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1. 发明申请

US20110051527A1 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE 有权
标题翻译：非易失性半导体存储器件
公开(公告)号：US20110051527A1
公开(公告)日：2011-03-03
申请号：US12725827
申请日：2010-03-17
申请人： Ryouhei Kirisawa , Masaru Kito , Shigeto Oota , Yoshimasa Mikajiri
发明人： Ryouhei Kirisawa , Masaru Kito , Shigeto Oota , Yoshimasa Mikajiri
IPC分类号： G11C16/04 , G11C16/02
CPC分类号： G11C16/14 , G11C16/0483 , G11C16/10 , G11C16/26 , H01L27/11582
摘要： A nonvolatile semiconductor memory device includes: a memory unit; and a control unit. The memory unit includes: first and second memory strings including first and second memory transistors with first and second select gates, respectively; and first and second wirings connected thereto. In a selective erase operation of a selected cell transistor of the first memory transistors, the control unit applies V1 voltage to the first wiring, applies V2 voltage lower than V1 to a selected cell gate of the selected cell transistor, applies V3 voltage not higher than V1 and higher than V2 to a non-selected cell gate of the first memory transistors, applies V1 or V4 voltage not higher than V1 and not lower than V3 to the first select gate, and applies V2 or V4 voltage higher than V2 and not higher than V3 to the second wiring or sets the second wiring in a floating state.
摘要翻译：非易失性半导体存储器件包括：存储器单元; 和控制单元。存储单元包括：第一和第二存储器串，分别包括具有第一和第二选择栅极的第一和第二存储器晶体管; 以及与其连接的第一和第二布线。在第一存储晶体管的所选单元晶体管的选择性擦除操作中，控制单元向第一布线施加V1电压，向所选单元晶体管的选定单元栅极施加低于V1的V2电压，施加不高于 V1并且高于V2到第一存储晶体管的未选择的单元栅极，向第一选择栅施加不高于V1且不低于V3的V1或V4电压，并且施加V2或V4电压高于V2而不是更高而不是V3到第二布线，或将第二布线置于浮置状态。

2. 发明申请

US20110018050A1 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING SAME 有权
标题翻译：非易失性半导体存储器件及其制造方法
公开(公告)号：US20110018050A1
公开(公告)日：2011-01-27
申请号：US12727830
申请日：2010-03-19
申请人： Tomoko FUJIWARA , Ryota Katsumata , Masaru Kito , Yoshiaki Fukuzumi , Masaru Kidoh , Hiroyasu Tanaka , Yosuke Komori , Megumi Ishiduki , Junya Matsunami , Hideaki Aochi , Ryouhei Kirisawa , Yoshimasa Mikajiri , Shigeto Oota
发明人： Tomoko FUJIWARA , Ryota Katsumata , Masaru Kito , Yoshiaki Fukuzumi , Masaru Kidoh , Hiroyasu Tanaka , Yosuke Komori , Megumi Ishiduki , Junya Matsunami , Hideaki Aochi , Ryouhei Kirisawa , Yoshimasa Mikajiri , Shigeto Oota
IPC分类号： H01L29/51 , H01L21/4763
CPC分类号： H01L27/11551 , H01L27/11524 , H01L27/11526 , H01L27/11529 , H01L27/11556
摘要： A nonvolatile semiconductor memory device, includes: a stacked structural unit including electrode films alternately stacked with inter-electrode insulating films; first and second semiconductor pillars piercing the stacked structural unit; a connection portion semiconductor layer electrically connect the first and second semiconductor pillars; a connection portion conductive layer provided to oppose the connection portion semiconductor layer; a memory layer and an inner insulating film provided between the first and semiconductor pillars and each of the electrode films, and between the connection portion conductive layer and the connection portion semiconductor layer; an outer insulating film provided between the memory layer and each of the electrode films; and a connection portion outer insulating film provided between the memory layer and the connection portion conductive layer. The connection portion outer insulating film has a film thickness thicker than a film thickness of the outer insulating film.
摘要翻译：一种非易失性半导体存储器件，包括：堆叠结构单元，其包括交替层叠有电极间绝缘膜的电极膜; 第一和第二半导体柱刺穿堆叠结构单元; 连接部分半导体层电连接第一和第二半导体柱; 连接部分导电层，设置成与连接部分半导体层相对; 设置在所述第一半导体柱和所述半导体柱之间以及所述电极膜之间并且位于所述连接部分导电层和所述连接部半导体层之间的存储层和内部绝缘膜; 设置在所述存储层和每个所述电极膜之间的外部绝缘膜; 以及设置在存储层和连接部分导电层之间的连接部分外绝缘膜。连接部外绝缘膜的膜厚比外绝缘膜的膜厚厚。

3. 发明授权

US08791464B2 Nonvolatile semiconductor memory device and method for manufacturing same 有权
标题翻译：非易失性半导体存储器件及其制造方法
公开(公告)号：US08791464B2
公开(公告)日：2014-07-29
申请号：US12820371
申请日：2010-06-22
申请人： Tomoko Fujiwara , Ryota Katsumata , Masaru Kito , Yoshiaki Fukuzumi , Masaru Kidoh , Hiroyasu Tanaka , Yosuke Komori , Megumi Ishiduki , Hideaki Aochi , Ryouhei Kirisawa , Yoshimasa Mikajiri , Shigeto Oota
发明人： Tomoko Fujiwara , Ryota Katsumata , Masaru Kito , Yoshiaki Fukuzumi , Masaru Kidoh , Hiroyasu Tanaka , Yosuke Komori , Megumi Ishiduki , Hideaki Aochi , Ryouhei Kirisawa , Yoshimasa Mikajiri , Shigeto Oota
IPC分类号： H01L29/792
CPC分类号： H01L29/792 , H01L27/11526 , H01L27/11551 , H01L27/11556 , H01L27/11573 , H01L27/11578 , H01L29/66825 , H01L29/66833 , H01L29/7881 , H01L29/7926
摘要： According to one embodiment, a nonvolatile semiconductor memory device includes a stacked structure, a semiconductor pillar, a memory layer and an outer insulating film. The stacked structure includes a plurality of electrode films and a plurality of interelectrode insulating films alternately stacked in a first direction. The semiconductor pillar pierces the stacked structure in the first direction. The memory layer is provided between the electrode films and the semiconductor pillar. The outer insulating film is provided between the electrode films and the memory layer. The device includes a first region and a second region. An outer diameter of the outer insulating film along a second direction perpendicular to the first direction in the first region is larger than that in the second region. A thickness of the outer insulating film along the second direction in the first region is thicker than that in the second region.
摘要翻译：根据一个实施例，非易失性半导体存储器件包括堆叠结构，半导体柱，存储层和外部绝缘膜。堆叠结构包括沿第一方向交替堆叠的多个电极膜和多个电极间绝缘膜。半导体柱沿第一方向刺穿层叠结构。存储层设置在电极膜和半导体柱之间。外绝缘膜设置在电极膜和存储层之间。该装置包括第一区域和第二区域。沿着与第一区域的第一方向垂直的第二方向的外绝缘膜的外径大于第二区域的外径。第一区域中沿着第二方向的外绝缘膜的厚度比第二区域厚。

4. 发明授权

US08653582B2 Nonvolatile semiconductor memory device and method for manufacturing same 有权
标题翻译：非易失性半导体存储器件及其制造方法
公开(公告)号：US08653582B2
公开(公告)日：2014-02-18
申请号：US12724713
申请日：2010-03-16
申请人： Yoshiaki Fukuzumi , Ryota Katsumata , Masaru Kito , Masaru Kidoh , Hiroyasu Tanaka , Yosuke Komori , Megumi Ishiduki , Junya Matsunami , Tomoko Fujiwara , Hideaki Aochi , Ryouhei Kirisawa , Yoshimasa Mikajiri , Shigeto Oota
发明人： Yoshiaki Fukuzumi , Ryota Katsumata , Masaru Kito , Masaru Kidoh , Hiroyasu Tanaka , Yosuke Komori , Megumi Ishiduki , Junya Matsunami , Tomoko Fujiwara , Hideaki Aochi , Ryouhei Kirisawa , Yoshimasa Mikajiri , Shigeto Oota
IPC分类号： H01L29/788
CPC分类号： H01L27/11582 , H01L21/223 , H01L21/265 , H01L27/11578 , H01L29/04 , H01L29/1037 , H01L29/16 , H01L29/42344 , H01L29/4916 , H01L29/66666 , H01L29/66833 , H01L29/7827 , H01L29/792 , H01L29/7926
摘要： A nonvolatile semiconductor memory device, includes: a stacked structural unit including a plurality of insulating films alternately stacked with a plurality of electrode films in a first direction; a selection gate electrode stacked on the stacked structural unit in the first direction; an insulating layer stacked on the selection gate electrode in the first direction; a first semiconductor pillar piercing the stacked structural unit, the selection gate electrode, and the insulating layer in the first direction, a first cross section of the first semiconductor pillar having an annular configuration, the first cross section being cut in a plane orthogonal to the first direction; a first core unit buried in an inner side of the first semiconductor pillar, the first core unit being recessed from an upper face of the insulating layer; and a first conducting layer of the first semiconductor pillar provided on the first core unit to contact the first core unit.
摘要翻译：一种非易失性半导体存储器件，包括：堆叠结构单元，包括在第一方向上交替地堆叠有多个电极膜的多个绝缘膜; 选择栅极电极，其沿所述第一方向堆叠在所述层叠结构单元上; 绝缘层，其沿所述第一方向堆叠在所述选择栅电极上; 第一半导体柱在第一方向上穿透层叠结构单元，选择栅电极和绝缘层，第一半导体柱的第一截面具有环形构造，第一横截面在垂直于第一方向第一核心单元，其被埋在第一半导体柱的内侧，第一芯单元从绝缘层的上表面凹入; 以及设置在所述第一芯单元上以接触所述第一芯单元的所述第一半导体柱的第一导电层。

5. 发明授权

US08199573B2 Nonvolatile semiconductor memory device 有权
标题翻译：非易失性半导体存储器件
公开(公告)号：US08199573B2
公开(公告)日：2012-06-12
申请号：US12694677
申请日：2010-01-27
申请人： Yoshiaki Fukuzumi , Ryota Katsumata , Masaru Kito , Masaru Kidoh , Hiroyasu Tanaka , Tomoko Fujiwara , Megumi Ishiduki , Yosuke Komori , Yoshimasa Mikajiri , Shigeto Oota , Ryouhei Kirisawa , Hideaki Aochi
发明人： Yoshiaki Fukuzumi , Ryota Katsumata , Masaru Kito , Masaru Kidoh , Hiroyasu Tanaka , Tomoko Fujiwara , Megumi Ishiduki , Yosuke Komori , Yoshimasa Mikajiri , Shigeto Oota , Ryouhei Kirisawa , Hideaki Aochi
IPC分类号： G11C11/34 , G11C16/04
CPC分类号： G11C11/34 , G11C5/02 , G11C16/26
摘要： A nonvolatile semiconductor memory device comprises: a bit line; a source line; a memory string having a plurality of electrically data-rewritable memory transistors connected in series; a first select transistor provided between one end of the memory string and the bit line; a second select transistor provided between the other end of the memory string and the source line; and a control circuit configured to control a read operation. A plurality of the memory strings connected to one bit line via a plurality of the first select transistors. During reading of data from a selected one of the memory strings, the control circuit renders conductive the first select transistor connected to an unselected one of the memory strings and renders non-conductive the second select transistor connected to unselected one of the memory strings.
摘要翻译：非易失性半导体存储器件包括：位线; 源线; 具有串联连接的多个电数据可重写存储晶体管的存储器串; 设置在存储器串的一端和位线之间的第一选择晶体管; 设置在存储器串的另一端与源极线之间的第二选择晶体管; 以及控制电路，被配置为控制读取操作。经由多个第一选择晶体管连接到一个位线的多个存储器串。在从选择的一个存储器串读取数据期间，控制电路使连接到未选择的一个存储器串的第一选择晶体管导通，并且使第二选择晶体管连接到未选择的一个存储器串。

6. 发明授权

US08194467B2 Nonvolatile semiconductor memory device 有权
标题翻译：非易失性半导体存储器件
公开(公告)号：US08194467B2
公开(公告)日：2012-06-05
申请号：US12725742
申请日：2010-03-17
申请人： Yoshimasa Mikajiri , Ryouhei Kirisawa , Masaru Kito , Shigeto Oota
发明人： Yoshimasa Mikajiri , Ryouhei Kirisawa , Masaru Kito , Shigeto Oota
IPC分类号： G11C16/04 , H01L29/792
CPC分类号： G11C16/0466 , G11C5/02 , G11C16/0483 , H01L27/11556 , H01L27/11573 , H01L27/11578
摘要： A nonvolatile semiconductor memory device includes: a memory unit; and a control unit. The memory unit includes: a multilayer structure including electrode films and interelectrode insulating films alternately stacked; a semiconductor pillar piercing the multilayer structure; insulating films and a memory layer provided between the electrode films and the semiconductor pillar; and a wiring connected to the semiconductor pillar. In an erase operation, the control unit performs: a first operation setting the wiring at a first potential and the electrode film at a second potential lower than the first potential during a first period; and a second operation setting the wiring at a third potential and the electrode film at a fourth potential lower than the third potential during a second period after the first operation. A length of the second period is shorter than the first period, and/or a difference between the third and fourth potentials is smaller than a difference between the first and second potentials.
摘要翻译：非易失性半导体存储器件包括：存储器单元; 和控制单元。存储单元包括：交替堆叠的包括电极膜和电极间绝缘膜的多层结构; 穿透多层结构的半导体柱; 绝缘膜和设置在电极膜和半导体柱之间的存储层; 以及连接到半导体柱的布线。在擦除操作中，控制单元执行以下操作：在第一时段期间将布线设置为第一电位的第一操作和低于第一电位的第二电位的电极膜; 以及在第一操作之后的第二周期期间将布线设置在第三电位的第二操作和电极膜处于低于第三电位的第四电位。第二周期的长度比第一周期短，和/或第三和第四电位之间的差小于第一和第二电位之间的差。

7. 发明授权

US08169826B2 Nonvolatile semiconductor memory device 有权
标题翻译：非易失性半导体存储器件
公开(公告)号：US08169826B2
公开(公告)日：2012-05-01
申请号：US12726858
申请日：2010-03-18
申请人： Tomoo Hishida , Yoshihisa Iwata , Megumi Ishiduki , Ryota Katsumata , Yoshiaki Fukuzumi , Masaru Kito , Masaru Kidoh , Hiroyasu Tanaka , Yosuke Komori , Junya Matsunami , Tomoko Fujiwara , Hideaki Aochi , Ryouhei Kirisawa , Yoshimasa Mikajiri , Shigeto Oota
发明人： Tomoo Hishida , Yoshihisa Iwata , Megumi Ishiduki , Ryota Katsumata , Yoshiaki Fukuzumi , Masaru Kito , Masaru Kidoh , Hiroyasu Tanaka , Yosuke Komori , Junya Matsunami , Tomoko Fujiwara , Hideaki Aochi , Ryouhei Kirisawa , Yoshimasa Mikajiri , Shigeto Oota
IPC分类号： G11C16/04 , H01L29/792 , H01L29/66
CPC分类号： G11C5/025 , G11C5/02 , G11C5/04 , G11C16/0483 , H01L27/11573 , H01L27/11578 , H01L27/11582
摘要： A nonvolatile semiconductor memory device comprises: a plurality of first memory strings; a first select transistor having one end thereof connected to one end of the first memory strings; a first line commonly connected to the other end of a plurality of the first select transistors; a switch circuit having one end thereof connected to the first line; and a second line commonly connected to the other end of a plurality of the switch circuits. The switch circuit controls electrical connection between the second line and the first line.
摘要翻译：非易失性半导体存储器件包括：多个第一存储器串; 第一选择晶体管，其一端连接到第一存储器串的一端; 通常连接到多个第一选择晶体管的另一端的第一线; 开关电路，其一端连接到第一线; 以及通常连接到多个开关电路的另一端的第二线。开关电路控制第二线和第一线之间的电连接。

8. 发明申请

US20110216604A1 METHOD FOR OPERATING SEMICONDUCTOR MEMORY DEVICE 有权
标题翻译：操作半导体存储器件的方法
公开(公告)号：US20110216604A1
公开(公告)日：2011-09-08
申请号：US13039557
申请日：2011-03-03
申请人： Yoshimasa Mikajiri , Shigeto Oota , Masaru Kito , Ryouhei Kirisawa
发明人： Yoshimasa Mikajiri , Shigeto Oota , Masaru Kito , Ryouhei Kirisawa
IPC分类号： G11C16/04
CPC分类号： G11C16/04 , G11C16/16 , G11C16/3445 , H01L27/11582
摘要： According to one embodiment, a method is disclosed for operating a semiconductor memory device. The semiconductor memory device includes a substrate, a stacked body, a memory film, a channel body, a select transistor, and a wiring. The method can boost a potential of the channel body by applying a first erase potential to the wiring, the select gate, and the word electrode layer. In addition, after the boosting of the potential of the channel body, with the wiring and the select gate maintained at the first erase potential, the method can decrease a potential of the word electrode layer to a second erase potential lower than the first erase potential.
摘要翻译：根据一个实施例，公开了一种用于操作半导体存储器件的方法。半导体存储器件包括衬底，层叠体，存储膜，通道体，选择晶体管和布线。该方法可以通过向布线，选择栅极和字电极层施加第一擦除电位来提高通道体的电位。此外，在通道体的电位升高之后，在布线和选择栅极保持第一擦除电位的情况下，该方法可以将字电极层的电位降低到低于第一擦除电位的第二擦除电位。

9. 发明申请

US20110103149A1 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR DRIVING SAME 有权
标题翻译：非易失性半导体存储器件及其驱动方法
公开(公告)号：US20110103149A1
公开(公告)日：2011-05-05
申请号：US12851002
申请日：2010-08-05
申请人： Ryota KATSUMATA , Hideaki Aochi , Hiroyasu Tanaka , Masaru Kito , Yoshiaki Fukuzumi , Masaru Kidoh , Yosuke Komori , Megumi Ishiduki , Junya Matsunami , Tomoko Fujiwara , Ryouhei Kirisawa , Yoshimasa Mikajiri , Shigeto Oota
发明人： Ryota KATSUMATA , Hideaki Aochi , Hiroyasu Tanaka , Masaru Kito , Yoshiaki Fukuzumi , Masaru Kidoh , Yosuke Komori , Megumi Ishiduki , Junya Matsunami , Tomoko Fujiwara , Ryouhei Kirisawa , Yoshimasa Mikajiri , Shigeto Oota
IPC分类号： G11C16/04
CPC分类号： G11C16/0483 , G11C16/06 , H01L27/11582 , H01L29/66833 , H01L29/7926
摘要： According to one embodiment, a nonvolatile semiconductor memory device includes a memory cell array and a control circuit. The memory cell array includes a stacked body, a through-hole, a semiconductor pillar, and a charge storage film. The stacked body includes a plurality of insulating films alternately stacked with a plurality of electrode films. The through-hole is made in the stacked body to align in a stacking direction. The semiconductor pillar is buried in the through-hole. The charge storage film is provided between the electrode films and the semiconductor pillar. Memory cells are formed at each intersection between the electrode films and the semiconductor pillar. The control circuit writs a first value to at least some of the memory cells, performs an erasing operation of the first value from the memory cell written with the first value, reads data stored in the memory cell having undergone the erasing operation, and sets the memory cell to be unusable in a case that the first value is read from the memory cell.
摘要翻译：根据一个实施例，非易失性半导体存储器件包括存储单元阵列和控制电路。存储单元阵列包括层叠体，通孔，半导体柱和电荷存储膜。层叠体包括交替层叠有多个电极膜的多个绝缘膜。通孔形成在堆叠体中以沿堆叠方向对齐。半导体柱埋在通孔中。电荷存储膜设置在电极膜和半导体柱之间。在电极膜和半导体柱之间的每个交叉处形成存储单元。控制电路将第一值写入至少部分存储单元，从写入第一值的存储单元执行第一值的擦除操作，读取存储在经过擦除操作的存储单元中的数据，并将在从存储器单元读取第一值的情况下，存储器单元不可用。

10. 发明申请

US20110018052A1 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING SAME 有权
标题翻译：非易失性半导体存储器件及其制造方法
公开(公告)号：US20110018052A1
公开(公告)日：2011-01-27
申请号：US12820371
申请日：2010-06-22
申请人： Tomoko Fujiwara , Ryota Katsumata , Masaru Kito , Yoshiaki Fukuzumi , Masaru Kidoh , Hiroyasu Tanaka , Yosuke Komori , Megumi Ishiduki , Hideaki Aochi , Ryouhei Kirisawa , Yoshimasa Mikajiri , Shigeto Oota
发明人： Tomoko Fujiwara , Ryota Katsumata , Masaru Kito , Yoshiaki Fukuzumi , Masaru Kidoh , Hiroyasu Tanaka , Yosuke Komori , Megumi Ishiduki , Hideaki Aochi , Ryouhei Kirisawa , Yoshimasa Mikajiri , Shigeto Oota
IPC分类号： H01L29/792 , H01L21/28
CPC分类号： H01L29/792 , H01L27/11526 , H01L27/11551 , H01L27/11556 , H01L27/11573 , H01L27/11578 , H01L29/66825 , H01L29/66833 , H01L29/7881 , H01L29/7926
摘要： According to one embodiment, a nonvolatile semiconductor memory device includes a stacked structure, a semiconductor pillar, a memory layer and an outer insulating film. The stacked structure includes a plurality of electrode films and a plurality of interelectrode insulating films alternately stacked in a first direction. The semiconductor pillar pierces the stacked structure in the first direction. The memory layer is provided between the electrode films and the semiconductor pillar. The outer insulating film is provided between the electrode films and the memory layer. The device includes a first region and a second region. An outer diameter of the outer insulating film along a second direction perpendicular to the first direction in the first region is larger than that in the second region. A thickness of the outer insulating film along the second direction in the first region is thicker than that in the second region.
摘要翻译：根据一个实施例，非易失性半导体存储器件包括堆叠结构，半导体柱，存储层和外部绝缘膜。堆叠结构包括沿第一方向交替堆叠的多个电极膜和多个电极间绝缘膜。半导体柱沿第一方向刺穿层叠结构。存储层设置在电极膜和半导体柱之间。外绝缘膜设置在电极膜和存储层之间。该装置包括第一区域和第二区域。沿着与第一区域的第一方向垂直的第二方向的外绝缘膜的外径大于第二区域的外径。第一区域中沿着第二方向的外绝缘膜的厚度比第二区域厚。

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