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    • 1. 发明授权
    • System and method for applying a conformal barrier coating with pretreating
    • 用预应力施加保形屏障涂层的系统和方法
    • US08033885B2
    • 2011-10-11
    • US12242399
    • 2008-09-30
    • Ahmet Gun ErlatGeorge Theodore DalakosMin YanShelia Neumann TandonBrian Joseph Scherer
    • Ahmet Gun ErlatGeorge Theodore DalakosMin YanShelia Neumann TandonBrian Joseph Scherer
    • H05B33/04
    • C23C16/0245B05D1/62C23C16/029H01L51/5253H01L2251/5346Y10T428/24612
    • In a method for depositing a barrier coating, a device is provided comprising a first portion and a second portion where a surface of the second portion is in a shadow zone. The device is pretreated wherein the pretreating alters a deposition rate of the barrier coating on a surface exposed to the pretreating. The shadow zone is substantially unexposed to the pretreating. A barrier coating is deposited wherein the barrier coating substantially conforms to a profile of the device. The coating may be a graded-composition barrier coating wherein a composition of the coating varies substantially continuously across a thickness thereof. The first portion may include a flexible, substantially transparent substrate. The second portion may include an electronic device. The barrier coating and first portion may encapsulate the second portion. The method is a single, commercially advantageous, barrier deposition process, enabling increased product throughput and low process tact time.
    • 在用于沉积阻挡涂层的方法中,提供了包括第一部分和第二部分的装置,其中第二部分的表面处于阴影区域。 该装置被预处理,其中预处理改变了暴露于预处理的表面上的阻挡涂层的沉积速率。 阴影区域基本上未被暴露于预处理。 沉积阻挡涂层,其中阻挡涂层基本上符合设备的轮廓。 涂层可以是梯度组合物阻挡涂层,其中涂层的组合物在其厚度上基本连续地变化。 第一部分可以包括柔性的,基本上透明的基底。 第二部分可以包括电子设备。 阻挡涂层和第一部分可以封装第二部分。 该方法是单一的,商业上有利的阻隔沉积工艺,能够提高产品生产量和低工艺节拍时间。