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    • 1. 发明授权
    • Array substrate for liquid crystal display device and method of fabricating the same
    • 液晶显示装置用阵列基板及其制造方法
    • US07646445B2
    • 2010-01-12
    • US11529351
    • 2006-09-29
    • Woong-Kwon KimYoun-Gyoung ChangSeung-Ryull Park
    • Woong-Kwon KimYoun-Gyoung ChangSeung-Ryull Park
    • G02F1/136G02F1/1335G02F1/1343
    • G02F1/13458G02F1/134336G02F1/136209G02F2001/136222
    • An array substrate device having a color filter-on-thin film transistor (COT) structure for a liquid crystal display device includes a gate line formed on a substrate along a transverse direction, the gate line including a gate pad at one end thereof, a first insulating layer formed on the substrate to cover the gate line, the first insulating layer exposing a first portion of the gate pad, a data line formed over the first insulating layer along a longitudinal direction on the substrate, the data line defining a pixel region with the gate line and including a data pad at one end thereof, a thin film transistor formed at a crossing region of the gate and data lines, the thin film transistor including a gate electrode, a semiconductor layer, a source electrode, and a drain electrode, a black matrix overlapping the thin film transistor, the gate line, and the data line except a second portion of the drain electrode, a second insulating layer formed over an entire surface of the substrate to cover the black matrix, the second insulating layer exposing the first portion of the gate pad, a third portion of the data pad, and the pixel region, a first pixel electrode within the pixel region and contacting the second exposed portion of the drain electrode, a color filter on the first pixel electrode within the pixel region, and a second pixel electrode on the color filter and contacting the first pixel electrode.
    • 具有用于液晶显示装置的滤色器薄膜晶体管(COT)结构的阵列基板装置包括沿横向形成在基板上的栅极线,栅极线在其一端包括栅极焊盘, 形成在基板上以覆盖栅极线的第一绝缘层,暴露栅极焊盘的第一部分的第一绝缘层,沿着衬底上的纵向方向形成在第一绝缘层上的数据线,数据线限定像素区域 栅极线在其一端包括数据焊盘,形成在栅极和数据线的交叉区域的薄膜晶体管,薄膜晶体管包括栅电极,半导体层,源电极和漏极 电极,与薄膜晶体管重叠的黑矩阵,栅极线和除了漏电极的第二部分之外的数据线,在基板的整个表面上形成的第二绝缘层 覆盖黑矩阵,第二绝缘层暴露栅极焊盘的第一部分,数据焊盘的第三部分和像素区域,在像素区域内的第一像素电极,并且与漏电极的第二暴露部分接触 ,像素区域内的第一像素电极上的滤色器,以及滤色器上的第二像素电极,并与第一像素电极接触。
    • 4. 发明授权
    • Method of fabricating array substrate having color filter on thin film transistor structure
    • 在薄膜晶体管结构上制造具有滤色器的阵列基板的方法
    • US07130001B2
    • 2006-10-31
    • US10728835
    • 2003-12-08
    • Youn-Gyoung ChangSeung-Ryull Park
    • Youn-Gyoung ChangSeung-Ryull Park
    • G02F1/136G02F1/1335G02F1/13
    • G02F1/133516G02F2001/136222
    • A method of forming an array substrate for use in a liquid crystal display device includes forming a gate line, a gate pad, and a gate electrode, forming a first gate insulating layer to cover the gate line, the gate pad, and the gate electrode, forming an active layer and an ohmic contact layer on the first gate insulating layer, forming a data line, a data pad, a source electrode, and a drain electrode, forming a second insulating layer to cover the thin film transistor, forming a black matrix on the second insulating layer to cover the thin film transistor, the gate line, and the data line except a first portion of the drain electrode, forming a third insulating layer to cover the black matrix, patterning the first, second, and third insulating layers, forming a first transparent electrode layer to cover the patterned third insulating layer, coating an adhesive color film on the first transparent electrode layer, irradiating a laser to portions of the adhesive color film corresponding to the pixel region, removing the adhesive color film to form a color film, repeating coating the adhesive color film, irradiating the laser and removing the adhesive color film to form the color film within all of the pixel regions, forming a second transparent electrode to cover the color filter and the first transparent electrode layer, and patterning the first and second transparent electrode layers to form first and second pixel electrodes, a double-layered gate pad terminal, and a double-layered data pad terminal.
    • 形成用于液晶显示装置的阵列基板的方法包括:形成栅极线,栅极焊盘和栅极电极,形成第一栅极绝缘层以覆盖栅极线,栅极焊盘和栅极电极 在所述第一栅极绝缘层上形成有源层和欧姆接触层,形成数据线,数据焊盘,源电极和漏电极,形成第二绝缘层以覆盖所述薄膜晶体管,形成黑色 在第二绝缘层上覆盖薄膜晶体管,栅极线和除了漏电极的第一部分之外的数据线,形成第三绝缘层以覆盖黑矩阵,图案化第一绝缘层,第二绝缘层和第三绝缘层 形成第一透明电极层以覆盖所述图案化的第三绝缘层,在所述第一透明电极层上涂覆粘合剂着色膜,向所述粘合剂着色膜的部分照射激光 去除像素区域,去除粘合剂着色膜以形成彩色膜,重复涂布粘合剂着色膜,照射激光并去除粘合剂着色膜,以在所有像素区域内形成彩色膜,形成第二透明电极 覆盖滤色器和第一透明电极层,以及对第一和第二透明电极层进行构图以形成第一和第二像素电极,双层栅极焊盘端子和双层数据焊盘端子。
    • 6. 发明授权
    • Liquid crystal display device and method of manufacturing the same
    • 液晶显示装置及其制造方法
    • US09223178B2
    • 2015-12-29
    • US13160011
    • 2011-06-14
    • So-Young NohSeung-Ryull ParkJin-Pil Kim
    • So-Young NohSeung-Ryull ParkJin-Pil Kim
    • G02F1/1339G02F1/1337G02F1/1362
    • G02F1/13394G02F1/136286G02F2001/13396
    • A liquid crystal display device includes an array substrate including gate and data lines crossing each other on a first substrate to define a pixel region, and a thin film transistor and a pixel electrode in the pixel region, a color filter substrate including a black matrix on a second substrate and including an opening corresponding to the pixel region, and a color filter layer filling the opening, and a liquid crystal layer including a first patterned spacer contacting the array substrate and the color filter substrate, and corresponding to the thin film transistor of the array substrate, and a second patterned spacer having a first width along a length direction of the gate line, and a second width along a width direction of the gate line, contacting the color filter substrate and being spaced apart from the array substrate, and corresponding to the gate line.
    • 一种液晶显示装置,包括:阵列基板,包括在第一基板上彼此交叉以形成像素区域的栅极和数据线,以及像素区域中的薄膜晶体管和像素电极;滤色器基板,包括黑矩阵, 第二基板,包括对应于像素区域的开口,以及填充该开口的滤色器层,以及液晶层,其包括与阵列基板和滤色器基板接触的第一图案化间隔件,并且对应于薄膜晶体管 阵列基板和沿着栅极线的长度方向具有第一宽度的第二图案化间隔物和沿着栅极线的宽度方向的第二宽度,与滤色器基板接触并与阵列基板间隔开,以及 对应于门线。
    • 10. 发明申请
    • METHOD OF FABRICATING LIQUID CRYSTAL DISPLAY DEVICE
    • 制造液晶显示装置的方法
    • US20110136277A1
    • 2011-06-09
    • US12849489
    • 2010-08-03
    • Seung Ryull PARKKyung Mo Son
    • Seung Ryull PARKKyung Mo Son
    • H01L21/336
    • G02F1/13458G02F1/134363H01L27/124H01L27/1288
    • Disclosed is a method of fabricating a LCD device that includes forming sacrifice layer patterns in a pixel region while forming a gate line, a first storage electrode, and a gate pad on a substrate; sequentially forming a gate insulation film, an amorphous silicon film, an impurity-doped amorphous silicon film, and a source/drain metal film on a substrate, forming a transparent conductive material on the substrate covered with a protection and then patterning the transparent conductive material to form a second storage electrode overlapping the first storage electrode and an electrode pattern having a part overlapping an area of one side edge of the sacrifice layer patterns and the other part formed on the substrate; and simultaneously forming a common electrode and a pixel electrode in the pixel region by performing a lift-off process to remove the sacrifice layer patterns on the substrate where the electrode pattern is formed.
    • 公开了一种制造LCD器件的方法,其包括在形成栅极线的同时形成像素区域中的牺牲层图案,在衬底上形成第一存储电极和栅极焊盘; 在衬底上依次形成栅极绝缘膜,非晶硅膜,杂质掺杂非晶硅膜和源极/漏极金属膜,在被覆盖的衬底上形成透明导电材料,然后对透明导电材料 以形成与第一存储电极重叠的第二存储电极和具有与牺牲层图案的一个侧边缘的区域重叠的部分和形成在基板上的另一部分重叠的部分的电极图案; 并且通过执行剥离处理来同时形成像素区域中的公共电极和像素电极,以去除形成电极图案的基板上的牺牲层图案。