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    • 5. 发明申请
    • APPARATUS AND SENSOR FOR ADJUSTING SENSOR VERTICAL ALIGNMENT
    • 用于调节传感器垂直对准的装置和传感器
    • US20100182199A1
    • 2010-07-22
    • US12692049
    • 2010-01-22
    • Seong-hee JEONG
    • Seong-hee JEONG
    • H01Q3/12G01S13/00
    • G01S7/4026G01S2007/4034G01S2007/4091
    • Provided are a sensor capable of adjusting vertical alignment and a sensor vertical alignment adjusting apparatus using the same. The sensor has a structure with a plurality of switchable transmitting and receiving antennas so as to be able to adjust the vertical alignment, or a structure with a tilting motor for adjusting a radiating or receiving angle. The sensor vertical alignment adjusting apparatus using such a sensor corrects vertical misalignment of the sensor by determining whether or not the vertical misalignment of the sensor occurs, variably switching one from among the plurality of transmitting or receiving antennas of the sensor or controlling the tilting motor, and adjusting the radiating angle of the sensor signal or the receiving angle of a reflected wave of the sensor signal.
    • 提供能够调整垂直对准的传感器和使用该传感器的传感器垂直对准调节装置。 传感器具有多个可切换的发射和接收天线的结构,以便能够调节垂直对准,或者具有用于调节辐射或接收角度的倾斜电机的结构。 使用这种传感器的传感器垂直对准调整装置通过判断传感器的垂直未对准是否发生来校正传感器的垂直偏移,可变地切换传感器的多个发送或接收天线之一或控制倾斜电动机, 并调整传感器信号的辐射角或传感器信号的反射波的接收角度。
    • 6. 发明申请
    • THREE-DIMENSIONAL CAM MECHANISM
    • 三维CAM机制
    • US20100116072A1
    • 2010-05-13
    • US12451712
    • 2008-05-28
    • Takayuki TakahashiSeong Hee JeongYoshihito OzawaKunio ShimadaYaoyang ZhengKazuhiko Fukuda
    • Takayuki TakahashiSeong Hee JeongYoshihito OzawaKunio ShimadaYaoyang ZhengKazuhiko Fukuda
    • F16H25/16B25J17/00
    • F16H25/18F16H53/06Y10T74/18288Y10T74/18568Y10T74/2101
    • An object of the present invention is to provide a three-dimensional cam mechanism, which is capable of selecting a cam guide surface shape freely to drastically improve the degree of freedom for selecting a target locus on the follower side, transmitting not only a power between orthogonal axes but also a strong and reliable power, and performing a reversible operation. The present invention is configured such that a three-dimensional cam guide surface (2 (3)) is formed in a three-dimensional cam (1), and the cam guide surface (2) is caused to guide a cam follower (6 (7)) formed at a predetermined angle at one end of a follower side link (4), so that the rotational movement of the three-dimensional cam (1) is translated into the swinging movement at the other end of the follower side link (4). As a result, the cam guide surface shape can be selected freely to drastically improve the degree of freedom for selecting the target locus on the follower side, and smooth operations of the three-dimensional cam can be obtained not only by the selection of the shape of a supporting member but also by the free design of the cam guide surface shape, without being neither limited to the power transmission between the orthogonal axes nor followed by the backlash.
    • 本发明的目的是提供一种三维凸轮机构,其能够自由地选择凸轮引导表面形状,以显着地提高从动侧的目标轨迹的选择的自由度,不仅传递 正交轴,也是强大可靠的电力,并执行可逆操作。 本发明构造成在三维凸轮(1)中形成三维凸轮引导面(2(3)),并且使凸轮引导面(2)引导凸轮从动件(6( 7)),从而使三维凸轮(1)的旋转运动转变为从动侧连杆(5)的另一端的摆动运动 4)。 因此,可以自由选择凸轮引导面形状,大幅提高从动侧的目标轨迹的选择自由度,不仅可以通过选择形状来获得三维凸轮的平滑操作 的支撑构件,而且还通过凸轮引导件表面形状的自由设计,而不仅限于正交轴之间的动力传递,也不限于后隙。
    • 7. 发明授权
    • Method for manufacturing image sensor
    • 图像传感器制造方法
    • US07560202B2
    • 2009-07-14
    • US11614103
    • 2006-12-21
    • Seong Hee Jeong
    • Seong Hee Jeong
    • G02B5/20
    • H01L27/14685H01L27/14621H01L27/14627
    • A method for manufacturing an image sensor is provided. The method includes forming a metal pad on a pad region of a semiconductor substrate having an active region and the pad region, forming a metal pad opening by forming a passivation layer on an entire surface of the semiconductor substrate including the metal pad and selectively removing the passivation layer to expose the metal pad, forming a color filter array on the passivation layer of the active region by removing a photosensitive layer used for forming the color filter array through an ashing process using an end point detection method, and forming a microlens on the color filter layer.
    • 提供了一种用于制造图像传感器的方法。 该方法包括在具有有源区域和焊盘区域的半导体衬底的焊盘区域上形成金属焊盘,通过在包括金属焊盘的半导体衬底的整个表面上形成钝化层形成金属焊盘开口,并选择性地去除 钝化层以暴露金属焊盘,通过使用端点检测方法通过灰化处理去除用于形成滤色器阵列的感光层,在有源区的钝化层上形成滤色器阵列,以及在所述钝化层上形成微透镜 滤色层。
    • 8. 发明申请
    • METHOD FOR FORMING METAL LINE IN SEMICONDUCTOR DEVICE
    • 在半导体器件中形成金属线的方法
    • US20090166882A1
    • 2009-07-02
    • US12192071
    • 2008-08-14
    • Seong-Hee Jeong
    • Seong-Hee Jeong
    • H01L23/48H01L21/44
    • H01L21/76814H01L21/02063
    • A method for forming a metal line in a semiconductor device includes patterning a part of a first interlayer insulating film over a semiconductor substrate to form a contact hole therein, depositing a first metal in the contact hole to form a metal contact plug, forming a second interlayer insulating film over a semiconductor substrate where the metal contact plug is formed, etching the second interlayer insulating film to form a trench, removing residual gases from the formation of the metal contact plug after the formation of the trench, and depositing a second metal in the trench to form a metal film connected to the metal contact plug. Accordingly, it is possible to avoid the etching of the contact plug by removing the residual gases such as carbon and fluorine, after the formation of a trench.
    • 一种在半导体器件中形成金属线的方法包括:在半导体衬底上形成第一层间绝缘膜的一部分以在其中形成接触孔,在接触孔中沉积第一金属以形成金属接触塞,形成第二层 在形成金属接触塞的半导体基板上的层间绝缘膜,蚀刻第二层间绝缘膜以形成沟槽,在形成沟槽之后从金属接触插塞的形成中除去残留气体,并将第二金属沉积在 沟槽以形成连接到金属接触插塞的金属膜。 因此,可以避免在形成沟槽之后通过去除诸如碳和氟的残留气体来蚀刻接触塞。
    • 10. 发明申请
    • Method for manufacturing image sensor
    • 图像传感器制造方法
    • US20080153194A1
    • 2008-06-26
    • US11929865
    • 2007-10-30
    • Seong Hee JEONG
    • Seong Hee JEONG
    • H01L31/18
    • H01L27/14685H01L27/14621H01L27/14623H01L27/14627
    • A method for manufacturing an image sensor is provided. An interlayer insulating layer can be formed on a semiconductor substrate including a metal line, and a pad can be formed on the interlayer insulating layer. An insulating layer can be formed on the interlayer insulating layer and the pad, and a passivation layer can be formed on the insulating layer. A color filter layer can be formed on the passivation layer, and a planarization layer can be formed on the color filter layer. A microlens can be formed on the planarization layer, and a photoresist layer pattern exposing a portion of the passivation layer over the pad can be formed on the microlens. The pad can then be exposed by using the photoresist layer pattern as a mask, and the photoresist layer pattern can be removed.
    • 提供了一种用于制造图像传感器的方法。 可以在包括金属线的半导体基板上形成层间绝缘层,并且可以在层间绝缘层上形成焊盘。 可以在层间绝缘层和焊盘上形成绝缘层,并且可以在绝缘层上形成钝化层。 可以在钝化层上形成滤色器层,并且可以在滤色器层上形成平坦化层。 可以在平坦化层上形成微透镜,并且可以在微透镜上形成将钝化层的一部分暴露在焊盘上的光致抗蚀剂层图案。 然后可以通过使用光致抗蚀剂层图案作为掩模来曝光焊盘,并且可以去除光致抗蚀剂层图案。