会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 4. 发明授权
    • Method for generating wiring pattern data
    • 生成布线图案数据的方法
    • US08495549B2
    • 2013-07-23
    • US13483844
    • 2012-05-30
    • Takashi MaruyamaShinji Sugatani
    • Takashi MaruyamaShinji Sugatani
    • G06F17/50
    • H01J37/3174B82Y10/00B82Y40/00H01J2237/31761H01J2237/31764H01J2237/31776
    • A method includes connecting in a wiring area a plurality of basic block patterns which include a plurality of track patterns extending to one direction and being disposed at a prescribed pitch in an intersection direction intersecting the one direction to generate a plurality of parallel wiring patterns, each of which includes the track patterns connected together; generating a wiring route running on a track pattern; cutting away a track pattern terminal end, on which no wiring route runs, out of track pattern terminal ends of a track pattern including a route end of the wiring route and an adjacent track pattern connected to a track pattern start end of the track pattern concerned; and generating a wiring pattern data including a block pattern identifier corresponding to a basic block pattern out of the basic block patterns in the wiring area and a layout position of the basic block pattern.
    • 一种方法包括在布线区域中连接多个基本块图案,所述多个基本块图案包括延伸到一个方向的多个轨迹图案,并且以与所述一个方向交叉的交叉方向以规定间距布置以​​产生多个平行布线图案, 其中包括连接在一起的轨迹图案; 产生在轨道图案上运行的布线路线; 在包括布线路径的路线端的轨迹图案的轨迹图案终端之外,切断没有布线路径的轨道图案终端,以及连接到所述轨道图案的轨道图案开始端的相邻轨道图案 ; 以及生成包括与布线区域中的基本块图案相对应的基本块图案的块图案标识符和基本块图案的布局位置的布线图案数据。
    • 8. 发明申请
    • STEAM TURBINE, POWER PLANT AND METHOD FOR OPERATING STEAM TURBINE
    • 蒸汽涡轮机,动力装置和运行蒸汽涡轮机的方法
    • US20120137687A1
    • 2012-06-07
    • US13171559
    • 2011-06-29
    • Takashi MARUYAMA
    • Takashi MARUYAMA
    • F01K13/00
    • F01D1/04F01D3/02F01D13/02F01K7/38F05D2220/31
    • The steam turbine 1 includes the high-and-intermediate pressure turbine 2 of the single flow type, the intermediate-pressure turbine 4 of the single flow type, and the steam passage 6 that communicates a location on a part way of the steam flow inside the high-and-intermediate pressure turbine 2, to the steam inlet of the intermediate-pressure turbine 4. The high-and-intermediate pressure turbine 2 includes the high-pressure part 2A on the steam inlet side and the intermediate-pressure part 2B on the steam outlet side. The steam passage 6 feeds a part of the steam having passed through the high-pressure part 2A, from the location between the high-pressure part 2A and the intermediate-pressure part 2B, to the intermediate-pressure turbine 4.
    • 蒸汽轮机1包括单流型的高中压的压力涡轮机2,单流式的中压涡轮机4和将内部的蒸汽流的一部分的位置连通的蒸汽通道6 高压和中压汽轮机2连接到中压汽轮机4的蒸汽入口。高压和中压汽轮机2包括蒸汽入口侧的高压部分2A和中压部分2B的高压部分 在蒸汽出口侧。 蒸汽通道6将通过高压部分2A的蒸汽的一部分从高压部分2A和中间压力部分2B之间的位置供给到中压涡轮机4。
    • 10. 发明申请
    • Semiconductor wafer, semiconductor device, and method of manufacturing semiconductor device
    • 半导体晶片,半导体器件以及半导体器件的制造方法
    • US20070222089A1
    • 2007-09-27
    • US11798811
    • 2007-05-17
    • Takashi Maruyama
    • Takashi Maruyama
    • H01L23/544
    • H01J37/3045H01J2237/31754H01L23/544H01L2223/54426H01L2223/54453H01L2223/5446H01L2223/5448H01L2924/0002H01L2924/00
    • Disclosed are a semiconductor wafer, a semiconductor device, and a method of manufacturing the semiconductor device, which are capable of easily carrying out an alignment between a semiconductor substrate and an electron beam exposure apparatus. There is provided a method including steps of: forming an interlayer insulating film 25 on a gate electrode 17a and a conductive film 17, as well as in a first opening 17b; forming in the interlayer insulating film 25 a second opening 25a including the first opening 17b; forming a hole 14a in an element isolation insulating film 14 under the first opening 17b; by use of the first opening 17b and the hole 14a as an alignment mark 27 used for the alignment in a state where a resist 28 is applied, measuring an intensity of a reflected electron EBref from the alignment mark 27, thus aligning the electron beam exposure apparatus with the semiconductor substrate 10; exposing with an electron beam EB the resist 28 existing in a hole formation region of a first region I; and developing the resist 28 to make a resist pattern 28e.
    • 公开了能够容易地进行半导体基板和电子束曝光装置之间的取向的半导体晶片,半导体装置和半导体装置的制造方法。 提供了一种方法,包括以下步骤:在栅极电极17a和导电膜17以及第一开口17b中形成层间绝缘膜25; 在层间绝缘膜25中形成包括第一开口17b的第二开口25a; 在第一开口17b下的元件隔离绝缘膜14中形成孔14a; 通过使用第一开口17b和孔14a作为用于在施加抗蚀剂28的状态下进行取向的对准标记27,从反射电极EB