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    • 2. 发明授权
    • Method and apparatus for pressure swing adsorption
    • 用于变压吸附的方法和装置
    • US07824472B2
    • 2010-11-02
    • US12084622
    • 2006-02-23
    • Tatsushi Urakami
    • Tatsushi Urakami
    • B01D59/26
    • B01D53/053B01D53/0423B01D53/0446B01D2253/102B01D2253/108B01D2256/10B01D2256/12B01D2256/18B01D2257/11B01D2258/0216B01D2259/40054B01D2259/40079B01D2259/40081B01D2259/402B01D2259/41C01B23/0063C01B23/0068C01B2210/0035C01B2210/0037C01B2210/0042C01B2210/0045C01B2210/0046C01B2210/0053C01B2210/0082
    • In order to provide a new PSA method which can concentrate simultaneously a strong adsorbate such as xenon and a weak adsorbate such as nitrogen in a high concentration with a high recovery percentage when highly valuable gas such as xenon and krypton contained in the exhaust gas from a semiconductor manufacturing equipment, etc. is recovered in a high concentration with a high recovery percentage, the present invention provides a new PSA method in which the method uses a separation apparatus comprising a lower column and a upper column which are filled with an adsorbent, a material gas storage tank for storing the material gas to be introduced into the lower column, a strong adsorbate storage tank for storing a main component which is easily adsorbed by the adsorbent, and a compressor, and the strong adsorbate which is easily adsorbed by the adsorbent and the weak adsorbate which is not readily adsorbed by the adsorbent are recovered, wherein the method comprises an (a) adsorption step, (b) rinse step, (c) low column depressurization step, (d) upper column depressurization step, and (e) purge step sequentially repeated based on a predetermined sequence.
    • 为了提供一种新的PSA方法,其可以同时浓缩强吸附物质,如氙气和弱吸附物质如氮气,高回收率的高浓度,当废气中含有诸如氙气和氪气的高价值气体时, 半导体制造装置等以高回收率高回收率,本发明提供了一种新的PSA方法,其中该方法使用包含填充有吸附剂的下塔和上塔的分离装置, 用于储存待引入下塔的原料气体的原料气体储罐,用于储存容易被吸附剂吸附的主要成分的强吸附物储存罐和压缩机,以及容易被吸附剂吸附的强吸附物质 并且回收不容易被吸附剂吸附的弱吸附物质,其中该方法包括(a)吸附剂 p,(b)冲洗步骤,(c)低塔减压步骤,(d)上塔减压步骤,和(e)基于预定顺序顺序重复的吹扫步骤。