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    • 1. 发明申请
    • Metal filling process and metal filling apparatus
    • 金属灌装工艺和金属灌装设备
    • US20060113057A1
    • 2006-06-01
    • US11333345
    • 2006-01-18
    • Sayaka HirafuneTatsuo Suemasu
    • Sayaka HirafuneTatsuo Suemasu
    • B22D37/00B22D41/00
    • C23C2/34C23C2/00H01L21/76898H05K3/4038H05K2203/0285H05K2203/128H05K2203/1527
    • A metal filling process is provided in which micro holes formed in a work piece are filled with metal by immersing the work piece in molten metal and then removing the work piece from the molten metal. As the work piece is dipped into molten metal, a bottom surface of the work piece is tilted to an angle of 0.5° or more relative to the surface of the molten metal, and as the work piece is removed from the molten metal, a top surface of the work piece is tilted to an angle of 0.5° or more and less than 85° relative to the surface of the molten metal. Failures such as a work piece fracturing when it is dipped into molten metal, or when it is removed from molten metal, are prevented, and failures such as metal remaining on a surface of a work piece after the work piece has been removed from molten metal are also prevented.
    • 提供一种金属填充工艺,其中通过将工件浸入熔融金属中然后从熔融金属中去除工件,在工件中形成的微孔被金属填充。 当工件浸入熔融金属中时,工件的底面相对于熔融金属的表面倾斜0.5°或更大的角度,当工件从熔融金属中取出时,顶部 工件的表面相对于熔融金属的表面倾斜至0.5°以上且小于85°的角度。 防止在将其浸入熔融金属中时工件断裂或者从熔融金属中除去时的失效,并且在工件从熔融金属中除去后残留在工件表面上的金属等故障 也被阻止。
    • 3. 发明授权
    • Semiconductor package and method for manufacturing the same
    • 半导体封装及其制造方法
    • US07368321B2
    • 2008-05-06
    • US11828699
    • 2007-07-26
    • Michikazu TomitaTatsuo SuemasuSayaka Hirafune
    • Michikazu TomitaTatsuo SuemasuSayaka Hirafune
    • H01L21/00
    • H01L27/14618H01L31/0203H01L2224/94
    • A semiconductor package includes: a first substrate including: a semiconductor base material having a first side and a second side; a functional element that is provided at the first side of the semiconductor base material; a first wiring; a pad that is electrically connected to the functional element via the first wiring; a through-hole interconnection that is electrically connected to the pad and is provided in a hole that is defined penetrating the semiconductor base material from the first side thereof to the second side thereof, the through-hole interconnection including a first insulating film and a first conductive material formed on the first insulating film; and a sealing material provided surrounding the functional element; a second substrate that is bonded to a first side of the first substrate via the sealing material.
    • 半导体封装包括:第一基板,包括:具有第一侧和第二侧的半导体基体材料; 设置在所述半导体基材的第一侧的功能元件; 第一布线 通过所述第一布线电连接到所述功能元件的焊盘; 通孔互连,其电连接到所述焊盘,并且设置在从所述半导体基材的第一侧至其第二侧贯通的孔中,所述通孔互连包括第一绝缘膜和第一绝缘膜 形成在第一绝缘膜上的导电材料; 以及围绕所述功能元件设置的密封材料; 经由密封材料结合到第一基板的第一侧的第二基板。
    • 6. 发明申请
    • Semiconductor package and method for manufacturing the same
    • 半导体封装及其制造方法
    • US20060001147A1
    • 2006-01-05
    • US11166195
    • 2005-06-27
    • Michikazu TomitaTatsuo SuemasuSayaka Hirafune
    • Michikazu TomitaTatsuo SuemasuSayaka Hirafune
    • H01L29/76
    • H01L27/14618H01L31/0203H01L2224/94
    • A semiconductor package includes: a first substrate including: a semiconductor base material having a first side and a second side; a functional element that is provided at the first side of the semiconductor base material; a first wiring; a pad that is electrically connected to the functional element via the first wiring; a through-hole interconnection that is electrically connected to the pad and is provided in a hole that is defined penetrating the semiconductor base material from the first side thereof to the second side thereof, the through-hole interconnection including a first insulating film and a first conductive material formed on the first insulating film; and a sealing material provided surrounding the functional element; a second substrate that is bonded to a first side of the first substrate via the sealing material.
    • 半导体封装包括:第一基板,包括:具有第一侧和第二侧的半导体基体材料; 设置在所述半导体基材的第一侧的功能元件; 第一布线 通过所述第一布线电连接到所述功能元件的焊盘; 通孔互连,其电连接到所述焊盘,并且设置在从所述半导体基材的第一侧至其第二侧贯通的孔中,所述通孔互连包括第一绝缘膜和第一绝缘膜 形成在第一绝缘膜上的导电材料; 以及围绕所述功能元件设置的密封材料; 经由密封材料结合到第一基板的第一侧的第二基板。
    • 7. 发明申请
    • Semiconductor package and method for manufacturing the same
    • 半导体封装及其制造方法
    • US20070264753A1
    • 2007-11-15
    • US11828699
    • 2007-07-26
    • Michikazu TomitaTatsuo SuemasuSayaka Hirafune
    • Michikazu TomitaTatsuo SuemasuSayaka Hirafune
    • H01L21/58
    • H01L27/14618H01L31/0203H01L2224/94
    • A semiconductor package includes: a first substrate including: a semiconductor base material having a first side and a second side; a functional element that is provided at the first side of the semiconductor base material; a first wiring; a pad that is electrically connected to the functional element via the first wiring; a through-hole interconnection that is electrically connected to the pad and is provided in a hole that is defined penetrating the semiconductor base material from the first side thereof to the second side thereof, the through-hole interconnection including a first insulating film and a first conductive material formed on the first insulating film; and a sealing material provided surrounding the functional element; a second substrate that is bonded to a first side of the first substrate via the sealing material.
    • 半导体封装包括:第一基板,包括:具有第一侧和第二侧的半导体基体材料; 设置在所述半导体基材的第一侧的功能元件; 第一布线 通过所述第一布线电连接到所述功能元件的焊盘; 通孔互连,其电连接到所述焊盘,并且设置在从所述半导体基材的第一侧至其第二侧贯通的孔中,所述通孔互连包括第一绝缘膜和第一绝缘膜 形成在第一绝缘膜上的导电材料; 以及围绕所述功能元件设置的密封材料; 经由密封材料结合到第一基板的第一侧的第二基板。