专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20080279674A1 OPERATIVE METHOD OF A MANUFACTURING SYSTEM 审中-公开
标题翻译：制造系统的操作方法
公开(公告)号：US20080279674A1
公开(公告)日：2008-11-13
申请号：US12177326
申请日：2008-07-22
申请人： Yao-I Tung , Yu-Jen Tsai , Wei-Liang Lee , Ching-Hsiang Chang , Sung-Hsing Yeh
发明人： Yao-I Tung , Yu-Jen Tsai , Wei-Liang Lee , Ching-Hsiang Chang , Sung-Hsing Yeh
IPC分类号： B65H1/00
CPC分类号： H01L21/67225 , H01L21/67173
摘要： An operative method of a manufacturing system for processing a substrate is provided. The manufacturing system includes at least a handling system, two deposition apparatus groups, an etching apparatus group, a photolithography apparatus group and two photoresist-striping apparatus groups. The handling system has a plurality of handling paths comprising at least two connected ring paths, which are connected in a common path. These deposition apparatus groups and the photoresist-striping apparatus groups are located on the two ring paths respectively. The etching apparatus group is located on the common path. The photolithography apparatus group is located on the two ring paths between the two deposition apparatus groups. The manufacturing system of the present invention thus combines the advantages of the group-type manufacturing system and the continuous-type manufacturing system.
摘要翻译：提供了一种用于处理衬底的制造系统的操作方法。制造系统至少包括处理系统，两个沉积装置组，蚀刻装置组，光刻装置组和两个光刻胶剥离装置组。处理系统具有包括至少两个连接的环路的多个处理路径，其连接在公共路径中。这些沉积装置组和光刻胶剥离装置组分别位于两个环路上。蚀刻装置组位于公共路径上。光刻设备组位于两个沉积设备组之间的两个环路上。因此，本发明的制造系统结合了组型制造系统和连续型制造系统的优点。

2. 发明申请

US20060182542A1 Manufacturing system and operative method thereof 审中-公开
标题翻译：制造系统及其操作方法
公开(公告)号：US20060182542A1
公开(公告)日：2006-08-17
申请号：US11165640
申请日：2005-06-23
申请人： Yao-I Tung , Yu-Jen Tsai , Wei-Liang Lee , Ching-Hsiang Chang , Sung-Hsing Yeh
发明人： Yao-I Tung , Yu-Jen Tsai , Wei-Liang Lee , Ching-Hsiang Chang , Sung-Hsing Yeh
IPC分类号： H01L21/677
CPC分类号： H01L21/67225 , H01L21/67173
摘要： A manufacturing system is provided. The manufacturing system includes at least a handling system, two deposition apparatus groups, an etching apparatus group, a photolithography apparatus group and two photoresist-striping apparatus groups. The handling system has a plurality of handling paths comprising at least two connected ring paths, which are connected in a common path. These deposition apparatus groups and the photoresist-striping apparatus groups are located on the two ring paths respectively. The etching apparatus group is located on the common path. The photolithography apparatus group is located on the two ring paths between the two deposition apparatus groups. The manufacturing system of the present invention thus combines the advantages of the group-type manufacturing system and the continuous-type manufacturing system.
摘要翻译：提供制造系统。制造系统至少包括处理系统，两个沉积装置组，蚀刻装置组，光刻装置组和两个光刻胶剥离装置组。处理系统具有包括至少两个连接的环路的多个处理路径，其连接在公共路径中。这些沉积装置组和光刻胶剥离装置组分别位于两个环路上。蚀刻装置组位于公共路径上。光刻设备组位于两个沉积设备组之间的两个环路上。因此，本发明的制造系统结合了组型制造系统和连续型制造系统的优点。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式