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    • 4. 发明授权
    • Plasma-enhanced flash process
    • 等离子体增强闪光过程
    • US5869401A
    • 1999-02-09
    • US780099
    • 1996-12-20
    • Paul E. BrunemeierThomas Miu
    • Paul E. BrunemeierThomas Miu
    • H01L21/00
    • H01J37/32449H01J37/32862
    • A method in a plasma processing chamber, the chamber being employed for processing a substrate, for removing corrosive species from the plasma processing chamber after the substrate is processed. The method includes introducing a flash source gas comprising an oxidizing agent such as oxygen into the plasma processing chamber. The method further includes performing, a flash process, including striking a plasma in the plasma processing chamber with the flash source gas, thereby permitting oxygen species in the plasma to reduce a concentration of the corrosive species in the plasma processing chamber.
    • 等离子体处理室中的方法,该室用于处理基板,用于在处理基板之后从等离子体处理室中去除腐蚀物质。 该方法包括将包含氧化剂如氧气的闪光源气体引入等离子体处理室。 该方法还包括执行闪光处理,其包括用闪光源气体击打等离子体处理室中的等离子体,从而允许等离子体中的氧物质降低等离子体处理室中的腐蚀物质的浓度。