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1. 发明授权

US07812930B2 Lithographic apparatus and device manufacturing method using repeated patterns in an LCD to reduce datapath volume 有权
标题翻译：平版印刷设备和设备制造方法，使用LCD中的重复图案来减少数据路径的体积
公开(公告)号：US07812930B2
公开(公告)日：2010-10-12
申请号：US11084866
申请日：2005-03-21
申请人： Theodorus Leonardus Van Den Akker , Martinus Hendricus Hendricus Hoeks , Pieter Willem Herman De Jager , Lambertus Gerardus Maria Kessels , Marco Cornelis Jacobus Martinus Van Hassel , Frank Anton Morselt
发明人： Theodorus Leonardus Van Den Akker , Martinus Hendricus Hendricus Hoeks , Pieter Willem Herman De Jager , Lambertus Gerardus Maria Kessels , Marco Cornelis Jacobus Martinus Van Hassel , Frank Anton Morselt
IPC分类号： G03B27/32
CPC分类号： G03F7/70291 , G03F7/70508
摘要： A method and device for programming an array of individually controllable elements configured to impart a beam with a pattern. For example, the method can be suitable for use in a lithographic apparatus. The method includes generating first data representing a first pattern, generating second data representing a second pattern, writing the first data to a first buffer, and reading the first data from the first buffer to program the array of individually controllable elements to display the first pattern, while writing the second data to a second buffer in parallel.
摘要翻译：用于对被配置为赋予光束的图案的独立可控元件的阵列的编程的方法和装置。例如，该方法可适用于光刻设备。该方法包括产生表示第一图案的第一数据，产生表示第二图案的第二数据，将第一数据写入第一缓冲器，以及从第一缓冲器读取第一数据以对独立可控元件阵列进行编程以显示第一图案同时将第二数据并行地写入第二缓冲器。

2. 发明授权

US07209216B2 Lithographic apparatus and device manufacturing method utilizing dynamic correction for magnification and position in maskless lithography 有权
标题翻译：平版印刷设备和设备制造方法利用无掩模光刻术中的放大和位置的动态校正
公开(公告)号：US07209216B2
公开(公告)日：2007-04-24
申请号：US11089539
申请日：2005-03-25
申请人： Pieter Willem Herman De Jager , Theodorus Leonardus Van Den Akker , Willem Jurrianus Venema , Wouter Frans Willem Mulckhuyse , Lambertus Gerardus Maria Kessels
发明人： Pieter Willem Herman De Jager , Theodorus Leonardus Van Den Akker , Willem Jurrianus Venema , Wouter Frans Willem Mulckhuyse , Lambertus Gerardus Maria Kessels
IPC分类号： G03B27/42 , G03B27/54
CPC分类号： G03F7/70291 , G03F7/70508
摘要： A lithographic apparatus in which a size and/or a position of features formed on a substrate are adjusted by adjusting an intensity of radiation at boundaries of pattern features.
摘要翻译：其中通过调节图案特征边界处的辐射强度来调节形成在基底上的特征的尺寸和/或位置的光刻设备。

3. 发明授权

US07016016B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07016016B2
公开(公告)日：2006-03-21
申请号：US10875530
申请日：2004-06-25
申请人： Robert-Han Munnig Schmidt , Pieter Willem Herman De Jager , Theodorus Leonardus Van Den Akker
发明人： Robert-Han Munnig Schmidt , Pieter Willem Herman De Jager , Theodorus Leonardus Van Den Akker
IPC分类号： G03B27/42 , G03B27/52 , G03B27/58
CPC分类号： G03F7/7085 , G03B27/58 , G03F7/70758 , G03F7/70775 , G03F7/70791 , G03F7/70816 , G03F9/708 , G03F9/7084 , G03F9/7088
摘要： A lithographic apparatus patterns a projection beam of radiation using a patterning system. A substrate is supported on a substrate table and the patterned beam is projected onto the substrate on the table. A substrate displacement control system displaces the substrate relative to the table and the projection system in a predetermined direction, such that the patterned beam is scanned across the substrate. The position of the substrate relative to the table and the patterned beam is determined by the displacement control system. The displacement control system comprises at least one component that is displaceable with the substrate and a positioning apparatus to place that component in contact with the substrate, such that the component is displaced with the substrate as the projection beam is scanned across the substrate and such that the component is lifted from the substrate after the projection beams has been scanned across the substrate. The component could be, for example, an elongate strip carrying alignment marks or a magnet which is used to apply a displacement force to the substrate.
摘要翻译：光刻设备使用图案化系统对辐射投影束进行图案化。衬底被支撑在衬底台上，并且将图案化的光束投影到桌子上的衬底上。基板位移控制系统使基板相对于工作台和投影系统沿预定方向移位，使得图案化的光束跨过基板扫描。基板相对于工作台和图案化梁的位置由位移控制系统确定。位移控制系统包括至少一个可与衬底移位的部件和定位装置以使该部件与衬底接触，使得当投影束跨过衬底扫描时，该部件与衬底一起移位，并且使得在投影光束被扫描穿过基板之后，该部件被从基板提升。组件可以是例如带有对准标记的细长带或用于向基板施加位移力的磁体。

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