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1. 发明授权

US10222314B2 Flow channel device, complex permittivity measuring apparatus, and dielectric cytometry system 有权
公开(公告)号：US10222314B2
公开(公告)日：2019-03-05
申请号：US13142701
申请日：2010-01-07
申请人： Yoichi Katsumoto , Shinji Omori
发明人： Yoichi Katsumoto , Shinji Omori
IPC分类号： G01N15/12 , G01N15/10 , C40B60/14
摘要： A flow channel device, a complex permittivity measuring apparatus, and a dielectric cytometry system are provided which can improve the measurement accuracy. A constriction portion having a constricted space is disposed between an inflow port and an outflow port of a flow channel. Electrodes are arranged between the inflow port and the constriction portion and between the outflow port and the constriction portion. The conductance of the constriction portion at a low-limit frequency is less than the combined conductance of an inflow channel portion and an outflow channel portion. The capacitance of the constriction portion at a high-limit frequency is less than the combined capacitance of the inflow channel portion and the outflow channel portion.

2. 发明授权

US08368410B2 Transmission line for dielectric measurement and dielectric measuring device having the transmission line 有权
公开(公告)号：US08368410B2
公开(公告)日：2013-02-05
申请号：US12283009
申请日：2008-09-09
申请人： Yoshihito Hayashi , Shinji Omori , Ikuya Oshige
发明人： Yoshihito Hayashi , Shinji Omori , Ikuya Oshige
IPC分类号： G01R27/08 , G01R27/26
CPC分类号： G01R31/36 , G01N27/221
摘要： A transmission line substrate includes at least an insulating layer of a predetermined thickness, a pair of conductor layers arranged in a state of being opposed to each other such that the insulating layer is interposed between the conductor layers, the pair of conductor layers functioning as a high-frequency transmission line, and a fault part formed so as to make the conductor layer on one side disconnected, into which a sample to be measured can be introduced.

3. 发明申请

US20120103817A1 DIELECTRIC CYTOMETRIC APPARATUS AND DIELECTRIC-CYTOMETRIC CELL SORTING METHOD 有权
标题翻译：介电细胞仪和电介质细胞分选方法
公开(公告)号：US20120103817A1
公开(公告)日：2012-05-03
申请号：US13278749
申请日：2011-10-21
申请人： Shinji Omori , Kazumasa Sato , Yoichi Katsumoto , Tomoyuki Umetsu , Yoshihito Hayashi
发明人： Shinji Omori , Kazumasa Sato , Yoichi Katsumoto , Tomoyuki Umetsu , Yoshihito Hayashi
IPC分类号： C25B15/00 , G01N27/447
CPC分类号： G01N15/12 , B01L3/502761 , B01L2200/0652 , B01L2300/0645 , B01L2300/0816 , B01L2300/0864 , B01L2400/0424 , B03C5/005 , B03C5/028 , G01N2015/1081
摘要： Disclosed herein is a dielectric cytometric apparatus capable of analyzing cells and sorting the cells without adopting an optical analysis method and provides a dielectric cytometric cell sorting method for the apparatus. A stenosis channel allowing a single cell to flow is created on a cell injection section of a micro flow channel device used as a portion of the dielectric cytometric apparatus. A pair of measurement electrodes is created on the stenosis channel and an analyzer connected to the measurement electrodes measures the complex dielectric constant of for every cell passing through the stenosis channel. A electric-field application section provided on the downstream side of the stenosis channel applies an electric field for changing the flow of the cells inside a flow channel on the basis of information on the measured complex dielectric constants so that the cells can be sorted by making use of branch channels.
摘要翻译：本文公开了一种能够分析细胞并分选细胞而不采用光学分析方法并提供该装置的介质细胞计数细胞分选方法的介质细胞计数装置。在用作介电细胞仪器的一部分的微流通道装置的细胞注射部分上产生允许单细胞流动的狭窄通道。在狭窄通道上产生一对测量电极，连接到测量电极的分析仪测量通过狭窄通道的每个细胞的复合介电常数。设置在狭窄通道的下游侧的电场应用部根据关于测定的复介电常数的信息，施加用于改变流路内的细胞的流动的电场，使得可以通过制作细胞来分选细胞使用分支渠道。

4. 发明授权

US07556895B2 Mask, method of producing mask, and method of producing semiconductor device 失效
标题翻译：掩模，掩模的制造方法以及半导体装置的制造方法
公开(公告)号：US07556895B2
公开(公告)日：2009-07-07
申请号：US11594878
申请日：2006-11-09
申请人： Shigeru Moriya , Shinji Omori
发明人： Shigeru Moriya , Shinji Omori
IPC分类号： G03F1/00
CPC分类号： G03F1/20 , B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/31794 , H01L21/0334 , Y10S438/975
摘要： To provide a mask able to prevent a drop in pattern position accuracy due to the influence of internal stress of a membrane and able to align patterns including complementary divided patterns precisely, a method of producing the same, and a method of producing a semiconductor device. A stencil mask having lattice-shaped struts formed by etching a silicon wafer on four regions of a membrane wherein the lattices are offset from each other in the four regions and all of the struts are connected to other struts or the silicon wafer around the membrane (frame), a method of producing a stencil mask, and a method of producing a semiconductor device.
摘要翻译：为了提供能够防止由于膜的内部应力的影响而导致的图案位置精度下降的掩模，并且能够精确地对准包括互补分割图案的图案，其制造方法和制造半导体器件的方法。一种模板掩模，其具有通过在膜的四个区域上蚀刻硅晶片而形成的格子状支柱，其中格子在四个区域中彼此偏移，并且所有的支柱都连接到膜周围的其他支柱或硅晶片（框架），制造模板掩模的方法以及半导体器件的制造方法。

5. 发明申请

US20070105026A1 MASK, MASK BLANK, AND METHODS OF PRODUCING THESE 审中-公开
标题翻译：掩蔽，掩蔽空白及其生产方法
公开(公告)号：US20070105026A1
公开(公告)日：2007-05-10
申请号：US11619760
申请日：2007-01-04
申请人： Masaki Yoshizawa , Shinji Omori
发明人： Masaki Yoshizawa , Shinji Omori
IPC分类号： G03F1/00 , G21K5/00 , G03C5/00
CPC分类号： G03F1/20
摘要： A mask decreased in warping and having a high positioning precision, provided with at least a substrate aperture formed at a portion of a silicon substrate, a first silicon oxide film formed at one surface of the silicon substrate, a single crystal silicon layer formed on the first silicon layer and the substrate aperture, at least one aperture formed at a portion of the single crystal silicon layer on the substrate aperture and passing an exposure beam, a stress controlling layer formed on another surface of the silicon substrate having internal stress for flattening warping of the silicon substrate due to at least compressive stress of the first silicon oxide film; a method of producing the same, a mask blank decreased in warping, and a method of producing the same.
摘要翻译：掩模在翘曲中降低并且具有高定位精度，至少设置有形成在硅衬底的一部分处的衬底孔，形成在硅衬底的一个表面上的第一氧化硅膜，形成在硅衬底上的单晶硅层第一硅层和衬底孔，形成在衬底孔上的单晶硅层的一部分上并通过曝光束的至少一个孔，形成在具有用于平坦翘曲的内应力的硅衬底的另一表面上的应力控制层由于至少第一氧化硅膜的压应力而导致的硅衬底; 其制造方法，掩模坯料在翘曲中减少，及其制造方法。

6. 发明申请

US20070054203A1 Mask, method of producing mask, and method of producing semiconductor device 审中-公开
标题翻译：掩模，掩模的制造方法以及半导体装置的制造方法
公开(公告)号：US20070054203A1
公开(公告)日：2007-03-08
申请号：US11594908
申请日：2006-11-09
申请人： Shigeru Moriya , Shinji Omori
发明人： Shigeru Moriya , Shinji Omori
IPC分类号： G21K5/00 , G03F1/00
CPC分类号： G03F1/20 , B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/31794 , H01L21/0334 , Y10S438/975
摘要： To provide a mask able to prevent a drop in pattern position accuracy due to the influence of internal stress of a membrane and able to align patterns including complementary divided patterns precisely, a method of producing the same, and a method of producing a semiconductor device. A stencil mask having lattice-shaped struts formed by etching a silicon wafer on four regions of a membrane wherein the lattices are offset from each other in the four regions and all of the struts are connected to other struts or the silicon wafer around the membrane (frame), a method of producing a stencil mask, and a method of producing a semiconductor device.
摘要翻译：为了提供能够防止由于膜的内部应力的影响而导致的图案位置精度下降的掩模，并且能够精确地对准包括互补分割图案的图案，其制造方法和制造半导体器件的方法。一种模板掩模，其具有通过在膜的四个区域上蚀刻硅晶片而形成的格子状支柱，其中格子在四个区域中彼此偏移，并且所有的支柱都连接到膜周围的其他支柱或硅晶片（框架），制造模板掩模的方法以及半导体器件的制造方法。

7. 发明申请

US20050014076A1 Method of generating mask distortion data, exposure method and method of producing semiconductor device 失效
标题翻译：产生掩模失真数据的方法，制造半导体器件的曝光方法和方法
公开(公告)号：US20050014076A1
公开(公告)日：2005-01-20
申请号：US10848918
申请日：2004-05-19
申请人： Shinji Omori
发明人： Shinji Omori
IPC分类号： G01B15/00 , G03C5/00 , G03F1/38 , G03F1/44 , G03F7/20 , G03F9/00 , G06F17/50 , H01J37/305 , H01L21/027
CPC分类号： G03F9/7003 , G03F1/20 , G03F1/68 , G03F9/7084 , H01J2237/30461 , H01J2237/31794 , Y10S430/143
摘要： A method of generating mask distortion data capable of improving accuracy of distortion measurement, an exposure method using the same and a method of producing a semiconductor device, wherein a production mask is produced by a first thin film formed with a predetermined pattern, and a positional accuracy measurement mask is produced by forming second positional accuracy measurement marks at substantially same positions as those of the first positional accuracy measurement marks on a mask blanks having a second thin film, positions of the second positional accuracy measurement marks and third positional accuracy measurement marks of the positional accuracy measurement mask are measured, a correlation function of the both are calculated, positions of the first positional accuracy measurement marks of the production mask are measured, and mask distortion data on the first thin film of the production mask is generated by using the correlation function.
摘要翻译：一种产生能够提高失真测量精度的掩模失真数据的方法，使用该掩模失真数据的曝光方法和制造半导体器件的方法，其中通过以预定图案形成的第一薄膜和位置通过在与具有第二薄膜的掩模坯料上的第一位置精度测量标记的基本相同的位置处形成第二位置精度测量标记，将第二位置精度测量标记和第三位置精度测量标记的位置测量位置精度测量掩模，计算两者的相关函数，测量生产掩模的第一位置精度测量标记的位置，并通过使用生产掩模的第一薄膜上的掩模失真数据产生相关函数。

8. 发明申请

US20050008948A1 Complementary division mask, method of producing mask, and program 失效
标题翻译：互补分割面具，生产面膜的方法和程序
公开(公告)号：US20050008948A1
公开(公告)日：2005-01-13
申请号：US10885822
申请日：2004-07-07
申请人： Yoko Watanabe , Shinji Omori
发明人： Yoko Watanabe , Shinji Omori
IPC分类号： B08B3/04 , G03F1/20 , G03F1/68 , G03F9/00 , G06F17/50 , H01L21/027
CPC分类号： G03F1/20 , G03F1/82
摘要： A complementary division method able to suppress a pattern deformation by wet washing, having the steps of determining a definite division length able to suppress the pattern deformation when wet washing to a width and distance of a pattern that is assumed the pattern deformation over an elasticity limit is easiest given by wet washing in advance, dividing the entire line-and-space patterns at the determined division length in the longitudinal direction to divide suitably the line-and-space pattern by a simple algorithm, and further providing a method of producing a mask and program.
摘要翻译：一种能够通过湿式洗涤来抑制图案变形的互补分割方法，具有以下步骤：确定在湿洗时的图案变形的确定分割长度，以及假设在弹性极限上的图案变形的图案的宽度和距离通过预先通过湿式洗涤最容易，将长度方向上确定的划分长度的整个线间距图案划分成一个简单的算法，适当地划分线间距图案，并进一步提供一种方法，面具和程序。

9. 发明授权

US5675363A Method and equipment for controlling display of image data according to random-scan system 失效
标题翻译：根据随机扫描系统控制图像数据显示的方法和设备
公开(公告)号：US5675363A
公开(公告)日：1997-10-07
申请号：US226837
申请日：1994-04-13
申请人： Shinji Omori
发明人： Shinji Omori
IPC分类号： G06F3/153 , G09B9/30 , G09G1/07 , G09G1/08 , G09G5/00 , G09G5/377
CPC分类号： G09G1/07 , G09B9/301 , G09G2340/12
摘要： In an apparatus for displaying image data created by a computer according to the random-scan system, until the created display data is read out and displayed, in the time of buffering a buffer memory for temporarily storing the display data, the data is divided into plural blocks based on the display coordinate information added to the display data and is thus stored. When reading the data, the data is read out and displayed in sequence from blocks adjacent to each other.
摘要翻译：在用于根据随机扫描系统显示由计算机创建的图像数据的装置中，在缓冲用于临时存储显示数据的缓冲存储器的时间之前，直到读出并显示所创建的显示数据，该数据被分成基于添加到显示数据的显示坐标信息，从而存储多个块。当读取数据时，数据被读出并依次显示在彼此相邻的块中。

10. 发明授权

US08197655B2 System and method for detecting interaction between substances by superimposingly applying sinusoidal voltage 失效
标题翻译：通过叠加施加正弦电压来检测物质之间相互作用的系统和方法
公开(公告)号：US08197655B2
公开(公告)日：2012-06-12
申请号：US11385961
申请日：2006-03-22
申请人： Shinji Omori
发明人： Shinji Omori
IPC分类号： B01D57/02
CPC分类号： G01N27/447 , B03C5/005
摘要： Disclosed herein is a system for detecting interaction between substances includes a reaction field for allowing the interaction to proceed between the substances, and a voltage application section for applying a voltage to a working electrode arranged facing the reaction field such that a predetermined electrodynamic effect is given to the reaction field. The voltage application section is provided with a section for superimposingly applying two sinusoidal voltages of different frequencies to generate a beat. Also disclosed herein is a method for detecting interaction between substances in a procedure of allowing the interaction to proceed between the substances by making use of a predetermined electrodynamic effect, the method includes the step of applying two sinusoidal voltages of different frequencies superimposingly to generate a beat such that an electrochemical reaction is suppressed in a reaction field where the interaction is allowed to proceed.
摘要翻译：本文公开了一种用于检测物质之间的相互作用的系统，包括用于允许物质之间相互作用的反应场;以及电压施加部分，用于向面向反应场布置的工作电极施加电压，使得给定预定的电动力效应到反应场。电压施加部分设置有用于叠加施加不同频率的两个正弦电压的部分以产生拍子。本文还公开了一种用于在通过利用预定的电动作用使物质之间进行相互作用的过程中检测物质之间的相互作用的方法，所述方法包括叠加施加不同频率的两个正弦电压以产生节拍的步骤使得在允许相互作用进行的反应场中抑制电化学反应。

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