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1. 发明授权

US09158163B2 Display apparatus 有权
标题翻译：显示装置
公开(公告)号：US09158163B2
公开(公告)日：2015-10-13
申请号：US13942891
申请日：2013-07-16
申请人： Sung Hyuk Kim , Jin Suk Park
发明人： Sung Hyuk Kim , Jin Suk Park
IPC分类号： G02F1/1335 , G02F1/1333 , G02F1/1343 , G02F1/1337
CPC分类号： G02F1/134309 , G02F1/133514 , G02F1/133707 , G02F2001/134318
摘要： A display apparatus has a first display substrate including a pixel electrode, and a second display substrate facing the first display substrate and including a pixel region. The second display substrate includes an insulating substrate, a concave surface compensation pattern that is in the pixel region and that is on the insulating substrate, an overcoating layer covering the concave surface compensation pattern, and a common electrode that is on the overcoating layer and that has an aperture therein at a location corresponding to the concave surface compensation pattern.
摘要翻译：显示装置具有包括像素电极的第一显示基板和面对第一显示基板的包括像素区域的第二显示基板。第二显示基板包括绝缘基板，位于像素区域中且位于绝缘基板上的凹面补偿图案，覆盖凹面补偿图案的外涂层和位于外涂层上的公共电极，并且在与凹面补偿图案对应的位置处具有孔。

2. 发明申请

US20140022498A1 DISPLAY APPARATUS 有权
标题翻译：显示设备
公开(公告)号：US20140022498A1
公开(公告)日：2014-01-23
申请号：US13942891
申请日：2013-07-16
申请人： Sung Hyuk KIM , Jin Suk PARK
发明人： Sung Hyuk KIM , Jin Suk PARK
IPC分类号： G02F1/1343 , G02F1/1335
CPC分类号： G02F1/134309 , G02F1/133514 , G02F1/133707 , G02F2001/134318
摘要： A display apparatus has a first display substrate including a pixel electrode, and a second display substrate facing the first display substrate and including a pixel region. The second display substrate includes an insulating substrate, a concave surface compensation pattern that is in the pixel region and that is on the insulating substrate, an overcoating layer covering the concave surface compensation pattern, and a common electrode that is on the overcoating layer and that has an aperture therein at a location corresponding to the concave surface compensation pattern.
摘要翻译：显示装置具有包括像素电极的第一显示基板和面对第一显示基板的包括像素区域的第二显示基板。第二显示基板包括绝缘基板，位于像素区域中且位于绝缘基板上的凹面补偿图案，覆盖凹面补偿图案的外涂层和位于外涂层上的公共电极，并且在与凹面补偿图案对应的位置处具有孔。

3. 发明申请

US20070286776A1 OXIDIZING GAS PRESSURIZATION SYSTEM 审中-公开
标题翻译：氧气加压系统
公开(公告)号：US20070286776A1
公开(公告)日：2007-12-13
申请号：US11758440
申请日：2007-06-05
申请人： Chang-Jin Lee , Byoung-Ho Lee , Sung-Hyuk Kim
发明人： Chang-Jin Lee , Byoung-Ho Lee , Sung-Hyuk Kim
IPC分类号： G05D16/00
CPC分类号： C01B13/10 , C01B7/01
摘要： An oxidizing gas pressurization system capable of supplying protective cooling water into an oxidizing gas pressurization unit such that the protective cooling water serves as a protective film against strong oxidizing power and cools the heat generated in the pressurization unit is disclosed. The oxidizing gas pressurization system for pressurizing and supplying an oxidizing gas such as ozone and chlorine includes an oxidizing gas storage unit, an oxidizing gas pressurization unit for pressurizing the oxidizing gas supplied from the oxidizing gas storage unit at a high pressure and discharging the oxidizing gas, and a cooling water supply unit for supplying protective cooling water serving as a protective film against the oxidizing pas supplied into the oxidizing gas pressurization unit.
摘要翻译：公开了一种氧化气体加压系统，其能够将保护性冷却水供给到氧化剂气体加压装置中，使得保护性冷却水用作防止强氧化能力的保护膜并冷却加压单元中产生的热量。用于对臭氧和氯气等氧化性气体进行加压供给的氧化剂气体加压系统包括氧化气体储存单元，氧化气体加压单元，用于对从氧化剂气体储存单元供给的氧化气体进行高压加压并排出氧化气体以及冷却水供给单元，其供给用作保护膜的保护性冷却水，抵抗供给到氧化剂气体加压单元中的氧化气体。

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