5. 发明申请

US20090077526A1 Write-Pattern Determination for Maskless Lithography 失效
公开(公告)号：US20090077526A1
公开(公告)日：2009-03-19
申请号：US12206651
申请日：2008-09-08
申请人： Daniel S. Abrams , Timothy Lin
发明人： Daniel S. Abrams , Timothy Lin
IPC分类号： G06F17/50
CPC分类号： G03F7/70291 , G03F7/70116 , G03F7/70508
摘要： A method for generating a write pattern to be used in a maskless-lithography process is described. During the method, a computer system determines a one-to-one correspondence between pixels in the write pattern and at least a subset of elements in a spatial-light modulator used in the maskless-lithography process. Furthermore, the computer system generates the write pattern. Note that the write pattern includes features corresponding to at least the subset of elements in the spatial-light modulator, and the generating is in accordance with a characteristic dimension of an element in the spatial-light modulator and a target pattern that is to be printed on a semiconductor wafer during the maskless-lithography process.

6. 发明授权

US07324089B2 Optical device for optical mouse 失效
标题翻译：光电鼠标光学装置
公开(公告)号：US07324089B2
公开(公告)日：2008-01-29
申请号：US10856761
申请日：2004-06-01
申请人： Timothy Lin , Yu-Min Lin
发明人： Timothy Lin , Yu-Min Lin
IPC分类号： G09G5/08
CPC分类号： G06F3/03543
摘要： The present invention relates to an improved optical device for optical mouse, being installed inside the case body of the optical mouse, comprising: a LED, a lens mount, a sensor and a digital signal processor. That is, instead of using the LED, the LED assembly clip, the positioning holes and the lens mount, which are separated from and independent to one another, for fixing the LED inside the optical mouse, the present invention uses a combined device featuring fool-proof, and positioning-insetting-all-in-one concept can place the LED precisely at the first lens of the lens mount and is capable of installing the LED accurately onto the lens mount and the same time rapidly and effectively adjusting and fixing the relative angle and position as seen in FIG. 6 between the lens mount and the LED. Moreover, the combined device is easy to positioned such that the forgoing shortcomings of high manufacturing cost and difficult to mass-produced are avoided.
摘要翻译：本发明涉及一种改进的光学鼠标光学装置，其安装在光学鼠标的壳体内，包括：LED，透镜座，传感器和数字信号处理器。也就是说，代替使用LED组件夹，定位孔和透镜座，它们彼此分开并且彼此独立，用于将LED固定在光学鼠标内部，本发明使用具有傻瓜的组合装置可以将LED精确地放置在镜头座的第一个镜头上，并且可以将LED精确地安装到镜头座上，同时快速有效地调整和固定LED 相对角度和位置，如中所示。 6 在透镜安装座和LED之间。此外，组合装置易于定位，从而避免了高制造成本和难以批量生产的缺点。

7. 发明申请

US20050264532A1 Optical device for optical mouse 失效
标题翻译：光电鼠标光学装置
公开(公告)号：US20050264532A1
公开(公告)日：2005-12-01
申请号：US10856761
申请日：2004-06-01
申请人： Timothy Lin , Yu-Min Lin
发明人： Timothy Lin , Yu-Min Lin
IPC分类号： G06F3/033 , G09G5/08
CPC分类号： G06F3/03543
摘要： The present invention relates to an improved optical device for optical mouse, being installed inside the case body of the optical mouse, comprising: a LED, a lens mount, a sensor and a digital signal processor. That is, instead of using the LED, the LED assembly clip, the positioning holes and the lens mount, which are separated from and independent to one another, for fixing the LED inside the optical mouse, the present invention uses a combined device featuring fool-proof, and positioning-insetting-all-in-one concept can place the LED precisely at the first lens of the lens mount and is capable of installing the LED accurately onto the lens mount and the same time rapidly and effectively adjusting and fixing the relative angle and position as seen in FIG. 6 between the lens mount and the LED. Moreover, the combined device is easy to positioned such that the forgoing shortcomings of high manufacturing cost and difficult to mass-produced are avoided
摘要翻译：本发明涉及一种改进的光学鼠标光学装置，其安装在光学鼠标的壳体内，包括：LED，透镜座，传感器和数字信号处理器。也就是说，代替使用LED组件夹，定位孔和透镜座，它们彼此分开并且彼此独立，用于将LED固定在光学鼠标内部，本发明使用具有傻瓜的组合装置可以将LED精确地放置在镜头座的第一个镜头上，并且可以将LED精确地安装到镜头座上，同时快速有效地调整和固定LED 相对角度和位置，如中所示。 6 在透镜安装座和LED之间。此外，组合装置易于定位，从而避免了高制造成本和难以批量生产的缺点

8. 发明申请

US20050127390A1 LED package 审中-公开
标题翻译： LED封装
公开(公告)号：US20050127390A1
公开(公告)日：2005-06-16
申请号：US10760396
申请日：2004-01-21
申请人： Timothy Lin , Cheng-I Lin
发明人： Timothy Lin , Cheng-I Lin
IPC分类号： H01L33/54 , H01L33/00
CPC分类号： H01L33/54 , H01L2224/48091 , H01L2224/48247 , H01L2924/181 , H01L2924/00012 , H01L2924/00014
摘要： An improved LED package comprises a first stand, a second stand, an LED chip, an epoxy packaging object, wherein the first stand further comprises a concave bowl section, and a first pin is extended from the bottom of the first stand, and a second stand is disposed adjacent to the first stand and keeps a certain distance from the first stand. The LED chip is disposed in the bowl section at the top of the first stand, and the anode of the LED chip makes use of a conductive metal wire to electrically connect the second stand. The epoxy packaging object encapsulates the first stand, second stand, and LED chip inside and just leaves the first and second pins exposed. A plane perpendicular to the optical path of the light emitted by the LED chip is disposed on the top surface of the packaging object, and the top surface has more than one circular protrusion to achieve the objective of enhancing the brightness and uniformity of luminescence.
摘要翻译：一种改进的LED封装包括第一支架，第二支架，LED芯片，环氧树脂封装物体，其中第一支架还包括凹形凹槽部分，并且第一引脚从第一支架的底部延伸，第二支架支架设置在与第一支架相邻并且与第一支架保持一定距离。 LED芯片设置在第一支架的顶部的碗部中，并且LED芯片的阳极利用导电金属线来电连接第二支架。环氧树脂包装物体将第一支架，第二支架和LED芯片封装在内部，并使第一和第二引脚暴露。垂直于由LED芯片发射的光的光路的平面设置在包装物体的顶表面上，并且顶表面具有多于一个的圆形突起，以达到增强发光的亮度和均匀性的目的。

9. 发明申请

US20060200211A1 Cosmetic light therapy system 审中-公开
标题翻译：化妆灯治疗系统
公开(公告)号：US20060200211A1
公开(公告)日：2006-09-07
申请号：US11124230
申请日：2005-05-09
申请人： Timothy Lin
发明人： Timothy Lin
IPC分类号： A61N5/06
CPC分类号： A61N5/0613 , A61N2005/0651
摘要： The present invention discloses an improve cosmetic light therapy system having a light source of cosmetic and therapeutic capability, that can generate coherent light or noncoherent light and can directly focus the coherent/noncoherent light to radiate uniformly on a reasonably defined area, wherein the light source is an array of a plural sets of light emitting devices configured in a matrix of various shape and size, and each set of light emitting device is composed of two paired light emitting elements integrated and aligned in an inclined manner on a Printed Circuit Board (PCB) for controlling the phases and adjusting the discharging angles of the lights emitting from the two light emitting elements.
摘要翻译：本发明公开了一种具有化妆品和治疗能力的光源的改进的美容光疗系统，其可以产生相干光或非相干光，并且可以直接聚焦相干/非相干光以均匀地辐射在合理限定的区域上，其中光源是配置成各种形状和大小的矩阵的多组发光器件的阵列，并且每组发光器件由两个成对的发光元件组成，这两个发光元件在印刷电路板（PCB）上以倾斜的方式集成和对准），用于控制相位并调节从两个发光元件发射的光的放电角度。

10. 发明授权

US08245162B2 Write-pattern determination for maskless lithography 失效
公开(公告)号：US08245162B2
公开(公告)日：2012-08-14
申请号：US12206651
申请日：2008-09-08
申请人： Daniel S. Abrams , Timothy Lin
发明人： Daniel S. Abrams , Timothy Lin
IPC分类号： G06F17/50
CPC分类号： G03F7/70291 , G03F7/70116 , G03F7/70508
摘要： A method for generating a write pattern to be used in a maskless-lithography process is described. During the method, a computer system determines a one-to-one correspondence between pixels in the write pattern and at least a subset of elements in a spatial-light modulator used in the maskless-lithography process. Furthermore, the computer system generates the write pattern. Note that the write pattern includes features corresponding to at least the subset of elements in the spatial-light modulator, and the generating is in accordance with a characteristic dimension of an element in the spatial-light modulator and a target pattern that is to be printed on a semiconductor wafer during the maskless-lithography process.

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