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    • 4. 发明授权
    • Method, photolithography method, and method of manufacturing a semiconductor device using a pellicle film
    • 方法,光刻法和使用防护薄膜的半导体器件的制造方法
    • US09519220B2
    • 2016-12-13
    • US14706980
    • 2015-05-08
    • Su-Young LeeTae-Geun KimJong-Gul Doh
    • Su-Young LeeTae-Geun KimJong-Gul Doh
    • H01L21/00G03F7/20
    • G03F7/2004G03F1/62
    • A pellicle for an EUV lithography may include a pellicle film, a supporting structure and a handling block. The pellicle film may have a first surface for orienting opposite to a mask, and a second surface opposite to the first surface and for orienting toward the mask. The pellicle film may allow the EUV, which may pass through the mask, to penetrate the pellicle film. The supporting structure may be arranged on the second surface of the pellicle film to support the pellicle film. The handling block may be arranged on the first surface of the pellicle film. The handling block may have an opening configured to expose the pellicle film. Thus, the pellicle may be handled using the thick handling block, not the thin pellicle film, so that the thin pellicle film may not be damaged. The pellicle may protect the mask from byproducts generated in the EUV lithography process so that the mask may not be contaminated.
    • 用于EUV光刻的防护薄膜组件可以包括防护薄膜,支撑结构和处理块。 防护薄膜可以具有用于与掩模相对定向的第一表面和与第一表面相对的用于朝向掩模定向的第二表面。 防护薄膜可以允许穿过掩模的EUV穿透防护薄膜。 支撑结构可以布置在防护薄膜的第二表面上以支撑防护薄膜。 处理块可以布置在防护薄膜的第一表面上。 处理块可以具有用于暴露防护薄膜的开口。 因此,可以使用厚的处理块而不是薄的防护薄膜来处理防护薄膜,使得薄的防护薄膜不会被损坏。 防护薄膜组件可以保护面罩免于在EUV光刻工艺中产生的副产物,使得面罩不被污染。
    • 7. 发明授权
    • Semiconductor chip attaching apparatus
    • 半导体芯片连接装置
    • US08307543B2
    • 2012-11-13
    • US12772561
    • 2010-05-03
    • Su-Young Lee
    • Su-Young Lee
    • B23P19/00
    • H01L24/75H01L2924/14Y10T29/53178Y10T29/53183Y10T29/53191H01L2924/00
    • Provided are a semiconductor chip attaching apparatus and a semiconductor chip attaching method. The semiconductor chip attaching apparatus includes a collet body comprising a pick-up pad and a pad support and a collet plate on the collet body, the collet plate having a central portion. A lower surface of the edge portion contacts an upper surface of the pad support. An edge portion of the lower surface is spaced apart from the upper surface of the pad support. The apparatus further includes a first pipe extending through the collet plate and the collet body. The collet plate includes a second pipe in the edge portion.
    • 提供半导体芯片附着装置和半导体芯片附接方法。 半导体芯片安装装置包括夹头本体,该夹头本体包括拾取垫和垫支撑件以及夹头主体上的夹头板,该夹头板具有中心部分。 边缘部分的下表面接触垫支撑件的上表面。 下表面的边缘部分与垫支撑件的上表面间隔开。 该装置还包括延伸穿过夹头板和夹头体的第一管。 夹头板包括边缘部分中的第二管。
    • 8. 发明申请
    • WATER SUPPLY HOSE CONNECTOR FOR WASHING MACHINE
    • 洗衣机用水软管接头
    • US20090039648A1
    • 2009-02-12
    • US12187825
    • 2008-08-07
    • Su-Young LEE
    • Su-Young LEE
    • F16L41/00
    • D06F39/088F16L37/48Y02B40/56
    • A water supply hose connector for a washing machine comprises: a body portion having a screw thread on an inner surface thereof so as to be directly coupled to a tap having a screw thread; a hose connection portion formed below the body portion, and connected to a water supply hose that supplies water to a washing machine; a flange portion formed between the body portion and the hose connection portion, and outwardly protruding than the body portion; and a sealing member mounted in the body portion. Accordingly, bolts, etc. need not be used to connect the water supply hose connector to the tap, and efforts to concentrically form the water supply hose connector with the tap are not required. Accordingly, not only a user, but also an engineer can conveniently install the water supply hose connector for a washing machine.
    • 一种用于洗衣机的供水软管连接器包括:主体部分,其内表面上具有螺纹,以便直接联接到具有螺纹的龙头; 软管连接部分,形成在主体部分下方,并连接到向洗衣机供水的供水软管; 形成在主体部分和软管连接部分之间并且比主体部分向外突出的凸缘部分; 以及安装在主体部分中的密封构件。 因此,不需要使用螺栓等来将供水软管连接器连接到水龙头,并且不需要用水龙头同心地形成供水软管连接器。 因此,不仅用户,而且工程师也可以方便地安装用于洗衣机的供水软管连接器。
    • 9. 发明申请
    • METHOD, PHOTOLITHOGRAPHY METHOD, AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE USING A PELLICLE FILM
    • 方法,光刻方法和使用薄膜形成半导体器件的方法
    • US20160048079A1
    • 2016-02-18
    • US14706980
    • 2015-05-08
    • Su-Young LEETae-Geun KIMJong-Gul DOH
    • Su-Young LEETae-Geun KIMJong-Gul DOH
    • G03F7/20H01L21/78
    • G03F7/2004G03F1/62
    • A pellicle for an EUV lithography may include a pellicle film, a supporting structure and a handling block. The pellicle film may have a first surface for orienting opposite to a mask, and a second surface opposite to the first surface and for orienting toward the mask. The pellicle film may allow the EUV, which may pass through the mask, to penetrate the pellicle film. The supporting structure may be arranged on the second surface of the pellicle film to support the pellicle film. The handling block may be arranged on the first surface of the pellicle film. The handling block may have an opening configured to expose the pellicle film. Thus, the pellicle may be handled using the thick handling block, not the thin pellicle film, so that the thin pellicle film may not be damaged. The pellicle may protect the mask from byproducts generated in the EUV lithography process so that the mask may not be contaminated.
    • 用于EUV光刻的防护薄膜组件可以包括防护薄膜,支撑结构和处理块。 防护薄膜可以具有用于与掩模相对定向的第一表面和与第一表面相对的用于朝向掩模定向的第二表面。 防护薄膜可以允许穿过掩模的EUV穿透防护薄膜。 支撑结构可以布置在防护薄膜的第二表面上以支撑防护薄膜。 处理块可以布置在防护薄膜的第一表面上。 处理块可以具有用于暴露防护薄膜的开口。 因此,可以使用厚的处理块而不是薄的防护薄膜来处理防护薄膜,使得薄的防护薄膜不会被损坏。 防护薄膜组件可以保护面罩免于在EUV光刻工艺中产生的副产物,使得面罩不被污染。