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    • 4. 发明授权
    • High-Q, variable capacitance capacitor
    • 高Q,可变电容电容
    • US06587326B2
    • 2003-07-01
    • US10251630
    • 2002-09-19
    • Riccardo DepetroStefano Manzini
    • Riccardo DepetroStefano Manzini
    • H01G500
    • H01L29/417H01L29/94
    • High-Q, variable capacitance capacitor is formed by including a pocket of semiconductor material; a field insulating layer, covering the pocket; an opening in the field insulating layer, delimiting a first active area; an access region formed in the active area and extending at a distance from a first edge of the active area and adjacent to a second edge of the active area. A portion of the pocket is positioned between the access region and the first edge and forms a first plate; an insulating region extends above the portion of said body, and a polysilicon region extends above the insulating region and forms a second plate. A portion of the polysilicon region extends above the field insulating layer, parallel to the access region; a plurality of contacts are formed at a mutual distance along the portion of the polysilicon region extending above the field insulating layer.
    • 高Q型可变容性电容器通过包括半导体材料的袋形成; 覆盖口袋的场绝缘层; 在所述场绝缘层中的开口,限定第一有源区; 存取区,形成在有源区中,并且与有源区的第一边缘相距一定距离并且与有源区的第二边相邻。 口袋的一部分位于入口区域和第一边缘之间并形成第一板; 绝缘区域延伸到所述主体的部分上方,并且多晶硅区域延伸到绝缘区域上方并形成第二板。 所述多晶硅区域的一部分在所述场绝缘层的上方延伸,与所述接入区域平行; 沿着在场绝缘层上方延伸的多晶硅区域的相互距离形成多个触点。