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1. 发明授权

US4828874A Laser surface treatment method and apparatus for practicing same 失效
标题翻译：激光表面处理方法及其设备
公开(公告)号：US4828874A
公开(公告)日：1989-05-09
申请号：US46166
申请日：1987-05-05
申请人： Susumu Hiraoka , Keizo Suzuki , Shigeru Nishimatsu
发明人： Susumu Hiraoka , Keizo Suzuki , Shigeru Nishimatsu
IPC分类号： H01L21/302 , C23C16/48 , H01L21/3213
CPC分类号： H01L21/32137 , C23C16/483
摘要： A surface treatment method, wherein gas particles are applied to a solid surface of a substrate to treat the same surface, comprising the step of applying to the gas particles the narrow line width laser light capable of exciting or decomposing only such gas particles that have velocities in a predetermined range.
摘要翻译：一种表面处理方法，其中将气体颗粒施加到基材的固体表面以处理相同的表面，包括向气体颗粒施加能够仅激发或分解具有速度的气体颗粒的窄线宽度激光的步骤在预定范围内。

2. 发明授权

US06662115B2 Method for comparison of DNA base sequences 失效
标题翻译： DNA碱基序列比较方法
公开(公告)号：US06662115B2
公开(公告)日：2003-12-09
申请号：US09050010
申请日：1998-03-30
申请人： Keiichi Nagai , Ryotaro Irie , Susumu Hiraoka , Naoko Kasahara
发明人： Keiichi Nagai , Ryotaro Irie , Susumu Hiraoka , Naoko Kasahara
IPC分类号： G06F1900
CPC分类号： G06F19/22
摘要： A method for comparing DNA base sequences by comparing similarities between two amino acid sequences translated from two DNA base sequences, respectively, includes (1) a step of dividing each of the first DNA base sequence and the second DNA base sequence into groups of successive three nucleotides each, translating each of these groups of nucleotides into an amino acid, and thereby obtaining a first amino acid sequence and a second amino acid sequence, and (2) a step of determining similarities between each amino acid of the first translated amino acid sequence and each amino acid of the second translated amino acid sequence in view of nucleotide insertions or deletions in the first and second DNA base sequence and amino acid insertions or deletions in the first and second translated amino acid sequence. The method is repeated by shifting the base sequences one base at a time.
摘要翻译：通过比较分别从两个DNA碱基序列翻译的两个氨基酸序列之间的相似性来比较DNA碱基序列的方法包括（1）将第一DNA碱基序列和第二DNA碱基序列中的每一个分成连续三个组的步骤核苷酸各自将这些核苷酸组中的每一个转化成氨基酸，从而获得第一氨基酸序列和第二氨基酸序列，和（2）确定第一翻译氨基酸序列的每个氨基酸之间的相似性的步骤考虑到第一和第二DNA碱基序列中的核苷酸插入或缺失以及第一和第二翻译氨基酸序列中的氨基酸插入或缺失，第二翻译氨基酸序列的每个氨基酸。通过一次移位一个碱基来重复该方法。

3. 发明授权

US5401357A Dry etching method 失效
标题翻译：干蚀刻法
公开(公告)号：US5401357A
公开(公告)日：1995-03-28
申请号：US937781
申请日：1992-09-01
申请人： Hidekazu Okuhira , Tetsuo Ono , Susumu Hiraoka , Keizo Suzuki , Junji Shigeta , Hiroshi Masuda , Mitsuhiro Mori , Takuma Tanimoto , Shinichi Nakatsuka , Katsuhiko Mitani
发明人： Hidekazu Okuhira , Tetsuo Ono , Susumu Hiraoka , Keizo Suzuki , Junji Shigeta , Hiroshi Masuda , Mitsuhiro Mori , Takuma Tanimoto , Shinichi Nakatsuka , Katsuhiko Mitani
IPC分类号： H01L21/205 , H01L21/285 , H01L21/302 , H01L21/306 , H01L21/3065 , H01L21/308 , H01L21/316 , H01L21/331 , H01L21/335 , H01L21/338 , H01L29/205 , H01L29/73 , H01L29/737 , H01L29/778 , H01L29/812 , B44C1/22
CPC分类号： H01L29/66318 , H01L21/28587 , H01L21/30621 , H01L21/3081 , H01L21/31654 , H01L29/66462
摘要： A method may be used to dry etch a sample including a plurality of regions different from each other in the photo-absorption of a light having a specified wavelength using an etching gas plasma. The method is capable of selectively etching the desired material from a plurality of materials having different types of band gap energies or from a plurality of materials having different band gap energies. The method includes a step of irradiating a light having the specified wavelength on the sample for reducing an etching rate of a region having a large photo-absorption coefficient to the light, thereby selectively etching a region having a small photo-absorption coefficient to the light.
摘要翻译：在使用蚀刻气体等离子体对具有特定波长的光的光吸收中，可以使用一种方法来干蚀刻包括彼此不同的多个区域的样品。该方法能够从具有不同类型的带隙能量的多种材料或具有不同带隙能量的多种材料中选择性地蚀刻所需的材料。该方法包括在样品上照射具有特定波长的光以降低对光具有大的光吸收系数的区域的蚀刻速率的步骤，从而选择性地将具有小的光吸收系数的区域蚀刻到光。

4. 发明授权

US5108778A Surface treatment method 失效
标题翻译：表面处理方法
公开(公告)号：US5108778A
公开(公告)日：1992-04-28
申请号：US511946
申请日：1990-04-16
申请人： Keizo Suzuki , Susumu Hiraoka , Tatsumi Mizutani , Shigeru Nishimatsu
发明人： Keizo Suzuki , Susumu Hiraoka , Tatsumi Mizutani , Shigeru Nishimatsu
IPC分类号： C23C16/48 , C23F4/00 , C30B33/00
CPC分类号： C23C16/48 , C23F4/00 , C30B33/00
摘要： Disclosed are a surface treatment method and apparatus in which an active species beam that contains active species having translational energy in a range of 0.01-100 eV as at least a partial constituent thereof constructs at least a part of treatment means.

5. 发明授权

US4886571A Surface treatment and apparatus therefor 失效
标题翻译：表面处理及其设备
公开(公告)号：US4886571A
公开(公告)日：1989-12-12
申请号：US302334
申请日：1989-01-27
申请人： Keizo Suzuki , Susumu Hiraoka , Shigeru Nishimatsu
发明人： Keizo Suzuki , Susumu Hiraoka , Shigeru Nishimatsu
IPC分类号： H01L21/302 , C23C16/44 , C23C16/455 , H01L21/205 , H01L21/3065
CPC分类号： C23C16/45565 , C23C16/44 , C23C16/455 , C23C16/45591 , Y10S156/914
摘要： An apparatus for surface treating a sample article with activated particles, comprising a reaction chamber in which a sample article to be surface processed is placed, means for introducing a reaction gas into the reaction chamber, an activation surface properly set in the reaction chamber and arranged capable of activating at least one part of the particles composing the reaction gas, and means for evacuating the used reaction gas out of the reaction chamber.
摘要翻译：一种用于用活化颗粒表面处理样品的装置，包括其中放置待表面处理样品的反应室，用于将反应气体引入反应室的装置，适当地设置在反应室中的活化表面，能够活化至少一部分构成反应气体的粒子，以及将所使用的反应气体从反应室排出的装置。

6. 发明授权

US5505778A Surface treating apparatus, surface treating method and semiconductor device manufacturing method 失效
标题翻译：表面处理装置，表面处理方法及半导体装置的制造方法
公开(公告)号：US5505778A
公开(公告)日：1996-04-09
申请号：US730078
申请日：1991-07-15
申请人： Tetsuo Ono , Susumu Hiraoka , Sakae Saito , Kunio Harada , Mituhiro Tachibana , Shigeo Kubota , Keizo Suzuki
发明人： Tetsuo Ono , Susumu Hiraoka , Sakae Saito , Kunio Harada , Mituhiro Tachibana , Shigeo Kubota , Keizo Suzuki
IPC分类号： C23C16/44 , C23C16/452 , C23C16/455 , C23C16/54
CPC分类号： C23C16/452 , C23C16/4557 , Y10S438/974
摘要： An apparatus for treating solid surface using a thermally excited molecular beam according to the present invention is capable of completely preventing flying of contaminant caused by a heating source to a sample. To achieve this, in the present invention, the heating source for exciting the molecules is hermetically separated from the sample. Alternatively, a container where the heating source is housed and a container where the sample is accommodated are separated such that a conductance between the two containers is sufficiently small. In this way, chemical reactions between the molecular beam of the reactive gas which is highly reactive and the heating source heated to high temperatures can be eliminated, and flying of the contaminant to the sample can thus be greatly reduced. As a result, flying of the contaminating substances caused by the heating source to the sample can be prevented, and reduction in the surface treating rate of the sample, caused by the contaminant, can be prevented.
摘要翻译：根据本发明的使用热激发分子束处理固体表面的设备能够完全防止由加热源引起的污染物飞溅到样品。为了实现这一点，在本发明中，用于激发分子的加热源与样品气密分离。或者，容纳加热源的容器和容纳样品的容器被分离，使得两个容器之间的电导足够小。以这种方式，可以消除高反应性的反应性气体的分子束与加热到高温的加热源之间的化学反应，从而大大减少污染物向样品的飞散。结果，可以防止由加热源引起的对样品的污染物质的飞溅，并且可以防止由污染物引起的样品表面处理速度的降低。

7. 发明授权

US5110407A Surface fabricating device 失效
标题翻译：表面加工装置
公开(公告)号：US5110407A
公开(公告)日：1992-05-05
申请号：US658399
申请日：1991-02-20
申请人： Tetsuo Ono , Susumu Hiraoka , Keizo Suzuki
发明人： Tetsuo Ono , Susumu Hiraoka , Keizo Suzuki
IPC分类号： C23F4/00 , H01L21/302 , H01L21/3065 , H01L21/308
CPC分类号： H01L21/3085 , H01L21/3065
摘要： Anisotropic etching can be obtained in the direction of the incident heated beam of reactive gas with the introduction of a second material for controlling reactivity.
摘要翻译：通过引入用于控制反应性的第二材料，可以在入射的加热的反应气体束的方向上获得各向异性蚀刻。

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