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    • 2. 发明申请
    • SEMICONDUCTOR MEMORY DEVICE AND METHOD OF OPERATING THE SAME
    • 半导体存储器件及其操作方法
    • US20140204681A1
    • 2014-07-24
    • US13614486
    • 2012-09-13
    • Seung Hee Jo
    • Seung Hee Jo
    • G11C16/14
    • G11C16/14G11C11/5628G11C16/0483G11C16/24G11C16/26
    • A semiconductor memory device includes strings each configured to include a drain select transistor, memory cells, and a source select transistor coupled in series between a bit line and a common source line and peripheral circuits configured to perform an operation of precharging a bit line so that the precharge level of the bit line varies depending on whether an adjacent unselected memory cell, which is adjacent to a selected memory cell, is in the program state or the erase state, by supplying a first voltage to the adjacent unselected memory cell arranged toward the drain select transistor, a second voltage to the remaining memory cells in order to turn on the remaining memory cells, and a third voltage higher than a bit line precharge voltage to the common source line and perform a read operation of supplying a read voltage lower than the second voltage to the selected memory cell, the second voltage to the remaining memory cells including the adjacent unselected memory cell, and a ground voltage to the common source line.
    • 一种半导体存储器件包括串联的每个配置成包括排列选择晶体管,存储单元和串联耦合在位线和公共源极线之间的源极选择晶体管,以及被配置为执行对位线进行预充电的操作的外围电路, 位线的预充电电平根据与所选择的存储单元相邻的相邻未选择存储单元是否处于编程状态或擦除状态,通过向邻近未选择存储单元布置的相邻未选择存储单元提供第一电压而变化 漏极选择晶体管,向剩余的存储单元施加第二电压,以便将剩余的存储单元导通,以及比公共源极线高的位线预充电电压的第三电压,并且执行读取电压低于 对所选择的存储单元施加第二电压,向包括相邻的未选存储单元的剩余存储单元施加第二电压 到公共源极线的接地电压。
    • 8. 发明申请
    • METHOD FOR FABRICATING VIA HOLE AND THROUGH-SILICON VIA
    • 通过孔和通过硅制造的方法
    • US20120129341A1
    • 2012-05-24
    • US13187845
    • 2011-07-21
    • Seung Hee JOSeong Cheol KIM
    • Seung Hee JOSeong Cheol KIM
    • H01L21/28H01L21/311
    • H01L21/76898H01L23/481H01L2924/0002H01L2924/00
    • A method for fabricating a via hole includes forming a first mask pattern on a first surface of a wafer exposing a portion of the first surface of the wafer, forming a passivation region within the wafer by implanting impurities into the exposed portion of the wafer using the first mask pattern as an ion implantation barrier layer, forming an etching stop layer on the first surface of the wafer including the passivation regions, forming a second mask pattern on a second surface of the wafer faces away from the first surface of the wafer, wherein the second mask pattern exposes a portion of the second surface of the wafer over an area between the passivation regions, and forming a via hole by etching the wafer using the second mask pattern as an etching mask.
    • 一种用于制造通孔的方法包括在晶片的第一表面上形成第一掩模图案,该第一表面露出晶片的第一表面的一部分,通过将晶体中的杂质注入到晶片的暴露部分中,通过使用 第一掩模图案作为离子注入阻挡层,在包括钝化区的晶片的第一表面上形成蚀刻停止层,在晶片的第二表面上形成第二掩模图案,远离晶片的第一表面,其中 第二掩模图案将晶片的第二表面的一部分暴露在钝化区之间的区域上,并且使用第二掩模图案作为蚀刻掩模通过蚀刻晶片形成通孔。