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    • 4. 发明申请
    • SPUTTERING APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD
    • 溅射装置和电子装置制造方法
    • US20110147199A1
    • 2011-06-23
    • US12842264
    • 2010-07-23
    • Tetsuya OHISHIYu FUJIMOTO
    • Tetsuya OHISHIYu FUJIMOTO
    • C23C14/34
    • C23C14/02C23C14/34C23C14/564H01J37/34H01J37/3447
    • A sputtering apparatus comprises a substrate holder, and a screening member configured to screen a substrate mount surface of a surface of the substrate holder. The screening member comprises a first screening member configured to rotate about an axis in a first direction perpendicular to the substrate mount surface and screen at least a first area, and a second screening member configured to rotate about the axis and screen at least a second area. The first and second screening members are configured to be rotated to move between a screening position at which the first screening member screens at least the first area and the second screening member screens at least the second area and a retreat position at which the first and second screening members retract from an area above the substrate mount surface and overlap each other.
    • 溅射装置包括衬底保持器和被构造成筛选衬底保持器的表面的衬底安装表面的屏蔽构件。 所述屏蔽构件包括第一屏蔽构件,所述第一屏蔽构件被构造成围绕垂直于所述基板安装表面的第一方向的轴线旋转,并且至少屏蔽所述第一区域,以及第二屏蔽构件,所述第二屏蔽构件被配置为围绕所述轴线和屏幕旋转至少第二区域 。 第一和第二筛选构件被构造成旋转以在筛选位置之间移动,筛选位置,第一筛选构件至少筛选第一区域和第二筛选构件筛选至少第二区域和退回位置,第一和第二筛选构件 屏蔽构件从衬底安装表面上方的区域缩回并且彼此重叠。
    • 6. 发明授权
    • Sputtering apparatus and electronic device manufacturing method
    • 溅射装置和电子装置制造方法
    • US08652309B2
    • 2014-02-18
    • US12842264
    • 2010-07-23
    • Tetsuya OhishiYu Fujimoto
    • Tetsuya OhishiYu Fujimoto
    • C23C14/34
    • C23C14/02C23C14/34C23C14/564H01J37/34H01J37/3447
    • A sputtering apparatus comprises a substrate holder, and a screening member configured to screen a substrate mount surface of a surface of the substrate holder. The screening member comprises a first screening member configured to rotate about an axis in a first direction perpendicular to the substrate mount surface and screen at least a first area, and a second screening member configured to rotate about the axis and screen at least a second area. The first and second screening members are configured to be rotated to move between a screening position at which the first screening member screens at least the first area and the second screening member screens at least the second area and a retreat position at which the first and second screening members retract from an area above the substrate mount surface and overlap each other.
    • 溅射装置包括衬底保持器和被构造成筛选衬底保持器的表面的衬底安装表面的屏蔽构件。 所述屏蔽构件包括第一屏蔽构件,所述第一屏蔽构件被构造成围绕垂直于所述基板安装表面的第一方向的轴线旋转,并且至少屏蔽所述第一区域,以及第二屏蔽构件,所述第二屏蔽构件被配置成围绕所述轴线和屏幕旋转, 。 第一和第二屏蔽构件被构造成旋转以在第一屏蔽构件至少屏蔽第一区域和第二屏蔽构件屏蔽至少第二区域的屏蔽位置和第一和第二屏蔽构件的退避位置之间移动, 屏蔽构件从衬底安装表面上方的区域缩回并且彼此重叠。