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    • 8. 发明授权
    • Processes and apparatus having a semiconductor fin
    • 具有半导体散热片的方法和装置
    • US08154081B2
    • 2012-04-10
    • US13017854
    • 2011-01-31
    • Mark FischerT. Earl AllenH. Montgomery Manning
    • Mark FischerT. Earl AllenH. Montgomery Manning
    • H01L27/12
    • H01L29/785H01L29/66818H01L29/7853Y10S438/947
    • A process may include first etching a trench isolation dielectric through a dielectric hard mask that abuts the sidewall of a fin semiconductor. The first etch can be carried out to expose at least a portion of the sidewall, causing the dielectric hard mask to recede to a greater degree in the lateral direction than the vertical direction. The process may include second etching the fin semiconductor to achieve a thinned semiconductor fin, which has receded beneath the shadow of the laterally receded hard mask. The thinned semiconductor fin may have a characteristic dimension that can exceed photolithography limits. Electronic devices may include the thinned semiconductor fin as part of a field effect transistor.
    • 工艺可以包括首先通过与散热片半导体的侧壁邻接的电介质硬掩模蚀刻沟槽隔离电介质。 可以执行第一蚀刻以暴露侧壁的至少一部分,使得电介质硬掩模在横向方向上比垂直方向更大程度地退回。 该方法可以包括第二蚀刻鳍式半导体以实现减薄的半导体鳍片,其已经在横向后退的硬掩模的阴影之下退化。 减薄的半导体鳍片可以具有可超过光刻极限的特征尺寸。 电子器件可以包括作为场效应晶体管的一部分的变薄的半导体鳍片。